JP4525789B2 - 作業設備および作業設備における局所クリーンルーム - Google Patents
作業設備および作業設備における局所クリーンルーム Download PDFInfo
- Publication number
- JP4525789B2 JP4525789B2 JP2008108058A JP2008108058A JP4525789B2 JP 4525789 B2 JP4525789 B2 JP 4525789B2 JP 2008108058 A JP2008108058 A JP 2008108058A JP 2008108058 A JP2008108058 A JP 2008108058A JP 4525789 B2 JP4525789 B2 JP 4525789B2
- Authority
- JP
- Japan
- Prior art keywords
- work
- area
- clean
- room
- drive unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000428 dust Substances 0.000 claims description 44
- 230000003749 cleanliness Effects 0.000 claims description 35
- 238000010276 construction Methods 0.000 claims description 20
- 239000000853 adhesive Substances 0.000 claims description 7
- 230000001070 adhesive effect Effects 0.000 claims description 7
- 238000012545 processing Methods 0.000 description 17
- 239000002245 particle Substances 0.000 description 15
- 238000005192 partition Methods 0.000 description 6
- 239000002648 laminated material Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000009940 knitting Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000009423 ventilation Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 2
- 238000004378 air conditioning Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
Images
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- Ventilation (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008108058A JP4525789B2 (ja) | 2008-04-17 | 2008-04-17 | 作業設備および作業設備における局所クリーンルーム |
CN2009101345060A CN101559388B (zh) | 2008-04-17 | 2009-04-17 | 洁净室装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008108058A JP4525789B2 (ja) | 2008-04-17 | 2008-04-17 | 作業設備および作業設備における局所クリーンルーム |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009257680A JP2009257680A (ja) | 2009-11-05 |
JP4525789B2 true JP4525789B2 (ja) | 2010-08-18 |
Family
ID=41218465
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008108058A Expired - Fee Related JP4525789B2 (ja) | 2008-04-17 | 2008-04-17 | 作業設備および作業設備における局所クリーンルーム |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4525789B2 (zh) |
CN (1) | CN101559388B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5427833B2 (ja) * | 2011-05-18 | 2014-02-26 | パナソニック株式会社 | クリーンルームの逆流防止装置 |
WO2016190021A1 (ja) * | 2015-05-26 | 2016-12-01 | 住友化学株式会社 | 偏光板製造用クリーンルーム |
CN105771523A (zh) * | 2016-05-10 | 2016-07-20 | 江苏万新光学有限公司 | 一种偏光片洁净装片装置 |
US20210125843A1 (en) * | 2019-10-24 | 2021-04-29 | Xia Tai Xin Semiconductor (Qing Dao) Ltd. | Air control cabinet module and clean room system having the same |
JP7448778B2 (ja) * | 2019-11-20 | 2024-03-13 | 三井住友建設株式会社 | 物品処理設備 |
JP7513399B2 (ja) | 2020-01-23 | 2024-07-09 | ファナック株式会社 | クリーンベンチ装置 |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6335414U (zh) * | 1986-08-27 | 1988-03-07 | ||
JPH03107642U (zh) * | 1989-12-22 | 1991-11-06 | ||
