JP3813890B2 - ３層レジストプロセス用中間層材料組成物及びそれを用いたパターン形成方法 - Google Patents

３層レジストプロセス用中間層材料組成物及びそれを用いたパターン形成方法 Download PDF

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Publication number
JP3813890B2
JP3813890B2 JP2002081328A JP2002081328A JP3813890B2 JP 3813890 B2 JP3813890 B2 JP 3813890B2 JP 2002081328 A JP2002081328 A JP 2002081328A JP 2002081328 A JP2002081328 A JP 2002081328A JP 3813890 B2 JP3813890 B2 JP 3813890B2
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Japan
Prior art keywords
group
intermediate layer
layer
resist
polymer
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JP2002081328A
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Japanese (ja)
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JP2003280207A5 (enExample
JP2003280207A (ja
Inventor
一也 上西
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Fujifilm Holdings Corp
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Fuji Photo Film Co Ltd
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Priority to JP2002081328A priority Critical patent/JP3813890B2/ja
Priority to US10/392,814 priority patent/US6884571B2/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silicon Polymers (AREA)
JP2002081328A 2002-03-22 2002-03-22 ３層レジストプロセス用中間層材料組成物及びそれを用いたパターン形成方法 Expired - Fee Related JP3813890B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002081328A JP3813890B2 (ja) 2002-03-22 2002-03-22 ３層レジストプロセス用中間層材料組成物及びそれを用いたパターン形成方法
US10/392,814 US6884571B2 (en) 2002-03-22 2003-03-21 Intermediate layer composition for three-layer resist process and pattern formation method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002081328A JP3813890B2 (ja) 2002-03-22 2002-03-22 ３層レジストプロセス用中間層材料組成物及びそれを用いたパターン形成方法

Publications (3)

Publication Number Publication Date
JP2003280207A JP2003280207A (ja) 2003-10-02
JP2003280207A5 JP2003280207A5 (enExample) 2005-04-07
JP3813890B2 true JP3813890B2 (ja) 2006-08-23

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JP2002081328A Expired - Fee Related JP3813890B2 (ja) 2002-03-22 2002-03-22 ３層レジストプロセス用中間層材料組成物及びそれを用いたパターン形成方法

Country Status (2)

Country Link
US (1) US6884571B2 (enExample)
JP (1) JP3813890B2 (enExample)

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CN109153860B (zh) 2016-04-06 2021-04-23 索尼公司 具有间隔连接体基团的超高亮二聚体或聚合物染料
JP7527537B2 (ja) 2016-05-10 2024-08-05 ソニーグループ株式会社 ペプチド骨格を有する超明色ポリマー染料
US11390754B2 (en) 2016-05-10 2022-07-19 Sony Corporation Compositions comprising a polymeric dye and a cyclodextrin and uses thereof
BR112018073199A2 (pt) 2016-05-11 2019-04-16 Sony Corporation corantes diméricos ou poliméricos ultrabrilhantes
EP3464477A1 (en) 2016-06-06 2019-04-10 Sony Corporation Ionic polymers comprising fluorescent or colored reporter groups
WO2018022925A1 (en) 2016-07-29 2018-02-01 Sony Corporation Ultra bright dimeric or polymeric dyes and methods for preparation of the same
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US12290571B2 (en) 2017-10-05 2025-05-06 Sony Group Corporation Programmable dendritic drugs
CN111836645A (zh) 2017-11-16 2020-10-27 索尼公司 可编程的聚合药物
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WO2019140128A1 (en) 2018-01-12 2019-07-18 Sony Corporation Phosphoalkyl polymers comprising biologically active compounds
EP3737417B1 (en) 2018-01-12 2025-08-27 Sony Group Corporation Phosphoalkyl ribose polymers comprising biologically active compounds
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KR102864292B1 (ko) 2018-03-21 2025-09-26 소니그룹주식회사 링커 군을 갖는 중합체성 텐덤 염료
JP7580689B2 (ja) 2018-06-27 2024-11-12 ソニーグループ株式会社 デオキシリボースを含むリンカー基を有するポリマー色素
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EP3861074A2 (en) 2019-09-26 2021-08-11 Sony Group Corporation Polymeric tandem dyes with linker groups
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CN111533860B (zh) * 2020-06-10 2021-10-01 青岛天祥环保工程有限公司 水性涂料超疏水改性剂及其制备方法
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US6743885B2 (en) * 2001-07-31 2004-06-01 Sumitomo Chemical Company, Limited Resin composition for intermediate layer of three-layer resist

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Publication number Publication date
US6884571B2 (en) 2005-04-26
US20030207208A1 (en) 2003-11-06
JP2003280207A (ja) 2003-10-02

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