HK1026767A1 - Electromagnetic alignment and scanning apparatus - Google Patents

Electromagnetic alignment and scanning apparatus

Info

Publication number
HK1026767A1
HK1026767A1 HK00103151A HK00103151A HK1026767A1 HK 1026767 A1 HK1026767 A1 HK 1026767A1 HK 00103151 A HK00103151 A HK 00103151A HK 00103151 A HK00103151 A HK 00103151A HK 1026767 A1 HK1026767 A1 HK 1026767A1
Authority
HK
Hong Kong
Prior art keywords
scanning apparatus
electromagnetic alignment
alignment
electromagnetic
scanning
Prior art date
Application number
HK00103151A
Inventor
Akimitsu Ebihara
Thomas Novak
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1026767A1 publication Critical patent/HK1026767A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
HK00103151A 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus HK1026767A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26699994A 1994-06-27 1994-06-27

Publications (1)

Publication Number Publication Date
HK1026767A1 true HK1026767A1 (en) 2000-12-22

Family

ID=23016891

Family Applications (12)

Application Number Title Priority Date Filing Date
HK00103151A HK1026767A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103149A HK1025841A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101431A HK1035430A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK98115706A HK1017824A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101430A HK1032291A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101432A HK1035431A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103152A HK1025842A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101436A HK1035435A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101433A HK1035432A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101434A HK1035433A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103148A HK1025840A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103150A HK1026766A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus

Family Applications After (11)

Application Number Title Priority Date Filing Date
HK00103149A HK1025841A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101431A HK1035430A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK98115706A HK1017824A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101430A HK1032291A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101432A HK1035431A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103152A HK1025842A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101436A HK1035435A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101433A HK1035432A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101434A HK1035433A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103148A HK1025840A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103150A HK1026766A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus

Country Status (4)

