JP4253088B2 - 反射防止膜組成物およびその準備方法、ならびに反射防止膜およびその形成方法 - Google Patents
反射防止膜組成物およびその準備方法、ならびに反射防止膜およびその形成方法 Download PDFInfo
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- JP4253088B2 JP4253088B2 JP28983199A JP28983199A JP4253088B2 JP 4253088 B2 JP4253088 B2 JP 4253088B2 JP 28983199 A JP28983199 A JP 28983199A JP 28983199 A JP28983199 A JP 28983199A JP 4253088 B2 JP4253088 B2 JP 4253088B2
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- fluorene
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- 238000000034 method Methods 0.000 title claims description 24
- 239000000203 mixture Substances 0.000 title claims description 11
- 238000002360 preparation method Methods 0.000 title description 2
- -1 9-anthraldehyde 2-amino-7-methyl-5-oxo-5H- [1] benzopyrano [2,3-b] pyridine-3-carbonitrile Chemical compound 0.000 claims description 26
- 229920000642 polymer Polymers 0.000 claims description 26
- 150000001875 compounds Chemical class 0.000 claims description 20
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- 239000001257 hydrogen Substances 0.000 claims description 13
- 150000008376 fluorenones Chemical class 0.000 claims description 12
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 10
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 claims description 10
- GUEIZVNYDFNHJU-UHFFFAOYSA-N quinizarin Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(O)=CC=C2O GUEIZVNYDFNHJU-UHFFFAOYSA-N 0.000 claims description 10
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 claims description 10
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 claims description 9
- 239000006117 anti-reflective coating Substances 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 9
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 8
- 125000004858 cycloalkoxyalkyl group Chemical group 0.000 claims description 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- AFMVESZOYKHDBJ-UHFFFAOYSA-N fluoren-9-ol Chemical compound C1=CC=C2C(O)C3=CC=CC=C3C2=C1 AFMVESZOYKHDBJ-UHFFFAOYSA-N 0.000 claims description 5
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 claims description 5
- 239000003960 organic solvent Substances 0.000 claims description 5
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 4
- 238000001459 lithography Methods 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 230000003667 anti-reflective effect Effects 0.000 claims description 3
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims description 2
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 claims description 2
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 7
- CCFAKBRKTKVJPO-UHFFFAOYSA-N 1-anthroic acid Chemical class C1=CC=C2C=C3C(C(=O)O)=CC=CC3=CC2=C1 CCFAKBRKTKVJPO-UHFFFAOYSA-N 0.000 claims 6
- ASDLSKCKYGVMAI-UHFFFAOYSA-N 9,10-dioxoanthracene-2-carboxylic acid Chemical compound C1=CC=C2C(=O)C3=CC(C(=O)O)=CC=C3C(=O)C2=C1 ASDLSKCKYGVMAI-UHFFFAOYSA-N 0.000 claims 6
- APAJFZPFBHMFQR-UHFFFAOYSA-N anthraflavic acid Chemical compound OC1=CC=C2C(=O)C3=CC(O)=CC=C3C(=O)C2=C1 APAJFZPFBHMFQR-UHFFFAOYSA-N 0.000 claims 6
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 claims 3
