JP4249810B2 - 染色されたフォトレジストとその方法及びそれからなる工業製品 - Google Patents

染色されたフォトレジストとその方法及びそれからなる工業製品 Download PDF

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Publication number
JP4249810B2
JP4249810B2 JP30776297A JP30776297A JP4249810B2 JP 4249810 B2 JP4249810 B2 JP 4249810B2 JP 30776297 A JP30776297 A JP 30776297A JP 30776297 A JP30776297 A JP 30776297A JP 4249810 B2 JP4249810 B2 JP 4249810B2
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JP
Japan
Prior art keywords
photoresist
forming
relief image
group
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP30776297A
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English (en)
Japanese (ja)
Other versions
JPH10186647A (ja
JPH10186647A5 (enExample
Inventor
マイケル モリ ジェイムズ
ダブリュー サックレー ジェームズ
エフ シンタ ロジャー
ベル ローズマリー
エル ミラー＝ファーフェイ ロビン
ジー アダムス ティモシー
エム ザイドウスキイ トーマス
ケイ パベルチェク エドワード
ドカント マニュエル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials International LLC
Original Assignee
Rohm and Haas Electronic Materials LLC
DuPont Electronic Materials International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Electronic Materials LLC, DuPont Electronic Materials International LLC filed Critical Rohm and Haas Electronic Materials LLC
Publication of JPH10186647A publication Critical patent/JPH10186647A/ja
Publication of JPH10186647A5 publication Critical patent/JPH10186647A5/ja
Application granted granted Critical
Publication of JP4249810B2 publication Critical patent/JP4249810B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP30776297A 1996-10-07 1997-10-06 染色されたフォトレジストとその方法及びそれからなる工業製品 Expired - Lifetime JP4249810B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US726613 1996-10-07
US08/726,613 US7147983B1 (en) 1996-10-07 1996-10-07 Dyed photoresists and methods and articles of manufacture comprising same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006290286A Division JP4250182B2 (ja) 1996-10-07 2006-10-25 染色されたフォトレジストとその方法及びそれからなる工業製品

Publications (3)

Publication Number Publication Date
JPH10186647A JPH10186647A (ja) 1998-07-14
JPH10186647A5 JPH10186647A5 (enExample) 2006-12-14
JP4249810B2 true JP4249810B2 (ja) 2009-04-08

Family

ID=24919313

Family Applications (2)

Application Number Title Priority Date Filing Date
JP30776297A Expired - Lifetime JP4249810B2 (ja) 1996-10-07 1997-10-06 染色されたフォトレジストとその方法及びそれからなる工業製品
JP2006290286A Expired - Lifetime JP4250182B2 (ja) 1996-10-07 2006-10-25 染色されたフォトレジストとその方法及びそれからなる工業製品

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2006290286A Expired - Lifetime JP4250182B2 (ja) 1996-10-07 2006-10-25 染色されたフォトレジストとその方法及びそれからなる工業製品

Country Status (4)

Country Link
US (3) US7147983B1 (enExample)
EP (1) EP0834770B1 (enExample)
JP (2) JP4249810B2 (enExample)
DE (1) DE69726378T2 (enExample)

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KR100549574B1 (ko) 1999-12-30 2006-02-08 주식회사 하이닉스반도체 유기 반사 방지막용 중합체 및 그의 제조방법
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KR101111647B1 (ko) * 2009-08-27 2012-02-14 영창케미칼 주식회사 반도체 패턴 형성을 위한 ｉ-선용 네가티브형 포토레지스트 조성물
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Also Published As

Publication number Publication date
US20090220888A1 (en) 2009-09-03
JP2007058236A (ja) 2007-03-08
JPH10186647A (ja) 1998-07-14
DE69726378D1 (de) 2004-01-08
EP0834770B1 (en) 2003-11-26
DE69726378T2 (de) 2004-09-16
US20060204892A1 (en) 2006-09-14
US7632630B2 (en) 2009-12-15
JP4250182B2 (ja) 2009-04-08
EP0834770A2 (en) 1998-04-08
EP0834770A3 (en) 1999-07-21
US7147983B1 (en) 2006-12-12

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