JP3968038B2 - 基板処理方法及び基板処理装置及び現像処理方法及び現像処理装置 - Google Patents
基板処理方法及び基板処理装置及び現像処理方法及び現像処理装置 Download PDFInfo
- Publication number
- JP3968038B2 JP3968038B2 JP2003057331A JP2003057331A JP3968038B2 JP 3968038 B2 JP3968038 B2 JP 3968038B2 JP 2003057331 A JP2003057331 A JP 2003057331A JP 2003057331 A JP2003057331 A JP 2003057331A JP 3968038 B2 JP3968038 B2 JP 3968038B2
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Classifications
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- E—FIXED CONSTRUCTIONS
- E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
- E02D—FOUNDATIONS; EXCAVATIONS; EMBANKMENTS; UNDERGROUND OR UNDERWATER STRUCTURES
- E02D5/00—Bulkheads, piles, or other structural elements specially adapted to foundation engineering
- E02D5/22—Piles
- E02D5/24—Prefabricated piles
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- E—FIXED CONSTRUCTIONS
- E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
- E02D—FOUNDATIONS; EXCAVATIONS; EMBANKMENTS; UNDERGROUND OR UNDERWATER STRUCTURES
- E02D7/00—Methods or apparatus for placing sheet pile bulkheads, piles, mouldpipes, or other moulds
- E02D7/24—Placing by using fluid jets
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- Engineering & Computer Science (AREA)
- Structural Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Mining & Mineral Resources (AREA)
- Paleontology (AREA)
- Civil Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Liquid Crystal (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003057331A JP3968038B2 (ja) | 2003-03-04 | 2003-03-04 | 基板処理方法及び基板処理装置及び現像処理方法及び現像処理装置 |
KR1020040014275A KR101129065B1 (ko) | 2003-03-04 | 2004-03-03 | 기판처리방법 및 기판처리장치 및 현상처리방법 및현상처리장치 |
KR1020110026345A KR101136158B1 (ko) | 2003-03-04 | 2011-03-24 | 현상처리방법 및 현상처리장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003057331A JP3968038B2 (ja) | 2003-03-04 | 2003-03-04 | 基板処理方法及び基板処理装置及び現像処理方法及び現像処理装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007112055A Division JP4113562B2 (ja) | 2007-04-20 | 2007-04-20 | 現像処理方法及び現像処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004266215A JP2004266215A (ja) | 2004-09-24 |
JP3968038B2 true JP3968038B2 (ja) | 2007-08-29 |
Family
ID=33120788
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003057331A Expired - Fee Related JP3968038B2 (ja) | 2003-03-04 | 2003-03-04 | 基板処理方法及び基板処理装置及び現像処理方法及び現像処理装置 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP3968038B2 (ko) |
KR (2) | KR101129065B1 (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4492875B2 (ja) * | 2005-06-21 | 2010-06-30 | 東京エレクトロン株式会社 | 基板処理システム及び基板処理方法 |
JP5188926B2 (ja) * | 2008-10-16 | 2013-04-24 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
KR102201884B1 (ko) * | 2013-12-27 | 2021-01-12 | 세메스 주식회사 | 기판 처리 장치 및 방법 |
KR102256692B1 (ko) * | 2013-12-30 | 2021-05-25 | 세메스 주식회사 | 기판 처리 시스템 및 방법 |
DE102014222382B4 (de) * | 2014-11-03 | 2021-08-26 | Singulus Technologies Ag | Verfahren und Vorrichtung zur Zugbildung von Gegenständen in Transportanlagen |
JP5928629B1 (ja) * | 2015-03-23 | 2016-06-01 | ウシオ電機株式会社 | 光配向装置及び光配向方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3552187B2 (ja) | 1997-04-07 | 2004-08-11 | 大日本スクリーン製造株式会社 | 基板処理装置及び方法 |
JP3887549B2 (ja) * | 2001-07-16 | 2007-02-28 | 東京エレクトロン株式会社 | 基板搬送装置 |
-
2003
- 2003-03-04 JP JP2003057331A patent/JP3968038B2/ja not_active Expired - Fee Related
-
2004
- 2004-03-03 KR KR1020040014275A patent/KR101129065B1/ko active IP Right Grant
-
2011
- 2011-03-24 KR KR1020110026345A patent/KR101136158B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20040078578A (ko) | 2004-09-10 |
JP2004266215A (ja) | 2004-09-24 |
KR101136158B1 (ko) | 2012-04-17 |
KR20110049750A (ko) | 2011-05-12 |
KR101129065B1 (ko) | 2012-03-26 |
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