JP4241281B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP4241281B2
JP4241281B2 JP2003324639A JP2003324639A JP4241281B2 JP 4241281 B2 JP4241281 B2 JP 4241281B2 JP 2003324639 A JP2003324639 A JP 2003324639A JP 2003324639 A JP2003324639 A JP 2003324639A JP 4241281 B2 JP4241281 B2 JP 4241281B2
Authority
JP
Japan
Prior art keywords
light
exposure apparatus
optical system
mirror
arc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003324639A
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English (en)
Japanese (ja)
Other versions
JP2005093693A (ja
JP2005093693A5 (enExample
Inventor
俊彦 辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003324639A priority Critical patent/JP4241281B2/ja
Priority to EP04001822A priority patent/EP1517339A3/en
Priority to TW093102016A priority patent/TWI267127B/zh
Priority to US10/769,373 priority patent/US7110084B2/en
Priority to US10/768,896 priority patent/US7064806B2/en
Priority to KR1020040074612A priority patent/KR100687655B1/ko
Publication of JP2005093693A publication Critical patent/JP2005093693A/ja
Publication of JP2005093693A5 publication Critical patent/JP2005093693A5/ja
Application granted granted Critical
Publication of JP4241281B2 publication Critical patent/JP4241281B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003324639A 2003-09-17 2003-09-17 露光装置 Expired - Fee Related JP4241281B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2003324639A JP4241281B2 (ja) 2003-09-17 2003-09-17 露光装置
EP04001822A EP1517339A3 (en) 2003-09-17 2004-01-28 Illumination optical system and exposure apparatus
TW093102016A TWI267127B (en) 2003-09-17 2004-01-29 Illumination optical system and exposure apparatus
US10/768,896 US7064806B2 (en) 2003-09-17 2004-01-30 Illumination optical system and exposure apparatus
US10/769,373 US7110084B2 (en) 2003-09-17 2004-01-30 Illumination optical system and exposure apparatus
KR1020040074612A KR100687655B1 (ko) 2003-09-17 2004-09-17 조명광학계 및 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003324639A JP4241281B2 (ja) 2003-09-17 2003-09-17 露光装置

Publications (3)

Publication Number Publication Date
JP2005093693A JP2005093693A (ja) 2005-04-07
JP2005093693A5 JP2005093693A5 (enExample) 2006-10-19
JP4241281B2 true JP4241281B2 (ja) 2009-03-18

Family

ID=34191311

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003324639A Expired - Fee Related JP4241281B2 (ja) 2003-09-17 2003-09-17 露光装置

Country Status (5)

Country Link
US (2) US7064806B2 (enExample)
EP (1) EP1517339A3 (enExample)
JP (1) JP4241281B2 (enExample)
KR (1) KR100687655B1 (enExample)
TW (1) TWI267127B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4241295B2 (ja) * 2003-09-26 2009-03-18 キヤノン株式会社 ステージ装置
JP4458330B2 (ja) * 2003-12-26 2010-04-28 キヤノン株式会社 光源ユニットの多層膜ミラーを交換する方法
JP2005317611A (ja) * 2004-04-27 2005-11-10 Canon Inc 露光方法及び装置
JP5030944B2 (ja) * 2005-04-26 2012-09-19 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ露光装置のための照明システム
WO2006134512A2 (en) * 2005-06-14 2006-12-21 Philips Intellectual Property & Standards Gmbh Debris mitigation system with improved gas distribution
WO2007001624A2 (en) * 2005-06-28 2007-01-04 Microchips, Inc. Medical and dental implant devices for controlled drug delivery
KR100729263B1 (ko) * 2005-07-14 2007-06-15 삼성전자주식회사 기판 노광 장치
JP4986754B2 (ja) * 2007-07-27 2012-07-25 キヤノン株式会社 照明光学系及びそれを有する露光装置
JP2009176838A (ja) * 2008-01-22 2009-08-06 Canon Inc 液浸露光装置及びデバイス製造方法
DE102008001553B4 (de) * 2008-05-05 2015-04-30 Carl Zeiss Smt Gmbh Komponente zur Einstellung einer scanintegrierten Beleuchtungsenergie in einer Objektebene einer Mikrolithographie-Projektionsbelichtungsanlage
US8227778B2 (en) * 2008-05-20 2012-07-24 Komatsu Ltd. Semiconductor exposure device using extreme ultra violet radiation
JP5534910B2 (ja) * 2009-04-23 2014-07-02 ギガフォトン株式会社 極端紫外光源装置
US12401779B1 (en) * 2024-04-09 2025-08-26 DISTANCE TECHNOLOGIES Oy Calibrating optical combiner using structured light

