GB9817493D0 - Electromagnetic alignment and scanning apparatus - Google Patents

Electromagnetic alignment and scanning apparatus

Info

Publication number
GB9817493D0
GB9817493D0 GBGB9817493.1A GB9817493A GB9817493D0 GB 9817493 D0 GB9817493 D0 GB 9817493D0 GB 9817493 A GB9817493 A GB 9817493A GB 9817493 D0 GB9817493 D0 GB 9817493D0
Authority
GB
United Kingdom
Prior art keywords
scanning apparatus
electromagnetic alignment
alignment
electromagnetic
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GBGB9817493.1A
Other versions
GB2325565B (en
GB2325565A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to GB9900926A priority Critical patent/GB2329517B/en
Priority to GB9900929A priority patent/GB2329518B/en
Publication of GB9817493D0 publication Critical patent/GB9817493D0/en
Publication of GB2325565A publication Critical patent/GB2325565A/en
Application granted granted Critical
Publication of GB2325565B publication Critical patent/GB2325565B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Toxicology (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Position Or Direction (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Machine Tool Units (AREA)
GB9817493A 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus Expired - Lifetime GB2325565B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB9900926A GB2329517B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900929A GB2329518B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US26699994A 1994-06-27 1994-06-27
GB9512659A GB2290658B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus

Publications (3)

Publication Number Publication Date
GB9817493D0 true GB9817493D0 (en) 1998-10-07
GB2325565A GB2325565A (en) 1998-11-25
GB2325565B GB2325565B (en) 1999-03-31

Family

ID=23016891

Family Applications (13)

Application Number Title Priority Date Filing Date
GB9817491A Expired - Lifetime GB2329067B (en) 1994-06-27 1995-06-21 Electromagnetioc alignment and scanning apparatus
GB9900926A Expired - Lifetime GB2329517B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9817493A Expired - Lifetime GB2325565B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900933A Expired - Lifetime GB2329519B (en) 1994-06-27 1995-06-21 Electromagnmetic alignment and scanning apparatus
GB9817490A Expired - Lifetime GB2325563B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900929A Expired - Lifetime GB2329518B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900940A Expired - Lifetime GB2329522B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9512659A Expired - Lifetime GB2290658B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900937A Expired - Lifetime GB2329521B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900935A Expired - Lifetime GB2329520B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9817492A Expired - Lifetime GB2325564B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9825844A Expired - Lifetime GB2329516B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9817494A Expired - Lifetime GB2325566B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus

Family Applications Before (2)

Application Number Title Priority Date Filing Date
GB9817491A Expired - Lifetime GB2329067B (en) 1994-06-27 1995-06-21 Electromagnetioc alignment and scanning apparatus
GB9900926A Expired - Lifetime GB2329517B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus

Family Applications After (10)

Application Number Title Priority Date Filing Date
GB9900933A Expired - Lifetime GB2329519B (en) 1994-06-27 1995-06-21 Electromagnmetic alignment and scanning apparatus
GB9817490A Expired - Lifetime GB2325563B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900929A Expired - Lifetime GB2329518B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900940A Expired - Lifetime GB2329522B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9512659A Expired - Lifetime GB2290658B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900937A Expired - Lifetime GB2329521B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9900935A Expired - Lifetime GB2329520B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9817492A Expired - Lifetime GB2325564B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9825844A Expired - Lifetime GB2329516B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus
GB9817494A Expired - Lifetime GB2325566B (en) 1994-06-27 1995-06-21 Electromagnetic alignment and scanning apparatus

Country Status (4)

Country Link
JP (6) JP3800616B2 (en)
KR (7) KR100281853B1 (en)
GB (13) GB2329067B (en)
HK (12) HK1025842A1 (en)

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TW201834020A (en) 2003-10-28 2018-09-16 日商尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
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Also Published As

Publication number Publication date
HK1035431A1 (en) 2001-11-23
KR100281860B1 (en) 2001-02-15
JP3804787B2 (en) 2006-08-02
GB9512659D0 (en) 1995-08-23
HK1026767A1 (en) 2000-12-22
HK1017824A1 (en) 1999-11-26
GB2325564B (en) 1999-03-24
GB2325566B (en) 1999-03-31
GB9825844D0 (en) 1999-01-20
GB2325564A (en) 1998-11-25
KR100281857B1 (en) 2001-02-15
JP4687911B2 (en) 2011-05-25
GB2329520A (en) 1999-03-24
GB2325563B (en) 1999-03-24
HK1035432A1 (en) 2001-11-23
GB2325565B (en) 1999-03-31
JPH0863231A (en) 1996-03-08
GB2329519A (en) 1999-03-24
JP2007242034A (en) 2007-09-20
JP2006258817A (en) 2006-09-28
HK1035435A1 (en) 2001-11-23
GB2329520B (en) 1999-06-02
JP3804786B2 (en) 2006-08-02
GB2290658B (en) 1999-03-24
GB2329067A (en) 1999-03-10
GB2325563A (en) 1998-11-25
GB2329516A (en) 1999-03-24
GB2325566A (en) 1998-11-25
GB2290658A (en) 1996-01-03
JP3804785B2 (en) 2006-08-02
GB2329517A (en) 1999-03-24
GB2329517B (en) 1999-06-02
GB9817494D0 (en) 1998-10-07
GB2325565A (en) 1998-11-25
JP4135188B2 (en) 2008-08-20
HK1035430A1 (en) 2001-11-23
KR100281855B1 (en) 2001-02-15
HK1025841A1 (en) 2000-11-24
KR100281859B1 (en) 2001-02-15
GB9817491D0 (en) 1998-10-07
GB2329521B (en) 1999-06-02
GB2329522A (en) 1999-03-24
HK1032291A1 (en) 2001-07-13
JP2003197518A (en) 2003-07-11
KR100281856B1 (en) 2001-02-15
GB9817490D0 (en) 1998-10-07
KR100281853B1 (en) 2001-04-02
GB9817492D0 (en) 1998-10-07
GB2329067B (en) 1999-06-02
GB2329516B (en) 1999-06-02
HK1035433A1 (en) 2001-11-23
KR960002519A (en) 1996-01-26
GB2329518A (en) 1999-03-24
GB2329521A (en) 1999-03-24
HK1026766A1 (en) 2000-12-22
GB2329522B (en) 1999-06-02
GB2329519B (en) 1999-06-02
KR100281858B1 (en) 2001-02-15
JP3800616B2 (en) 2006-07-26
HK1025840A1 (en) 2000-11-24
JP2003158073A (en) 2003-05-30
JP2003197519A (en) 2003-07-11
GB2329518B (en) 1999-06-02
HK1025842A1 (en) 2000-11-24

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Expiry date: 20150620