HK1032291A1 - Electromagnetic alignment and scanning apparatus - Google Patents

Electromagnetic alignment and scanning apparatus

Info

Publication number
HK1032291A1
HK1032291A1 HK01101430A HK01101430A HK1032291A1 HK 1032291 A1 HK1032291 A1 HK 1032291A1 HK 01101430 A HK01101430 A HK 01101430A HK 01101430 A HK01101430 A HK 01101430A HK 1032291 A1 HK1032291 A1 HK 1032291A1
Authority
HK
Hong Kong
Prior art keywords
scanning apparatus
electromagnetic alignment
alignment
electromagnetic
scanning
Prior art date
Application number
HK01101430A
Inventor
Akimitsu Ebihara
Thomas Novak
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1032291A1 publication Critical patent/HK1032291A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
HK01101430A 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus HK1032291A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26699994A 1994-06-27 1994-06-27

Publications (1)

Publication Number Publication Date
HK1032291A1 true HK1032291A1 (en) 2001-07-13

Family

ID=23016891

Family Applications (12)

Application Number Title Priority Date Filing Date
HK01101432A HK1035431A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101434A HK1035433A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101430A HK1032291A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101436A HK1035435A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101431A HK1035430A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK98115706A HK1017824A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101433A HK1035432A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103151A HK1026767A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103150A HK1026766A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103148A HK1025840A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103149A HK1025841A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103152A HK1025842A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus

Family Applications Before (2)

Application Number Title Priority Date Filing Date
HK01101432A HK1035431A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101434A HK1035433A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus

Family Applications After (9)

Application Number Title Priority Date Filing Date
HK01101436A HK1035435A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101431A HK1035430A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK98115706A HK1017824A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101433A HK1035432A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103151A HK1026767A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103150A HK1026766A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103148A HK1025840A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103149A HK1025841A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103152A HK1025842A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus

Country Status (4)

Country Link
JP (6) JP3800616B2 (en)
KR (7) KR100281853B1 (en)
GB (13) GB2325563B (en)
HK (12) HK1035431A1 (en)

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US6222614B1 (en) * 1996-12-06 2001-04-24 Nikon Corporation Exposure elements with a cable-relaying support
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KR100521704B1 (en) * 1997-09-19 2005-10-14 가부시키가이샤 니콘 Stage apparatus, a scanning aligner and a scanning exposure method, and a device manufacturing thereby
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US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
AU1051999A (en) * 1997-11-12 1999-05-31 Nikon Corporation Projection exposure apparatus
AU4061099A (en) * 1998-06-17 2000-01-05 Nikon Corporation Exposure method and exposure apparatus
US6252234B1 (en) * 1998-08-14 2001-06-26 Nikon Corporation Reaction force isolation system for a planar motor
US6307284B1 (en) * 1998-09-16 2001-10-23 Canon Kabushiki Kaisha Positioning apparatus, information recording/reproducing apparatus, and inspection apparatus
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TWI264617B (en) 1999-12-21 2006-10-21 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
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CN100514581C (en) * 2002-12-09 2009-07-15 Acm研究公司 Measuring alignment between a wafer chuck and polishing/plating receptacle
KR101484435B1 (en) 2003-04-09 2015-01-19 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
TWI360158B (en) 2003-10-28 2012-03-11 Nikon Corp Projection exposure device,exposure method and dev
TWI385414B (en) 2003-11-20 2013-02-11 尼康股份有限公司 Optical illuminating apparatus, illuminating method, exposure apparatus, exposure method and device fabricating method
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US7852034B2 (en) 2004-04-09 2010-12-14 Nikon Corporation Drive method of moving body, stage unit, and exposure apparatus
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EP2660854B1 (en) 2005-05-12 2017-06-21 Nikon Corporation Projection optical system, exposure apparatus and exposure method
US7292317B2 (en) * 2005-06-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
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EP2068349A4 (en) * 2006-09-29 2011-03-30 Nikon Corp Stage device and exposure device
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP4554715B2 (en) * 2009-02-24 2010-09-29 ファナック株式会社 Linear drive with cable clamp or relay structure
TWI623819B (en) * 2009-05-15 2018-05-11 Nikon Corp Moving body device, power transmission device, exposure device, and element manufacturing method
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CN102887341A (en) * 2011-07-22 2013-01-23 大银微系统股份有限公司 Crossbeam pre-tensioning module of cantilever type platform
CN103522079B (en) * 2013-09-29 2016-01-06 天津大学 Dual spring pretension flexible decoupling zero linear electric motors locating platform
US9878386B2 (en) 2013-10-31 2018-01-30 Foundation Of Soongsil University-Industry Cooperation Eccentric electrode for electric discharge machining, method of manufacturing the same, and micro electric discharge machining apparatus including the same
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Also Published As

