JP4435569B2 - 常温に近い温度で製造され及び動作する、化学的検出材料としての半導体材料の用途 - Google Patents
常温に近い温度で製造され及び動作する、化学的検出材料としての半導体材料の用途 Download PDFInfo
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Description
・薄膜層の蒸着により得られるプラチナ
・鉄(III)フタロシアニン
・薄膜層の蒸着又は高ドープ濃度のAuS(CH3)2Clのドープによって得られる金
上述したジェイ・ムスタ(J. Muster)他による文献に開示されている湿式化学法(wet-chemical)を用いて、ドープされていないV2O5ナノファイバのストックを準備した。40mlの水中の0.2gのアンモニウム(メタ)バナジウム酸塩(アルドリッチ社(Aldrich))及び2gの酸性イオン交換樹脂(Dowex 50WX8−100(アルドリッチ社))からV2O5ゾルを準備した。数時間後、時間とともに黒ずむオレンジゾル(orange sol)が観察された。約3日後には、数μmの長さのV2O5ファイバが観察された。実験に用いたファイバは、製造から数ヶ月経過したファイバである。
銀がドープされた五酸化バナジウムナノベルトは、上述した(a)と同様の処理において、V2O5ゾルを準備する際、溶液に銀塩(硝酸銀)を加えることによって得られた。
リソグラフ法によって作製されたすだれ状電極構造を支持したBK7ガラス基板上に1次元ナノ粒子を堆積させた。電極構造は、5nmのチタン接着層上に95nmの金層を堆積させたものである。電極構造は、50対の電極指を有し、各電極指の幅を10μmとし、電極指間の間隔を10μmとし、交差幅を1800μmとした。電極構造の外形寸法を2mm×2mmとした。センサ膜を堆積させる前に、アセトン、ヘキサン、イソプロパノールが入った超音波槽に入れ、酸素プラズマを(30W及び0.24mbarで4分間)印加することによって、基板を洗浄した。次に、洗浄された基板を0.1%のDAS(N−[3−(トリメトキシシリル)プロピル]−エチレンジアイミン:アルドリッチ社(N- [3- (trimethoxysilyl) propyl]-ethylenediamine, Aldrich))を含む水溶液に2分間浸し、純水ですすぎ、空気流によって乾燥させた。この処理により、ガラス基板は、アミノ基によって官能基化され、アミノ基は、後に堆積されるナノファイバに結合する官能基として機能する。H2Oにファイバを懸濁させた懸濁液に基板を20秒間浸すことにより、(a)の工程によって得られたファイバを基板に浸せき塗布した。次に、基板を純水ですすぎ、空気流によって乾燥させた。これにより、ドープされていないV2O5ナノファイバセンサ(センサ8)を製造した。
1次元ナノ粒子として、(b)の工程で得られた、銀がドープされた五酸化バナジウムナノファイバを用いた点を除いて(c)と同様の工程を行った。これにより、センサ7として、銀がドープされたV2O5ナノファイバセンサが得られた。
(c)の工程で得られたセンサを表1に詳細を示すように、ドーパントの溶液に浸した。浸せきの後、センサを純水で完全にすすぎ、空気流で乾燥させた。
(c)の工程で得られたドープされていないセンサ上に金層を2nmの厚みで蒸着させることにより、センサ3を得た。原子間力顕微鏡により、略球形の粒子が形成されていることが確認された。
ガス試験の実験のため、上述した(c)〜(f)の工程によって作製された各センサを容量が約1.23cm3の自作(home made)のテフロン製のチャンバに設置した。試験用のガスは、ドイツのオバーモーレン(Ober-Morlen)のMCZ Umwelttechnik GmbH社のマスフローシステムを用いて、適切な量のキャリアガス(乾燥したN2)によって分析物のストックを希釈(乾燥したN2に10%の分析物(H2、CO、NH3)を希釈)することによって、所望の分析物濃度を実現した。試験用のチャンバにおける質量流量を、400ml毎秒に調整し、全ての実験において一定に維持した。全ての実験は、常温で行った。
銀がドープされた五酸化バナジウムセンサ1、5、6を100ppmのCOに晒した。なお、センサ5は低レベルにドープされ、センサ1は、中レベルにドープされ、センサ6は、高レベルにドープされている。これらのセンサの応答を図5に示す。センサ5は、速い応答を示し、相対抵抗率ΔR/Riniを−1.3%変化させたが、それぞれ中レベル及び高レベルのドーピングレベルを有するセンサ1及びセンサ6は、それぞれ相対抵抗率ΔR/Riniを+1.0%及び1.3%変化させた。これにより、ドーピングレベルを変化させることによってセンサの応答を変更できることがわかる。