- HLGMTCSSRBPNOQ-MHWRWJLKSA-N (ne)-n-(anthracen-9-ylmethylidene)hydroxylamine Chemical compound C1=CC=C2C(/C=N/O)=C(C=CC=C3)C3=CC2=C1 HLGMTCSSRBPNOQ-MHWRWJLKSA-N 0.000 claims 3
- KHUFHLFHOQVFGB-UHFFFAOYSA-N 1-aminoanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2N KHUFHLFHOQVFGB-UHFFFAOYSA-N 0.000 claims 3
- MNCMBBIFTVWHIP-UHFFFAOYSA-N 1-anthracen-9-yl-2,2,2-trifluoroethanone Chemical compound C1=CC=C2C(C(=O)C(F)(F)F)=C(C=CC=C3)C3=CC2=C1 MNCMBBIFTVWHIP-UHFFFAOYSA-N 0.000 claims 3
- WFSMJMTYIMFHPV-UHFFFAOYSA-N 2-(9h-fluoren-9-yl)acetic acid Chemical compound C1=CC=C2C(CC(=O)O)C3=CC=CC=C3C2=C1 WFSMJMTYIMFHPV-UHFFFAOYSA-N 0.000 claims 3
- XGWFJBFNAQHLEF-UHFFFAOYSA-N 9-anthroic acid Chemical compound C1=CC=C2C(C(=O)O)=C(C=CC=C3)C3=CC2=C1 XGWFJBFNAQHLEF-UHFFFAOYSA-N 0.000 claims 3
- XXSCONYSQQLHTH-UHFFFAOYSA-N 9h-fluoren-9-ylmethanol Chemical compound C1=CC=C2C(CO)C3=CC=CC=C3C2=C1 XXSCONYSQQLHTH-UHFFFAOYSA-N 0.000 claims 3
- HTPXFGUCAUTOEL-UHFFFAOYSA-N 9h-fluorene-1-carboxylic acid Chemical compound C1C2=CC=CC=C2C2=C1C(C(=O)O)=CC=C2 HTPXFGUCAUTOEL-UHFFFAOYSA-N 0.000 claims 3
- MNQGEQSXFDKAPY-UHFFFAOYSA-N 9h-fluorene-2-carbaldehyde Chemical compound C1=CC=C2C3=CC=C(C=O)C=C3CC2=C1 MNQGEQSXFDKAPY-UHFFFAOYSA-N 0.000 claims 3
- IBIDFEWDKNJSRD-UHFFFAOYSA-N 9h-fluorene-2-carboxylic acid Chemical compound C1=CC=C2C3=CC=C(C(=O)O)C=C3CC2=C1 IBIDFEWDKNJSRD-UHFFFAOYSA-N 0.000 claims 3
- WJNBLUOXTBTGMB-UHFFFAOYSA-N 9h-fluorene-4-carboxylic acid Chemical compound C1C2=CC=CC=C2C2=C1C=CC=C2C(=O)O WJNBLUOXTBTGMB-UHFFFAOYSA-N 0.000 claims 3
- DNVJGJUGFFYUPT-UHFFFAOYSA-N 9h-fluorene-9-carboxylic acid Chemical compound C1=CC=C2C(C(=O)O)C3=CC=CC=C3C2=C1 DNVJGJUGFFYUPT-UHFFFAOYSA-N 0.000 claims 3
- JCJNNHDZTLRSGN-UHFFFAOYSA-N anthracen-9-ylmethanol Chemical compound C1=CC=C2C(CO)=C(C=CC=C3)C3=CC2=C1 JCJNNHDZTLRSGN-UHFFFAOYSA-N 0.000 claims 3
- KEQZHLAEKAVZLY-UHFFFAOYSA-N anthracene-9-carbonitrile Chemical compound C1=CC=C2C(C#N)=C(C=CC=C3)C3=CC2=C1 KEQZHLAEKAVZLY-UHFFFAOYSA-N 0.000 claims 3
- NUZWLKWWNNJHPT-UHFFFAOYSA-N anthralin Chemical compound C1C2=CC=CC(O)=C2C(=O)C2=C1C=CC=C2O NUZWLKWWNNJHPT-UHFFFAOYSA-N 0.000 claims 3
- TZIQWQARHPGHIG-UHFFFAOYSA-N anthrarobin Chemical compound C1=CC=CC2=CC3=C(O)C(O)=CC=C3C(O)=C21 TZIQWQARHPGHIG-UHFFFAOYSA-N 0.000 claims 3
- JPICKYUTICNNNJ-UHFFFAOYSA-N anthrarufin Chemical compound O=C1C2=C(O)C=CC=C2C(=O)C2=C1C=CC=C2O JPICKYUTICNNNJ-UHFFFAOYSA-N 0.000 claims 3
- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 claims 3
- 229960002311 dithranol Drugs 0.000 claims 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims 1
- YVXRKDVOSYFSPJ-UHFFFAOYSA-N 2-amino-7-methyl-5-oxochromeno[2,3-b]pyridine-3-carbonitrile Chemical compound NC1=C(C#N)C=C2C(=O)C3=CC(C)=CC=C3OC2=N1 YVXRKDVOSYFSPJ-UHFFFAOYSA-N 0.000 claims 1
- YMNKUHIVVMFOFO-UHFFFAOYSA-N anthracene-9-carbaldehyde Chemical compound C1=CC=C2C(C=O)=C(C=CC=C3)C3=CC2=C1 YMNKUHIVVMFOFO-UHFFFAOYSA-N 0.000 claims 1
- 239000010408 film Substances 0.000 description 34
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 26
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 21