Country Link
JP (6) JP3800616B2 (en)
KR (7) KR100281853B1 (en)
GB (13) GB2290658B (en)
HK (12) HK1026767A1 (en)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0772801B1 (en) * 1995-05-30 2003-07-16 ASML Netherlands B.V. A positioning device with a reference frame for a measuring system
JP3659529B2 (en) * 1996-06-06 2005-06-15 キヤノン株式会社 Exposure apparatus and device manufacturing method
JPH10521A (en) * 1996-06-07 1998-01-06 Nikon Corp Support device
US5821981A (en) * 1996-07-02 1998-10-13 Gerber Systems Corporation Magnetically preloaded air bearing motion system for an imaging device
US6222614B1 (en) * 1996-12-06 2001-04-24 Nikon Corporation Exposure elements with a cable-relaying support
KR100512450B1 (en) * 1996-12-24 2006-01-27 에이에스엠엘 네델란즈 비.브이. Two-dimensionally stabilized positioning device with two object holders and lithographic device with such positioning device
JP3626504B2 (en) 1997-03-10 2005-03-09 アーエスエム リソグラフィ ベスローテン フェンノートシャップ Positioning device having two article holders
EP1450208A1 (en) * 1997-03-10 2004-08-25 ASML Netherlands B.V. Lithographic apparatus having two object holders
US20010003028A1 (en) 1997-09-19 2001-06-07 Nikon Corporation Scanning Exposure Method
WO1999016113A1 (en) * 1997-09-19 1999-04-01 Nikon Corporation Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby
JP4164905B2 (en) * 1997-09-25 2008-10-15 株式会社ニコン Electromagnetic force motor, stage apparatus and exposure apparatus
US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
WO1999025011A1 (en) * 1997-11-12 1999-05-20 Nikon Corporation Projection exposure apparatus
EP1134793A4 (en) * 1998-06-17 2006-07-26 Nikon Corp Exposure method and exposure apparatus
US6252234B1 (en) * 1998-08-14 2001-06-26 Nikon Corporation Reaction force isolation system for a planar motor
US6307284B1 (en) * 1998-09-16 2001-10-23 Canon Kabushiki Kaisha Positioning apparatus, information recording/reproducing apparatus, and inspection apparatus
EP1248288A1 (en) * 1999-12-16 2002-10-09 Nikon Corporation Exposure method and exposure apparatus
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
US6836093B1 (en) * 1999-12-21 2004-12-28 Nikon Corporation Exposure method and apparatus
EP1111469B1 (en) * 1999-12-21 2007-10-17 ASML Netherlands B.V. Lithographic apparatus with a balanced positioning system
TWI264617B (en) 1999-12-21 2006-10-21 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
DE60136667D1 (en) 2000-02-21 2009-01-08 Sharp Kk Precision carrier plate
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
KR100387243B1 (en) * 2000-06-26 2003-06-12 삼성전자주식회사 Electromagnetic x-y stage driver for the nano data storage system and method for fabricating the coils of the same
JP2002170765A (en) * 2000-12-04 2002-06-14 Nikon Corp Stage system and exposure system
JP4021158B2 (en) * 2001-04-27 2007-12-12 株式会社新川 XY table in semiconductor manufacturing equipment
JP2002343706A (en) * 2001-05-18 2002-11-29 Nikon Corp Stage system and its driving method, exposing system and exposing method, and device and its fabricating method
US6788385B2 (en) 2001-06-21 2004-09-07 Nikon Corporation Stage device, exposure apparatus and method
KR100391000B1 (en) * 2001-06-30 2003-07-12 주식회사 하이닉스반도체 Exposure device for semiconductor device
CN100355032C (en) * 2002-03-12 2007-12-12 浜松光子学株式会社 Substrate dividing method
KR100937318B1 (en) * 2002-12-02 2010-01-18 두산인프라코어 주식회사 Squareness Adjustment Device Of Feed Axes For Machining Center
WO2004053942A2 (en) * 2002-12-09 2004-06-24 Acm Research, Inc. Measuring alignment between a wafer chuck and polishing/plating receptacle
KR20150036786A (en) 2003-04-09 2015-04-07 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
TWI474132B (en) 2003-10-28 2015-02-21 尼康股份有限公司 Optical illumination device, projection exposure device, exposure method and device manufacturing method
TWI612338B (en) 2003-11-20 2018-01-21 尼康股份有限公司 Optical illuminating apparatus, exposure device, exposure method, and device manufacturing method
JP4720506B2 (en) 2003-12-15 2011-07-13 株式会社ニコン Stage apparatus, exposure apparatus, and exposure method
JP4586367B2 (en) * 2004-01-14 2010-11-24 株式会社ニコン Stage apparatus and exposure apparatus
TWI505329B (en) 2004-02-06 2015-10-21 尼康股份有限公司 Optical illumination apparatus, light-exposure apparatus, light-exposure method and device manufacturing method
WO2005098911A1 (en) * 2004-04-09 2005-10-20 Nikon Corporation Drive method for mobile body, stage device, and exposure device
KR101119814B1 (en) 2004-06-07 2012-03-06 가부시키가이샤 니콘 Stage apparatus, exposure apparatus, and exposure method
WO2006025341A1 (en) 2004-09-01 2006-03-09 Nikon Corporation Substrate holder, stage apparatus, and exposure apparatus
JP4541849B2 (en) * 2004-11-22 2010-09-08 キヤノン株式会社 Positioning device
US7557529B2 (en) 2005-01-11 2009-07-07 Nikon Corporation Stage unit and exposure apparatus
US7456935B2 (en) * 2005-04-05 2008-11-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table
KR101504765B1 (en) 2005-05-12 2015-03-30 가부시키가이샤 니콘 Projection optical system, exposure apparatus and exposure method
US7292317B2 (en) * 2005-06-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
US7675201B2 (en) * 2006-07-25 2010-03-09 Asml Netherlands B.V. Lithographic apparatus with planar motor driven support
EP2068349A4 (en) * 2006-09-29 2011-03-30 Nikon Corp Stage device and exposure device
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP4554715B2 (en) * 2009-02-24 2010-09-29 ファナック株式会社 Linear drive with cable clamp or relay structure
WO2010131485A1 (en) * 2009-05-15 2010-11-18 株式会社ニコン Mobile apparatus, power transmission apparatus, exposure apparatus, and device manufacturing method
JP5651035B2 (en) * 2011-02-09 2015-01-07 株式会社ソディック Mobile device
CN102887341A (en) * 2011-07-22 2013-01-23 大银微系统股份有限公司 Crossbeam pre-tensioning module of cantilever type platform
CN103522079B (en) * 2013-09-29 2016-01-06 天津大学 Dual spring pretension flexible decoupling zero linear electric motors locating platform
US9878386B2 (en) 2013-10-31 2018-01-30 Foundation Of Soongsil University-Industry Cooperation Eccentric electrode for electric discharge machining, method of manufacturing the same, and micro electric discharge machining apparatus including the same
CN103824792A (en) * 2014-02-28 2014-05-28 上海和辉光电有限公司 Storage cabinet and control method thereof
JP5912143B2 (en) * 2014-03-04 2016-04-27 株式会社新川 Bonding equipment
JP6379612B2 (en) * 2014-04-11 2018-08-29 株式会社ニコン MOBILE DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
CN107664920B (en) * 2016-07-29 2019-04-12 上海微电子装备（集团）股份有限公司 Electromagnetism track-type facilities
JP2019529970A (en) * 2016-09-09 2019-10-17 エーエスエムエル ホールディング エヌ．ブイ． Lithographic apparatus and support structure background
CN110328405B (en) * 2019-08-09 2020-09-22 佛山市镭科智能设备有限公司 Clamping control method for sectional material
CN114043260B (en) * 2022-01-13 2022-04-26 上海隐冠半导体技术有限公司 Displacement device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0393994B1 (en) * 1989-04-17 1994-06-15 SHARP Corporation A linear driving apparatus
NL9100407A (en) * 1991-03-07 1992-10-01 Philips Nv OPTICAL LITHOGRAPHIC DEVICE WITH A FORCE COMPENSATED MACHINE FRAME.
JPH0529442A (en) * 1991-07-18 1993-02-05 Toshiba Corp Table device
US5285142A (en) * 1993-02-09 1994-02-08 Svg Lithography Systems, Inc. Wafer stage with reference surface
JPH07260472A (en) * 1994-03-22 1995-10-13 Nikon Corp Orthogonality measuring method for stage device
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
JPH08229759A (en) * 1995-02-24 1996-09-10 Canon Inc Positioning device, and device and method of manufacturing device