JPH05340581A (ja) * | 1992-06-09 | 1993-12-21 | Retsu Yamakawa | クリーンルームシステム |
JPH0745487A (ja) * | 1993-07-27 | 1995-02-14 | Sony Corp | 半導体製造装置 |
JPH0888155A (ja) * | 1994-09-20 | 1996-04-02 | Asahi Kogyosha:Kk | 局所クリーン化におけるインターフェイスボックス及びそのクリーンルーム |
JPH09264575A (ja) * | 1996-03-28 | 1997-10-07 | Matsushita Electric Ind Co Ltd | 製造装置及び清浄方法 |
JP2000085963A (ja) * | 1998-09-16 | 2000-03-28 | Shin Meiwa Ind Co Ltd | クリーン作業装置 |
JP2003042498A (ja) * | 2001-07-31 | 2003-02-13 | Sony Corp | 半導体製造システム、半導体製造装置、半導体製造方法及び半導体装置 |
JP2003083579A (ja) * | 2001-09-11 | 2003-03-19 | Seiko Epson Corp | クリーンスペースユニットとクリーンエア吹き出しユニット |
JP2003214668A (ja) * | 2002-01-21 | 2003-07-30 | Hitachi Plant Eng & Constr Co Ltd | クリーンルーム |
JP2003302083A (ja) * | 2002-04-10 | 2003-10-24 | Canon Inc | ワークの加工方法、ワークの加工装置及びカセット、並びに、プリント装置のユニット |
JP2004228576A (ja) * | 2003-01-24 | 2004-08-12 | Samsung Electronics Co Ltd | 基板加工装置 |
JP2006242419A (ja) * | 2005-03-01 | 2006-09-14 | Sanki Eng Co Ltd | クリーンブースおよびそのクリーンブースを用いた作業システム |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1008397B (zh) * | 1985-10-09 | 1990-06-13 | 高砂热学工业株式会社 | 多用途适应性强的洁净室系统 |
JPS6475835A (en) * | 1987-09-17 | 1989-03-22 | Fujitsu Ltd | Clean working booth |
TWI289645B (en) * | 2003-07-29 | 2007-11-11 | Alps Electric Co Ltd | Clean bench |
-
2008
- 2008-04-17 JP JP2008108058A patent/JP4525789B2/ja not_active Expired - Fee Related
-
2009
- 2009-04-17 CN CN2009101345060A patent/CN101559388B/zh not_active Expired - Fee Related
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6335414U (zh) * | 1986-08-27 | 1988-03-07 | ||
JPH03107642U (zh) * | 1989-12-22 | 1991-11-06 | ||
JPH05340581A (ja) * | 1992-06-09 | 1993-12-21 | Retsu Yamakawa | クリーンルームシステム |
JPH0745487A (ja) * | 1993-07-27 | 1995-02-14 | Sony Corp | 半導体製造装置 |
JPH0888155A (ja) * | 1994-09-20 | 1996-04-02 | Asahi Kogyosha:Kk | 局所クリーン化におけるインターフェイスボックス及びそのクリーンルーム |
JPH09264575A (ja) * | 1996-03-28 | 1997-10-07 | Matsushita Electric Ind Co Ltd | 製造装置及び清浄方法 |
JP2000085963A (ja) * | 1998-09-16 | 2000-03-28 | Shin Meiwa Ind Co Ltd | クリーン作業装置 |
JP2003042498A (ja) * | 2001-07-31 | 2003-02-13 | Sony Corp | 半導体製造システム、半導体製造装置、半導体製造方法及び半導体装置 |
JP2003083579A (ja) * | 2001-09-11 | 2003-03-19 | Seiko Epson Corp | クリーンスペースユニットとクリーンエア吹き出しユニット |
JP2003214668A (ja) * | 2002-01-21 | 2003-07-30 | Hitachi Plant Eng & Constr Co Ltd | クリーンルーム |
JP2003302083A (ja) * | 2002-04-10 | 2003-10-24 | Canon Inc | ワークの加工方法、ワークの加工装置及びカセット、並びに、プリント装置のユニット |
JP2004228576A (ja) * | 2003-01-24 | 2004-08-12 | Samsung Electronics Co Ltd | 基板加工装置 |
JP2006242419A (ja) * | 2005-03-01 | 2006-09-14 | Sanki Eng Co Ltd | クリーンブースおよびそのクリーンブースを用いた作業システム |
Also Published As
Publication number | Publication date |
---|---|
CN101559388A (zh) | 2009-10-21 |
JP2009257680A (ja) | 2009-11-05 |
CN101559388B (zh) | 2012-08-22 |
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