JP4525789B2 - 作業設備および作業設備における局所クリーンルーム - Google Patents

作業設備および作業設備における局所クリーンルーム Download PDF

Info

Publication number
JP4525789B2
JP4525789B2 JP2008108058A JP2008108058A JP4525789B2 JP 4525789 B2 JP4525789 B2 JP 4525789B2 JP 2008108058 A JP2008108058 A JP 2008108058A JP 2008108058 A JP2008108058 A JP 2008108058A JP 4525789 B2 JP4525789 B2 JP 4525789B2
Authority
JP
Japan
Prior art keywords
work
area
clean
room
drive unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008108058A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009257680A (ja
Inventor
倫央 郷古
敦資 坂井田
富一 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
Denso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denso Corp filed Critical Denso Corp
Priority to JP2008108058A priority Critical patent/JP4525789B2/ja
Priority to CN2009101345060A priority patent/CN101559388B/zh
Publication of JP2009257680A publication Critical patent/JP2009257680A/ja
Application granted granted Critical
Publication of JP4525789B2 publication Critical patent/JP4525789B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Ventilation (AREA)
JP2008108058A 2008-04-17 2008-04-17 作業設備および作業設備における局所クリーンルーム Expired - Fee Related JP4525789B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008108058A JP4525789B2 (ja) 2008-04-17 2008-04-17 作業設備および作業設備における局所クリーンルーム
CN2009101345060A CN101559388B (zh) 2008-04-17 2009-04-17 洁净室装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008108058A JP4525789B2 (ja) 2008-04-17 2008-04-17 作業設備および作業設備における局所クリーンルーム

Publications (2)

Publication Number Publication Date
JP2009257680A JP2009257680A (ja) 2009-11-05
JP4525789B2 true JP4525789B2 (ja) 2010-08-18

Family

ID=41218465

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008108058A Expired - Fee Related JP4525789B2 (ja) 2008-04-17 2008-04-17 作業設備および作業設備における局所クリーンルーム

Country Status (2)

Country Link
JP (1) JP4525789B2 (zh)
CN (1) CN101559388B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5427833B2 (ja) * 2011-05-18 2014-02-26 パナソニック株式会社 クリーンルームの逆流防止装置
WO2016190021A1 (ja) * 2015-05-26 2016-12-01 住友化学株式会社 偏光板製造用クリーンルーム
CN105771523A (zh) * 2016-05-10 2016-07-20 江苏万新光学有限公司 一种偏光片洁净装片装置
US20210125843A1 (en) * 2019-10-24 2021-04-29 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Air control cabinet module and clean room system having the same
JP7448778B2 (ja) * 2019-11-20 2024-03-13 三井住友建設株式会社 物品処理設備
JP7513399B2 (ja) 2020-01-23 2024-07-09 ファナック株式会社 クリーンベンチ装置

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6335414U (zh) * 1986-08-27 1988-03-07
JPH03107642U (zh) * 1989-12-22 1991-11-06
JPH05340581A (ja) * 1992-06-09 1993-12-21 Retsu Yamakawa クリーンルームシステム
JPH0745487A (ja) * 1993-07-27 1995-02-14 Sony Corp 半導体製造装置
JPH0888155A (ja) * 1994-09-20 1996-04-02 Asahi Kogyosha:Kk 局所クリーン化におけるインターフェイスボックス及びそのクリーンルーム
JPH09264575A (ja) * 1996-03-28 1997-10-07 Matsushita Electric Ind Co Ltd 製造装置及び清浄方法
JP2000085963A (ja) * 1998-09-16 2000-03-28 Shin Meiwa Ind Co Ltd クリーン作業装置
JP2003042498A (ja) * 2001-07-31 2003-02-13 Sony Corp 半導体製造システム、半導体製造装置、半導体製造方法及び半導体装置
JP2003083579A (ja) * 2001-09-11 2003-03-19 Seiko Epson Corp クリーンスペースユニットとクリーンエア吹き出しユニット
JP2003214668A (ja) * 2002-01-21 2003-07-30 Hitachi Plant Eng & Constr Co Ltd クリーンルーム
JP2003302083A (ja) * 2002-04-10 2003-10-24 Canon Inc ワークの加工方法、ワークの加工装置及びカセット、並びに、プリント装置のユニット
JP2004228576A (ja) * 2003-01-24 2004-08-12 Samsung Electronics Co Ltd 基板加工装置
JP2006242419A (ja) * 2005-03-01 2006-09-14 Sanki Eng Co Ltd クリーンブースおよびそのクリーンブースを用いた作業システム

