JP4312555B2 - 真空蒸着用ルツボおよび蛍光体シート製造装置 - Google Patents

真空蒸着用ルツボおよび蛍光体シート製造装置 Download PDF

Info

Publication number
JP4312555B2
JP4312555B2 JP2003325704A JP2003325704A JP4312555B2 JP 4312555 B2 JP4312555 B2 JP 4312555B2 JP 2003325704 A JP2003325704 A JP 2003325704A JP 2003325704 A JP2003325704 A JP 2003325704A JP 4312555 B2 JP4312555 B2 JP 4312555B2
Authority
JP
Japan
Prior art keywords
crucible
forming material
film forming
phosphor
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003325704A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005089835A (ja
JP2005089835A5 (enExample
Inventor
恭久 野口
誠 柏谷
純司 中田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2003325704A priority Critical patent/JP4312555B2/ja
Priority to US10/943,144 priority patent/US20050103273A1/en
Publication of JP2005089835A publication Critical patent/JP2005089835A/ja
Publication of JP2005089835A5 publication Critical patent/JP2005089835A5/ja
Application granted granted Critical
Publication of JP4312555B2 publication Critical patent/JP4312555B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Conversion Of X-Rays Into Visible Images (AREA)
  • Physical Vapour Deposition (AREA)
  • Luminescent Compositions (AREA)
JP2003325704A 2003-09-18 2003-09-18 真空蒸着用ルツボおよび蛍光体シート製造装置 Expired - Fee Related JP4312555B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003325704A JP4312555B2 (ja) 2003-09-18 2003-09-18 真空蒸着用ルツボおよび蛍光体シート製造装置
US10/943,144 US20050103273A1 (en) 2003-09-18 2004-09-17 Vacuum evaporation crucible and phosphor sheet manufacturing apparatus using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003325704A JP4312555B2 (ja) 2003-09-18 2003-09-18 真空蒸着用ルツボおよび蛍光体シート製造装置

Publications (3)

Publication Number Publication Date
JP2005089835A JP2005089835A (ja) 2005-04-07
JP2005089835A5 JP2005089835A5 (enExample) 2006-06-15
JP4312555B2 true JP4312555B2 (ja) 2009-08-12

Family

ID=34456081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003325704A Expired - Fee Related JP4312555B2 (ja) 2003-09-18 2003-09-18 真空蒸着用ルツボおよび蛍光体シート製造装置

Country Status (2)

Country Link
US (1) US20050103273A1 (enExample)
JP (1) JP4312555B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4726570B2 (ja) * 2005-08-05 2011-07-20 日立造船株式会社 真空蒸着用蒸発装置
JP4679291B2 (ja) * 2005-08-05 2011-04-27 日立造船株式会社 真空蒸着用蒸発方法および装置
EP1790755B1 (en) * 2005-10-28 2012-12-12 Agfa HealthCare NV Method of vaporisation of phosphor precursor raw materials.
US20070098881A1 (en) * 2005-10-28 2007-05-03 Jean-Pierre Tahon Method of preparing stabilized storage phosphor panels
US20070098880A1 (en) * 2005-10-28 2007-05-03 Jean-Pierre Tahon Method of vaporization of phosphor precursor raw materials
US20070131866A1 (en) * 2005-12-14 2007-06-14 General Electric Company Activated alkali metal rare earth halides and articles using same
JP2007297695A (ja) * 2006-05-08 2007-11-15 Fujifilm Corp 真空蒸着用ルツボおよび真空蒸着装置
EP1967605A1 (en) * 2007-03-08 2008-09-10 Applied Materials, Inc. Evaporation tube and evaporation apparatus with adapted evaporation characteristic
EP1967606A1 (en) * 2007-03-08 2008-09-10 Applied Materials, Inc. Evaporation crucible and evaporation apparatus with adapted evaporation characteristic
EP2020454B1 (en) * 2007-07-27 2012-09-05 Applied Materials, Inc. Evaporation apparatus with inclined crucible
US20090162535A1 (en) * 2007-12-21 2009-06-25 Jean-Pierre Tahon Method of forming a phosphor or scintillator material and vapor deposition apparatus used therefor
JP2015001387A (ja) * 2013-06-13 2015-01-05 株式会社東芝 放射線検出器の製造方法
KR102722614B1 (ko) * 2016-08-05 2024-10-28 삼성디스플레이 주식회사 선형 증착원 및 이를 포함하는 증착 장치
JP7353191B2 (ja) * 2020-01-14 2023-09-29 キヤノン電子管デバイス株式会社 放射線検出モジュール、および放射線検出器
EP4219787A1 (en) * 2022-01-28 2023-08-02 Essilor International Physical vapor deposition machine with a thermal evaporator having a cup heated-up by electric current