センサ7を360ppbのアンモニアに晒した。センサ7の応答を図6に示す。このセンサ7は、120秒以内に相対抵抗率ΔR/Riniを−1.6%変化させる速い応答を示した。これにより、センサ7は、非常に低い濃度のアンモニアに対して速い応答を示し、回復時間が短いことがわかる。図7に示す感度等温線(isotherm)は、より高濃度のアンモニアに対して、センサ7の応答が強くなることを示している。
常温において、金がドープされたセンサ2を1ppmのCOに晒した。このセンサ2の応答を図8に示す。低い濃度においても、120秒以内に−1.7%の相対抵抗率ΔR/Riniの変化による応答が得られた。
常温において、金がドープされたセンサ3を20ppmのH2に晒した。このセンサ3の応答を図9に示す。120秒以内に−0.4%の相対抵抗率ΔR/Riniの変化による応答が得られた。
銀がドープされたセンサ7を、40%の相対湿度において、30ppbのブチルアミンに晒した。センサ7の応答を図10に示す。上向きの矢印は、ブチルアミンが供給された時刻を表し、下向きの矢印は、ブチルアミンが気相から除去された時刻を表す。500秒以内に、+1.9%の相対抵抗率ΔR/Riniの変化が得られた。
2匹の新鮮な魚(鱈)の試料を準備し、それぞれガラス容器に収容した。容器の頭隙のガスをマイクロポンプによって採取し、これを10秒間、銀がドープされたセンサ7に晒すことによって分析した。第1の試料を分析した後、第2の試料を分析した。図11に示す破線は、試料が新鮮である1日目の実験結果を表している。いずれの試料からも同様な信号が得られている。次に、24時間、試料1を冷蔵庫に貯蔵し、試料2を大気条件で保管した。翌日に両方のサンプルを再び分析した。図11に示す実線は、この2日目の実験結果を表している。大気条件で保管された試料2に関する信号は、冷蔵庫に貯蔵した試料1の信号より大きな応答を示している。殆どの海魚は腐敗時にアミンを発生することが知られている。試料2の信号の応答の強さは、より高い温度のために魚の腐敗が進み、したがってより高いレベルのアミンが発生していることを示していると考えられる。
様々な湿度条件で、銀がドープされたセンサ7を237ppmのブチルアミンに晒した。この実験では、5%、20%、30%、40%、50%、60%の相対湿度において、センサの応答を測定した。この実験によるセンサの応答を図12に示す。矢印は、湿度の上昇を示している。最も高い感度は、相対湿度が60%の条件において得られた。
Claims (33)
- 基板と、
上記基板上に形成され、実質的に、酸化バナジウム(V2O5)からなる半導性AxBy化合物からなる1次元ナノ粒子を有するセンサ媒質と、
上記センサ媒質の物理的及び/又は化学的特性の変化を検出する検出装置と、
分析物を加湿して所定の湿度に調整して上記分析物に対する検出の感度を高める湿度調整装置と
を備える化学センサ装置。 - 前記1次元ナノ粒子は、ナノワイヤ、ナノチューブ、ナノファイバ又はナノベルトの形状である
請求項1に記載の化学センサ装置。 - 上記1次元ナノ粒子は、非中空である請求項1または2に記載の化学センサ装置。
- 上記1次元ナノ粒子は、矩形の断面を有する請求項1または2に記載の化学センサ装置。
- 上記1次元ナノ粒子は、束の形で提供されている請求項1または2に記載の化学センサ装置。
- 上記1次元ナノ粒子は、更にドーパントを含む請求項1または2に記載の化学センサ装置。
- 上記ドーパントは、有機化合物である請求項6に記載の化学センサ装置。
- 上記有機化合物は、チオール、カルボキシル酸、アミン、ホスフィン、ホスフィンオキシド、ピリジン及びピリジン誘導体、チオフェン及びチオフェン誘導体、ピロール及びピロール誘導体からなるグループから選択される請求項7に記載の化学センサ装置。
- 上記ドーパントは、イオン又はイオン錯体である請求項6に記載の化学センサ装置。
- 上記ドーパントは、上記1次元ナノ粒子内に挿入され、及び/又は該1次元ナノ粒子の表面に吸収されている請求項6に項記載の化学センサ装置。
- 上記センサ媒質は、上記1次元ナノ粒子とは異なる第2のナノ粒子を更に含む請求項1または2に記載の化学センサ装置。
- 上記第2のナノ粒子は、略球形の形状を有している請求項11に記載の化学センサ装置。
- 上記第2のナノ粒子は、実質的に、金属からなる請求項11に記載の化学センサ装置。
- 当該化学センサ装置は、化学抵抗器、化学感応ダイオード、多端子素子、化学感応トランジスタ、感量素子又は光素子として構成されている請求項1または2に記載の化学センサ装置。
- 上記センサ媒質に設けられた前記センサ媒質を加熱するヒータを更に備える請求項1または2に記載の化学センサ装置。
- 上記センサ媒質は、上記基板に配設された2つの電極間をブリッジする少なくとも1種類の上記1次元ナノ粒子を備える請求項1または2に項記載の化学センサ装置。
