DE69726378D1 - Gefärbte Photoresists sowie Methoden und Artikel, die diese umfassen - Google Patents

Gefärbte Photoresists sowie Methoden und Artikel, die diese umfassen

Info

Publication number
DE69726378D1
DE69726378D1 DE69726378T DE69726378T DE69726378D1 DE 69726378 D1 DE69726378 D1 DE 69726378D1 DE 69726378 T DE69726378 T DE 69726378T DE 69726378 T DE69726378 T DE 69726378T DE 69726378 D1 DE69726378 D1 DE 69726378D1
Authority
DE
Germany
Prior art keywords
methods
articles incorporating
colored photoresists
photoresists
colored
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69726378T
Other languages
English (en)
Other versions
DE69726378T2 (de
Inventor
James Michael Mori
W Thackeray
Roger F Sinta
Rosemary Bell
Robin L Miller-Fahey
Timothy G Adams
Thomas M Zydowsky
Edward K Pavelchek
Manuel Docanto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Rohm and Haas Electronic Materials LLC
Original Assignee
Shipley Co Inc
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc, Shipley Co LLC filed Critical Shipley Co Inc
Publication of DE69726378D1 publication Critical patent/DE69726378D1/de
Application granted granted Critical
Publication of DE69726378T2 publication Critical patent/DE69726378T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE69726378T 1996-10-07 1997-09-10 Gefärbte Photoresists sowie Methoden und Artikel, die diese umfassen Expired - Fee Related DE69726378T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/726,613 US7147983B1 (en) 1996-10-07 1996-10-07 Dyed photoresists and methods and articles of manufacture comprising same
US726613 1996-10-07

Publications (2)

Publication Number Publication Date
DE69726378D1 true DE69726378D1 (de) 2004-01-08
DE69726378T2 DE69726378T2 (de) 2004-09-16

Family

ID=24919313

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69726378T Expired - Fee Related DE69726378T2 (de) 1996-10-07 1997-09-10 Gefärbte Photoresists sowie Methoden und Artikel, die diese umfassen

Country Status (4)

Country Link
US (3) US7147983B1 (de)
EP (1) EP0834770B1 (de)
JP (2) JP4249810B2 (de)
DE (1) DE69726378T2 (de)

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US5976770A (en) * 1998-01-15 1999-11-02 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
KR100395904B1 (ko) * 1999-04-23 2003-08-27 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법
KR100310252B1 (ko) * 1999-06-22 2001-11-14 박종섭 유기 반사방지 중합체 및 그의 제조방법
KR100533379B1 (ko) * 1999-09-07 2005-12-06 주식회사 하이닉스반도체 유기 난반사 방지막용 조성물과 이의 제조방법
KR100549574B1 (ko) 1999-12-30 2006-02-08 주식회사 하이닉스반도체 유기 반사 방지막용 중합체 및 그의 제조방법
KR100734249B1 (ko) * 2000-09-07 2007-07-02 삼성전자주식회사 축합환의 방향족 환을 포함하는 보호기를 가지는 감광성폴리머 및 이를 포함하는 레지스트 조성물
JP3712048B2 (ja) * 2000-09-27 2005-11-02 信越化学工業株式会社 レジスト材料
EP1197998A3 (de) * 2000-10-10 2005-12-21 Shipley Company LLC Antireflektiver Schaumstoff
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JP5002137B2 (ja) * 2005-07-28 2012-08-15 富士フイルム株式会社 化学増幅型レジスト組成物及びその製造方法
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US7592118B2 (en) 2007-03-27 2009-09-22 Fujifilm Corporation Positive resist composition and pattern forming method using the same
JP4982228B2 (ja) 2007-03-30 2012-07-25 富士フイルム株式会社 ポジ型レジスト組成物及びこれを用いたパターン形成方法
JP4905250B2 (ja) * 2007-05-18 2012-03-28 住友化学株式会社 化学増幅型ポジ型レジスト組成物
KR100871770B1 (ko) 2007-09-12 2008-12-05 주식회사 효성 안트라세닐 벤질기 발색단을 포함하는 공중합체, 상기공중합체의 제조방법, 상기 공중합체를 포함하는유기반사방지막 조성물 및 상기 조성물을 포함하는유기반사방지막
KR101111647B1 (ko) * 2009-08-27 2012-02-14 영창케미칼 주식회사 반도체 패턴 형성을 위한 ｉ-선용 네가티브형 포토레지스트 조성물
TWI605310B (zh) * 2009-12-15 2017-11-11 羅門哈斯電子材料有限公司 光阻劑及其使用方法
CN101768373A (zh) * 2010-01-08 2010-07-07 武汉科技学院 一种重氮偶合法制备水溶性乙烯砜型聚氨酯类高分子活性染料的方法
JP6049250B2 (ja) 2010-11-30 2016-12-21 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 光酸発生剤
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US20140356789A1 (en) * 2013-05-31 2014-12-04 Orthogonal, Inc. Fluorinated photopolymer with integrated anthracene sensitizer
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KR102028483B1 (ko) * 2013-09-17 2019-10-07 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
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JP2016018075A (ja) 2014-07-08 2016-02-01 東京応化工業株式会社 レジストパターン形成方法及びレジスト組成物
KR102480950B1 (ko) 2014-12-24 2022-12-23 올싸거널 인코포레이티드 전자 장치의 포토리소그래피 패터닝
JP7243180B2 (ja) * 2017-12-25 2023-03-22 東ソー株式会社 光架橋性重合体、絶縁層及びこれを含む有機トランジスタデバイス
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Also Published As

Publication number Publication date
EP0834770A3 (de) 1999-07-21
US7147983B1 (en) 2006-12-12
US20060204892A1 (en) 2006-09-14
EP0834770A2 (de) 1998-04-08
EP0834770B1 (de) 2003-11-26
US20090220888A1 (en) 2009-09-03
JP4250182B2 (ja) 2009-04-08
JPH10186647A (ja) 1998-07-14
JP4249810B2 (ja) 2009-04-08
JP2007058236A (ja) 2007-03-08
DE69726378T2 (de) 2004-09-16
US7632630B2 (en) 2009-12-15

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