GB2329521B - Electromagnetic alignment and scanning apparatus - Google Patents

Electromagnetic alignment and scanning apparatus

Info

Publication number
GB2329521B
GB2329521B GB9900937A GB9900937A GB2329521B GB 2329521 B GB2329521 B GB 2329521B GB 9900937 A GB9900937 A GB 9900937A GB 9900937 A GB9900937 A GB 9900937A GB 2329521 B GB2329521 B GB 2329521B
Authority
GB
United Kingdom
Prior art keywords
scanning apparatus
electromagnetic alignment
alignment
electromagnetic
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB9900937A
Other versions
GB2329521A (en
Inventor
Akimitsu Ebihara
Thomas Novak
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of GB2329521A publication Critical patent/GB2329521A/en
Application granted granted Critical
Publication of GB2329521B publication Critical patent/GB2329521B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70766Reaction force control means, e.g. countermass
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70775Position control, e.g. interferometers or encoders for determining the stage position
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709Vibration, e.g. vibration detection, compensation, suppression or isolation
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
GB9900937A 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus Expired - Lifetime GB2329521B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US26699994A 1994-06-27 1994-06-27
GB9817491A GB2329067B (en) 1994-06-27 1995-06-21 Electromagnetioc alignment and scanning apparatus

Publications (2)

Publication Number Publication Date
GB2329521A GB2329521A (en) 1999-03-24
GB2329521B true GB2329521B (en) 1999-06-02

Family

ID=23016891

Family Applications (13)

Application Number Title Priority Date Filing Date
GB9817492A Expired - Lifetime GB2325564B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900937A Expired - Lifetime GB2329521B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900933A Expired - Lifetime GB2329519B (en) 1994-06-27 1995-06-21 Electromagnmetic alignment and scanning apparatus
GB9817490A Expired - Lifetime GB2325563B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9817494A Expired - Lifetime GB2325566B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900929A Expired - Lifetime GB2329518B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9825844A Expired - Lifetime GB2329516B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9817491A Expired - Lifetime GB2329067B (en) 1994-06-27 1995-06-21 Electromagnetioc alignment and scanning apparatus
GB9900935A Expired - Lifetime GB2329520B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900940A Expired - Lifetime GB2329522B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9817493A Expired - Lifetime GB2325565B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9512659A Expired - Lifetime GB2290658B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900926A Expired - Lifetime GB2329517B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB9817492A Expired - Lifetime GB2325564B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus

Family Applications After (11)

Application Number Title Priority Date Filing Date
GB9900933A Expired - Lifetime GB2329519B (en) 1994-06-27 1995-06-21 Electromagnmetic alignment and scanning apparatus
GB9817490A Expired - Lifetime GB2325563B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9817494A Expired - Lifetime GB2325566B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900929A Expired - Lifetime GB2329518B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9825844A Expired - Lifetime GB2329516B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9817491A Expired - Lifetime GB2329067B (en) 1994-06-27 1995-06-21 Electromagnetioc alignment and scanning apparatus
GB9900935A Expired - Lifetime GB2329520B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900940A Expired - Lifetime GB2329522B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9817493A Expired - Lifetime GB2325565B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9512659A Expired - Lifetime GB2290658B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900926A Expired - Lifetime GB2329517B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus

Country Status (4)

