JP4402202B2 - 反射型半導体表示装置 - Google Patents
反射型半導体表示装置 Download PDFInfo
- Publication number
- JP4402202B2 JP4402202B2 JP18270499A JP18270499A JP4402202B2 JP 4402202 B2 JP4402202 B2 JP 4402202B2 JP 18270499 A JP18270499 A JP 18270499A JP 18270499 A JP18270499 A JP 18270499A JP 4402202 B2 JP4402202 B2 JP 4402202B2
- Authority
- JP
- Japan
- Prior art keywords
- tft
- display device
- conductive layer
- channel
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
- H10D30/6713—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes
- H10D30/6715—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes characterised by the doping profiles, e.g. having lightly-doped source or drain extensions
Landscapes
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Thin Film Transistor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18270499A JP4402202B2 (ja) | 1999-06-29 | 1999-06-29 | 反射型半導体表示装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18270499A JP4402202B2 (ja) | 1999-06-29 | 1999-06-29 | 反射型半導体表示装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001013525A JP2001013525A (ja) | 2001-01-19 |
| JP2001013525A5 JP2001013525A5 (enExample) | 2006-08-17 |
| JP4402202B2 true JP4402202B2 (ja) | 2010-01-20 |
Family
ID=16122987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18270499A Expired - Fee Related JP4402202B2 (ja) | 1999-06-29 | 1999-06-29 | 反射型半導体表示装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4402202B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4693257B2 (ja) * | 2001-02-21 | 2011-06-01 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| SG179310A1 (en) | 2001-02-28 | 2012-04-27 | Semiconductor Energy Lab | Semiconductor device and manufacturing method thereof |
| CN1245703C (zh) * | 2001-12-11 | 2006-03-15 | 精工爱普生株式会社 | 显示装置及其电子机器 |
| JP4314820B2 (ja) * | 2001-12-11 | 2009-08-19 | セイコーエプソン株式会社 | 表示装置及び電子機器 |
| WO2011080957A1 (ja) * | 2009-12-29 | 2011-07-07 | シャープ株式会社 | 薄膜トランジスタ、その製造方法、および表示装置 |
| US11423844B2 (en) | 2018-05-17 | 2022-08-23 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic device |
| JP7520690B2 (ja) * | 2020-10-26 | 2024-07-23 | 株式会社ジャパンディスプレイ | 表示装置 |
-
1999
- 1999-06-29 JP JP18270499A patent/JP4402202B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2001013525A (ja) | 2001-01-19 |
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