JP3856125B2 - 処理方法及び処理装置 - Google Patents

処理方法及び処理装置 Download PDF

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Publication number
JP3856125B2
JP3856125B2 JP2002134882A JP2002134882A JP3856125B2 JP 3856125 B2 JP3856125 B2 JP 3856125B2 JP 2002134882 A JP2002134882 A JP 2002134882A JP 2002134882 A JP2002134882 A JP 2002134882A JP 3856125 B2 JP3856125 B2 JP 3856125B2
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JP
Japan
Prior art keywords
processing
processed
processing unit
condition
unit
Prior art date
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Expired - Lifetime
Application number
JP2002134882A
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English (en)
Japanese (ja)
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JP2003332192A (ja
JP2003332192A5 (https=
Inventor
清久 立山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2002134882A priority Critical patent/JP3856125B2/ja
Priority to KR1020030028823A priority patent/KR100935971B1/ko
Priority to US10/434,128 priority patent/US6799910B2/en
Priority to CNB031309461A priority patent/CN1278380C/zh
Publication of JP2003332192A publication Critical patent/JP2003332192A/ja
Publication of JP2003332192A5 publication Critical patent/JP2003332192A5/ja
Application granted granted Critical
Publication of JP3856125B2 publication Critical patent/JP3856125B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47D—FURNITURE SPECIALLY ADAPTED FOR CHILDREN
    • A47D3/00—Children's tables
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47B—TABLES; DESKS; OFFICE FURNITURE; CABINETS; DRAWERS; GENERAL DETAILS OF FURNITURE
    • A47B13/00—Details of tables or desks
    • A47B13/08—Table tops; Rims therefor
    • A47B13/083—Rims for table tops
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47B—TABLES; DESKS; OFFICE FURNITURE; CABINETS; DRAWERS; GENERAL DETAILS OF FURNITURE
    • A47B13/00—Details of tables or desks
    • A47B13/08—Table tops; Rims therefor
    • A47B13/16—Holders for glasses, ashtrays, lamps, candles or the like forming part of tables
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47B—TABLES; DESKS; OFFICE FURNITURE; CABINETS; DRAWERS; GENERAL DETAILS OF FURNITURE
    • A47B17/00—Writing-tables
    • A47B17/06—Writing-tables with parts, e.g. trays, movable on a pivot or by chains or belts
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47B—TABLES; DESKS; OFFICE FURNITURE; CABINETS; DRAWERS; GENERAL DETAILS OF FURNITURE
    • A47B95/00—Fittings for furniture
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47D—FURNITURE SPECIALLY ADAPTED FOR CHILDREN
    • A47D15/00—Accessories for children's furniture, e.g. safety belts or baby-bottle holders
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
    • H04R1/00—Details of transducers, loudspeakers or microphones
    • H04R1/02—Casings; Cabinets ; Supports therefor; Mountings therein
    • H04R1/028—Casings; Cabinets ; Supports therefor; Mountings therein associated with devices performing functions other than acoustics, e.g. electric candles
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47B—TABLES; DESKS; OFFICE FURNITURE; CABINETS; DRAWERS; GENERAL DETAILS OF FURNITURE
    • A47B2220/00—General furniture construction, e.g. fittings
    • A47B2220/0075—Lighting
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
    • H04R2430/00—Signal processing covered by H04R, not provided for in its groups
    • H04R2430/01—Aspects of volume control, not necessarily automatic, in sound systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Acoustics & Sound (AREA)
  • Signal Processing (AREA)
  • Pediatric Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2002134882A 2002-05-10 2002-05-10 処理方法及び処理装置 Expired - Lifetime JP3856125B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2002134882A JP3856125B2 (ja) 2002-05-10 2002-05-10 処理方法及び処理装置
KR1020030028823A KR100935971B1 (ko) 2002-05-10 2003-05-07 처리방법 및 처리장치
US10/434,128 US6799910B2 (en) 2002-05-10 2003-05-09 Processing method and processing apparatus
CNB031309461A CN1278380C (zh) 2002-05-10 2003-05-09 处理方法以及处理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002134882A JP3856125B2 (ja) 2002-05-10 2002-05-10 処理方法及び処理装置