Country Link
JP (6) JP3800616B2 (en)
KR (7) KR100281853B1 (en)
GB (13) GB2325564B (en)
HK (12) HK1035431A1 (en)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5953105A (en) * 1995-05-30 1999-09-14 U.S. Philips Corporation Positioning device with a reference frame for a measuring system, and a lithographic device provided with such a positioning device
JP3659529B2 (en) * 1996-06-06 2005-06-15 キヤノン株式会社 Exposure apparatus and device manufacturing method
JPH10521A (en) * 1996-06-07 1998-01-06 Nikon Corp Support device
US5821981A (en) * 1996-07-02 1998-10-13 Gerber Systems Corporation Magnetically preloaded air bearing motion system for an imaging device
US6222614B1 (en) * 1996-12-06 2001-04-24 Nikon Corporation Exposure elements with a cable-relaying support
DE69717975T2 (en) * 1996-12-24 2003-05-28 Asml Netherlands Bv POSITIONER BALANCED IN TWO DIRECTIONS, AND LITHOGRAPHIC DEVICE WITH SUCH A POSITIONER
DE69829614T2 (en) 1997-03-10 2006-03-09 Asml Netherlands B.V. LITHOGRAPHY DEVICE WITH A POSITIONING DEVICE WITH TWO OBJECTS
EP1450208A1 (en) * 1997-03-10 2004-08-25 ASML Netherlands B.V. Lithographic apparatus having two object holders
EP1028456A4 (en) 1997-09-19 2003-03-05 Nikon Corp Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby
US20010003028A1 (en) 1997-09-19 2001-06-07 Nikon Corporation Scanning Exposure Method
JP4164905B2 (en) * 1997-09-25 2008-10-15 株式会社ニコン Electromagnetic force motor, stage apparatus and exposure apparatus
US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
EP1041607A4 (en) * 1997-11-12 2003-11-05 Nikon Corp Projection exposure apparatus
AU4061099A (en) * 1998-06-17 2000-01-05 Nikon Corporation Exposure method and exposure apparatus
US6252234B1 (en) * 1998-08-14 2001-06-26 Nikon Corporation Reaction force isolation system for a planar motor
US6307284B1 (en) * 1998-09-16 2001-10-23 Canon Kabushiki Kaisha Positioning apparatus, information recording/reproducing apparatus, and inspection apparatus
WO2001045145A1 (en) * 1999-12-16 2001-06-21 Nikon Corporation Exposure method and exposure apparatus
US6836093B1 (en) * 1999-12-21 2004-12-28 Nikon Corporation Exposure method and apparatus
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
EP1111469B1 (en) * 1999-12-21 2007-10-17 ASML Netherlands B.V. Lithographic apparatus with a balanced positioning system
TWI264617B (en) 1999-12-21 2006-10-21 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
DE60136667D1 (en) 2000-02-21 2009-01-08 Sharp Kk Precision carrier plate
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
KR100387243B1 (en) * 2000-06-26 2003-06-12 삼성전자주식회사 Electromagnetic x-y stage driver for the nano data storage system and method for fabricating the coils of the same
JP2002170765A (en) * 2000-12-04 2002-06-14 Nikon Corp Stage system and exposure system
JP4021158B2 (en) * 2001-04-27 2007-12-12 株式会社新川 XY table in semiconductor manufacturing equipment
JP2002343706A (en) * 2001-05-18 2002-11-29 Nikon Corp Stage system and its driving method, exposing system and exposing method, and device and its fabricating method
US6788385B2 (en) 2001-06-21 2004-09-07 Nikon Corporation Stage device, exposure apparatus and method
KR100391000B1 (en) * 2001-06-30 2003-07-12 주식회사 하이닉스반도체 Exposure device for semiconductor device
ATE362653T1 (en) * 2002-03-12 2007-06-15 Hamamatsu Photonics Kk METHOD FOR SEPARATING SUBSTRATES
KR100937318B1 (en) * 2002-12-02 2010-01-18 두산인프라코어 주식회사 Squareness Adjustment Device Of Feed Axes For Machining Center
WO2004053942A2 (en) * 2002-12-09 2004-06-24 Acm Research, Inc. Measuring alignment between a wafer chuck and polishing/plating receptacle
KR20170018113A (en) 2003-04-09 2017-02-15 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
TW201834020A (en) 2003-10-28 2018-09-16 日商尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TWI612338B (en) 2003-11-20 2018-01-21 尼康股份有限公司 Optical illuminating apparatus, exposure device, exposure method, and device manufacturing method
JP4720506B2 (en) 2003-12-15 2011-07-13 株式会社ニコン Stage apparatus, exposure apparatus, and exposure method
JP4586367B2 (en) * 2004-01-14 2010-11-24 株式会社ニコン Stage apparatus and exposure apparatus
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
JP5130714B2 (en) 2004-04-09 2013-01-30 株式会社ニコン Driving method for moving body, stage apparatus, exposure apparatus, exposure method, and device manufacturing method
EP1780786A4 (en) 2004-06-07 2009-11-25 Nikon Corp Stage apparatus, exposure apparatus, and exposure method
US20070252970A1 (en) 2004-09-01 2007-11-01 Nikon Corporation Substrate Holder, Stage Apparatus, and Exposure Apparatus
JP4541849B2 (en) * 2004-11-22 2010-09-08 キヤノン株式会社 Positioning device
US7557529B2 (en) 2005-01-11 2009-07-07 Nikon Corporation Stage unit and exposure apparatus
US7456935B2 (en) * 2005-04-05 2008-11-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table
EP2660853B1 (en) 2005-05-12 2017-07-05 Nikon Corporation Projection optical system, exposure apparatus and exposure method
US7292317B2 (en) * 2005-06-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
US7675201B2 (en) * 2006-07-25 2010-03-09 Asml Netherlands B.V. Lithographic apparatus with planar motor driven support
WO2008041575A1 (en) * 2006-09-29 2008-04-10 Nikon Corporation Stage device and exposure device
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP4554715B2 (en) * 2009-02-24 2010-09-29 ファナック株式会社 Linear drive with cable clamp or relay structure
KR102211255B1 (en) * 2009-05-15 2021-02-02 가부시키가이샤 니콘 Mobile apparatus, power transmission apparatus, exposure apparatus, and device manufacturing method
JP5651035B2 (en) * 2011-02-09 2015-01-07 株式会社ソディック Mobile device
CN102887341A (en) * 2011-07-22 2013-01-23 大银微系统股份有限公司 Crossbeam pre-tensioning module of cantilever type platform
CN103522079B (en) * 2013-09-29 2016-01-06 天津大学 Dual spring pretension flexible decoupling zero linear electric motors locating platform
US9878386B2 (en) 2013-10-31 2018-01-30 Foundation Of Soongsil University-Industry Cooperation Eccentric electrode for electric discharge machining, method of manufacturing the same, and micro electric discharge machining apparatus including the same
CN103824792A (en) * 2014-02-28 2014-05-28 上海和辉光电有限公司 Storage cabinet and control method thereof
JP5912143B2 (en) * 2014-03-04 2016-04-27 株式会社新川 Bonding equipment
JP6379612B2 (en) * 2014-04-11 2018-08-29 株式会社ニコン MOBILE DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
CN107664920B (en) * 2016-07-29 2019-04-12 上海微电子装备(集团)股份有限公司 Electromagnetism track-type facilities
WO2018046280A1 (en) * 2016-09-09 2018-03-15 Asml Holding N.V. Lithographic apparatus and support structures background
CN110328405B (en) * 2019-08-09 2020-09-22 佛山市镭科智能设备有限公司 Clamping control method for sectional material
CN114043260B (en) * 2022-01-13 2022-04-26 上海隐冠半导体技术有限公司 Displacement device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5208497A (en) * 1989-04-17 1993-05-04 Sharp Kabushiki Kaisha Linear driving apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL9100407A (en) * 1991-03-07 1992-10-01 Philips Nv OPTICAL LITHOGRAPHIC DEVICE WITH A FORCE COMPENSATED MACHINE FRAME.
JPH0529442A (en) * 1991-07-18 1993-02-05 Toshiba Corp Table device
US5285142A (en) * 1993-02-09 1994-02-08 Svg Lithography Systems, Inc. Wafer stage with reference surface
JPH07260472A (en) * 1994-03-22 1995-10-13 Nikon Corp Orthogonality measuring method for stage device
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
JPH08229759A (en) * 1995-02-24 1996-09-10 Canon Inc Positioning device, and device and method of manufacturing device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5208497A (en) * 1989-04-17 1993-05-04 Sharp Kabushiki Kaisha Linear driving apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Optical/Laser Microlithography II, 1989, Vol 1088, pg424-433Buckley et al, "Step and Scan" *

