JP4416250B2 - アクティブ除振装置及び露光装置 - Google Patents

アクティブ除振装置及び露光装置 Download PDF

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Publication number
JP4416250B2
JP4416250B2 JP2000031342A JP2000031342A JP4416250B2 JP 4416250 B2 JP4416250 B2 JP 4416250B2 JP 2000031342 A JP2000031342 A JP 2000031342A JP 2000031342 A JP2000031342 A JP 2000031342A JP 4416250 B2 JP4416250 B2 JP 4416250B2
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JP
Japan
Prior art keywords
vibration isolation
vibration
stage
isolation table
compensator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000031342A
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English (en)
Japanese (ja)
Other versions
JP2001221278A5 (enExample
JP2001221278A (ja
Inventor
伸二 涌井
功 岩井
孝 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2000031342A priority Critical patent/JP4416250B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Priority to DE60114260T priority patent/DE60114260T2/de
Priority to US09/777,955 priority patent/US6684132B2/en
Priority to EP01301082A priority patent/EP1124078B1/en
Priority to TW090102620A priority patent/TW535227B/zh
Priority to KR1020010006294A priority patent/KR20010078795A/ko
Publication of JP2001221278A publication Critical patent/JP2001221278A/ja
Publication of JP2001221278A5 publication Critical patent/JP2001221278A5/ja
Application granted granted Critical
Publication of JP4416250B2 publication Critical patent/JP4416250B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
    • F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Acoustics & Sound (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
  • Electron Beam Exposure (AREA)
JP2000031342A 2000-02-09 2000-02-09 アクティブ除振装置及び露光装置 Expired - Fee Related JP4416250B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2000031342A JP4416250B2 (ja) 2000-02-09 2000-02-09 アクティブ除振装置及び露光装置
US09/777,955 US6684132B2 (en) 2000-02-09 2001-02-07 Active anti-vibration apparatus and exposure apparatus
EP01301082A EP1124078B1 (en) 2000-02-09 2001-02-07 Active anti-vibration apparatus and exposure apparatus
TW090102620A TW535227B (en) 2000-02-09 2001-02-07 Active anti-vibration apparatus and exposure apparatus
DE60114260T DE60114260T2 (de) 2000-02-09 2001-02-07 Aktive, schwingungsdämpfende Einrichtung und Beleuchtungseinrichtung
KR1020010006294A KR20010078795A (ko) 2000-02-09 2001-02-09 액티브제진장치 및 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000031342A JP4416250B2 (ja) 2000-02-09 2000-02-09 アクティブ除振装置及び露光装置

Publications (3)

Publication Number Publication Date
JP2001221278A JP2001221278A (ja) 2001-08-17
JP2001221278A5 JP2001221278A5 (enExample) 2007-03-29
JP4416250B2 true JP4416250B2 (ja) 2010-02-17

Family

ID=18556109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000031342A Expired - Fee Related JP4416250B2 (ja) 2000-02-09 2000-02-09 アクティブ除振装置及び露光装置

Country Status (6)

