JP4633370B2 - 真空装置 - Google Patents

真空装置 Download PDF

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Publication number
JP4633370B2
JP4633370B2 JP2004039597A JP2004039597A JP4633370B2 JP 4633370 B2 JP4633370 B2 JP 4633370B2 JP 2004039597 A JP2004039597 A JP 2004039597A JP 2004039597 A JP2004039597 A JP 2004039597A JP 4633370 B2 JP4633370 B2 JP 4633370B2
Authority
JP
Japan
Prior art keywords
vacuum
pump
vacuum pump
gas
compressor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004039597A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005232977A (ja
Inventor
忠弘 大見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Foundation for Advancement of International Science
Original Assignee
Foundation for Advancement of International Science
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Foundation for Advancement of International Science filed Critical Foundation for Advancement of International Science
Priority to JP2004039597A priority Critical patent/JP4633370B2/ja
Priority to US10/589,748 priority patent/US20080206072A1/en
Priority to PCT/JP2005/002151 priority patent/WO2005078281A1/fr
Priority to TW094104683A priority patent/TW200537025A/zh
Publication of JP2005232977A publication Critical patent/JP2005232977A/ja
Application granted granted Critical
Publication of JP4633370B2 publication Critical patent/JP4633370B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
    • F04C23/003—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle having complementary function
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C18/14—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons
    • F04C18/16—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons with helical teeth, e.g. chevron-shaped, screw type
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/30—Use in a chemical vapor deposition [CVD] process or in a similar process

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Non-Positive Displacement Air Blowers (AREA)
JP2004039597A 2004-02-17 2004-02-17 真空装置 Expired - Fee Related JP4633370B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004039597A JP4633370B2 (ja) 2004-02-17 2004-02-17 真空装置
US10/589,748 US20080206072A1 (en) 2004-02-17 2005-02-14 Vacuum Apparatus
PCT/JP2005/002151 WO2005078281A1 (fr) 2004-02-17 2005-02-14 Appareil à vide
TW094104683A TW200537025A (en) 2004-02-17 2005-02-17 Vacuum apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004039597A JP4633370B2 (ja) 2004-02-17 2004-02-17 真空装置

Publications (2)

Publication Number Publication Date
JP2005232977A JP2005232977A (ja) 2005-09-02
JP4633370B2 true JP4633370B2 (ja) 2011-02-16

Family

ID=34857851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004039597A Expired - Fee Related JP4633370B2 (ja) 2004-02-17 2004-02-17 真空装置

Country Status (4)

Country Link
US (1) US20080206072A1 (fr)
JP (1) JP4633370B2 (fr)
TW (1) TW200537025A (fr)
WO (1) WO2005078281A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5862943B2 (ja) * 2011-11-16 2016-02-16 新東工業株式会社 真空装置及び真空装置の真空容器内の圧力制御方法
DE102012204820A1 (de) * 2012-03-26 2013-09-26 Bayerische Motoren Werke Aktiengesellschaft Fahrzeug-Tanksystem zur Speicherung eines Betriebsstoffes in tiefkaltem Zustand
WO2015182699A1 (fr) 2014-05-30 2015-12-03 株式会社 荏原製作所 Système d'évacuation des gaz
US10155600B2 (en) * 2015-12-28 2018-12-18 Starvac Systems Pty Ltd Apparatus for vacuum sealing products
JP6849184B2 (ja) * 2016-10-31 2021-03-24 範多機械株式会社 汚泥吸引車及びそれに用いられる汚泥回収機構
GB201707458D0 (en) * 2017-05-10 2017-06-21 Edwards Ltd Lubrication of gears in twin-shaft pumps

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04252878A (ja) * 1991-01-28 1992-09-08 Toshiba Corp 電子部品製造装置
JPH09195976A (ja) * 1996-01-18 1997-07-29 Kokusai Electric Co Ltd 真空排気装置
JPH10252651A (ja) * 1997-03-11 1998-09-22 Ebara Corp 真空排気システム
JP2002039061A (ja) * 2000-07-25 2002-02-06 Dia Shinku Kk 真空装置

