DE69009841T2 - Linearantriebsgerät. - Google Patents
Linearantriebsgerät.Info
- Publication number
- DE69009841T2 DE69009841T2 DE69009841T DE69009841T DE69009841T2 DE 69009841 T2 DE69009841 T2 DE 69009841T2 DE 69009841 T DE69009841 T DE 69009841T DE 69009841 T DE69009841 T DE 69009841T DE 69009841 T2 DE69009841 T2 DE 69009841T2
- Authority
- DE
- Germany
- Prior art keywords
- drive device
- linear drive
- linear
- drive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J19/00—Character- or line-spacing mechanisms
- B41J19/18—Character-spacing or back-spacing mechanisms; Carriage return or release devices therefor
- B41J19/20—Positive-feed character-spacing mechanisms
- B41J19/30—Electromagnetically-operated mechanisms
- B41J19/305—Linear drive mechanisms for carriage movement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G03B27/522—Projection optics
- G03B27/525—Projection optics for slit exposure
- G03B27/526—Projection optics for slit exposure in which the projection optics move
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/04—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B33/00—Constructional parts, details or accessories not provided for in the other groups of this subclass
- G11B33/02—Cabinets; Cases; Stands; Disposition of apparatus therein or thereon
- G11B33/08—Insulation or absorption of undesired vibrations or sounds
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
- H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/04—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
- G03G15/043—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material with means for controlling illumination or exposure
- G03G15/0435—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material with means for controlling illumination or exposure by introducing an optical element in the optical path, e.g. a filter
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1098601A JPH0734642B2 (ja) | 1989-04-17 | 1989-04-17 | リニアモータ装置 |
JP1285380A JP2610525B2 (ja) | 1989-10-31 | 1989-10-31 | リニアモータ装置 |
JP1318678A JP2644053B2 (ja) | 1989-12-07 | 1989-12-07 | リニアモータ装置 |
JP2020208A JP2651731B2 (ja) | 1990-01-29 | 1990-01-29 | 複写機 |
JP2023274A JP2651733B2 (ja) | 1990-01-31 | 1990-01-31 | 直線駆動装置 |
JP2023273A JP2651732B2 (ja) | 1990-01-31 | 1990-01-31 | 直線駆動装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69009841D1 DE69009841D1 (de) | 1994-07-21 |
DE69009841T2 true DE69009841T2 (de) | 1994-12-22 |
Family
ID=27548908
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69009841T Expired - Lifetime DE69009841T2 (de) | 1989-04-17 | 1990-04-17 | Linearantriebsgerät. |
Country Status (3)
Country | Link |
---|---|
US (1) | US5208497A (de) |
EP (1) | EP0393994B1 (de) |
DE (1) | DE69009841T2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004057062A1 (de) * | 2004-11-25 | 2006-06-22 | Technische Universität Dresden | Lineardirektantriebsanordnung und Verfahren zu seiner Regelung |
Families Citing this family (61)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5153494A (en) * | 1990-04-06 | 1992-10-06 | International Business Machines Corp. | Ultrafast electro-dynamic x, y and theta positioning stage |
JP2752248B2 (ja) * | 1990-11-30 | 1998-05-18 | シャープ株式会社 | リニアモータ装置 |
NL9100407A (nl) * | 1991-03-07 | 1992-10-01 | Philips Nv | Optisch lithografische inrichting met een krachtgecompenseerd machinegestel. |
DE69322983T2 (de) * | 1992-02-21 | 1999-07-15 | Canon Kk | System zum Steuern von Trägerplatten |
US5338121A (en) * | 1992-07-24 | 1994-08-16 | Fujitsu Limited | Shuttle apparatus for printer |
US7365513B1 (en) | 1994-04-01 | 2008-04-29 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
US6989647B1 (en) * | 1994-04-01 | 2006-01-24 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
US5528118A (en) | 1994-04-01 | 1996-06-18 | Nikon Precision, Inc. | Guideless stage with isolated reaction stage |
US5874820A (en) * | 1995-04-04 | 1999-02-23 | Nikon Corporation | Window frame-guided stage mechanism |
JP3800616B2 (ja) * | 1994-06-27 | 2006-07-26 | 株式会社ニコン | 目標物移動装置、位置決め装置及び可動ステージ装置 |
US6246204B1 (en) | 1994-06-27 | 2001-06-12 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US5631506A (en) * | 1994-12-14 | 1997-05-20 | Tritium Technologies | Sloped facet electromagnetic actuator adapted for vibration compensation |
TW318255B (de) | 1995-05-30 | 1997-10-21 | Philips Electronics Nv | |
JP2000505958A (ja) * | 1996-12-24 | 2000-05-16 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 2個の物品ホルダを有する二次元バランス位置決め装置及びこの位置決め装置を有するリソグラフ装置 |
US5815246A (en) * | 1996-12-24 | 1998-09-29 | U.S. Philips Corporation | Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device |
US6262796B1 (en) | 1997-03-10 | 2001-07-17 | Asm Lithography B.V. | Positioning device having two object holders |
AU8747698A (en) | 1997-08-21 | 1999-03-16 | Nikon Corporation | Positioning device, driving unit, and aligner equipped with the device |
WO1999016113A1 (fr) * | 1997-09-19 | 1999-04-01 | Nikon Corporation | Platine, dispositif d'alignement de balayage et procede d'exposition de balayage, et dispositif fabrique par ce moyen |
US20010003028A1 (en) | 1997-09-19 | 2001-06-07 | Nikon Corporation | Scanning Exposure Method |
JP3535749B2 (ja) * | 1997-12-10 | 2004-06-07 | キヤノン株式会社 | ステージ装置、露光装置、並びにデバイス製造方法 |
JP3630964B2 (ja) * | 1997-12-26 | 2005-03-23 | キヤノン株式会社 | ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法 |
EP1134793A4 (de) * | 1998-06-17 | 2006-07-26 | Nikon Corp | Belichtungsmethode und belichtungsapparat |
JP3745167B2 (ja) * | 1998-07-29 | 2006-02-15 | キヤノン株式会社 | ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法 |
US6144118A (en) | 1998-09-18 | 2000-11-07 | General Scanning, Inc. | High-speed precision positioning apparatus |
US6208045B1 (en) | 1998-11-16 | 2001-03-27 | Nikon Corporation | Electric motors and positioning devices having moving magnet arrays and six degrees of freedom |
US6147421A (en) * | 1998-11-16 | 2000-11-14 | Nikon Corporation | Platform positionable in at least three degrees of freedom by interaction with coils |
JP4146952B2 (ja) * | 1999-01-11 | 2008-09-10 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
US6323494B1 (en) | 1999-04-09 | 2001-11-27 | Nikon Corporation | Vertical direction force transducer |
US6124687A (en) * | 1999-05-03 | 2000-09-26 | Raytheon Company | Apparatus for solving bearing life and torque compensation problems in systems with oscillating components |
JP2001118773A (ja) * | 1999-10-18 | 2001-04-27 | Nikon Corp | ステージ装置及び露光装置 |
JP2001160530A (ja) * | 1999-12-01 | 2001-06-12 | Nikon Corp | ステージ装置及び露光装置 |
TWI264617B (en) * | 1999-12-21 | 2006-10-21 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
TW546551B (en) | 1999-12-21 | 2003-08-11 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
DE60136667D1 (de) * | 2000-02-21 | 2009-01-08 | Sharp Kk | Präzisionsträgerplatte |
JP2001297960A (ja) | 2000-04-11 | 2001-10-26 | Nikon Corp | ステージ装置および露光装置 |
US6445093B1 (en) | 2000-06-26 | 2002-09-03 | Nikon Corporation | Planar motor with linear coil arrays |
US6452292B1 (en) | 2000-06-26 | 2002-09-17 | Nikon Corporation | Planar motor with linear coil arrays |
US6593997B1 (en) * | 2000-11-16 | 2003-07-15 | Nikon Corporation | Stage assembly including a reaction assembly |
US6603531B1 (en) * | 2000-11-16 | 2003-08-05 | Nikon Corporation | Stage assembly including a reaction assembly that is connected by actuators |
US6885430B2 (en) * | 2000-11-16 | 2005-04-26 | Nikon Corporation | System and method for resetting a reaction mass assembly of a stage assembly |
US6958808B2 (en) * | 2000-11-16 | 2005-10-25 | Nikon Corporation | System and method for resetting a reaction mass assembly of a stage assembly |
US6757053B1 (en) | 2000-11-16 | 2004-06-29 | Nikon Corporation | Stage assembly including a reaction mass assembly |
US6987558B2 (en) | 2001-01-16 | 2006-01-17 | Nikon Corporation | Reaction mass for a stage device |
ITTO20010142A1 (it) * | 2001-02-16 | 2002-08-16 | Pluritec S P A | Testa operatrice per una macchina utensile avente un mandrino girevole su un asse verticale. |
JP2002283174A (ja) * | 2001-03-26 | 2002-10-03 | Fanuc Ltd | 直線駆動装置 |
US6922025B2 (en) * | 2002-02-21 | 2005-07-26 | Anorad Corporation | Zero ripple linear motor system |
US7061577B2 (en) | 2002-03-26 | 2006-06-13 | Nikon Corporation | Image adjustor including damping assembly |
US6724466B2 (en) | 2002-03-26 | 2004-04-20 | Nikon Corporation | Stage assembly including a damping assembly |
US20040057817A1 (en) * | 2002-09-24 | 2004-03-25 | Hazelton Andrew J. | Switchable damping mechanism for use in a stage apparatus |
US20040119436A1 (en) * | 2002-12-23 | 2004-06-24 | Michael Binnard | Method and apparatus for reducing countermass stroke with initial velocity |
US6861771B2 (en) * | 2003-03-26 | 2005-03-01 | Asm Technology Singapore Pte. Ltd. | Active vibration attenuation |
US20040252287A1 (en) * | 2003-06-11 | 2004-12-16 | Michael Binnard | Reaction frame assembly that functions as a reaction mass |
US7221433B2 (en) | 2004-01-28 | 2007-05-22 | Nikon Corporation | Stage assembly including a reaction assembly having a connector assembly |
JP4071227B2 (ja) * | 2004-09-28 | 2008-04-02 | 株式会社新川 | ボンディング装置 |
US7193683B2 (en) * | 2005-01-06 | 2007-03-20 | Nikon Corporation | Stage design for reflective optics |
US7649613B2 (en) * | 2006-03-03 | 2010-01-19 | Asml Netherlands B.V. | Lithographic apparatus, method of controlling a component of a lithographic apparatus and device manufacturing method |
US20070268475A1 (en) * | 2006-05-16 | 2007-11-22 | Nikon Corporation | System and method for controlling a stage assembly |
JP4808590B2 (ja) * | 2006-10-26 | 2011-11-02 | 東芝機械株式会社 | リテーナの位置ずれ防止装置 |
US8267388B2 (en) * | 2007-09-12 | 2012-09-18 | Xradia, Inc. | Alignment assembly |
CN103057284B (zh) * | 2013-01-15 | 2015-12-09 | 深圳德康威尔科技有限公司 | 一种用于驱动打印头的驱动装置 |
CN109038995A (zh) * | 2018-10-23 | 2018-12-18 | 珠海格力电器股份有限公司 | 直线电机及其控制方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5785567A (en) * | 1980-11-14 | 1982-05-28 | Hitachi Ltd | Voice coil motor |
US4516231A (en) * | 1982-08-26 | 1985-05-07 | Rca Corporation | Optical disc system having momentum compensation |
JPS60182086A (ja) * | 1984-02-29 | 1985-09-17 | Hitachi Ltd | 制振装置 |
JPS61293740A (ja) * | 1985-06-21 | 1986-12-24 | Hiroshi Teramachi | テ−ブル移送装置 |
JPS632997A (ja) * | 1986-06-20 | 1988-01-07 | Hitachi Ltd | グルコ−スの除去方法 |
KR910007482B1 (ko) * | 1988-03-18 | 1991-09-26 | 가부시끼가이샤 히다찌세이사꾸쇼 | 리니어 액세스기구와 자기디스크장치 |
-
1990
- 1990-04-17 EP EP90304115A patent/EP0393994B1/de not_active Expired - Lifetime
- 1990-04-17 DE DE69009841T patent/DE69009841T2/de not_active Expired - Lifetime
- 1990-04-17 US US07/509,806 patent/US5208497A/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004057062A1 (de) * | 2004-11-25 | 2006-06-22 | Technische Universität Dresden | Lineardirektantriebsanordnung und Verfahren zu seiner Regelung |
DE102004057062B4 (de) * | 2004-11-25 | 2012-06-14 | Technische Universität Dresden | Lineardirektantriebsanordnung und Verfahren zu seiner Regelung |
Also Published As
Publication number | Publication date |
---|---|
EP0393994A3 (de) | 1991-03-06 |
US5208497A (en) | 1993-05-04 |
EP0393994B1 (de) | 1994-06-15 |
DE69009841D1 (de) | 1994-07-21 |
EP0393994A2 (de) | 1990-10-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Free format text: PATENTANWAELTE MUELLER & HOFFMANN, 81667 MUENCHEN |