KR100687655B1 - 조명광학계 및 노광장치 - Google Patents

조명광학계 및 노광장치 Download PDF

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Publication number
KR100687655B1
KR100687655B1 KR1020040074612A KR20040074612A KR100687655B1 KR 100687655 B1 KR100687655 B1 KR 100687655B1 KR 1020040074612 A KR1020040074612 A KR 1020040074612A KR 20040074612 A KR20040074612 A KR 20040074612A KR 100687655 B1 KR100687655 B1 KR 100687655B1
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KR
South Korea
Prior art keywords
light
optical system
mirror
reflective mask
arc
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KR1020040074612A
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English (en)
Korean (ko)
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KR20050028848A (ko
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쯔지도시히코
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020040074612A 2003-09-17 2004-09-17 조명광학계 및 노광장치 Expired - Fee Related KR100687655B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00324639 2003-09-17
JP2003324639A JP4241281B2 (ja) 2003-09-17 2003-09-17 露光装置

Publications (2)

Publication Number Publication Date
KR20050028848A KR20050028848A (ko) 2005-03-23
KR100687655B1 true KR100687655B1 (ko) 2007-02-28

Family

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Family Applications (1)

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KR1020040074612A Expired - Fee Related KR100687655B1 (ko) 2003-09-17 2004-09-17 조명광학계 및 노광장치

Country Status (5)

Country Link
US (2) US7110084B2 (enExample)
EP (1) EP1517339A3 (enExample)
JP (1) JP4241281B2 (enExample)
KR (1) KR100687655B1 (enExample)
TW (1) TWI267127B (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4241295B2 (ja) * 2003-09-26 2009-03-18 キヤノン株式会社 ステージ装置
JP4458330B2 (ja) * 2003-12-26 2010-04-28 キヤノン株式会社 光源ユニットの多層膜ミラーを交換する方法
JP2005317611A (ja) * 2004-04-27 2005-11-10 Canon Inc 露光方法及び装置
US8873151B2 (en) * 2005-04-26 2014-10-28 Carl Zeiss Smt Gmbh Illumination system for a microlithgraphic exposure apparatus
JP4981795B2 (ja) * 2005-06-14 2012-07-25 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ ガス分散性が改良された破屑軽減システム
WO2007001624A2 (en) * 2005-06-28 2007-01-04 Microchips, Inc. Medical and dental implant devices for controlled drug delivery
KR100729263B1 (ko) * 2005-07-14 2007-06-15 삼성전자주식회사 기판 노광 장치
JP4986754B2 (ja) * 2007-07-27 2012-07-25 キヤノン株式会社 照明光学系及びそれを有する露光装置
JP2009176838A (ja) * 2008-01-22 2009-08-06 Canon Inc 液浸露光装置及びデバイス製造方法
DE102008001553B4 (de) * 2008-05-05 2015-04-30 Carl Zeiss Smt Gmbh Komponente zur Einstellung einer scanintegrierten Beleuchtungsenergie in einer Objektebene einer Mikrolithographie-Projektionsbelichtungsanlage
US8227778B2 (en) * 2008-05-20 2012-07-24 Komatsu Ltd. Semiconductor exposure device using extreme ultra violet radiation
JP5534910B2 (ja) * 2009-04-23 2014-07-02 ギガフォトン株式会社 極端紫外光源装置
US12401779B1 (en) * 2024-04-09 2025-08-26 DISTANCE TECHNOLOGIES Oy Calibrating optical combiner using structured light

Citations (5)

* Cited by examiner, † Cited by third party
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JPH056851A (ja) * 1991-01-08 1993-01-14 Nec Corp 照明光学装置
JPH1070058A (ja) 1996-08-26 1998-03-10 Canon Inc Ｘ線縮小投影露光装置及びこれを用いた半導体デバイス製造装置
KR20020005966A (ko) * 2000-07-10 2002-01-18 시마무라 테루오 결상 광학계, 그 결상 광학계를 구비한 노광 장치, 그 노광 장치를 이용한 마이크로디바이스 제조 방법 및 그 결상 광학계를 이용한 노광 방법
KR20040023629A (ko) * 2001-07-04 2004-03-18 가부시키가이샤 니콘 투영 광학계 및 상기 투영 광학계를 구비한 노광 장치
KR20040034510A (ko) * 2002-10-21 2004-04-28 가부시키가이샤 니콘 투영 광학계 및 해당 투영 광학계를 구비한 노광 장치