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2793609A (en) * 1953-01-26 1957-05-28 British Dielectric Res Ltd Means for the deposition of materials by evaporation in a vacuum
US2819420A (en) * 1954-03-19 1958-01-07 Gen Electric Electroluminescent cell
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
US6237529B1 (en) * 2000-03-03 2001-05-29 Eastman Kodak Company Source for thermal physical vapor deposition of organic electroluminescent layers
DE10011568C1 (de) * 2000-03-09 2001-06-13 Gea Canzler Gmbh Wärmetauscherelement
JP2002146516A (ja) * 2000-11-07 2002-05-22 Sony Corp 有機薄膜の蒸着方法
ITMI20010995A1 (it) * 2001-05-15 2002-11-15 Getters Spa Dispensatori di cesio e processo per il loro uso
JP2003113466A (ja) * 2001-07-31 2003-04-18 Fuji Photo Film Co Ltd 真空蒸着装置
US20030168013A1 (en) * 2002-03-08 2003-09-11 Eastman Kodak Company Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device
US20040000379A1 (en) * 2002-06-27 2004-01-01 Ulvac, Inc. Evaporation container and evaporation source
US20040144321A1 (en) * 2003-01-28 2004-07-29 Eastman Kodak Company Method of designing a thermal physical vapor deposition system
JP2005029896A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 原材料の蒸発のために使用されるるつぼのための改良されたアセンブリ
US7261118B2 (en) * 2003-08-19 2007-08-28 Air Products And Chemicals, Inc. Method and vessel for the delivery of precursor materials

Also Published As

Publication number Publication date
US20050103273A1 (en) 2005-05-19
JP2005089835A (ja) 2005-04-07

Similar Documents

Publication Publication Date Title
JP4312555B2 (ja) 真空蒸着用ルツボおよび蛍光体シート製造装置
US7070658B2 (en) Vapor deposition apparatus
JP2008285719A (ja) 真空蒸着方法
US20070003718A1 (en) Reflector, heating crucible equipped with reflector and process for preparation of radiation image storage panel
US7217944B2 (en) Process and apparatus for producing evaporated phosphor sheets and an evaporated phosphor sheet produced by means of such process and apparatus
US20080035857A1 (en) Method of manufacturing a radiation image storage panel
JP2005336558A (ja) 蒸着装置及び蒸着方法
JP2005126821A (ja) 真空蒸着装置および真空蒸着の前処理方法
JP2005029896A (ja) 原材料の蒸発のために使用されるるつぼのための改良されたアセンブリ
JP2005350731A (ja) 真空蒸着装置
JP2008088531A (ja) 蛍光体層の形成方法
JP2007297695A (ja) 真空蒸着用ルツボおよび真空蒸着装置
JP3995038B2 (ja) 蛍光体シート製造装置
JP4087661B2 (ja) 材料供給装置
JP2005126822A (ja) 真空蒸着方法および真空蒸着装置
JP2006098339A (ja) 放射線像変換パネルの製造方法
JP3862215B2 (ja) 蛍光体シート製造装置
JP2006274308A (ja) 蛍光体シート製造装置
JP4779363B2 (ja) 放射線像変換パネルの製造方法
JP3952012B2 (ja) 放射線像変換パネル及び放射線像変換パネルの製造方法
JP2004076074A (ja) 蒸着装置
JP2005351762A (ja) 蛍光体シート製造装置
EP1892729A1 (en) Method of manufacturing a radiation image storage panel
JP2005351756A (ja) 蛍光体シート製造装置
JP2004108866A (ja) 蛍光体シートの製造方法および装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060413

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060413

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A712

Effective date: 20061212

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20080725

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20081120

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081125

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090126

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090428

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090513

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120522

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130522

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140522

Year of fee payment: 5

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees