JP4487108B2 - リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム - Google Patents

リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム Download PDF

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Publication number
JP4487108B2
JP4487108B2 JP2006521023A JP2006521023A JP4487108B2 JP 4487108 B2 JP4487108 B2 JP 4487108B2 JP 2006521023 A JP2006521023 A JP 2006521023A JP 2006521023 A JP2006521023 A JP 2006521023A JP 4487108 B2 JP4487108 B2 JP 4487108B2
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JP
Japan
Prior art keywords
purge gas
projection apparatus
gas mixture
lithographic projection
moisture
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Expired - Lifetime
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JP2006521023A
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Japanese (ja)
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JP2006528425A (ja
Inventor
デル ネット、アントニウス、ヨハネス ファン
シュピーゲルマン、ジェフリー
ブラグト、ヨハヌス、ヨセフス ファン
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Entegris Inc
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Entegris Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Electron Beam Exposure (AREA)
  • Air Humidification (AREA)
  • Fuel Cell (AREA)
JP2006521023A 2003-07-21 2004-07-20 リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム Expired - Lifetime JP4487108B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/623,180 US7384149B2 (en) 2003-07-21 2003-07-21 Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
PCT/NL2004/000519 WO2005008339A2 (en) 2003-07-21 2004-07-20 Lithographic projection apparatus, purge gas supply system and gas purging method

Publications (2)

Publication Number Publication Date
JP2006528425A JP2006528425A (ja) 2006-12-14
JP4487108B2 true JP4487108B2 (ja) 2010-06-23

Family

ID=34079792

Family Applications (4)

Application Number Title Priority Date Filing Date
JP2006521023A Expired - Lifetime JP4487108B2 (ja) 2003-07-21 2004-07-20 リソグラフィ投影装置、ガスパージ方法、デバイス製造方法およびパージガス供給システム
JP2006521216A Withdrawn JP2006528431A (ja) 2003-07-21 2004-07-21 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2007299182A Withdrawn JP2008160080A (ja) 2003-07-21 2007-11-19 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2011235682A Withdrawn JP2012074712A (ja) 2003-07-21 2011-10-27 リソグラフ投影装置、パージガス供給システムおよびガスパージ

Family Applications After (3)

Application Number Title Priority Date Filing Date
JP2006521216A Withdrawn JP2006528431A (ja) 2003-07-21 2004-07-21 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2007299182A Withdrawn JP2008160080A (ja) 2003-07-21 2007-11-19 リソグラフ投影装置、パージガス供給システムおよびガスパージ
JP2011235682A Withdrawn JP2012074712A (ja) 2003-07-21 2011-10-27 リソグラフ投影装置、パージガス供給システムおよびガスパージ

Country Status (9)

Country Link
US (4) US7384149B2 (https=)
EP (3) EP1649325B1 (https=)
JP (4) JP4487108B2 (https=)
KR (3) KR100846184B1 (https=)
CN (3) CN1853142B (https=)
DE (1) DE602004027497D1 (https=)
SG (1) SG141460A1 (https=)
TW (3) TWI251130B (https=)
WO (2) WO2005008339A2 (https=)

Families Citing this family (124)

* Cited by examiner, † Cited by third party
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