JP4182002B2 - 金属および合金にセラミック被膜を形成するプロセスと装置、およびこのプロセスによって生成される被膜 - Google Patents

金属および合金にセラミック被膜を形成するプロセスと装置、およびこのプロセスによって生成される被膜 Download PDF

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Publication number
JP4182002B2
JP4182002B2 JP2003580609A JP2003580609A JP4182002B2 JP 4182002 B2 JP4182002 B2 JP 4182002B2 JP 2003580609 A JP2003580609 A JP 2003580609A JP 2003580609 A JP2003580609 A JP 2003580609A JP 4182002 B2 JP4182002 B2 JP 4182002B2
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current
pulse
coating
electrolyte
ceramic coating
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Japanese (ja)
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JP2005521794A (ja
JP2005521794A5 (fr
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シャトロフ，アレクサンデル・セルゲーヴィッチ
サムソノフ，ヴィクトル・ヨシフォヴィッチ
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アイル・コート・リミテッド
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/005—Apparatus specially adapted for electrolytic conversion coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/024—Anodisation under pulsed or modulated current or potential
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/026—Anodisation with spark discharge
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/20—Electroplating using ultrasonics, vibrations
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electroplating Methods And Accessories (AREA)
JP2003580609A 2002-03-27 2002-09-23 金属および合金にセラミック被膜を形成するプロセスと装置、およびこのプロセスによって生成される被膜 Expired - Lifetime JP4182002B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0207193A GB2386907B (en) 2002-03-27 2002-03-27 Process and device for forming ceramic coatings on metals and alloys, and coatings produced by this process
US10/123,010 US6896785B2 (en) 2002-03-27 2002-04-15 Process and device for forming ceramic coatings on metals and alloys, and coatings produced by this process
PCT/GB2002/004305 WO2003083181A2 (fr) 2002-03-27 2002-09-23 Procede et dispositif permettant de former des revetements en ceramique sur des metaux et des alliages, et revetements produits selon ledit procede

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2007243844A Division JP4722102B2 (ja) 2002-03-27 2007-09-20 金属および合金にセラミック被膜を形成するプロセスと装置
JP2008062544A Division JP2008179901A (ja) 2002-03-27 2008-03-12 金属および合金にセラミック被膜を形成するプロセスと装置、およびこのプロセスによって生成される被膜

Publications (3)

Publication Number Publication Date
JP2005521794A JP2005521794A (ja) 2005-07-21
JP2005521794A5 JP2005521794A5 (fr) 2006-01-05
JP4182002B2 true JP4182002B2 (ja) 2008-11-19

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Family Applications (2)

Application Number Title Priority Date Filing Date
JP2003580609A Expired - Lifetime JP4182002B2 (ja) 2002-03-27 2002-09-23 金属および合金にセラミック被膜を形成するプロセスと装置、およびこのプロセスによって生成される被膜
JP2007243844A Expired - Lifetime JP4722102B2 (ja) 2002-03-27 2007-09-20 金属および合金にセラミック被膜を形成するプロセスと装置

Family Applications After (1)

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JP2007243844A Expired - Lifetime JP4722102B2 (ja) 2002-03-27 2007-09-20 金属および合金にセラミック被膜を形成するプロセスと装置

Country Status (7)

Country Link
EP (1) EP1488024B1 (fr)
JP (2) JP4182002B2 (fr)
CN (1) CN100503899C (fr)
AU (1) AU2002329410A1 (fr)
HK (1) HK1059804A1 (fr)
NO (1) NO20034936L (fr)
WO (1) WO2003083181A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008038256A (ja) * 2002-03-27 2008-02-21 Isle Coat Ltd 金属および合金にセラミック被膜を形成するプロセスと装置、およびこのプロセスによって生成される被膜

