JP3824285B2 - 感放射線性着色組成物 - Google Patents

感放射線性着色組成物 Download PDF

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Publication number
JP3824285B2
JP3824285B2 JP06145797A JP6145797A JP3824285B2 JP 3824285 B2 JP3824285 B2 JP 3824285B2 JP 06145797 A JP06145797 A JP 06145797A JP 6145797 A JP6145797 A JP 6145797A JP 3824285 B2 JP3824285 B2 JP 3824285B2
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JP
Japan
Prior art keywords
group
pigment
formula
general formula
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP06145797A
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English (en)
Japanese (ja)
Other versions
JPH10254133A (ja
JPH10254133A5 (OSRAM
Inventor
信雄 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP06145797A priority Critical patent/JP3824285B2/ja
Priority to US09/041,678 priority patent/US5998091A/en
Priority to KR10-1998-0008685A priority patent/KR100481350B1/ko
Publication of JPH10254133A publication Critical patent/JPH10254133A/ja
Publication of JPH10254133A5 publication Critical patent/JPH10254133A5/ja
Application granted granted Critical
Publication of JP3824285B2 publication Critical patent/JP3824285B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/111Polymer of unsaturated acid or ester

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP06145797A 1997-03-14 1997-03-14 感放射線性着色組成物 Expired - Fee Related JP3824285B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP06145797A JP3824285B2 (ja) 1997-03-14 1997-03-14 感放射線性着色組成物
US09/041,678 US5998091A (en) 1997-03-14 1998-03-13 Radiation sensitive colored composition
KR10-1998-0008685A KR100481350B1 (ko) 1997-03-14 1998-03-14 감방사선성착색조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06145797A JP3824285B2 (ja) 1997-03-14 1997-03-14 感放射線性着色組成物

Publications (3)

Publication Number Publication Date
JPH10254133A JPH10254133A (ja) 1998-09-25
JPH10254133A5 JPH10254133A5 (OSRAM) 2004-10-14
JP3824285B2 true JP3824285B2 (ja) 2006-09-20

Family

ID=13171598

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06145797A Expired - Fee Related JP3824285B2 (ja) 1997-03-14 1997-03-14 感放射線性着色組成物

Country Status (3)

Country Link
US (1) US5998091A (OSRAM)
JP (1) JP3824285B2 (OSRAM)
KR (1) KR100481350B1 (OSRAM)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
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EP0893737A3 (en) * 1997-07-24 1999-11-24 JSR Corporation Radiation sensitive composition
JP3838601B2 (ja) * 1998-05-15 2006-10-25 富士写真フイルム株式会社 放射線硬化性組成物
CA2337428A1 (en) * 1998-08-21 2000-03-02 Anne Schuwey Thermal- and photoinitiated radical polymerization in the presence of an addition fragmentation agent
JP2001174985A (ja) * 1999-12-15 2001-06-29 Sumitomo Chem Co Ltd 顔料分散感光液、その製造方法及びそれを用いる着色画像の形成方法
JP2002031713A (ja) * 2000-02-01 2002-01-31 Mitsubishi Chemicals Corp カラーフィルター用組成物及びカラーフィルター
JP2001249213A (ja) * 2000-03-03 2001-09-14 Fujifilm Arch Co Ltd カラーフィルター用組成物及びカラーフィルター
CN1462284A (zh) 2000-08-16 2003-12-17 部鲁尔科学公司 用于滤色片应用的光敏树脂组合物
JP4486282B2 (ja) * 2001-07-17 2010-06-23 富士フイルム株式会社 顔料分散剤、これを含む顔料分散組成物および着色感光性組成物
US7235296B2 (en) * 2002-03-05 2007-06-26 3M Innovative Properties Co. Formulations for coated diamond abrasive slurries
JP4561101B2 (ja) * 2003-03-06 2010-10-13 Jsr株式会社 カラーフィルタ用感放射線性組成物およびカラーフィルタ
JP4749658B2 (ja) * 2003-06-26 2011-08-17 富士フイルム株式会社 カラーフィルター用着色樹脂被膜及びその製造方法、カラーフィルター用着色樹脂被膜の評価方法、並びに、カラーフィルター
US20050069644A1 (en) * 2003-09-29 2005-03-31 National Taiwan University Micro-stamping method for photoelectric process
JP4611724B2 (ja) * 2004-12-03 2011-01-12 東京応化工業株式会社 遮光膜形成用感光性組成物、該遮光膜形成用感光性組成物で形成されたブラックマトリクス
JP4675693B2 (ja) * 2005-06-23 2011-04-27 東京応化工業株式会社 感光性樹脂組成物
US7883826B2 (en) * 2006-12-07 2011-02-08 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
KR100881860B1 (ko) 2007-01-17 2009-02-06 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터
US8298452B2 (en) * 2007-02-26 2012-10-30 Dai Nippon Printing Co., Ltd. Negative type resist composition for color filter, color filter using same, and liquid crystal display
JP4988383B2 (ja) * 2007-03-02 2012-08-01 スリーエム イノベイティブ プロパティズ カンパニー (メタ)アクリル系着色フィルム、マーキングフィルム、レセプターシート、及びその製造方法
TWI403838B (zh) * 2007-04-11 2013-08-01 Lg Chemical Ltd 包含由做為鹼溶性樹脂之大分子單體所製備之聚合物之光感樹脂組成物
JP5374903B2 (ja) * 2008-03-31 2013-12-25 大日本印刷株式会社 カラーフィルタ用ネガ型レジスト組成物、カラーフィルタ及び液晶表示装置
JP5401870B2 (ja) * 2008-08-26 2014-01-29 大日本印刷株式会社 カラーフィルタ用ネガ型レジスト組成物、カラーフィルタ及び液晶表示装置
EP2913375A1 (en) 2008-10-09 2015-09-02 Fujifilm Corporation Near-infrared absorptive composition, near-infrared absorptive coated material, near-infrared absorptive liquid dispersion, near-infrared absorptive ink, printed material, and near-infrared absorptive image-forming composition
US8486591B2 (en) 2008-10-24 2013-07-16 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter prepared using the same
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WO2017077908A1 (ja) * 2015-11-06 2017-05-11 住友化学株式会社 アクリル樹脂組成物
JP2017088707A (ja) * 2015-11-06 2017-05-25 住友化学株式会社 アクリル樹脂組成物
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KR102087259B1 (ko) 2016-09-28 2020-03-10 삼성에스디아이 주식회사 신규한 화합물, 코어-쉘 염료, 이를 포함하는 감광성 수지 조성물 및 컬러필터
KR102061244B1 (ko) 2017-05-17 2019-12-31 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터
JPWO2020166510A1 (ja) 2019-02-14 2021-11-11 富士フイルム株式会社 硬化性組成物、膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、及び、高分子化合物
CN112745326B (zh) 2019-10-29 2023-10-20 三星Sdi株式会社 酞菁类化合物、感光性树脂组合物、感光性树脂层、彩色滤光片以及显示装置

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JPH07311461A (ja) * 1994-05-17 1995-11-28 Dainippon Printing Co Ltd 水溶性着色感光性樹脂組成物
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