GB201903420D0 - Photoresist - Google Patents
PhotoresistInfo
- Publication number
- GB201903420D0 GB201903420D0 GBGB1903420.6A GB201903420A GB201903420D0 GB 201903420 D0 GB201903420 D0 GB 201903420D0 GB 201903420 A GB201903420 A GB 201903420A GB 201903420 D0 GB201903420 D0 GB 201903420D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB1903420.6A GB201903420D0 (en) | 2019-03-13 | 2019-03-13 | Photoresist |
PCT/GB2020/050619 WO2020183183A1 (en) | 2019-03-13 | 2020-03-12 | Photoresist composition comprising a polymer comprising a fused aromatic ring structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB1903420.6A GB201903420D0 (en) | 2019-03-13 | 2019-03-13 | Photoresist |
Publications (1)
Publication Number | Publication Date |
---|---|
GB201903420D0 true GB201903420D0 (en) | 2019-04-24 |
Family
ID=66380277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB1903420.6A Ceased GB201903420D0 (en) | 2019-03-13 | 2019-03-13 | Photoresist |
Country Status (2)
Country | Link |
---|---|
GB (1) | GB201903420D0 (en) |
WO (1) | WO2020183183A1 (en) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7147983B1 (en) * | 1996-10-07 | 2006-12-12 | Shipley Company, L.L.C. | Dyed photoresists and methods and articles of manufacture comprising same |
KR100734249B1 (en) * | 2000-09-07 | 2007-07-02 | 삼성전자주식회사 | Photosensitive polymers having protective group including fused aromatic ring and resist compositions comprising the same |
KR100944227B1 (en) * | 2007-12-17 | 2010-02-24 | 제일모직주식회사 | Methacrylate compound and photosensitive polymer having aromatic acid labile group, and resist composition |
KR100922841B1 (en) * | 2007-12-18 | 2009-10-20 | 제일모직주식회사 | Photosensitive polymers and resist composition including same |
JP5385017B2 (en) * | 2008-07-11 | 2014-01-08 | 信越化学工業株式会社 | Resist pattern forming method and photomask manufacturing method |
US9063420B2 (en) * | 2013-07-16 | 2015-06-23 | Rohm And Haas Electronic Materials Llc | Photoresist composition, coated substrate, and method of forming electronic device |
-
2019
- 2019-03-13 GB GBGB1903420.6A patent/GB201903420D0/en not_active Ceased
-
2020
- 2020-03-12 WO PCT/GB2020/050619 patent/WO2020183183A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2020183183A1 (en) | 2020-09-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AT | Applications terminated before publication under section 16(1) |