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 20
- 229920005989 resin Polymers 0.000 description 18
- 239000011347 resin Substances 0.000 description 18
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 9
- 229920001577 copolymer Polymers 0.000 description 9
- 229920003986 novolac Polymers 0.000 description 7
- 238000001556 precipitation Methods 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- 0 CC(C)(*)c1ccc(*)cc1 Chemical compound CC(C)(*)c1ccc(*)cc1 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 150000002431 hydrogen Chemical group 0.000 description 4
- HTQAWUWYTPJXMS-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate 2-phenylethenol Chemical compound OCCOC(=O)C=C.OC=Cc1ccccc1 HTQAWUWYTPJXMS-UHFFFAOYSA-N 0.000 description 3
- DRSHXJFUUPIBHX-UHFFFAOYSA-N COc1ccc(cc1)N1N=CC2C=NC(Nc3cc(OC)c(OC)c(OCCCN4CCN(C)CC4)c3)=NC12 Chemical compound COc1ccc(cc1)N1N=CC2C=NC(Nc3cc(OC)c(OC)c(OCCCN4CCN(C)CC4)c3)=NC12 DRSHXJFUUPIBHX-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 230000007261 regionalization Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- KWFDMDKGDNUIAY-UHFFFAOYSA-N 2-hydroxyethyl 2-methylprop-2-enoate;2-phenylethenol Chemical compound CC(=C)C(=O)OCCO.OC=CC1=CC=CC=C1 KWFDMDKGDNUIAY-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- FKLJPTJMIBLJAV-UHFFFAOYSA-N Compound IV Chemical compound O1N=C(C)C=C1CCCCCCCOC1=CC=C(C=2OCCN=2)C=C1 FKLJPTJMIBLJAV-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical class [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N Methyl ethyl ketone Natural products CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- UWQPDVZUOZVCBH-UHFFFAOYSA-N 2-diazonio-4-oxo-3h-naphthalen-1-olate Chemical group C1=CC=C2C(=O)C(=[N+]=[N-])CC(=O)C2=C1 UWQPDVZUOZVCBH-UHFFFAOYSA-N 0.000 description 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- MKHXOKALQIHXPI-UHFFFAOYSA-N 2-phenylprop-1-en-1-ol Chemical compound OC=C(C)C1=CC=CC=C1 MKHXOKALQIHXPI-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- NYVMWIRMHNBNMP-UHFFFAOYSA-N CC(C)=C(C1CC1)c1c(cccc2)c2cc2ccccc12 Chemical compound CC(C)=C(C1CC1)c1c(cccc2)c2cc2ccccc12 NYVMWIRMHNBNMP-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UZQJCQINVLELAG-UHFFFAOYSA-N Cc(cc1)ccc1[ClH]C Chemical compound Cc(cc1)ccc1[ClH]C UZQJCQINVLELAG-UHFFFAOYSA-N 0.000 description 1
- FNLPIBFIQJAXEM-UHFFFAOYSA-N Cc1c(C(C(C=C2)=N)=C)c2ccc1 Chemical compound Cc1c(C(C(C=C2)=N)=C)c2ccc1 FNLPIBFIQJAXEM-UHFFFAOYSA-N 0.000 description 1
- 206010011416 Croup infectious Diseases 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 201000010549 croup Diseases 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/34—Introducing sulfur atoms or sulfur-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
- C08F212/16—Halogens
- C08F212/20—Fluorine
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR98-63695 | 1998-12-31 | ||
| KR10-1998-0063695A KR100363695B1 (ko) | 1998-12-31 | 1998-12-31 | 유기난반사방지중합체및그의제조방법 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007042141A Division JP2007231270A (ja) | 1998-12-31 | 2007-02-22 | 有機反射防止膜用重合体、その製造方法および半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000204115A JP2000204115A (ja) | 2000-07-25 |
