JP4500492B2 - 安定なエレクトロルミネッセント装置 - Google Patents

安定なエレクトロルミネッセント装置 Download PDF

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Publication number
JP4500492B2
JP4500492B2 JP2002577494A JP2002577494A JP4500492B2 JP 4500492 B2 JP4500492 B2 JP 4500492B2 JP 2002577494 A JP2002577494 A JP 2002577494A JP 2002577494 A JP2002577494 A JP 2002577494A JP 4500492 B2 JP4500492 B2 JP 4500492B2
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layer
transparent
polymer
copolymer
paste
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Expired - Fee Related
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Japanese (ja)
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JP2005501373A5 (enExample
JP2005501373A (ja
Inventor
ビレルト,ペーター
クローツ,トム
バン・デン・ボゲルト,ロジエ
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アグフア−ゲヴエルト,ナームローゼ・フエンノートシヤツプ
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/20—Polysulfones
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/12—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
    • H01B1/124—Intrinsically conductive polymers
    • H01B1/128—Intrinsically conductive polymers comprising six-membered aromatic rings in the main chain, e.g. polyanilines, polyphenylenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • C08G61/122—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides
    • C08G61/123—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds
    • C08G61/126—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule derived from five- or six-membered heterocyclic compounds, other than imides derived from five-membered heterocyclic compounds with a five-membered ring containing one sulfur atom in the ring
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/106—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/52—Electrically conductive inks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D165/00—Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/06—Luminescent materials, e.g. electroluminescent or chemiluminescent containing organic luminescent materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/82—Cathodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Conductive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2002577494A 2001-03-29 2002-03-19 安定なエレクトロルミネッセント装置 Expired - Fee Related JP4500492B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP01000098 2001-03-29
EP01000730 2001-12-10
PCT/EP2002/003063 WO2002080627A2 (en) 2001-03-29 2002-03-19 Stable electroluminescent devices

Publications (3)

Publication Number Publication Date
JP2005501373A JP2005501373A (ja) 2005-01-13
JP2005501373A5 JP2005501373A5 (enExample) 2005-12-22
JP4500492B2 true JP4500492B2 (ja) 2010-07-14

Family

ID=26076409

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2002577494A Expired - Fee Related JP4500492B2 (ja) 2001-03-29 2002-03-19 安定なエレクトロルミネッセント装置
JP2002578328A Expired - Fee Related JP3855167B2 (ja) 2001-03-29 2002-03-19 3,4−ジアルコキシチオフェンのポリマーもしくはコポリマー及び非−ニュートニアン結合剤を含有する水性組成物。

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2002578328A Expired - Fee Related JP3855167B2 (ja) 2001-03-29 2002-03-19 3,4−ジアルコキシチオフェンのポリマーもしくはコポリマー及び非−ニュートニアン結合剤を含有する水性組成物。

Country Status (8)

Country Link
EP (2) EP1374644B1 (enExample)
JP (2) JP4500492B2 (enExample)
KR (2) KR100859363B1 (enExample)
CN (2) CN100558782C (enExample)
AU (2) AU2002315256A1 (enExample)
DE (1) DE60210429T2 (enExample)
TW (2) TWI283140B (enExample)
WO (2) WO2002079316A2 (enExample)