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CN100469946C (zh) * 2005-12-19 2009-03-18 广东工业大学 一种TiC陶瓷涂层的制备方法
JP4125765B2 (ja) * 2006-09-28 2008-07-30 日本パーカライジング株式会社 金属のセラミックス皮膜コーティング方法およびそれに用いる電解液ならびにセラミックス皮膜および金属材料
EP2084310A1 (fr) * 2006-10-05 2009-08-05 Boston Scientific Limited Revêtements exempts de polymère pour dispositifs médicaux formés par dépôt électrolytique de plasma
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US9284409B2 (en) 2007-07-19 2016-03-15 Boston Scientific Scimed, Inc. Endoprosthesis having a non-fouling surface
EP2185103B1 (fr) 2007-08-03 2014-02-12 Boston Scientific Scimed, Inc. Revêtement pour un dispositif médical ayant une aire surfacique accrue
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EP2271380B1 (fr) 2008-04-22 2013-03-20 Boston Scientific Scimed, Inc. Dispositifs médicaux revêtus d une substance inorganique
US8932346B2 (en) 2008-04-24 2015-01-13 Boston Scientific Scimed, Inc. Medical devices having inorganic particle layers
CN101333673B (zh) * 2008-07-29 2011-11-23 浙江工业大学 用于微弧氧化制备纳米陶瓷涂层的电解液及处理方法
JP5394021B2 (ja) * 2008-08-06 2014-01-22 アイシン精機株式会社 アルミニウム合金ピストン部材およびその製造方法
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GB2469115B (en) 2009-04-03 2013-08-21 Keronite Internat Ltd Process for the enhanced corrosion protection of valve metals
CN101892507B (zh) * 2010-07-29 2012-02-22 南昌航空大学 一种提高钛合金微弧氧化膜生长速度的方法
KR101890966B1 (ko) * 2011-02-08 2018-08-22 캠브리지 나노썸 리미티드 비금속성 코팅 및 이의 제조방법
KR101349076B1 (ko) * 2011-07-20 2014-01-14 현대자동차주식회사 연료전지 스택용 매니폴드 블록의 산화층 형성 장치 및 방법
US20150290135A1 (en) * 2012-11-16 2015-10-15 Merck Sharp & Dohme Corp. Process for making agglomerates using acoustic mixing technology
KR101476235B1 (ko) * 2012-12-11 2014-12-24 한국기계연구원 플라즈마 전해산화를 이용한 마그네슘재 표면처리 방법, 이에 의해 형성된 마그네슘 양극산화피막 및 플라즈마 전해산화에 사용되는 마그네슘재 표면처리액
WO2014175653A1 (fr) * 2013-04-23 2014-10-30 인제대학교 산학협력단 Procédé de préparation de nanostructure par dépôt électrochimique, et nanostructure ainsi préparée
KR101572849B1 (ko) * 2013-04-23 2015-12-01 인제대학교 산학협력단 전기 화학 증착에 의한 나노 구조체의 제조 방법 및 이에 의하여 제조된 나노 구조체
GB2513575B (en) 2013-04-29 2017-05-31 Keronite Int Ltd Corrosion and erosion-resistant mixed oxide coatings for the protection of chemical and plasma process chamber components
KR101419273B1 (ko) * 2013-08-27 2014-07-15 (주)엠에스티테크놀로지 플라즈마 전해 산화에 의해 금속 표면에 투명층을 형성하는 방법
CN103567404A (zh) * 2013-11-04 2014-02-12 虞雪君 一种用于结晶器的复合镀层材料及制备方法
CN103567405A (zh) * 2013-11-04 2014-02-12 虞雪君 一种用于冶金连铸机结晶器的复合镀层材料
CH708829A1 (fr) 2013-11-11 2015-05-15 Panerai Ag Off Composant en alliage aluminium-lithium comprenant un revêtement céramique et procédé pour former le revêtement.
CN103695985B (zh) * 2013-12-16 2016-02-10 电子科技大学 一种镍氢电池镍电极表面制备氧化钛涂层的方法
CN104562130B (zh) * 2014-08-22 2017-06-16 东莞市武华新材料有限公司 轻金属或其合金表面氧化钛基陶瓷膜层的制造方法
US9506161B2 (en) * 2014-12-12 2016-11-29 Metal Industries Research & Development Centre Surface treatment of a magnesium alloy
JP2016156036A (ja) * 2015-02-23 2016-09-01 株式会社栗本鐵工所 皮膜形成方法
KR101701268B1 (ko) 2015-04-09 2017-02-13 현대성우메탈 주식회사 마그네슘 합금용 플라즈마 전해 산화용 전해액 및 이를 이용한 전해산화방법
EP3359711A1 (fr) 2015-12-16 2018-08-15 Henkel AG & Co. KGaA Procédé de dépôt de revêtements protecteurs à base de titane sur aluminium
CN109385654A (zh) * 2017-08-11 2019-02-26 昆山汉鼎精密金属有限公司 自动微弧氧化系统及其方法
KR102205172B1 (ko) 2019-06-19 2021-01-20 오엠피주식회사 금속제 물품의 내표면에 산화피막을 형성하는 장치
KR102205173B1 (ko) 2019-06-19 2021-01-20 오엠피주식회사 금속제 물품의 내표면에 산화피막을 형성하는 방법
CN110257878B (zh) * 2019-07-16 2021-06-08 广西大学 一种制备铝钛复合板微弧氧化膜的方法
CN113943964A (zh) * 2020-07-15 2022-01-18 中国科学院上海硅酸盐研究所 钛合金表面热控耐磨损涂层及其制备方法
CN112708917A (zh) * 2020-12-23 2021-04-27 西安工业大学 一种钛合金涡轮叶片表面微弧氧化层的制备方法
CN113774459A (zh) * 2021-09-29 2021-12-10 上海交通大学 一种锆合金表面致密高耐蚀微弧氧化膜层的制备方法
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008038256A (ja) * 2002-03-27 2008-02-21 Isle Coat Ltd 金属および合金にセラミック被膜を形成するプロセスと装置、およびこのプロセスによって生成される被膜
JP4722102B2 (ja) * 2002-03-27 2011-07-13 アイル・コート・リミテッド 金属および合金にセラミック被膜を形成するプロセスと装置

Also Published As

Publication number Publication date
WO2003083181A3 (fr) 2004-09-10
JP2005521794A (ja) 2005-07-21
EP1488024B1 (fr) 2017-05-03
NO20034936L (no) 2004-01-09
AU2002329410A1 (en) 2003-10-13
HK1059804A1 (en) 2004-07-16
WO2003083181A2 (fr) 2003-10-09
CN1623013A (zh) 2005-06-01
AU2002329410A8 (en) 2003-10-13
JP4722102B2 (ja) 2011-07-13
EP1488024A2 (fr) 2004-12-22
NO20034936D0 (no) 2003-11-06
JP2008038256A (ja) 2008-02-21
CN100503899C (zh) 2009-06-24

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