Publication number Publication date
GB2325565A (en) 1998-11-25
GB9817492D0 (en) 1998-10-07
GB9817491D0 (en) 1998-10-07
JP2006258817A (en) 2006-09-28
HK1035433A1 (en) 2001-11-23
GB2325564B (en) 1999-03-24
HK1026766A1 (en) 2000-12-22
GB2329516B (en) 1999-06-02
GB2329520B (en) 1999-06-02
HK1035430A1 (en) 2001-11-23
JP3804787B2 (en) 2006-08-02
GB2329521B (en) 1999-06-02
HK1025841A1 (en) 2000-11-24
GB9512659D0 (en) 1995-08-23
JP4687911B2 (en) 2011-05-25
JP2007242034A (en) 2007-09-20
GB2329516A (en) 1999-03-24
GB9817490D0 (en) 1998-10-07
GB2329522A (en) 1999-03-24
GB2329517B (en) 1999-06-02
GB2329519B (en) 1999-06-02
GB2325563B (en) 1999-03-24
KR960002519A (en) 1996-01-26
GB2329517A (en) 1999-03-24
GB2329522B (en) 1999-06-02
GB9817494D0 (en) 1998-10-07
HK1025840A1 (en) 2000-11-24
HK1026767A1 (en) 2000-12-22
HK1025842A1 (en) 2000-11-24
GB2325566B (en) 1999-03-31
GB9817493D0 (en) 1998-10-07
HK1035431A1 (en) 2001-11-23
GB2329518B (en) 1999-06-02
KR100281855B1 (en) 2001-02-15
HK1035435A1 (en) 2001-11-23
KR100281858B1 (en) 2001-02-15
GB2325566A (en) 1998-11-25
JP4135188B2 (en) 2008-08-20
KR100281860B1 (en) 2001-02-15
GB2329518A (en) 1999-03-24
GB2329521A (en) 1999-03-24
JP2003158073A (en) 2003-05-30
GB9825844D0 (en) 1999-01-20
KR100281859B1 (en) 2001-02-15
KR100281853B1 (en) 2001-04-02
GB2329519A (en) 1999-03-24
HK1035432A1 (en) 2001-11-23
JP3804785B2 (en) 2006-08-02
GB2329067B (en) 1999-06-02
KR100281856B1 (en) 2001-02-15
GB2325565B (en) 1999-03-31
JP2003197518A (en) 2003-07-11
JPH0863231A (en) 1996-03-08
GB2325564A (en) 1998-11-25
GB2325563A (en) 1998-11-25
GB2329520A (en) 1999-03-24
JP3804786B2 (en) 2006-08-02
GB2290658B (en) 1999-03-24
GB2290658A (en) 1996-01-03
GB2329067A (en) 1999-03-10
JP2003197519A (en) 2003-07-11
HK1017824A1 (en) 1999-11-26
KR100281857B1 (en) 2001-02-15
JP3800616B2 (en) 2006-07-26

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Effective date: 20150620