| JP4253088B2 true JP4253088B2 (ja) | 2009-04-08 |
Family
ID=19570257
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28983199A Expired - Fee Related JP4253088B2 (ja) | 1998-12-31 | 1999-10-12 | 反射防止膜組成物およびその準備方法、ならびに反射防止膜およびその形成方法 |
| JP2007042141A Withdrawn JP2007231270A (ja) | 1998-12-31 | 2007-02-22 | 有機反射防止膜用重合体、その製造方法および半導体装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007042141A Withdrawn JP2007231270A (ja) | 1998-12-31 | 2007-02-22 | 有機反射防止膜用重合体、その製造方法および半導体装置 |
Country Status (10)
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100804873B1 (ko) * | 1999-06-10 | 2008-02-20 | 얼라이드시그날 인코퍼레이티드 | 포토리소그래피용 ｓｏｇ 반사방지 코팅 |
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| JPS5236043B2 (US06492441-20021210-C00025.png) * | 1974-02-21 | 1977-09-13 | ||
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| JP3823449B2 (ja) * | 1997-06-16 | 2006-09-20 | 住友化学株式会社 | フォトレジスト組成物 |
| TW457403B (en) | 1998-07-03 | 2001-10-01 | Clariant Int Ltd | Composition for forming a radiation absorbing coating containing blocked isocyanate compound and anti-reflective coating formed therefrom |
-
1998
- 1998-12-31 KR KR10-1998-0063695A patent/KR100363695B1/ko not_active IP Right Cessation
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1999
- 1999-07-23 GB GB9917218A patent/GB2345289B/en not_active Expired - Fee Related
- 1999-07-30 FR FR9909924A patent/FR2788060B1/fr not_active Expired - Fee Related
- 1999-08-17 NL NL1012840A patent/NL1012840C2/nl not_active IP Right Cessation
- 1999-08-25 DE DE19940320A patent/DE19940320B4/de not_active Expired - Fee Related
- 1999-09-22 TW TW088116247A patent/TWI227259B/zh not_active IP Right Cessation
- 1999-10-07 US US09/413,679 patent/US6350818B1/en not_active Expired - Fee Related
- 1999-10-12 JP JP28983199A patent/JP4253088B2/ja not_active Expired - Fee Related
- 1999-11-24 IT IT1999TO001027A patent/IT1308658B1/it active
- 1999-12-23 CN CNB991249739A patent/CN1166704C/zh not_active Expired - Fee Related
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- 2001-12-11 US US10/015,333 patent/US6492441B2/en not_active Expired - Fee Related
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Also Published As
| Publication number | Publication date |
|---|---|
| NL1012840A1 (nl) | 2000-07-03 |
| US20020120070A1 (en) | 2002-08-29 |
| DE19940320B4 (de) | 2006-09-21 |
| JP2000204115A (ja) | 2000-07-25 |
| CN1166704C (zh) | 2004-09-15 |
| CN1260355A (zh) | 2000-07-19 |
| IT1308658B1 (it) | 2002-01-09 |
| DE19940320A1 (de) | 2000-07-06 |
| KR100363695B1 (ko) | 2003-04-11 |
| GB2345289A (en) | 2000-07-05 |
| FR2788060A1 (fr) | 2000-07-07 |
| ITTO991027A0 (it) | 1999-11-24 |
| US6350818B1 (en) | 2002-02-26 |
| JP2007231270A (ja) | 2007-09-13 |
| ITTO991027A1 (it) | 2001-05-24 |
| FR2788060B1 (fr) | 2003-10-17 |
| GB9917218D0 (en) | 1999-09-22 |
| US6492441B2 (en) | 2002-12-10 |
| TWI227259B (en) | 2005-02-01 |
| NL1012840C2 (nl) | 2001-06-07 |
| GB2345289B (en) | 2003-03-26 |
| KR20010016643A (ko) | 2001-03-05 |
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