Families Citing this family (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PT1446985E (pt) * 2001-10-24 2008-11-24 Lyttron Technology Gmbh Visor electroluminescente tridimensional
AU2003237181A1 (en) * 2002-05-07 2003-11-11 Reveo, Inc. Conductive ink
US7431866B2 (en) 2002-09-24 2008-10-07 E. I. Du Pont De Nemours And Company Water dispersible polythiophenes made with polymeric acid colloids
CN1681869B (zh) 2002-09-24 2010-05-26 E.I.内穆尔杜邦公司 用于电子器件用聚合物酸胶体制成的可水分散的聚苯胺
JP2004204114A (ja) * 2002-12-26 2004-07-22 Dainippon Printing Co Ltd インクジェット用インク組成物
US7390438B2 (en) 2003-04-22 2008-06-24 E.I. Du Pont De Nemours And Company Water dispersible substituted polydioxythiophenes made with fluorinated polymeric sulfonic acid colloids
JPWO2004106404A1 (ja) * 2003-05-27 2006-07-20 富士通株式会社 有機導電性ポリマー組成物、それを用いた透明導電膜及び透明導電体、並びに、該透明導電体を用いた入力装置及びその製造方法
DE10335727A1 (de) * 2003-08-05 2005-02-24 H.C. Starck Gmbh Transparente Elektrode für elektro-optische Aufbauten
EP1718125B9 (en) * 2004-02-18 2013-08-21 Shin-Etsu Polymer Co., Ltd. El sheet and member for lighting press-button switch
DE102004010145A1 (de) * 2004-02-27 2005-09-15 H.C. Starck Gmbh Verformbare elektrolumineszierende Anordnung
US7338620B2 (en) * 2004-03-17 2008-03-04 E.I. Du Pont De Nemours And Company Water dispersible polydioxythiophenes with polymeric acid colloids and a water-miscible organic liquid
US7351358B2 (en) 2004-03-17 2008-04-01 E.I. Du Pont De Nemours And Company Water dispersible polypyrroles made with polymeric acid colloids for electronics applications
US7250461B2 (en) * 2004-03-17 2007-07-31 E. I. Du Pont De Nemours And Company Organic formulations of conductive polymers made with polymeric acid colloids for electronics applications, and methods for making such formulations
US7427441B2 (en) * 2004-09-17 2008-09-23 Eastman Kodak Co Transparent polymeric coated conductor
US7842196B2 (en) 2004-10-08 2010-11-30 Shin-Etsu Polymer Co., Ltd. Conductive composition and production method thereof, antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium, and capacitors and production method thereof
JP5283818B2 (ja) * 2004-10-08 2013-09-04 信越ポリマー株式会社 導電性組成物及びその製造方法
CN1763989B (zh) * 2004-10-22 2011-10-05 H.C.施塔克股份有限公司 电光结构用透明电极
WO2006045764A1 (en) * 2004-10-29 2006-05-04 Agfa-Gevaert Printable organic non-volatile passive memory element and method of makin thereof
US7675123B2 (en) 2004-10-29 2010-03-09 Agfa-Gevaert Nv Printable non-volatile passive memory element and method of making thereof
JP5241997B2 (ja) * 2005-03-08 2013-07-17 信越ポリマー株式会社 導電性高分子溶液および導電性塗膜
JP2006278582A (ja) * 2005-03-28 2006-10-12 Dainippon Printing Co Ltd 有機薄膜太陽電池
JP2006310729A (ja) * 2005-03-28 2006-11-09 Dainippon Printing Co Ltd 有機薄膜太陽電池
JP2006278583A (ja) * 2005-03-28 2006-10-12 Dainippon Printing Co Ltd 有機薄膜太陽電池
US7387856B2 (en) * 2005-06-20 2008-06-17 Industrial Technology Research Institute Display comprising liquid crystal droplets in a hydrophobic binder
EP1899985A4 (en) 2005-06-27 2010-03-10 Du Pont ELECTRICALLY CONDUCTIVE POLYMER COMPOSITIONS
KR101356296B1 (ko) 2005-06-28 2014-02-06 이 아이 듀폰 디 네모아 앤드 캄파니 높은 일 함수의 투명한 도체
KR100715548B1 (ko) * 2005-07-29 2007-05-07 광 석 서 부분 치환된 고분자 도판트를 사용하여 합성된 전도성고분자
DE102005043828A1 (de) * 2005-09-13 2007-03-22 H.C. Starck Gmbh Verfahren zur Herstellung von Elektrolytkondensatoren
DE102005043829A1 (de) * 2005-09-13 2007-04-05 H.C. Starck Gmbh Verfahren zur Herstellung von Elektrolytkondensatoren mit hoher Nennspannung
JP4534930B2 (ja) * 2005-09-27 2010-09-01 パナソニック電工株式会社 有機太陽電池の製造方法
US7706165B2 (en) 2005-12-20 2010-04-27 Agfa-Gevaert Nv Ferroelectric passive memory cell, device and method of manufacture thereof
