JP4646577B2 - 光電変換装置、その製造方法及び撮像システム - Google Patents
光電変換装置、その製造方法及び撮像システム Download PDFInfo
- Publication number
- JP4646577B2 JP4646577B2 JP2004254359A JP2004254359A JP4646577B2 JP 4646577 B2 JP4646577 B2 JP 4646577B2 JP 2004254359 A JP2004254359 A JP 2004254359A JP 2004254359 A JP2004254359 A JP 2004254359A JP 4646577 B2 JP4646577 B2 JP 4646577B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- impurity
- mos transistor
- photoelectric conversion
- transfer mos
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/803—Pixels having integrated switching, control, storage or amplification elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/802—Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
- H10F39/8053—Colour filters
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/811—Interconnections
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
- H10F77/147—Shapes of bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
- H10F77/148—Shapes of potential barriers
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Light Receiving Elements (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004254359A JP4646577B2 (ja) | 2004-09-01 | 2004-09-01 | 光電変換装置、その製造方法及び撮像システム |
| US11/214,846 US7365380B2 (en) | 2004-09-01 | 2005-08-31 | Photoelectric conversion device, method for manufacturing the same and image pickup system |
| US12/041,738 US7994552B2 (en) | 2004-09-01 | 2008-03-04 | Photoelectric conversion device, method for manufacturing the same and image pickup system |
| US13/173,007 US8309997B2 (en) | 2004-09-01 | 2011-06-30 | Photoelectric conversion device, method for manufacturing the same and image pickup system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004254359A JP4646577B2 (ja) | 2004-09-01 | 2004-09-01 | 光電変換装置、その製造方法及び撮像システム |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010191389A Division JP5295188B2 (ja) | 2010-08-27 | 2010-08-27 | 光電変換装置、その製造方法及び撮像システム |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006073734A JP2006073734A (ja) | 2006-03-16 |
| JP2006073734A5 JP2006073734A5 (enExample) | 2007-10-18 |
| JP4646577B2 true JP4646577B2 (ja) | 2011-03-09 |
Family
ID=35941827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004254359A Expired - Fee Related JP4646577B2 (ja) | 2004-09-01 | 2004-09-01 | 光電変換装置、その製造方法及び撮像システム |
Country Status (2)
| Country | Link |
|---|---|
| US (3) | US7365380B2 (enExample) |
| JP (1) | JP4646577B2 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7737519B2 (en) * | 2004-05-06 | 2010-06-15 | Canon Kabushiki Kaisha | Photoelectric conversion device and manufacturing method thereof |
| JP4496866B2 (ja) * | 2004-07-08 | 2010-07-07 | ソニー株式会社 | 固体撮像素子及びその製造方法 |
| JP4646577B2 (ja) | 2004-09-01 | 2011-03-09 | キヤノン株式会社 | 光電変換装置、その製造方法及び撮像システム |
| JP4618786B2 (ja) * | 2005-01-28 | 2011-01-26 | キヤノン株式会社 | 固体撮像装置の製造方法 |
| JP2007242697A (ja) * | 2006-03-06 | 2007-09-20 | Canon Inc | 撮像装置および撮像システム |
| JP5305622B2 (ja) * | 2006-08-31 | 2013-10-02 | キヤノン株式会社 | 光電変換装置の製造方法 |
| JP4315457B2 (ja) * | 2006-08-31 | 2009-08-19 | キヤノン株式会社 | 光電変換装置及び撮像システム |
