JP4071220B2 - ガラス基板の製造方法 - Google Patents

ガラス基板の製造方法 Download PDF

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Publication number
JP4071220B2
JP4071220B2 JP2004167969A JP2004167969A JP4071220B2 JP 4071220 B2 JP4071220 B2 JP 4071220B2 JP 2004167969 A JP2004167969 A JP 2004167969A JP 2004167969 A JP2004167969 A JP 2004167969A JP 4071220 B2 JP4071220 B2 JP 4071220B2
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Japan
Prior art keywords
glass plate
etching
etching solution
masking agent
glass
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Expired - Fee Related
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JP2004167969A
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English (en)
Japanese (ja)
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JP2005298314A (ja
Inventor
智弘 西山
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西山ステンレスケミカル株式会社
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Priority to JP2004167969A priority Critical patent/JP4071220B2/ja
Priority to SG200404296A priority patent/SG115713A1/en
Priority to TW093123095A priority patent/TWI250136B/zh
Priority to CNB2004100641632A priority patent/CN100513340C/zh
Priority to KR1020040068837A priority patent/KR100725468B1/ko
Publication of JP2005298314A publication Critical patent/JP2005298314A/ja
Application granted granted Critical
Publication of JP4071220B2 publication Critical patent/JP4071220B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
JP2004167969A 2004-03-17 2004-06-07 ガラス基板の製造方法 Expired - Fee Related JP4071220B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004167969A JP4071220B2 (ja) 2004-03-17 2004-06-07 ガラス基板の製造方法
SG200404296A SG115713A1 (en) 2004-03-17 2004-07-30 Glass plate surface etching method, glass plate etching apparatus, glass plate for flat panel display, and flat panel display
TW093123095A TWI250136B (en) 2004-03-17 2004-08-02 Glass plate surface etching method, glass plate etching apparatus, glass plate for flat panel display, and flat panel display
CNB2004100641632A CN100513340C (zh) 2004-03-17 2004-08-20 玻璃板表面蚀刻方法和装置、及玻璃板和平面显示器
KR1020040068837A KR100725468B1 (ko) 2004-03-17 2004-08-31 유리판 표면의 에칭 방법, 유리판 에칭 장치, 평판디스플레이용 유리판 및 평판 디스플레이

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004075585 2004-03-17
JP2004167969A JP4071220B2 (ja) 2004-03-17 2004-06-07 ガラス基板の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007152268A Division JP2007284345A (ja) 2004-03-17 2007-06-08 フラットパネルディスプレイ用ガラス板の製造方法及びその装置

Publications (2)

Publication Number Publication Date
JP2005298314A JP2005298314A (ja) 2005-10-27
JP4071220B2 true JP4071220B2 (ja) 2008-04-02

Family

ID=35041438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004167969A Expired - Fee Related JP4071220B2 (ja) 2004-03-17 2004-06-07 ガラス基板の製造方法

Country Status (5)

Country Link
JP (1) JP4071220B2 (zh)
KR (1) KR100725468B1 (zh)
CN (1) CN100513340C (zh)
SG (1) SG115713A1 (zh)
TW (1) TWI250136B (zh)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100741291B1 (ko) * 2006-02-14 2007-07-23 에버테크노 주식회사 Ｌｃｄ 유리 슬리밍장치
KR100732019B1 (ko) * 2006-02-17 2007-06-25 (주)지원테크 유리 기판의 박판화 장치
KR20070105699A (ko) * 2006-04-27 2007-10-31 삼성전자주식회사 기판 식각 장치 및 이를 이용한 기판 식각 방법
JP2008013389A (ja) 2006-07-04 2008-01-24 Nec Corp エッチング装置及び薄型ガラス基板の製造方法
KR100824544B1 (ko) 2006-09-18 2008-04-23 (주)에스티아이 식각 장치 및 식각방법
KR101300524B1 (ko) * 2006-09-19 2013-09-02 (주)에스티아이 식각장치 및 식각방법
KR101375848B1 (ko) 2006-12-08 2014-03-18 (주)스마트에이스 기판식각장치 및 이를 이용한 액정표시소자 제조라인
KR100865767B1 (ko) * 2007-03-15 2008-10-28 우진선행기술 주식회사 기판 슬림화 장치 및 기판 슬림화 방법
KR100732016B1 (ko) * 2007-03-22 2007-06-25 (주)지원테크 유리 기판의 박판화 장치
KR100801957B1 (ko) * 2007-06-26 2008-02-12 이민철 에칭 키트
KR100943756B1 (ko) * 2007-10-15 2010-02-23 우진선행기술 주식회사 기판 슬림화 장치
KR100860294B1 (ko) * 2008-01-09 2008-09-25 주식회사 이코니 유리기판 에칭 장치와 상기 에칭 장치에 의하여 제조된유리박판
KR100943321B1 (ko) 2008-03-03 2010-02-19 (주)세미로드 유리 식각 장치와 유리 기판의 슬러지 제거 방법
KR100889949B1 (ko) * 2008-04-10 2009-03-20 주식회사 엠엠테크 하향식 기판 박형화장치 및 이를 이용한 박형화 시스템
CN101630635B (zh) * 2009-08-25 2011-11-30 满纳韩宏电子科技(南京)有限公司 玻璃基板蚀刻装置
KR101007306B1 (ko) * 2010-02-23 2011-01-13 주식회사 엠엠테크 상부 하향 분사식 기판 에칭 장치
JP5761187B2 (ja) * 2010-06-21 2015-08-12 旭硝子株式会社 ガラス板の研磨方法、ガラス板の製造方法、およびガラス板の製造装置
CN102653451A (zh) * 2011-03-01 2012-09-05 三福化工股份有限公司 玻璃基板连续结晶式化学蚀刻方法与设备
CN102730956B (zh) * 2011-04-11 2015-08-26 诺发光电股份有限公司 保护玻璃的加工方法
KR101277161B1 (ko) * 2011-07-08 2013-06-20 주식회사 엠엠테크 글라스 박형화 시스템
JP5334216B2 (ja) * 2011-10-28 2013-11-06 株式会社Ｎｓｃ ガラス基板の製造方法
JP5317304B2 (ja) * 2012-01-31 2013-10-16 株式会社Ｎｓｃ 化学研磨装置
KR20130092713A (ko) * 2012-02-13 2013-08-21 (주)미코씨엔씨 터치스크린용 강화 유리 기판의 가공방법
JP5340457B1 (ja) * 2012-06-06 2013-11-13 株式会社Ｎｓｃ 化学研磨装置
KR101387058B1 (ko) * 2012-10-11 2014-04-21 주식회사 유플러스비젼 저반사 나노구조의 유리기판 제조방법 및 이를 위한 부식액 조성물
CN104176943A (zh) * 2013-05-24 2014-12-03 中国科学院微电子研究所 一种增加石英片表面刻蚀粗糙度的方法
CN104761150B (zh) * 2015-03-16 2017-09-22 南昌欧菲光学技术有限公司 玻璃蚀刻液、利用该蚀刻液蚀刻玻璃的方法、盖板玻璃及其制备方法
JP6651127B2 (ja) * 2015-09-11 2020-02-19 日本電気硝子株式会社 ガラス板の製造方法及びその製造装置
JP6283062B2 (ja) * 2016-05-31 2018-02-21 株式会社Ｎｓｃ 表示装置製造方法
TWI649285B (zh) * 2016-06-07 2019-02-01 全鴻精研股份有限公司 水平式玻璃蝕刻的方法
TWI613167B (zh) * 2016-11-18 2018-02-01 宏益玻璃科技股份有限公司 一種抗眩光強化抗菌及抗指紋之玻璃面板製作方法
TWI829673B (zh) * 2018-03-07 2024-01-21 美商康寧公司 玻璃基板黏接控制
JP2023512488A (ja) * 2020-01-17 2023-03-27 コーニング インコーポレイテッド 基板面を処理する方法、そのための装置、及び処理されたガラス物品
WO2023278223A1 (en) * 2021-07-01 2023-01-05 Corning Incorporated Methods of etching glass-based sheets
KR102400576B1 (ko) * 2021-09-02 2022-05-19 오성수 유리판의 단면 가공 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2103548B (en) * 1981-08-20 1985-01-30 Glaverbel Method of reducing light reflection from glass surfaces
JPS63121678A (ja) 1986-11-11 1988-05-25 Dainippon Screen Mfg Co Ltd クロム被膜のエツチング方法及びエツチング装置
KR0180850B1 (ko) * 1996-06-26 1999-03-20 구자홍 유리기판 에칭장치
JP3623094B2 (ja) 1998-01-30 2005-02-23 セントラル硝子株式会社 ガラス板面の酸処理方法およびその装置
JPH11307494A (ja) 1998-04-17 1999-11-05 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2000323813A (ja) 1999-05-12 2000-11-24 Dainippon Screen Mfg Co Ltd 基板処理装置
CN1306912A (zh) * 2000-01-21 2001-08-08 张建华 玻璃本色砂面装饰制品及其化学生产方法
CN2492564Y (zh) * 2001-08-16 2002-05-22 铼宝科技股份有限公司 有机电致发光显示面板铟锡氧化物电极的电化学蚀刻平坦化装置
SG121817A1 (en) * 2002-11-22 2006-05-26 Nishiyama Stainless Chemical Co Ltd Glass substrate for flat planel display, and process for producing the same

Also Published As

Publication number Publication date
KR100725468B1 (ko) 2007-06-08
CN1669967A (zh) 2005-09-21
JP2005298314A (ja) 2005-10-27
TW200531945A (en) 2005-10-01
SG115713A1 (en) 2005-10-28
CN100513340C (zh) 2009-07-15
TWI250136B (en) 2006-03-01
KR20050093669A (ko) 2005-09-23

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