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3787035T2 (de) * 1986-03-12 1994-03-10 Matsushita Electric Ind Co Ltd Optisches Projektionssystem für Präzisionskopien.
JPS6329930A (ja) 1986-07-23 1988-02-08 Nec Corp 縮小投影露光装置
JP3111476B2 (ja) * 1991-01-08 2000-11-20 日本電気株式会社 照明光学装置
US5581605A (en) * 1993-02-10 1996-12-03 Nikon Corporation Optical element, production method of optical element, optical system, and optical apparatus
US5677939A (en) * 1994-02-23 1997-10-14 Nikon Corporation Illuminating apparatus
JP3371512B2 (ja) 1994-02-23 2003-01-27 株式会社ニコン 照明装置及び露光装置
KR0135834B1 (ko) * 1994-10-28 1998-04-24 김광호 램프의 그림자를 없애기 위한 이중 반사경을 구비한 광원 장치
US5737137A (en) * 1996-04-01 1998-04-07 The Regents Of The University Of California Critical illumination condenser for x-ray lithography
JP3862347B2 (ja) 1996-04-11 2006-12-27 キヤノン株式会社 Ｘ線縮小露光装置およびこれを利用したデバイス製造方法
JP3706691B2 (ja) * 1996-08-26 2005-10-12 キヤノン株式会社 Ｘ線縮小投影露光装置及びこれを用いた半導体デバイス製造方法
WO1999026278A1 (en) * 1997-11-14 1999-05-27 Nikon Corporation Exposure apparatus and method of manufacturing the same, and exposure method
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
JPH11345761A (ja) * 1998-05-29 1999-12-14 Nikon Corp 走査型露光装置
JP2000091220A (ja) * 1998-09-08 2000-03-31 Nikon Corp 投影露光装置及び投影露光方法
JP2000089000A (ja) 1998-09-14 2000-03-31 Nikon Corp Ｘ線発生装置
JP2000100685A (ja) 1998-09-17 2000-04-07 Nikon Corp 露光装置及び該装置を用いた露光方法
DE50014428D1 (de) 1999-07-30 2007-08-02 Zeiss Carl Smt Ag Steuerung der Beleuchtungsverteilung in der Austrittspupille eines EUV-Beleuchtungssystems
JP2002023055A (ja) * 2000-07-10 2002-01-23 Nikon Corp 結像光学系および該結像光学系を備えた露光装置
JP2003015040A (ja) * 2001-07-04 2003-01-15 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP3605053B2 (ja) 2001-07-27 2004-12-22 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
EP1280008B2 (en) * 2001-07-27 2011-09-14 Canon Kabushiki Kaisha Illumination system, projection exposure apparatus and device manufacturing method
JP3605055B2 (ja) * 2001-07-31 2004-12-22 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
JP2003227914A (ja) * 2002-01-31 2003-08-15 Canon Inc Ｅｕｖ光用の波面分割素子及びそれを有する位相測定装置
JP2003233005A (ja) * 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
JP3720788B2 (ja) * 2002-04-15 2005-11-30 キヤノン株式会社 投影露光装置及びデバイス製造方法
US20040080815A1 (en) * 2002-07-12 2004-04-29 Peter Muys Lens with optimized heat transfer properties
JP2004138926A (ja) * 2002-10-21 2004-05-13 Nikon Corp 投影光学系および該投影光学系を備えた露光装置

Also Published As

Publication number Publication date
TWI267127B (en) 2006-11-21
TW200512805A (en) 2005-04-01
US7110084B2 (en) 2006-09-19
EP1517339A3 (en) 2009-06-10
JP2005093693A (ja) 2005-04-07
US7064806B2 (en) 2006-06-20
KR100687655B1 (ko) 2007-02-28
US20050057738A1 (en) 2005-03-17
KR20050028848A (ko) 2005-03-23
EP1517339A2 (en) 2005-03-23
US20050057737A1 (en) 2005-03-17

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