JP4481571B2 - 均質な金属水素化物触媒を回収する方法 - Google Patents
均質な金属水素化物触媒を回収する方法 Download PDFInfo
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- JP4481571B2 JP4481571B2 JP2002593059A JP2002593059A JP4481571B2 JP 4481571 B2 JP4481571 B2 JP 4481571B2 JP 2002593059 A JP2002593059 A JP 2002593059A JP 2002593059 A JP2002593059 A JP 2002593059A JP 4481571 B2 JP4481571 B2 JP 4481571B2
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- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/584—Recycling of catalysts
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- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
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Description
(a)液流が均質なVIII族貴金属水素化物触媒を含み、該液流を反応器から取り出すステップと、
(b)金属の少なくとも一部が吸収剤に結合された状態にすることが可能な工程条件下で、該液流を固体の酸性吸収剤と接触させるステップと、
(c)金属の脱離が起こる工程条件下で、吸収剤に結合している該金属を、水素および溶媒を含む流体ストリッピング媒体にさらすステップと、
(d)活性なVIII族貴金属水素化物触媒を回収するステップと
を含む方法が提供される。
実施例1
28gのオクテン−1および52gのトルエンを含有する溶液中で、175ppmのロジウムと10重量%のトリフェニルホスフィンを含有する溶液を使用して、ロジウムをオクテンのヒドロホルミル化反応器溶液から可逆的に取り除くAmberlyst DPT−1の能力を調べた。まず、85℃および85psigにおいて、気体の吸収量を測定しながら、1:1の水素/一酸化炭素を使用してヒドロホルミル化することにより、オクテンをノナナールに転化した。洗浄および乾燥をした25mlの乾燥容積のAmberlyst DPT−1を、トルエン中に10重量%のトリフェニルホスフィンを含有する溶液に浸し、その後濾過した。オクテンのヒドロホルミル化が、感知できる気体吸収の停止によって完了したことが示された後、その溶液を冷却し、湿潤状態の樹脂をオートクレーブに入れた。その混合物を次に85℃に1時間加熱して、液体を樹脂から排出した。分析により溶液中のロジウムの濃度は14ppmに低下したことが示された。トルエン中の10重量%のトリフェニルホスフィン50mlを、反応器に残っている樹脂に加えた。その溶液は、1:1の水素/一酸化炭素を用いて大気圧でパージし、85℃に加熱し、(水素で85℃に加圧し、)水素で1000psigに加圧した。オートクレーブはその後放冷した。トリフェニルホスフィン溶液を樹脂から取り除くと、160ppmのロジウムを含有していることが分かった。
実施例2
28gのオクテン−1と52gのトルエンおよび1mlのソルビン酸エチルを含有する溶液中で、175ppmのロジウムと10重量%のトリフェニルホスフィンを含有する溶液を使用して、ヒドロホルミル化触媒の回収に及ぼす触媒毒の影響を調べた。まず、85℃および85psigにおいて、気体の吸収量を測定しながら、1:1の水素/一酸化炭素を使用してヒドロホルミル化することにより、オクテンをノナールに転化した。気体の吸収の割合から、ロジウムは、触媒毒および阻害物質が存在しない場合に期待される活性度のわずか50%しか有さないことが計算された。洗浄および乾燥をした25mlの乾燥容積のAmberlyst DPT−1を、トルエン中に10重量%のトリフェニルホスフィンを含有する溶液に浸し、その後濾過した。オクテンのヒドロホルミル化が、感知できる気体吸収の停止によって完了したことが示された後、その溶液を冷却し、湿潤状態の樹脂をオートクレーブに入れた。その混合物を次に85℃に1時間加熱して、液体を樹脂から排出した。分析により溶液中のロジウムの濃度は25ppmに低下したことが示された。14gのオクテンを含有するトルエン溶液中の10重量%のトリフェニルホスフィンの50mlを、反応器に残っている樹脂に加えた。その溶液は、1:1の水素/一酸化炭素を用いて大気圧でパージし、85℃に加熱し、(水素で85℃に加圧し、)水素で1000psigに加圧した。オートクレーブはその後放冷した。トリフェニルホスフィン溶液を樹脂から取り除くと、150ppmのロジウムを含有していることが分かった。この溶液を、次に、オクテン、トルエン、トリフェニルホスフィンをさらに使用して100mlとし、きれいな反応器に入れ換えて、1:1の水素/一酸化炭素を用いて85℃および85psigまで加圧した。気体の吸収の割合から、その溶液の活性度は、非阻害溶液から期待されるであろう活性度の98%と測定された。
