JP3800616B2 - 目標物移動装置、位置決め装置及び可動ステージ装置 - Google Patents

目標物移動装置、位置決め装置及び可動ステージ装置 Download PDF

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Publication number
JP3800616B2
JP3800616B2 JP14319095A JP14319095A JP3800616B2 JP 3800616 B2 JP3800616 B2 JP 3800616B2 JP 14319095 A JP14319095 A JP 14319095A JP 14319095 A JP14319095 A JP 14319095A JP 3800616 B2 JP3800616 B2 JP 3800616B2
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Japan
Prior art keywords
stage
movable
drive
carrier
moving
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Expired - Lifetime
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JP14319095A
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English (en)
Japanese (ja)
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JPH0863231A (ja
Inventor
明光 蛯原
ノヴァク トーマス
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Toxicology (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Position Or Direction (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Machine Tool Units (AREA)
JP14319095A 1994-06-27 1995-06-09 目標物移動装置、位置決め装置及び可動ステージ装置 Expired - Lifetime JP3800616B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US26699994A 1994-06-27 1994-06-27
US08/266999 1994-06-27

Related Child Applications (4)

Application Number Title Priority Date Filing Date
JP2002305403A Division JP3804787B2 (ja) 1994-06-27 2002-10-21 露光装置および露光方法
JP2002305402A Division JP3804786B2 (ja) 1994-06-27 2002-10-21 露光装置および露光方法
JP2002305401A Division JP3804785B2 (ja) 1994-06-27 2002-10-21 露光装置および露光方法
JP2006075215A Division JP4135188B2 (ja) 1994-06-27 2006-03-17 位置決め装置

Publications (2)

Publication Number Publication Date
JPH0863231A JPH0863231A (ja) 1996-03-08
JP3800616B2 true JP3800616B2 (ja) 2006-07-26

Family

ID=23016891

Family Applications (6)

Application Number Title Priority Date Filing Date
JP14319095A Expired - Lifetime JP3800616B2 (ja) 1994-06-27 1995-06-09 目標物移動装置、位置決め装置及び可動ステージ装置
JP2002305402A Expired - Lifetime JP3804786B2 (ja) 1994-06-27 2002-10-21 露光装置および露光方法
JP2002305403A Expired - Lifetime JP3804787B2 (ja) 1994-06-27 2002-10-21 露光装置および露光方法
JP2002305401A Expired - Lifetime JP3804785B2 (ja) 1994-06-27 2002-10-21 露光装置および露光方法
JP2006075215A Expired - Lifetime JP4135188B2 (ja) 1994-06-27 2006-03-17 位置決め装置
JP2007094076A Expired - Lifetime JP4687911B2 (ja) 1994-06-27 2007-03-30 位置決め装置及び位置決め方法

Family Applications After (5)

Application Number Title Priority Date Filing Date
JP2002305402A Expired - Lifetime JP3804786B2 (ja) 1994-06-27 2002-10-21 露光装置および露光方法
JP2002305403A Expired - Lifetime JP3804787B2 (ja) 1994-06-27 2002-10-21 露光装置および露光方法
JP2002305401A Expired - Lifetime JP3804785B2 (ja) 1994-06-27 2002-10-21 露光装置および露光方法
JP2006075215A Expired - Lifetime JP4135188B2 (ja) 1994-06-27 2006-03-17 位置決め装置
JP2007094076A Expired - Lifetime JP4687911B2 (ja) 1994-06-27 2007-03-30 位置決め装置及び位置決め方法

Country Status (4)

Country Link
JP (6) JP3800616B2 (ko)
KR (7) KR100281853B1 (ko)
GB (13) GB2329518B (ko)
HK (12) HK1025842A1 (ko)

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JP3659529B2 (ja) * 1996-06-06 2005-06-15 キヤノン株式会社 露光装置およびデバイス製造方法
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Also Published As

Publication number Publication date
HK1035430A1 (en) 2001-11-23
HK1025841A1 (en) 2000-11-24
GB2325563A (en) 1998-11-25
GB2329516A (en) 1999-03-24
GB2329521B (en) 1999-06-02
GB2329517A (en) 1999-03-24
GB2329520B (en) 1999-06-02
JP3804785B2 (ja) 2006-08-02
GB2329520A (en) 1999-03-24
GB9817490D0 (en) 1998-10-07
KR100281853B1 (ko) 2001-04-02
JP4687911B2 (ja) 2011-05-25
KR960002519A (ko) 1996-01-26
GB9817494D0 (en) 1998-10-07
HK1017824A1 (en) 1999-11-26
GB2329522A (en) 1999-03-24
GB2325566A (en) 1998-11-25
GB2329522B (en) 1999-06-02
KR100281855B1 (ko) 2001-02-15
GB2329519B (en) 1999-06-02
HK1035432A1 (en) 2001-11-23
HK1026766A1 (en) 2000-12-22
GB2329518B (en) 1999-06-02
HK1035435A1 (en) 2001-11-23
HK1025842A1 (en) 2000-11-24
GB2325565B (en) 1999-03-31
KR100281857B1 (ko) 2001-02-15
KR100281858B1 (ko) 2001-02-15
KR100281860B1 (ko) 2001-02-15
HK1035431A1 (en) 2001-11-23
JP3804786B2 (ja) 2006-08-02
GB2329516B (en) 1999-06-02
GB9512659D0 (en) 1995-08-23
GB2329517B (en) 1999-06-02
GB9817491D0 (en) 1998-10-07
GB2290658A (en) 1996-01-03
JP2006258817A (ja) 2006-09-28
GB2290658B (en) 1999-03-24
GB9825844D0 (en) 1999-01-20
KR100281859B1 (ko) 2001-02-15
GB9817492D0 (en) 1998-10-07
JP2003197518A (ja) 2003-07-11
JP2003197519A (ja) 2003-07-11
GB2329521A (en) 1999-03-24
GB2325563B (en) 1999-03-24
JP4135188B2 (ja) 2008-08-20
GB2325564B (en) 1999-03-24
JPH0863231A (ja) 1996-03-08
KR100281856B1 (ko) 2001-02-15
GB2325565A (en) 1998-11-25
GB2329518A (en) 1999-03-24
JP2003158073A (ja) 2003-05-30
HK1025840A1 (en) 2000-11-24
GB9817493D0 (en) 1998-10-07
HK1032291A1 (en) 2001-07-13
GB2329519A (en) 1999-03-24
GB2325564A (en) 1998-11-25
HK1026767A1 (en) 2000-12-22
HK1035433A1 (en) 2001-11-23
GB2325566B (en) 1999-03-31
GB2329067A (en) 1999-03-10
JP2007242034A (ja) 2007-09-20
JP3804787B2 (ja) 2006-08-02
GB2329067B (en) 1999-06-02

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