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2430314C3 (de) * 1974-06-24 1982-11-25 Siemens AG, 1000 Berlin und 8000 München Flüssigkeitsring-Vakuumpumpe mit vorgeschaltetem Verdichter
FR2640697B1 (fr) * 1988-12-16 1993-01-08 Cit Alcatel Ensemble de pompage pour l'obtention de vides eleves
NL9200076A (nl) * 1992-01-16 1993-08-16 Leybold B V Werkwijze, droge meertrapspomp en plasmascrubber voor het omvormen van reactieve gassen.
DE4213763B4 (de) * 1992-04-27 2004-11-25 Unaxis Deutschland Holding Gmbh Verfahren zum Evakuieren einer Vakuumkammer und einer Hochvakuumkammer sowie Hochvakuumanlage zu seiner Durchführung
US5733104A (en) * 1992-12-24 1998-03-31 Balzers-Pfeiffer Gmbh Vacuum pump system
JPH08321448A (ja) * 1995-05-25 1996-12-03 Tadahiro Omi 真空排気装置、半導体製造装置及び真空処理方法
DE19524609A1 (de) * 1995-07-06 1997-01-09 Leybold Ag Vorrichtung zum raschen Evakuieren einer Vakuumkammer
GB9614849D0 (en) * 1996-07-15 1996-09-04 Boc Group Plc Processes for the scubbing of noxious substances
KR0183912B1 (ko) * 1996-08-08 1999-05-01 김광호 다중 반응 챔버에 연결된 펌핑 설비 및 이를 사용하는 방법
JP3767052B2 (ja) * 1996-11-30 2006-04-19 アイシン精機株式会社 多段式真空ポンプ
DE19704234B4 (de) * 1997-02-05 2006-05-11 Pfeiffer Vacuum Gmbh Verfahren und Vorrichtung zur Regelung des Saugvermögens von Vakuumpumpen
US5944049A (en) * 1997-07-15 1999-08-31 Applied Materials, Inc. Apparatus and method for regulating a pressure in a chamber
JP4112659B2 (ja) * 1997-12-01 2008-07-02 大陽日酸株式会社 希ガスの回収方法及び装置
US7077159B1 (en) * 1998-12-23 2006-07-18 Applied Materials, Inc. Processing apparatus having integrated pumping system
KR100384907B1 (ko) * 1999-03-05 2003-05-23 동경 엘렉트론 주식회사 진공 장치
DE19929519A1 (de) * 1999-06-28 2001-01-04 Pfeiffer Vacuum Gmbh Verfahren zum Betrieb einer Mehrkammer-Vakuumanlage
US6863019B2 (en) * 2000-06-13 2005-03-08 Applied Materials, Inc. Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
FR2822200B1 (fr) * 2001-03-19 2003-09-26 Cit Alcatel Systeme de pompage pour gaz a faible conductivite thermique
JP4335469B2 (ja) * 2001-03-22 2009-09-30 株式会社荏原製作所 真空排気装置のガス循環量調整方法及び装置
US6589023B2 (en) * 2001-10-09 2003-07-08 Applied Materials, Inc. Device and method for reducing vacuum pump energy consumption
DE10302764A1 (de) * 2003-01-24 2004-07-29 Pfeiffer Vacuum Gmbh Vakuumpumpsystem
US7094036B2 (en) * 2003-09-24 2006-08-22 The Boc Group Plc Vacuum pumping system
US20070020115A1 (en) * 2005-07-01 2007-01-25 The Boc Group, Inc. Integrated pump apparatus for semiconductor processing

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04252878A (ja) * 1991-01-28 1992-09-08 Toshiba Corp 電子部品製造装置
JPH09195976A (ja) * 1996-01-18 1997-07-29 Kokusai Electric Co Ltd 真空排気装置
JPH10252651A (ja) * 1997-03-11 1998-09-22 Ebara Corp 真空排気システム
JP2002039061A (ja) * 2000-07-25 2002-02-06 Dia Shinku Kk 真空装置

Also Published As

Publication number Publication date
TW200537025A (en) 2005-11-16
US20080206072A1 (en) 2008-08-28
JP2005232977A (ja) 2005-09-02
WO2005078281A1 (fr) 2005-08-25

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