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DE3787035T2 (de) * 1986-03-12 1994-03-10 Matsushita Electric Ind Co Ltd Optisches Projektionssystem für Präzisionskopien.
JPS6329930A (ja) 1986-07-23 1988-02-08 Nec Corp 縮小投影露光装置
US5581605A (en) * 1993-02-10 1996-12-03 Nikon Corporation Optical element, production method of optical element, optical system, and optical apparatus
US5677939A (en) * 1994-02-23 1997-10-14 Nikon Corporation Illuminating apparatus
JP3371512B2 (ja) 1994-02-23 2003-01-27 株式会社ニコン 照明装置及び露光装置
KR0135834B1 (ko) * 1994-10-28 1998-04-24 김광호 램프의 그림자를 없애기 위한 이중 반사경을 구비한 광원 장치
US5737137A (en) * 1996-04-01 1998-04-07 The Regents Of The University Of California Critical illumination condenser for x-ray lithography
JP3862347B2 (ja) * 1996-04-11 2006-12-27 キヤノン株式会社 Ｘ線縮小露光装置およびこれを利用したデバイス製造方法
AU1053199A (en) * 1997-11-14 1999-06-07 Nikon Corporation Exposure apparatus and method of manufacturing the same, and exposure method
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
JPH11345761A (ja) * 1998-05-29 1999-12-14 Nikon Corp 走査型露光装置
JP2000091220A (ja) * 1998-09-08 2000-03-31 Nikon Corp 投影露光装置及び投影露光方法
JP2000089000A (ja) 1998-09-14 2000-03-31 Nikon Corp Ｘ線発生装置
JP2000100685A (ja) 1998-09-17 2000-04-07 Nikon Corp 露光装置及び該装置を用いた露光方法
WO2001009684A1 (de) 1999-07-30 2001-02-08 Carl Zeiss Steuerung der beleuchtungsverteilung in der austrittspupille eines euv-beleuchtungssystems
JP3605055B2 (ja) * 2001-07-31 2004-12-22 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
JP3605053B2 (ja) 2001-07-27 2004-12-22 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
EP1280008B2 (en) * 2001-07-27 2011-09-14 Canon Kabushiki Kaisha Illumination system, projection exposure apparatus and device manufacturing method
JP2003227914A (ja) * 2002-01-31 2003-08-15 Canon Inc Ｅｕｖ光用の波面分割素子及びそれを有する位相測定装置
JP2003233005A (ja) * 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
JP3720788B2 (ja) * 2002-04-15 2005-11-30 キヤノン株式会社 投影露光装置及びデバイス製造方法
US20040080815A1 (en) * 2002-07-12 2004-04-29 Peter Muys Lens with optimized heat transfer properties

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH056851A (ja) * 1991-01-08 1993-01-14 Nec Corp 照明光学装置
JPH1070058A (ja) 1996-08-26 1998-03-10 Canon Inc Ｘ線縮小投影露光装置及びこれを用いた半導体デバイス製造装置
KR20020005966A (ko) * 2000-07-10 2002-01-18 시마무라 테루오 결상 광학계, 그 결상 광학계를 구비한 노광 장치, 그 노광 장치를 이용한 마이크로디바이스 제조 방법 및 그 결상 광학계를 이용한 노광 방법
KR20040023629A (ko) * 2001-07-04 2004-03-18 가부시키가이샤 니콘 투영 광학계 및 상기 투영 광학계를 구비한 노광 장치
KR20040034510A (ko) * 2002-10-21 2004-04-28 가부시키가이샤 니콘 투영 광학계 및 해당 투영 광학계를 구비한 노광 장치

Also Published As

Publication number Publication date
US20050057738A1 (en) 2005-03-17
TWI267127B (en) 2006-11-21
KR20050028848A (ko) 2005-03-23
US7110084B2 (en) 2006-09-19
TW200512805A (en) 2005-04-01
EP1517339A3 (en) 2009-06-10
EP1517339A2 (en) 2005-03-23
US20050057737A1 (en) 2005-03-17
US7064806B2 (en) 2006-06-20
JP4241281B2 (ja) 2009-03-18
JP2005093693A (ja) 2005-04-07

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