Also Published As

Publication number Publication date
KR960002519A (en) 1996-01-26
HK1035433A1 (en) 2001-11-23
GB9817493D0 (en) 1998-10-07
JP2003197519A (en) 2003-07-11
HK1032291A1 (en) 2001-07-13
GB2325564A (en) 1998-11-25
GB2325566B (en) 1999-03-31
JP2006258817A (en) 2006-09-28
KR100281856B1 (en) 2001-02-15
GB2329517B (en) 1999-06-02
GB9512659D0 (en) 1995-08-23
JP2007242034A (en) 2007-09-20
GB2290658A (en) 1996-01-03
HK1035431A1 (en) 2001-11-23
HK1025840A1 (en) 2000-11-24
HK1017824A1 (en) 1999-11-26
JP2003158073A (en) 2003-05-30
GB9825844D0 (en) 1999-01-20
GB2329517A (en) 1999-03-24
GB2325564B (en) 1999-03-24
GB2290658B (en) 1999-03-24
JP4135188B2 (en) 2008-08-20
GB9817491D0 (en) 1998-10-07
GB2329518B (en) 1999-06-02
GB2329516A (en) 1999-03-24
GB2329518A (en) 1999-03-24
GB2325563B (en) 1999-03-24
HK1035432A1 (en) 2001-11-23
GB2325565B (en) 1999-03-31
GB9817492D0 (en) 1998-10-07
HK1035430A1 (en) 2001-11-23
JP4687911B2 (en) 2011-05-25
GB2329519B (en) 1999-06-02
GB2329521A (en) 1999-03-24
GB2325563A (en) 1998-11-25
GB2325566A (en) 1998-11-25
JP3804787B2 (en) 2006-08-02
KR100281859B1 (en) 2001-02-15
GB2329519A (en) 1999-03-24
GB2329067B (en) 1999-06-02
GB9817494D0 (en) 1998-10-07
JP2003197518A (en) 2003-07-11
GB2325565A (en) 1998-11-25
JP3804785B2 (en) 2006-08-02
JP3800616B2 (en) 2006-07-26
KR100281857B1 (en) 2001-02-15
KR100281860B1 (en) 2001-02-15
GB2329520B (en) 1999-06-02
HK1026766A1 (en) 2000-12-22
HK1035435A1 (en) 2001-11-23
GB2329521B (en) 1999-06-02
GB2329067A (en) 1999-03-10
JPH0863231A (en) 1996-03-08
KR100281853B1 (en) 2001-04-02
KR100281858B1 (en) 2001-02-15
GB2329520A (en) 1999-03-24
HK1025841A1 (en) 2000-11-24
GB2329522B (en) 1999-06-02
HK1025842A1 (en) 2000-11-24
GB2329516B (en) 1999-06-02
KR100281855B1 (en) 2001-02-15
JP3804786B2 (en) 2006-08-02
GB9817490D0 (en) 1998-10-07
GB2329522A (en) 1999-03-24

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Effective date: 20150620