実施例3
オクテン−1中に570ppmのロジウムと10重量%のトリフェニルホスフィンを含有する溶液の200mlを使用して、溶液状態のヒドロホルミル化触媒の濃度に及ぼす水素圧の影響を調べた。最初、1:1の水素/一酸化炭素を用いてのヒドロホルミル化が完了するまで、溶液を徐々に加熱して85℃および85psigにした。冷却後、洗浄、乾燥したAmberlyst DPT−1の50mlを反応器に加え、攪拌しながら95℃まで温めた。95℃で4時間加熱した後、溶液を取り出してロジウム濃度を測定したところ18ppmであった。次に、10重量%トリフェニルホスフィンのトルエン溶液100mlをオートクレーブに加え、40℃および水素の500psigで16時間攪拌した。この時間の後反応器から採取した試料は、330ppmのロジウムを含有していた。次に、オートクレーブ内の圧力を抜き、温度を70℃に上げた。2時間後試料を採取し分析したところ、24ppmのロジウムを含有していることが分かった。オートクレーブ内の圧力を再び500psigに上げ、30分後に試料をとった。その時間の後の溶液は150ppmのロジウムを含有していた。
Claims (21)
- 反応器への再生利用に適する触媒として、均質なVIII族貴金属水素化物触媒を反応器の液流から回収する方法であって、該方法が下記のステップ:
(a)液流が均質なVIII族貴金属水素化物触媒を含み、該液流を反応器から取り出すステップと、
(b)金属の少なくとも一部が吸収剤に結合された状態にすることが可能な工程条件下で、該液流を固体の酸性吸収剤と接触させるステップと、
(c)金属の脱離が起こる工程条件下で、吸収剤に結合している該金属を、水素および溶媒を含む流体ストリッピング媒体にさらすステップと、
(d)活性なVIII族貴金属水素化物触媒を回収するステップと
を含む方法。 - 該流体ストリッピング媒体が、単一の流体相である請求項1に記載の方法。
- 該単一の流体相が、超臨界相である請求項2に記載の方法。
- 該流体ストリッピング媒体が、2つの流体相を含む請求項1に記載の方法。
- 該VIII族貴金属水素化物触媒が、白金水素化物触媒、パラジウム水素化物触媒、イリジウム水素化物触媒、またはロジウム水素化物触媒である請求項1から4のいずれか一項に記載の方法。
- 該触媒が、HRh(CO)(PPh3)3である請求項5に記載の方法。
- 該反応器の液流が、ヒドロホルミル化反応器からのものである請求項1から6のいずれか一項に記載の方法。
- 該反応器の液流が、不揮発性の反応副生物を含む請求項7に記載の方法。
- 固体の酸性吸収剤と接触していた反応器の液流を取り出す請求項1から8のいずれか一項に記載の方法。
- 該酸性吸収剤が、イオン交換樹脂である請求項1から9のいずれか一項に記載の方法。
- 該酸性吸収剤が、スルホン酸基またはカルボン酸基を含有するスチレンジビニルベンゼン共重合体である請求項1から10のいずれか一項に記載の方法。
- 該酸性吸収剤がシリカ含有の主鎖を有しており、酸性の官能基が該シリカに結合している請求項1から10のいずれか一項に記載の方法。
- 該酸性の官能基が、芳香族カルボン酸、脂肪族カルボン酸、芳香族スルホン酸または脂肪族スルホン酸である請求項12に記載の方法。
- 該酸性吸収剤が、Amberlyst(登録商標)15またはAmberlyst(登録商標)DPT−1である請求項1から11のいずれか一項に記載の方法。
- ステップ(b)を20℃から100℃までの温度で行う請求項1から14のいずれか一項に記載の方法。
- 該温度が、50℃から95℃の範囲内である請求項15に記載の方法。
- 該反応器の液流を、酸性吸収剤と接触させる前に濃縮する請求項1から16のいずれか一項に記載の方法。
- 該反応器の液流を、吸収剤と接触させる前に、吸収剤に適合する溶媒で希釈する請求項1から17のいずれか一項に記載の方法。
- 該反応器の液流を、酸性吸収剤と接触させるのに先立って、クラスター化した触媒を破壊するために酸化させる請求項1から18のいずれか一項に記載の方法。
- 酸化させた液流を、処理してヒドロカルボニル化する請求項19に記載の方法。
- ストリッピング媒体の気相が、追加的に一酸化炭素を含む請求項1から20のいずれか一項に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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GBGB0113079.8A GB0113079D0 (en) | 2001-05-30 | 2001-05-30 | Process |
PCT/GB2002/002577 WO2002096555A1 (en) | 2001-05-30 | 2002-05-29 | Process for recovering homogeneous metal hydrate catalysts |
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JP2004526570A JP2004526570A (ja) | 2004-09-02 |
