GB201903420D0 - Photoresist - Google Patents

Photoresist

Info

Publication number
GB201903420D0
GB201903420D0 GBGB1903420.6A GB201903420A GB201903420D0 GB 201903420 D0 GB201903420 D0 GB 201903420D0 GB 201903420 A GB201903420 A GB 201903420A GB 201903420 D0 GB201903420 D0 GB 201903420D0
Authority
GB
United Kingdom
Prior art keywords
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB1903420.6A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanotronix Inc
Original Assignee
Nanotronix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanotronix Inc filed Critical Nanotronix Inc
Priority to GBGB1903420.6A priority Critical patent/GB201903420D0/en
Publication of GB201903420D0 publication Critical patent/GB201903420D0/en
Priority to PCT/GB2020/050619 priority patent/WO2020183183A1/en
Ceased legal-status Critical Current

Links

GBGB1903420.6A 2019-03-13 2019-03-13 Photoresist Ceased GB201903420D0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GBGB1903420.6A GB201903420D0 (en) 2019-03-13 2019-03-13 Photoresist
PCT/GB2020/050619 WO2020183183A1 (en) 2019-03-13 2020-03-12 Photoresist composition comprising a polymer comprising a fused aromatic ring structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB1903420.6A GB201903420D0 (en) 2019-03-13 2019-03-13 Photoresist

Publications (1)

Publication Number Publication Date
GB201903420D0 true GB201903420D0 (en) 2019-04-24

Family

ID=66380277

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB1903420.6A Ceased GB201903420D0 (en) 2019-03-13 2019-03-13 Photoresist

Country Status (2)

Country Link
GB (1) GB201903420D0 (en)
WO (1) WO2020183183A1 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7147983B1 (en) * 1996-10-07 2006-12-12 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
KR100734249B1 (en) * 2000-09-07 2007-07-02 삼성전자주식회사 Photosensitive polymers having protective group including fused aromatic ring and resist compositions comprising the same
KR100944227B1 (en) * 2007-12-17 2010-02-24 제일모직주식회사 Methacrylate compound and photosensitive polymer having aromatic acid labile group, and resist composition
KR100922841B1 (en) * 2007-12-18 2009-10-20 제일모직주식회사 Photosensitive polymers and resist composition including same
JP5385017B2 (en) * 2008-07-11 2014-01-08 信越化学工業株式会社 Resist pattern forming method and photomask manufacturing method
US9063420B2 (en) * 2013-07-16 2015-06-23 Rohm And Haas Electronic Materials Llc Photoresist composition, coated substrate, and method of forming electronic device

Also Published As

Publication number Publication date
WO2020183183A1 (en) 2020-09-17

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)