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1008397B (zh) * 1985-10-09 1990-06-13 高砂热学工业株式会社 多用途适应性强的洁净室系统
JPS6475835A (en) * 1987-09-17 1989-03-22 Fujitsu Ltd Clean working booth
TWI289645B (en) * 2003-07-29 2007-11-11 Alps Electric Co Ltd Clean bench

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6335414U (zh) * 1986-08-27 1988-03-07
JPH03107642U (zh) * 1989-12-22 1991-11-06
JPH05340581A (ja) * 1992-06-09 1993-12-21 Retsu Yamakawa クリーンルームシステム
JPH0745487A (ja) * 1993-07-27 1995-02-14 Sony Corp 半導体製造装置
JPH0888155A (ja) * 1994-09-20 1996-04-02 Asahi Kogyosha:Kk 局所クリーン化におけるインターフェイスボックス及びそのクリーンルーム
JPH09264575A (ja) * 1996-03-28 1997-10-07 Matsushita Electric Ind Co Ltd 製造装置及び清浄方法
JP2000085963A (ja) * 1998-09-16 2000-03-28 Shin Meiwa Ind Co Ltd クリーン作業装置
JP2003042498A (ja) * 2001-07-31 2003-02-13 Sony Corp 半導体製造システム、半導体製造装置、半導体製造方法及び半導体装置
JP2003083579A (ja) * 2001-09-11 2003-03-19 Seiko Epson Corp クリーンスペースユニットとクリーンエア吹き出しユニット
JP2003214668A (ja) * 2002-01-21 2003-07-30 Hitachi Plant Eng & Constr Co Ltd クリーンルーム
JP2003302083A (ja) * 2002-04-10 2003-10-24 Canon Inc ワークの加工方法、ワークの加工装置及びカセット、並びに、プリント装置のユニット
JP2004228576A (ja) * 2003-01-24 2004-08-12 Samsung Electronics Co Ltd 基板加工装置
JP2006242419A (ja) * 2005-03-01 2006-09-14 Sanki Eng Co Ltd クリーンブースおよびそのクリーンブースを用いた作業システム

Also Published As

Publication number Publication date
CN101559388A (zh) 2009-10-21
JP2009257680A (ja) 2009-11-05
CN101559388B (zh) 2012-08-22

Similar Documents

Publication Publication Date Title
JP4525789B2 (ja) 作業設備および作業設備における局所クリーンルーム
US6033301A (en) Fan filter unit and a clean room for using the same
JP4598124B2 (ja) ワーク自動作業装置
JP4684683B2 (ja) クリーンブースおよびそのクリーンブースを用いた作業システム
JPH09264575A (ja) 製造装置及び清浄方法
JP5408909B2 (ja) クリーンルーム
JP4370186B2 (ja) 薄膜太陽電池製造システム
KR200476578Y1 (ko) 레이저 가공설비의 보조 집진장치
JP7513399B2 (ja) クリーンベンチ装置
JP2000346416A (ja) 循環型クリーンルーム
JPH07310941A (ja) クリーンルーム
JP2014025617A (ja) エアシャワー装置
JP2007171730A (ja) レチクルクリーニング装置
KR100628580B1 (ko) 생산시스템
JP2003004273A (ja) クリーンルーム内の除塵方法
KR100213436B1 (ko) Lcd 패널 제작 장치 및 이를 이용한 청정실 시스템
JP2006071167A (ja) クリーンルーム
JPH07318128A (ja) クリーンルームで発生する汚染物質の除去方法
KR20140084286A (ko) 기판 처리 장치 및 로봇 컨트롤러
JP2904011B2 (ja) クリーンルーム
JP2002143697A (ja) 防塵ブース
JP2001343140A (ja) クリーン作業モジュールおよびクリーントンネル
JP7069651B2 (ja) ロードポート装置
JP3987901B2 (ja) エアーシャワー装置及びクリーンルーム
CN108405539A (zh) 局部回风无尘系统及一种工作台

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090821

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100226

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100302

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100405

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100511

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100524

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130611

Year of fee payment: 3

R151 Written notification of patent or utility model registration

Ref document number: 4525789

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130611

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140611

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees