GB9817490D0 - Electromagnetic alignment and scanning apparatus - Google Patents
Electromagnetic alignment and scanning apparatusInfo
- Publication number
- GB9817490D0 GB9817490D0 GBGB9817490.7A GB9817490A GB9817490D0 GB 9817490 D0 GB9817490 D0 GB 9817490D0 GB 9817490 A GB9817490 A GB 9817490A GB 9817490 D0 GB9817490 D0 GB 9817490D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- scanning apparatus
- electromagnetic alignment
- alignment
- electromagnetic
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Computer Networks & Wireless Communication (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Atmospheric Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Toxicology (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Control Of Position Or Direction (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Machine Tool Units (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US26699994A | 1994-06-27 | 1994-06-27 | |
GB9512659A GB2290658B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9817490D0 true GB9817490D0 (en) | 1998-10-07 |
GB2325563A GB2325563A (en) | 1998-11-25 |
GB2325563B GB2325563B (en) | 1999-03-24 |
Family
ID=23016891
Family Applications (13)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9825844A Expired - Lifetime GB2329516B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9817492A Expired - Lifetime GB2325564B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9817494A Expired - Lifetime GB2325566B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9900937A Expired - Lifetime GB2329521B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9512659A Expired - Lifetime GB2290658B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9900929A Expired - Lifetime GB2329518B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9900940A Expired - Lifetime GB2329522B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9817491A Expired - Lifetime GB2329067B (en) | 1994-06-27 | 1995-06-21 | Electromagnetioc alignment and scanning apparatus |
GB9900935A Expired - Lifetime GB2329520B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9900926A Expired - Lifetime GB2329517B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9900933A Expired - Lifetime GB2329519B (en) | 1994-06-27 | 1995-06-21 | Electromagnmetic alignment and scanning apparatus |
GB9817493A Expired - Lifetime GB2325565B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9817490A Expired - Lifetime GB2325563B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
Family Applications Before (12)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9825844A Expired - Lifetime GB2329516B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9817492A Expired - Lifetime GB2325564B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9817494A Expired - Lifetime GB2325566B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9900937A Expired - Lifetime GB2329521B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9512659A Expired - Lifetime GB2290658B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9900929A Expired - Lifetime GB2329518B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9900940A Expired - Lifetime GB2329522B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9817491A Expired - Lifetime GB2329067B (en) | 1994-06-27 | 1995-06-21 | Electromagnetioc alignment and scanning apparatus |
GB9900935A Expired - Lifetime GB2329520B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9900926A Expired - Lifetime GB2329517B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
GB9900933A Expired - Lifetime GB2329519B (en) | 1994-06-27 | 1995-06-21 | Electromagnmetic alignment and scanning apparatus |
GB9817493A Expired - Lifetime GB2325565B (en) | 1994-06-27 | 1995-06-21 | Electromagnetic alignment and scanning apparatus |
Country Status (4)
Country | Link |
---|---|
JP (6) | JP3800616B2 (en) |
KR (7) | KR100281853B1 (en) |
GB (13) | GB2329516B (en) |
HK (12) | HK1025842A1 (en) |
Families Citing this family (64)
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DE69629087T2 (en) * | 1995-05-30 | 2004-04-22 | Asml Netherlands B.V. | POSITIONING DEVICE WITH A REFERENCE FRAME FOR A MEASURING SYSTEM |
JP3659529B2 (en) * | 1996-06-06 | 2005-06-15 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
JPH10521A (en) * | 1996-06-07 | 1998-01-06 | Nikon Corp | Support device |
US5821981A (en) * | 1996-07-02 | 1998-10-13 | Gerber Systems Corporation | Magnetically preloaded air bearing motion system for an imaging device |
US6222614B1 (en) * | 1996-12-06 | 2001-04-24 | Nikon Corporation | Exposure elements with a cable-relaying support |
DE69717975T2 (en) * | 1996-12-24 | 2003-05-28 | Asml Netherlands B.V., Veldhoven | POSITIONER BALANCED IN TWO DIRECTIONS, AND LITHOGRAPHIC DEVICE WITH SUCH A POSITIONER |
EP1450208A1 (en) * | 1997-03-10 | 2004-08-25 | ASML Netherlands B.V. | Lithographic apparatus having two object holders |
USRE40043E1 (en) | 1997-03-10 | 2008-02-05 | Asml Netherlands B.V. | Positioning device having two object holders |
US20010003028A1 (en) | 1997-09-19 | 2001-06-07 | Nikon Corporation | Scanning Exposure Method |
AU9095798A (en) | 1997-09-19 | 1999-04-12 | Nikon Corporation | Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby |
JP4164905B2 (en) * | 1997-09-25 | 2008-10-15 | 株式会社ニコン | Electromagnetic force motor, stage apparatus and exposure apparatus |
US6408045B1 (en) | 1997-11-11 | 2002-06-18 | Canon Kabushiki Kaisha | Stage system and exposure apparatus with the same |
WO1999025011A1 (en) * | 1997-11-12 | 1999-05-20 | Nikon Corporation | Projection exposure apparatus |
WO1999066542A1 (en) * | 1998-06-17 | 1999-12-23 | Nikon Corporation | Exposure method and exposure apparatus |
US6252234B1 (en) * | 1998-08-14 | 2001-06-26 | Nikon Corporation | Reaction force isolation system for a planar motor |
US6307284B1 (en) * | 1998-09-16 | 2001-10-23 | Canon Kabushiki Kaisha | Positioning apparatus, information recording/reproducing apparatus, and inspection apparatus |
WO2001045145A1 (en) * | 1999-12-16 | 2001-06-21 | Nikon Corporation | Exposure method and exposure apparatus |
EP1111469B1 (en) * | 1999-12-21 | 2007-10-17 | ASML Netherlands B.V. | Lithographic apparatus with a balanced positioning system |
US6836093B1 (en) | 1999-12-21 | 2004-12-28 | Nikon Corporation | Exposure method and apparatus |
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EP1128216B1 (en) | 2000-02-21 | 2008-11-26 | Sharp Kabushiki Kaisha | Precision stage device |
US7301605B2 (en) | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
KR100387243B1 (en) * | 2000-06-26 | 2003-06-12 | 삼성전자주식회사 | Electromagnetic x-y stage driver for the nano data storage system and method for fabricating the coils of the same |
JP2002170765A (en) * | 2000-12-04 | 2002-06-14 | Nikon Corp | Stage system and exposure system |
JP4021158B2 (en) * | 2001-04-27 | 2007-12-12 | 株式会社新川 | XY table in semiconductor manufacturing equipment |
JP2002343706A (en) * | 2001-05-18 | 2002-11-29 | Nikon Corp | Stage system and its driving method, exposing system and exposing method, and device and its fabricating method |
US6788385B2 (en) | 2001-06-21 | 2004-09-07 | Nikon Corporation | Stage device, exposure apparatus and method |
KR100391000B1 (en) * | 2001-06-30 | 2003-07-12 | 주식회사 하이닉스반도체 | Exposure device for semiconductor device |
CN100485902C (en) * | 2002-03-12 | 2009-05-06 | 浜松光子学株式会社 | Substrate dividing method |
KR100937318B1 (en) * | 2002-12-02 | 2010-01-18 | 두산인프라코어 주식회사 | Squareness Adjustment Device Of Feed Axes For Machining Center |
WO2004053942A2 (en) * | 2002-12-09 | 2004-06-24 | Acm Research, Inc. | Measuring alignment between a wafer chuck and polishing/plating receptacle |
EP1857880B1 (en) | 2003-04-09 | 2015-09-16 | Nikon Corporation | Exposure method and apparatus and device manufacturing method |
TWI360158B (en) | 2003-10-28 | 2012-03-11 | Nikon Corp | Projection exposure device,exposure method and dev |
TW201809801A (en) | 2003-11-20 | 2018-03-16 | 日商尼康股份有限公司 | Optical illuminating apparatus, exposure device, exposure method, and device manufacturing method |
KR101941351B1 (en) | 2003-12-15 | 2019-01-22 | 가부시키가이샤 니콘 | Stage system, exposure apparatus and exposure method |
JP4586367B2 (en) * | 2004-01-14 | 2010-11-24 | 株式会社ニコン | Stage apparatus and exposure apparatus |
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JP5130714B2 (en) * | 2004-04-09 | 2013-01-30 | 株式会社ニコン | Driving method for moving body, stage apparatus, exposure apparatus, exposure method, and device manufacturing method |
US20080192226A1 (en) | 2004-06-07 | 2008-08-14 | Nikon Corporation | Stage Unit, Exposure Apparatus, and Exposure Method |
KR101187611B1 (en) | 2004-09-01 | 2012-10-08 | 가부시키가이샤 니콘 | Substrate holder, stage apparatus, and exposure apparatus |
JP4541849B2 (en) * | 2004-11-22 | 2010-09-08 | キヤノン株式会社 | Positioning device |
US7557529B2 (en) | 2005-01-11 | 2009-07-07 | Nikon Corporation | Stage unit and exposure apparatus |
US7456935B2 (en) * | 2005-04-05 | 2008-11-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table |
KR101455551B1 (en) | 2005-05-12 | 2014-10-27 | 가부시키가이샤 니콘 | Projection optical system, exposure apparatus and exposure method |
US7292317B2 (en) * | 2005-06-08 | 2007-11-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing substrate stage compensating |
US7675201B2 (en) * | 2006-07-25 | 2010-03-09 | Asml Netherlands B.V. | Lithographic apparatus with planar motor driven support |
JP5141979B2 (en) * | 2006-09-29 | 2013-02-13 | 株式会社ニコン | Stage apparatus and exposure apparatus |
JP5267029B2 (en) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
JP4554715B2 (en) * | 2009-02-24 | 2010-09-29 | ファナック株式会社 | Linear drive with cable clamp or relay structure |
WO2010131485A1 (en) * | 2009-05-15 | 2010-11-18 | 株式会社ニコン | Mobile apparatus, power transmission apparatus, exposure apparatus, and device manufacturing method |
JP5651035B2 (en) * | 2011-02-09 | 2015-01-07 | 株式会社ソディック | Mobile device |
CN102887341A (en) * | 2011-07-22 | 2013-01-23 | 大银微系统股份有限公司 | Crossbeam pre-tensioning module of cantilever type platform |
CN103522079B (en) * | 2013-09-29 | 2016-01-06 | 天津大学 | Dual spring pretension flexible decoupling zero linear electric motors locating platform |
US9878386B2 (en) | 2013-10-31 | 2018-01-30 | Foundation Of Soongsil University-Industry Cooperation | Eccentric electrode for electric discharge machining, method of manufacturing the same, and micro electric discharge machining apparatus including the same |
CN103824792A (en) * | 2014-02-28 | 2014-05-28 | 上海和辉光电有限公司 | Storage cabinet and control method thereof |
JP5912143B2 (en) * | 2014-03-04 | 2016-04-27 | 株式会社新川 | Bonding equipment |
JP6379612B2 (en) * | 2014-04-11 | 2018-08-29 | 株式会社ニコン | MOBILE DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
CN107664920B (en) * | 2016-07-29 | 2019-04-12 | 上海微电子装备(集团)股份有限公司 | Electromagnetism track-type facilities |
WO2018046280A1 (en) * | 2016-09-09 | 2018-03-15 | Asml Holding N.V. | Lithographic apparatus and support structures background |
CN110328405B (en) * | 2019-08-09 | 2020-09-22 | 佛山市镭科智能设备有限公司 | Clamping control method for sectional material |
CN114043260B (en) * | 2022-01-13 | 2022-04-26 | 上海隐冠半导体技术有限公司 | Displacement device |
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-
1995
- 1995-06-09 JP JP14319095A patent/JP3800616B2/en not_active Expired - Lifetime
- 1995-06-21 GB GB9825844A patent/GB2329516B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9817492A patent/GB2325564B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9817494A patent/GB2325566B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9900937A patent/GB2329521B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9512659A patent/GB2290658B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9900929A patent/GB2329518B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9900940A patent/GB2329522B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9817491A patent/GB2329067B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9900935A patent/GB2329520B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9900926A patent/GB2329517B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9900933A patent/GB2329519B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9817493A patent/GB2325565B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9817490A patent/GB2325563B/en not_active Expired - Lifetime
- 1995-06-26 KR KR1019950018389A patent/KR100281853B1/en not_active IP Right Cessation
-
1998
- 1998-12-24 HK HK00103152A patent/HK1025842A1/en not_active IP Right Cessation
- 1998-12-24 HK HK01101431A patent/HK1035430A1/en not_active IP Right Cessation
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1999
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2002
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2006
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2007
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Legal Events
Date | Code | Title | Description |
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PE20 | Patent expired after termination of 20 years |
Expiry date: 20150620 |