JP4481571B2 true JP4481571B2 (ja) | 2010-06-16 |
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US (2) | US20040171478A1 (ja) |
EP (1) | EP1390143B1 (ja) |
JP (1) | JP4481571B2 (ja) |
KR (1) | KR100580441B1 (ja) |
CN (1) | CN1231295C (ja) |
AT (1) | ATE285845T1 (ja) |
AU (1) | AU2002304405B2 (ja) |
BR (1) | BR0209716B1 (ja) |
DE (1) | DE60202462T2 (ja) |
EA (1) | EA005039B1 (ja) |
GB (1) | GB0113079D0 (ja) |
MY (1) | MY128848A (ja) |
TW (1) | TW587961B (ja) |
WO (1) | WO2002096555A1 (ja) |
ZA (1) | ZA200309120B (ja) |
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GB0113080D0 (en) * | 2001-05-30 | 2001-07-18 | Kvaerner Process Tech Ltd | Process |
JP2007044568A (ja) * | 2005-08-05 | 2007-02-22 | Mitsubishi Chemicals Corp | 遷移金属の除去方法 |
EP2075070A1 (en) * | 2007-12-13 | 2009-07-01 | BP Chemicals Limited | Catalyst recovery process |
DE102008057857B4 (de) | 2008-11-18 | 2014-09-11 | Oxea Gmbh | Verfahren zur Rückgewinnung von Rhodium aus Rhodiumkomplexverbindungen enthaltenden wässrigen Lösungen |
US8575062B2 (en) | 2010-11-11 | 2013-11-05 | Chevron U.S.A. Inc. | Hydroconversion multi-metallic catalyst and method for making thereof |
US9168519B2 (en) | 2010-11-11 | 2015-10-27 | Chevron U.S.A. Inc. | Hydroconversion multi-metallic catalyst and method for making thereof |
JP5797766B2 (ja) | 2010-11-11 | 2015-10-21 | シェブロン ユー.エス.エー. インコーポレイテッド | 水素化変換多金属触媒及びその作製方法 |
US8658558B2 (en) | 2010-11-11 | 2014-02-25 | Chevron U.S.A. Inc. | Hydroconversion multi-metallic catalyst and method for making thereof |
US8575061B2 (en) | 2010-11-11 | 2013-11-05 | Chevron U.S.A. Inc. | Hydroconversion multi-metallic catalyst and method for making thereof |
US8586500B2 (en) | 2010-11-11 | 2013-11-19 | Chevron U.S.A. Inc. | Hydroconversion multi-metallic catalyst and method for making thereof |
US9266098B2 (en) | 2012-09-05 | 2016-02-23 | Chevron U.S.A. Inc. | Hydroconversion multi-metallic catalysts and method for making thereof |
CN111344273B (zh) * | 2017-11-15 | 2023-08-18 | 三菱化学株式会社 | 醛制造方法及醇制造方法 |
US20220143590A1 (en) | 2019-06-27 | 2022-05-12 | Dow Technology Investments Llc | Process to prepare solution from hydroformylation process for precious metal recovery |