Country Link
US (1) US6684132B2 (enExample)
EP (1) EP1124078B1 (enExample)
JP (1) JP4416250B2 (enExample)
KR (1) KR20010078795A (enExample)
DE (1) DE60114260T2 (enExample)
TW (1) TW535227B (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3670575B2 (ja) * 2000-01-12 2005-07-13 Ｔｄｋ株式会社 コイル封入圧粉コアの製造方法およびコイル封入圧粉コア
JP2003202051A (ja) * 2002-01-04 2003-07-18 Canon Inc 除振装置
US7108497B2 (en) * 2004-01-12 2006-09-19 Omnimold, Llc Interchangeable blow mold parison closing apparatus
JP2005282696A (ja) * 2004-03-29 2005-10-13 Canon Inc 除振マウント装置、露光装置及びデバイス製造方法
JP4290172B2 (ja) * 2006-03-30 2009-07-01 キヤノン株式会社 伝達特性算出装置及び伝達特性算出方法並びに露光装置
JP4906416B2 (ja) * 2006-07-11 2012-03-28 日本碍子株式会社 物体の通過検出装置
JP4970904B2 (ja) * 2006-11-06 2012-07-11 倉敷化工株式会社 アクティブ除振装置
EP2119938A1 (en) * 2008-05-15 2009-11-18 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO A vibration sensor and a system to isolate vibrations.
US20140293251A1 (en) * 2008-08-18 2014-10-02 Asml Netherlands B.V. Projection System, Lithographic Apparatus, Method of Projecting a Beam of Radiation onto a Target and Device Manufacturing Method
TWI391703B (zh) * 2008-12-03 2013-04-01 Asia Optical Co Inc 光學防手震系統之增益調整裝置及其方法
JP6151927B2 (ja) * 2012-02-17 2017-06-21 キヤノン株式会社 アクティブ除振装置
US9171695B2 (en) 2012-06-26 2015-10-27 Hitachi High-Technologies Corporation Stage apparatus and sample observation apparatus
JP6152001B2 (ja) * 2012-08-03 2017-06-21 キヤノン株式会社 アクティブ除振装置、除振方法、加工装置、検査装置、露光装置及びワークの製造方法
EP2846062B1 (de) * 2013-09-10 2017-05-31 Integrated Dynamics Engineering GmbH Schwingungsisolationssystem mit in Teilbereiche unterteilter Auflage sowie Verfahren zu dessen Regelung
WO2017089214A1 (en) * 2015-11-23 2017-06-01 Asml Netherlands B.V. Positioning device, lithographic apparatus and device manufacturing method
EP3394676B1 (en) * 2015-12-21 2020-09-09 ASML Netherlands B.V. Lithographic apparatus having an active base frame support
JP6556196B2 (ja) 2017-07-27 2019-08-07 倉敷化工株式会社 アクティブ除振装置
US11169450B2 (en) 2018-04-25 2021-11-09 Asml Netherlands B.V. Pneumatic support device and lithographic apparatus with pneumatic support device
CN110566629B (zh) * 2019-09-20 2020-06-26 乐清市芮易经济信息咨询有限公司 基于振动补偿的大型机器用共振消除装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3217522B2 (ja) 1992-03-02 2001-10-09 キヤノン株式会社 精密位置決め装置
JP3184044B2 (ja) 1994-05-24 2001-07-09 キヤノン株式会社 微動位置決め制御装置
JP3224489B2 (ja) 1995-03-28 2001-10-29 キヤノン株式会社 空気バネ式除振装置
US5812420A (en) 1995-09-05 1998-09-22 Nikon Corporation Vibration-preventive apparatus and exposure apparatus
JP3807516B2 (ja) * 1995-09-05 2006-08-09 株式会社ニコン 除振装置、除振方法及び露光装置
JPH09326362A (ja) * 1996-04-05 1997-12-16 Nikon Corp 除振装置及び露光装置
JP3733174B2 (ja) 1996-06-19 2006-01-11 キヤノン株式会社 走査型投影露光装置
JP3581499B2 (ja) 1996-09-27 2004-10-27 キヤノン株式会社 除振装置及びその制御方法
US6128552A (en) * 1996-11-08 2000-10-03 Canon Kabushiki Kaisha Anti-vibration apparatus and method
JPH10141428A (ja) 1996-11-08 1998-05-29 Canon Inc 能動除振装置
US6170622B1 (en) 1997-03-07 2001-01-09 Canon Kabushiki Kaisha Anti-vibration apparatus and anti-vibration method thereof
JP3286201B2 (ja) 1997-03-07 2002-05-27 キヤノン株式会社 能動的除振装置
JPH10261561A (ja) 1997-03-18 1998-09-29 Toshiba Corp 露光制御方法及びその装置
JPH10311364A (ja) 1997-05-09 1998-11-24 Canon Inc 能動的除振制振装置
JP2002505596A (ja) 1997-05-23 2002-02-19 トランサージカル，インコーポレイテッド Ｍｒｉ誘導治療装置及び方法
JP4313865B2 (ja) 1998-01-14 2009-08-12 キヤノン株式会社 除振装置
JP4109747B2 (ja) * 1998-05-07 2008-07-02 キヤノン株式会社 アクティブ除振装置および露光装置

Also Published As

Publication number Publication date
EP1124078B1 (en) 2005-10-26
EP1124078A2 (en) 2001-08-16
JP2001221278A (ja) 2001-08-17
DE60114260D1 (de) 2005-12-01
US20010011697A1 (en) 2001-08-09
KR20010078795A (ko) 2001-08-21
EP1124078A3 (en) 2003-06-18
DE60114260T2 (de) 2006-07-13
TW535227B (en) 2003-06-01
US6684132B2 (en) 2004-01-27

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