| JP5159120B2 (ja) * | 2007-02-23 | 2013-03-06 | キヤノン株式会社 | 光電変換装置およびその製造方法 |
| JP2008244021A (ja) * | 2007-03-26 | 2008-10-09 | Matsushita Electric Ind Co Ltd | 固体撮像装置およびそれを用いたカメラ |
| JP5366396B2 (ja) * | 2007-12-28 | 2013-12-11 | キヤノン株式会社 | 光電変換装置の製造方法、半導体装置の製造方法、光電変換装置、及び撮像システム |
| JP4798205B2 (ja) | 2008-10-23 | 2011-10-19 | ソニー株式会社 | 固体撮像装置とその製造方法、及び撮像装置 |
| JP5302644B2 (ja) * | 2008-12-03 | 2013-10-02 | キヤノン株式会社 | 撮像装置、及び撮像システム |
| JP2010161236A (ja) | 2009-01-08 | 2010-07-22 | Canon Inc | 光電変換装置の製造方法 |
| JP5558916B2 (ja) * | 2009-06-26 | 2014-07-23 | キヤノン株式会社 | 光電変換装置の製造方法 |
| JP5563257B2 (ja) * | 2009-08-28 | 2014-07-30 | キヤノン株式会社 | 光電変換装置、撮像システム、及び光電変換装置の製造方法 |
| US20110169991A1 (en) * | 2010-01-08 | 2011-07-14 | Omnivision Technologies, Inc. | Image sensor with epitaxially self-aligned photo sensors |
| JP6529221B2 (ja) | 2014-05-14 | 2019-06-12 | キヤノン株式会社 | 光電変換装置及びその製造方法 |
| JP6541361B2 (ja) * | 2015-02-05 | 2019-07-10 | キヤノン株式会社 | 固体撮像装置 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2901328B2 (ja) * | 1990-09-20 | 1999-06-07 | 日本電気株式会社 | 固体撮像素子 |
| JPH04326874A (ja) * | 1991-04-26 | 1992-11-16 | Fuji Photo Film Co Ltd | ストロボ付ムービーカメラ |
| JPH0694978A (ja) * | 1992-09-14 | 1994-04-08 | Nikon Corp | 視線検出装置 |
| JP2557192Y2 (ja) * | 1993-04-19 | 1997-12-08 | マックス株式会社 | 鉄筋等の結束機用のワイヤリール |
| JPH07161958A (ja) * | 1993-12-09 | 1995-06-23 | Nec Corp | 固体撮像装置 |
| JPH11126893A (ja) * | 1997-10-23 | 1999-05-11 | Nikon Corp | 固体撮像素子とその製造方法 |
| US6023081A (en) * | 1997-11-14 | 2000-02-08 | Motorola, Inc. | Semiconductor image sensor |
| US6051857A (en) * | 1998-01-07 | 2000-04-18 | Innovision, Inc. | Solid-state imaging device and method of detecting optical signals using the same |
| JPH11274454A (ja) * | 1998-03-19 | 1999-10-08 | Canon Inc | 固体撮像装置及びその形成方法 |
| JP3592107B2 (ja) * | 1998-11-27 | 2004-11-24 | キヤノン株式会社 | 固体撮像装置およびカメラ |
| US6850278B1 (en) | 1998-11-27 | 2005-02-01 | Canon Kabushiki Kaisha | Solid-state image pickup apparatus |
| JP4604296B2 (ja) * | 1999-02-09 | 2011-01-05 | ソニー株式会社 | 固体撮像装置及びその製造方法 |
| JP3934827B2 (ja) | 1999-06-30 | 2007-06-20 | 株式会社東芝 | 固体撮像装置 |
| US6504194B1 (en) * | 1999-12-01 | 2003-01-07 | Innotech Corporation | Solid state imaging device, method of manufacturing the same, and solid state imaging system |
| JP2001196572A (ja) | 2000-01-13 | 2001-07-19 | Canon Inc | 光電変換装置 |
| JP2001284568A (ja) * | 2000-03-31 | 2001-10-12 | Sharp Corp | 固体撮像装置 |
| US20020047174A1 (en) * | 2000-10-06 | 2002-04-25 | Piet De Pauw | Photodiode and methods for design optimization and generating fast signal current |
| JP4270742B2 (ja) * | 2000-11-30 | 2009-06-03 | Necエレクトロニクス株式会社 | 固体撮像装置 |
| JP2004039671A (ja) | 2002-06-28 | 2004-02-05 | Canon Inc | 光電変換装置及びその制御方法 |
| JP3840214B2 (ja) | 2003-01-06 | 2006-11-01 | キヤノン株式会社 | 光電変換装置及び光電変換装置の製造方法及び同光電変換装置を用いたカメラ |
| US7323731B2 (en) * | 2003-12-12 | 2008-01-29 | Canon Kabushiki Kaisha | Photoelectric conversion device, method of manufacturing photoelectric conversion device, and image pickup system |
| JP4646577B2 (ja) * | 2004-09-01 | 2011-03-09 | キヤノン株式会社 | 光電変換装置、その製造方法及び撮像システム |