Also Published As

Publication number Publication date
GB9512659D0 (en) 1995-08-23
KR100281858B1 (en) 2001-02-15
KR100281856B1 (en) 2001-02-15
HK1026767A1 (en) 2000-12-22
HK1026766A1 (en) 2000-12-22
GB2329517A (en) 1999-03-24
KR100281853B1 (en) 2001-04-02
HK1035430A1 (en) 2001-11-23
GB2325563A (en) 1998-11-25
HK1025842A1 (en) 2000-11-24
HK1025840A1 (en) 2000-11-24
JP2006258817A (en) 2006-09-28
KR960002519A (en) 1996-01-26
GB2290658B (en) 1999-03-24
GB2290658A (en) 1996-01-03
GB2325566A (en) 1998-11-25
GB9817493D0 (en) 1998-10-07
JP2003158073A (en) 2003-05-30
GB2329520B (en) 1999-06-02
GB2329067B (en) 1999-06-02
KR100281859B1 (en) 2001-02-15
GB2329522B (en) 1999-06-02
GB2325565B (en) 1999-03-31
GB9817490D0 (en) 1998-10-07
HK1035435A1 (en) 2001-11-23
GB2329521A (en) 1999-03-24
GB2325565A (en) 1998-11-25
GB2325566B (en) 1999-03-31
GB2329067A (en) 1999-03-10
GB2329518B (en) 1999-06-02
JP3804785B2 (en) 2006-08-02
GB2325564B (en) 1999-03-24
GB2329519A (en) 1999-03-24
GB2325564A (en) 1998-11-25
HK1032291A1 (en) 2001-07-13
GB2329516B (en) 1999-06-02
KR100281855B1 (en) 2001-02-15
JP4135188B2 (en) 2008-08-20
GB2325563B (en) 1999-03-24
JP2003197518A (en) 2003-07-11
JP3800616B2 (en) 2006-07-26
GB9825844D0 (en) 1999-01-20
JP2007242034A (en) 2007-09-20
KR100281860B1 (en) 2001-02-15
JP3804787B2 (en) 2006-08-02
GB2329519B (en) 1999-06-02
JP2003197519A (en) 2003-07-11
KR100281857B1 (en) 2001-02-15
HK1035431A1 (en) 2001-11-23
JP4687911B2 (en) 2011-05-25
GB9817494D0 (en) 1998-10-07
GB2329516A (en) 1999-03-24
JPH0863231A (en) 1996-03-08
GB9817492D0 (en) 1998-10-07
HK1025841A1 (en) 2000-11-24
HK1035433A1 (en) 2001-11-23
GB2329517B (en) 1999-06-02
GB2329518A (en) 1999-03-24
JP3804786B2 (en) 2006-08-02
GB9817491D0 (en) 1998-10-07
HK1035432A1 (en) 2001-11-23
GB2329522A (en) 1999-03-24
HK1017824A1 (en) 1999-11-26
GB2329520A (en) 1999-03-24

Similar Documents

Publication Publication Date Title
GB2329516B (en) Electromagnetic alignment and scanning apparatus
GB2328280B (en) Scanning apparatus and methods
GB9503695D0 (en) Alignment apparatus and method
GB9423045D0 (en) Turn up and alignment apparatus
GB2270604B (en) Scanning method and apparatus
GB2295517B (en) Facsimile apparatus and methods
GB2302186B (en) Scanning apparatus and method
HK1014054A1 (en) Image forming apparatus and image fixing apparatus
HK1035434A1 (en) Electromagnetic alignment and scanning apparatus
GB9410430D0 (en) Scanning apparatus and method
GB9411468D0 (en) Scanning apparatus
GB9308616D0 (en) Scanning method and apparatus
HK1004344A1 (en) Scanning arrangement and method

Legal Events

Date Code Title Description
PE20 Patent expired after termination of 20 years

Expiry date: 20150620