- 上記センサに設けられた前記センサの湿度を調整する湿度調整装置を更に備える請求項1または2に載の化学センサ装置。
- 上記センサ媒質に設けられた前記センサ媒質の湿度を監視する湿度監視ユニットを更に備える請求項1または2に記載の化学センサ装置。
- 請求項1〜18のいずれか1項に記載の化学センサ装置を製造する化学センサ装置の製造方法において、
a)基板表面を有する基板を準備する工程と、
b)実質的に請求項1記載の半導性AxBy化合物からなる1次元ナノ粒子を準備する工程と、
c)上記1次元ナノ粒子によって上記基板表面を被覆してセンサ媒質を形成する工程と、
d)上記センサ媒質の物理的性質の変化を検出する検出装置を配設する工程とを有し、
分析物に対する検出の感度を高めるために上記分析物が加湿される
化学センサ装置の製造方法。 - 上記1次元ナノ粒子は、上記基板の表面に配列される請求項19に記載の化学センサ装置の製造方法。
- 上記1次元ナノ粒子は、第1の官能基によって上記基板表面に結合し、第2の官能基によって上記1次元ナノ粒子の表面に結合する二官能配位子によって、該基板の表面に固定される請求項19または20に記載の化学センサ装置の製造方法。
- 上記センサ媒質に近接させて、湿度調整装置及び/又は湿度測定ユニットを配設する工程を更に有する請求項19または20に記載の化学センサ装置の製造方法。
- 試料内の分析物を検出する検出方法において、
センサ媒質及び検出装置を備える請求項1〜18のいずれか1項に記載の化学センサ装置を準備する工程と、
上記センサ媒質に分析物を接触させ、上記検出装置によって、該センサ媒質の物理的性質の変化を検出する工程とを有する検出方法。 - 上記分析物は、気相で提供される請求項23に記載の検出方法。
- 上記分析物は、アミンである請求項23または24に記載の検出方法。
- 上記センサ媒質の物理的性質の変化は、100℃以下において判定される請求項23または24に記載の検出方法。
- 上記センサ媒質の物理的性質の変化は、相対湿度が5%より高い上記センサ媒質上の雰囲気において判定される請求項23または24に記載の検出方法。
- 上記センサ媒質の物理的性質の変化を検出する間、上記相対湿度は、一定の値に維持される請求項27に記載の検出方法。
- 上記センサ媒質は、水蒸気によって飽和されている請求項23または24に記載の検出方法。
- 上記分析物における相対湿度を第1のレベルに調整し、該分析物を上記センサ媒質に接触させて、該センサ媒質の物理的性質の変化を示す第1の値を判定する第1の検出を行う工程と、
上記分析物における相対湿度を第2のレベルに調整し、該分析物を上記センサ媒質に接触させて、該センサ媒質の物理的性質の変化を示す第2の値を判定する第2の検出を行う工程と、
上記第1の値及び第2の値を比較して、上記分析物を識別する工程とを有する請求項23または24に記載の検出方法。 - 上記相対湿度の第1及び第2のレベル間の差は、少なくとも10%である請求項30に記載の検出方法。
- 上記センサ媒質の物理的性質の変化は、50℃以下において判定される請求項23または24に記載の検出方法。
- 上記センサ媒質の物理的性質の変化は、常温において判定される請求項23または24に記載の検出方法。
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20190127679A (ko) * | 2017-03-14 | 2019-11-13 | 머터리얼스 센터 레오벤 포르슝 게엠베하 | 미립자 농도를 측정하기 위한 미립자 센서 및 그 방법 |
KR102492249B1 (ko) * | 2017-03-14 | 2023-01-27 | 머터리얼스 센터 레오벤 포르슝 게엠베하 | 미립자 농도를 측정하기 위한 미립자 센서 및 그 방법 |
Also Published As
Publication number | Publication date |
---|---|
CA2468251A1 (en) | 2003-06-05 |
KR20040054801A (ko) | 2004-06-25 |
CN1618014A (zh) | 2005-05-18 |
CN1618014B (zh) | 2010-04-28 |
WO2003046536A1 (en) | 2003-06-05 |
JP2005510711A (ja) | 2005-04-21 |
AU2002354154B2 (en) | 2007-06-07 |
AU2002354154A1 (en) | 2003-06-10 |
US20050072213A1 (en) | 2005-04-07 |
EP1456634A1 (en) | 2004-09-15 |
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