DE102006006427A1 (de) * 2006-02-07 2007-08-16 Technische Universität Dresden Elektrolumineszente Lichtemissionseinrichtung
JP4706845B2 (ja) * 2006-02-15 2011-06-22 凸版印刷株式会社 有機el素子の製造方法
KR100680556B1 (ko) * 2006-04-04 2007-02-08 박동수 열교환 장치
JP5031264B2 (ja) * 2006-05-17 2012-09-19 信越ポリマー株式会社 帯電防止塗料、帯電防止膜及び帯電防止フィルム、光学フィルタ、光情報記録媒体
CN101454371B (zh) * 2006-06-01 2013-07-17 E.I.内穆尔杜邦公司 导电聚合物组合物
ATE431959T1 (de) 2006-12-01 2009-06-15 Fraunhofer Ges Forschung Hochtransparentes, elektrochromes beschichtungsmaterial, verfahren zur herstellung dafür und verwendung des materials
US8062553B2 (en) 2006-12-28 2011-11-22 E. I. Du Pont De Nemours And Company Compositions of polyaniline made with perfuoropolymeric acid which are heat-enhanced and electronic devices made therewith
US8153029B2 (en) 2006-12-28 2012-04-10 E.I. Du Pont De Nemours And Company Laser (230NM) ablatable compositions of electrically conducting polymers made with a perfluoropolymeric acid applications thereof
US20080191172A1 (en) 2006-12-29 2008-08-14 Che-Hsiung Hsu High work-function and high conductivity compositions of electrically conducting polymers
DE102007041039A1 (de) * 2007-08-29 2009-03-05 H.C. Starck Gmbh Herstellung leitfähiger Beschichtungen mittels Tintenstrahldrucks
DE102008023008A1 (de) 2008-05-09 2009-11-12 H.C. Starck Gmbh Neuartige Polythiophene-Polyanion-Komplexe in unpolaren organischen Lösungsmitteln
CN101624490B (zh) * 2008-07-07 2012-10-10 鹤山雅图仕印刷有限公司 导电高分子印刷油墨及其制作方法
CN101624491B (zh) * 2008-07-07 2012-08-22 鹤山雅图仕印刷有限公司 水性无水胶印导电油墨及其制作方法
JP5508429B2 (ja) * 2008-10-30 2014-05-28 エシロール アテルナジオナール カンパニー ジェネラーレ デ オプティック 優れた帯電防止性を有する被覆された物品を提供する導電性高分子をベースとした硬化性被覆組成物
JP5560281B2 (ja) 2008-11-17 2014-07-23 アイメック 有機デバイスの電気コンタクトを形成するための溶液処理方法
JP5761547B2 (ja) * 2009-04-15 2015-08-12 Dic株式会社 水性スクリーンインキ
EP2311910A1 (de) 2009-10-17 2011-04-20 Bayer MaterialScience AG Verfahren zur Herstellung einer elektrisch leitfähigen Zusammensetzung
JP2012038441A (ja) * 2010-08-04 2012-02-23 Alps Electric Co Ltd 発光装置
KR20130133886A (ko) * 2010-09-01 2013-12-09 엔티에이치 디그리 테크놀로지스 월드와이드 인코포레이티드 다이오드, 다이오드 또는 기타 2-단자 집적 회로의 액체 또는 겔 현탁액의 인쇄 가능한 조성물, 및 이의 제조 방법
KR101488628B1 (ko) 2010-09-30 2015-01-30 린텍 가부시키가이샤 도전성 접착제 조성물, 전자 디바이스, 양극 적층체 및 전자 디바이스의 제조 방법
WO2012058416A2 (en) * 2010-10-28 2012-05-03 University Of Florida Research Foundation, Inc. Cathodically coloring yellow soluble electrochromic and light emitting polymers
DE102012016759A1 (de) 2012-08-27 2014-02-27 Inoviscoat Gmbh Leuchtelement mit einer Leuchtschicht, die Elektrolumineszenzteilchen aufweist
CN102623080A (zh) * 2012-04-16 2012-08-01 上海交通大学 基于溶液法/印刷涂布工艺的透明导电薄膜及其制备方法
CN104987675A (zh) * 2012-05-21 2015-10-21 宇亮光电股份有限公司 一种用于形成可挠式透明导电膜的导电材料
JP2014118560A (ja) * 2012-12-14 2014-06-30 Nuri Vista Co Ltd 高粘度性及び高伝導度を有する導電性高分子組成物
JP6129569B6 (ja) * 2013-02-04 2017-08-02 株式会社トーキン 導電性高分子溶液及びその製造方法、導電性高分子材料並びに固体電解コンデンサ
KR101582264B1 (ko) 2013-06-27 2016-01-04 삼성전자 주식회사 유기 박막용 조성물, 유기 박막 및 상기 유기 박막을 포함하는 전자 소자
TWI664232B (zh) * 2013-11-13 2019-07-01 日商長瀨化成股份有限公司 Conductive resin composition and transparent conductive laminate
JP6575893B2 (ja) * 2013-11-13 2019-09-18 ナガセケムテックス株式会社 導電性樹脂組成物及び透明導電積層体
JP6417621B2 (ja) 2014-02-12 2018-11-07 ナガセケムテックス株式会社 インク用組成物及び透明電極
DK3221404T3 (da) * 2014-11-19 2019-06-24 Biotectix Llc Ledende polymerbelægninger til tredimensionale substrater
JP2016149505A (ja) * 2015-02-13 2016-08-18 三菱化学株式会社 組成物、光電変換素子、太陽電池及び太陽電池モジュール
CN105440802B (zh) * 2015-12-22 2017-12-12 江南大学 一种可紫外光二聚的pedot导电墨水及其制备方法
CN114316685B (zh) * 2021-12-21 2023-03-17 江南大学 一种墨水直写3d打印pedot:pss复合水凝胶及其制备方法
EP4279524A1 (en) * 2022-05-20 2023-11-22 Agfa-Gevaert Nv Novel polythiophene/polyanion compositions
EP4435065A1 (en) 2023-03-20 2024-09-25 Agfa-Gevaert Nv Conductive polymer dispersion