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DE2448005C2 (de) * | 1974-10-09 | 1983-10-20 | Basf Ag, 6700 Ludwigshafen | Verfahren zur Regenerierung von Rhodium oder Iridium enthaltenden Katalysatoren aus Destillationsrückständen von Hydroformylierungsgemischen |
DE2614799C2 (de) * | 1976-04-06 | 1986-02-27 | Basf Ag, 6700 Ludwigshafen | Verfahren zur Regenerierung von Rhodium enthaltenden Katalysatoren durch Behandeln von rhodiumhaltigen Destillationsrückständen von Hydroformylierungsgemischen |
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GB0113080D0 (en) * | 2001-05-30 | 2001-07-18 | Kvaerner Process Tech Ltd | Process |
-
2001
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- 2002-05-29 KR KR1020037014427A patent/KR100580441B1/ko not_active IP Right Cessation
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- 2002-05-29 WO PCT/GB2002/002577 patent/WO2002096555A1/en active IP Right Grant
- 2002-05-29 CN CNB028108493A patent/CN1231295C/zh not_active Expired - Lifetime
- 2002-05-29 AT AT02732914T patent/ATE285845T1/de not_active IP Right Cessation
- 2002-05-29 EP EP02732914A patent/EP1390143B1/en not_active Expired - Lifetime
- 2002-05-29 JP JP2002593059A patent/JP4481571B2/ja not_active Expired - Fee Related
- 2002-05-29 EA EA200301198A patent/EA005039B1/ru not_active IP Right Cessation
- 2002-05-29 BR BRPI0209716-8A patent/BR0209716B1/pt not_active IP Right Cessation
- 2002-05-29 DE DE60202462T patent/DE60202462T2/de not_active Expired - Lifetime
- 2002-05-29 US US10/479,070 patent/US20040171478A1/en not_active Abandoned
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KR100580441B1 (ko) | 2006-05-15 |
ATE285845T1 (de) | 2005-01-15 |
DE60202462D1 (de) | 2005-02-03 |
US9035080B2 (en) | 2015-05-19 |
BR0209716B1 (pt) | 2012-09-04 |
CN1231295C (zh) | 2005-12-14 |
US20120130102A1 (en) | 2012-05-24 |
US20040171478A1 (en) | 2004-09-02 |
EA200301198A1 (ru) | 2004-04-29 |
EP1390143A1 (en) | 2004-02-25 |
EP1390143B1 (en) | 2004-12-29 |
AU2002304405B2 (en) | 2007-02-08 |
EA005039B1 (ru) | 2004-10-28 |
BR0209716A (pt) | 2004-07-27 |
DE60202462T2 (de) | 2005-12-29 |
MY128848A (en) | 2007-02-28 |
WO2002096555A1 (en) | 2002-12-05 |
TW587961B (en) | 2004-05-21 |
GB0113079D0 (en) | 2001-07-18 |
ZA200309120B (en) | 2005-01-26 |
CN1518480A (zh) | 2004-08-04 |
JP2004526570A (ja) | 2004-09-02 |
KR20040012796A (ko) | 2004-02-11 |
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