| JP4618786B2 (ja) | 2005-01-28 | 2011-01-26 | キヤノン株式会社 | 固体撮像装置の製造方法 |
| JP2006261597A (ja) | 2005-03-18 | 2006-09-28 | Canon Inc | 固体撮像装置、その製造方法及びカメラ |
-
2004
- 2004-09-01 JP JP2004254359A patent/JP4646577B2/ja not_active Expired - Fee Related
-
2005
- 2005-08-31 US US11/214,846 patent/US7365380B2/en not_active Expired - Fee Related
-
2008
- 2008-03-04 US US12/041,738 patent/US7994552B2/en not_active Expired - Fee Related
-
2011
- 2011-06-30 US US13/173,007 patent/US8309997B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US7365380B2 (en) | 2008-04-29 |
| US20110254065A1 (en) | 2011-10-20 |
| US20060043442A1 (en) | 2006-03-02 |
| US20080157153A1 (en) | 2008-07-03 |
| US8309997B2 (en) | 2012-11-13 |
| US7994552B2 (en) | 2011-08-09 |
| JP2006073734A (ja) | 2006-03-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7994552B2 (en) | Photoelectric conversion device, method for manufacturing the same and image pickup system | |
| JP4340248B2 (ja) | 半導体撮像装置を製造する方法 | |
| US7855407B2 (en) | CMOS image sensor and method for manufacturing the same | |
| JP5365144B2 (ja) | 固体撮像装置とその製造方法、及び電子機器 | |
| JP5564909B2 (ja) | 固体撮像装置とその製造方法、及び電子機器 | |
| JP4739324B2 (ja) | フォトダイオード領域を埋め込んだイメージセンサ及びその製造方法 | |
| US8363141B2 (en) | Solid-state image pickup device, image pickup system including the same, and method for manufacturing the same | |
| US7923727B2 (en) | Image sensor including a photoelectric conversion film | |
| JP4649441B2 (ja) | 裏面照射型撮像素子及びこれを備えた撮像装置 | |
| JP5487798B2 (ja) | 固体撮像装置、電子機器および固体撮像装置の製造方法 | |
| JP2012199489A (ja) | 固体撮像装置、固体撮像装置の製造方法、及び電子機器 | |
| CN100438057C (zh) | Cmos图像传感器及其制造方法 | |
| JP2014045219A (ja) | 固体撮像装置 | |
| JP5407282B2 (ja) | 固体撮像装置とその製造方法、及び電子機器 | |
| JP4174468B2 (ja) | 光電変換装置及び撮像システム | |
| CN101826539B (zh) | 固态图像捕获装置、制造该装置的方法以及图像捕获设备 | |
| CN100442530C (zh) | 固态成像器件及其驱动方法和照相装置 | |
| JP4709319B2 (ja) | 光電変換装置およびその製造方法、ならびに撮像システム | |
| JP5295188B2 (ja) | 光電変換装置、その製造方法及び撮像システム | |
| JP5624644B2 (ja) | 光電変換装置の製造方法 | |
| JP4115446B2 (ja) | Cmosイメージセンサの製造方法 | |
| US20070166865A1 (en) | CMOS Image Sensor and Method for Manufacturing the Same | |
| JP2005317639A (ja) | 光電変換装置及びその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070903 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070903 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20080207 |
|
| RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20090326 |
|
| RD05 | Notification of revocation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7425 Effective date: 20090427 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100628 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20100630 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100827 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100917 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101116 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20101206 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101207 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131217 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| LAPS | Cancellation because of no payment of annual fees |