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0593111B1 (en) * 1992-10-14 1998-06-17 Agfa-Gevaert N.V. Antistatic coating composition
DE69319200T2 (de) * 1992-10-14 1999-01-28 Agfa-Gevaert N.V., Mortsel Antistatische Beschichtungszusammensetzung
ATE287929T1 (de) * 1994-05-06 2005-02-15 Bayer Ag Leitfähige beschichtungen hergestellt aus mischungen enthaltend polythiophen und lösemittel
DE19627071A1 (de) * 1996-07-05 1998-01-08 Bayer Ag Elektrolumineszierende Anordnungen
DE19757542A1 (de) * 1997-12-23 1999-06-24 Bayer Ag Siebdruckpaste zur Herstellung elektrisch leitfähiger Beschichtungen
KR20000022633A (ko) * 1998-09-22 2000-04-25 김영남 전도성 유기고분자의 대전방지막이 형성된 유리기판 및 그 형성방법과 그 도포용액 및 그 도포용액의 제조방법
EP1003179B1 (en) 1998-11-17 2004-08-25 Agfa-Gevaert A method for preparing a conductive polythiophene layer at low temperature
DE60140129D1 (de) * 2000-06-26 2009-11-19 Agfa Gevaert Redispergierbarer latex enthaltend ein polythiophen

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Publication number Publication date
KR20030097813A (ko) 2003-12-31
JP2004532307A (ja) 2004-10-21
KR100859363B1 (ko) 2008-09-22
DE60210429D1 (de) 2006-05-18
TWI235171B (en) 2005-07-01
CN1527854A (zh) 2004-09-08
WO2002079316A2 (en) 2002-10-10
AU2002308173A1 (en) 2002-10-15
KR20040011487A (ko) 2004-02-05
DE60210429T2 (de) 2006-11-23
EP1374644A2 (en) 2004-01-02
TWI283140B (en) 2007-06-21
EP1383819B1 (en) 2016-01-20
AU2002315256A1 (en) 2002-10-15
JP2005501373A (ja) 2005-01-13
WO2002079316A3 (en) 2002-12-12
WO2002080627A3 (en) 2003-03-20
CN1509587A (zh) 2004-06-30
JP3855167B2 (ja) 2006-12-06
CN100392890C (zh) 2008-06-04
CN100558782C (zh) 2009-11-11
EP1383819A2 (en) 2004-01-28
WO2002080627A2 (en) 2002-10-10
EP1374644B1 (en) 2006-04-05

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