Publications (3)

Publication Number Publication Date
JP2003332192A JP2003332192A (ja) 2003-11-21
JP2003332192A5 JP2003332192A5 (https=) 2005-04-07
JP3856125B2 true JP3856125B2 (ja) 2006-12-13

Family

ID=29397476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002134882A Expired - Lifetime JP3856125B2 (ja) 2002-05-10 2002-05-10 処理方法及び処理装置

Country Status (4)

Country Link
US (1) US6799910B2 (https=)
JP (1) JP3856125B2 (https=)
KR (1) KR100935971B1 (https=)
CN (1) CN1278380C (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3810726B2 (ja) * 2002-10-03 2006-08-16 三菱重工業株式会社 基板加熱制御システム及び基板加熱制御方法
US7113253B2 (en) * 2003-09-16 2006-09-26 Asml Netherlands B.V. Method, apparatus and computer product for substrate processing
JP4579029B2 (ja) * 2005-03-30 2010-11-10 株式会社Sokudo 基板処理装置
JP4619854B2 (ja) * 2005-04-18 2011-01-26 東京エレクトロン株式会社 ロードロック装置及び処理方法
JP4811860B2 (ja) * 2006-05-10 2011-11-09 東京エレクトロン株式会社 熱処理方法、そのプログラム及び熱処理装置
JP2008103384A (ja) * 2006-10-17 2008-05-01 Elpida Memory Inc レジストパターンの形成方法およびレジスト塗布現像装置
JP4687682B2 (ja) * 2007-03-30 2011-05-25 東京エレクトロン株式会社 塗布、現像装置及びその方法並びに記憶媒体
US20100192844A1 (en) * 2009-01-30 2010-08-05 Semes Co., Ltd. Apparatus and method for treating substrate
CN101794710B (zh) 2009-01-30 2012-10-03 细美事有限公司 用于处理基板的系统及方法
JP5338777B2 (ja) * 2010-09-02 2013-11-13 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP6123740B2 (ja) 2014-06-17 2017-05-10 トヨタ自動車株式会社 半導体装置の製造ライン及び半導体装置の製造方法
JP6918461B2 (ja) * 2016-09-23 2021-08-11 東京エレクトロン株式会社 減圧乾燥システム、および減圧乾燥方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR950034648A (ko) * 1994-05-25 1995-12-28 김광호 반도체장치의 제조방법
US5849602A (en) * 1995-01-13 1998-12-15 Tokyo Electron Limited Resist processing process
JPH1030317A (ja) * 1996-07-16 1998-02-03 Buresuto:Kk 壁紙及び壁紙の裏打紙の剥離方法
JP3393035B2 (ja) * 1997-05-06 2003-04-07 東京エレクトロン株式会社 制御装置及び半導体製造装置
JP3729987B2 (ja) * 1997-07-29 2005-12-21 大日本スクリーン製造株式会社 基板処理装置
TW385488B (en) * 1997-08-15 2000-03-21 Tokyo Electron Ltd substrate processing device
JP3719839B2 (ja) * 1998-01-19 2005-11-24 大日本スクリーン製造株式会社 基板処理装置
JP3769426B2 (ja) 1999-09-22 2006-04-26 東京エレクトロン株式会社 絶縁膜形成装置
US6402400B1 (en) * 1999-10-06 2002-06-11 Tokyo Electron Limited Substrate processing apparatus
JP2001358045A (ja) * 2000-06-09 2001-12-26 Dainippon Screen Mfg Co Ltd 基板処理装置

Also Published As

Publication number Publication date
US6799910B2 (en) 2004-10-05
JP2003332192A (ja) 2003-11-21
CN1278380C (zh) 2006-10-04
KR20030087942A (ko) 2003-11-15
CN1457083A (zh) 2003-11-19
US20030210907A1 (en) 2003-11-13
KR100935971B1 (ko) 2010-01-08

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