HK1025842A1 - Electromagnetic alignment and scanning apparatus - Google Patents
Electromagnetic alignment and scanning apparatusInfo
- Publication number
- HK1025842A1 HK1025842A1 HK00103152A HK00103152A HK1025842A1 HK 1025842 A1 HK1025842 A1 HK 1025842A1 HK 00103152 A HK00103152 A HK 00103152A HK 00103152 A HK00103152 A HK 00103152A HK 1025842 A1 HK1025842 A1 HK 1025842A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- scanning apparatus
- electromagnetic alignment
- alignment
- electromagnetic
- scanning
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Computer Networks & Wireless Communication (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Toxicology (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Control Of Position Or Direction (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Machine Tool Units (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US26699994A | 1994-06-27 | 1994-06-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1025842A1 true HK1025842A1 (en) | 2000-11-24 |
Family
ID=23016891
Family Applications (12)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK00103151A HK1026767A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101433A HK1035432A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK98115706A HK1017824A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101430A HK1032291A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101432A HK1035431A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101436A HK1035435A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK00103149A HK1025841A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101434A HK1035433A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101431A HK1035430A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK00103148A HK1025840A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK00103152A HK1025842A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK00103150A HK1026766A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
Family Applications Before (10)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK00103151A HK1026767A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101433A HK1035432A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK98115706A HK1017824A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101430A HK1032291A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101432A HK1035431A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101436A HK1035435A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK00103149A HK1025841A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101434A HK1035433A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK01101431A HK1035430A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
HK00103148A HK1025840A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK00103150A HK1026766A1 (en) | 1994-06-27 | 1998-12-24 | Electromagnetic alignment and scanning apparatus |
Country Status (4)
Country | Link |
---|---|
JP (6) | JP3800616B2 (xx) |
KR (7) | KR100281853B1 (xx) |
GB (13) | GB2329518B (xx) |
HK (12) | HK1026767A1 (xx) |
Families Citing this family (64)
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---|---|---|---|---|
EP1341044A3 (en) * | 1995-05-30 | 2003-10-29 | ASML Netherlands B.V. | Positioning device with a reference frame for a measuring system |
JP3659529B2 (ja) * | 1996-06-06 | 2005-06-15 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
JPH10521A (ja) * | 1996-06-07 | 1998-01-06 | Nikon Corp | 支持装置 |
US5821981A (en) * | 1996-07-02 | 1998-10-13 | Gerber Systems Corporation | Magnetically preloaded air bearing motion system for an imaging device |
US6222614B1 (en) * | 1996-12-06 | 2001-04-24 | Nikon Corporation | Exposure elements with a cable-relaying support |
DE69735016T2 (de) * | 1996-12-24 | 2006-08-17 | Asml Netherlands B.V. | Lithographisches Gerät mit zwei Objekthaltern |
EP1450208A1 (en) * | 1997-03-10 | 2004-08-25 | ASML Netherlands B.V. | Lithographic apparatus having two object holders |
JP3626504B2 (ja) | 1997-03-10 | 2005-03-09 | アーエスエム リソグラフィ ベスローテン フェンノートシャップ | 2個の物品ホルダを有する位置決め装置 |
WO1999016113A1 (fr) * | 1997-09-19 | 1999-04-01 | Nikon Corporation | Platine, dispositif d'alignement de balayage et procede d'exposition de balayage, et dispositif fabrique par ce moyen |
US20010003028A1 (en) | 1997-09-19 | 2001-06-07 | Nikon Corporation | Scanning Exposure Method |
JP4164905B2 (ja) * | 1997-09-25 | 2008-10-15 | 株式会社ニコン | 電磁力モータ、ステージ装置および露光装置 |
US6408045B1 (en) * | 1997-11-11 | 2002-06-18 | Canon Kabushiki Kaisha | Stage system and exposure apparatus with the same |
AU1051999A (en) * | 1997-11-12 | 1999-05-31 | Nikon Corporation | Projection exposure apparatus |
KR20010043861A (ko) * | 1998-06-17 | 2001-05-25 | 오노 시게오 | 노광방법 및 장치 |
US6252234B1 (en) * | 1998-08-14 | 2001-06-26 | Nikon Corporation | Reaction force isolation system for a planar motor |
US6307284B1 (en) * | 1998-09-16 | 2001-10-23 | Canon Kabushiki Kaisha | Positioning apparatus, information recording/reproducing apparatus, and inspection apparatus |
AU1554901A (en) | 1999-12-16 | 2001-06-25 | Nikon Corporation | Exposure method and exposure apparatus |
TWI264617B (en) | 1999-12-21 | 2006-10-21 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
TW546551B (en) * | 1999-12-21 | 2003-08-11 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
US6836093B1 (en) | 1999-12-21 | 2004-12-28 | Nikon Corporation | Exposure method and apparatus |
EP1111469B1 (en) * | 1999-12-21 | 2007-10-17 | ASML Netherlands B.V. | Lithographic apparatus with a balanced positioning system |
EP1128216B1 (en) | 2000-02-21 | 2008-11-26 | Sharp Kabushiki Kaisha | Precision stage device |
US7301605B2 (en) | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
KR100387243B1 (ko) * | 2000-06-26 | 2003-06-12 | 삼성전자주식회사 | 초소형 정보저장기기용 x-y 스테이지 전자 구동 장치 및그 코일 제작 방법 |
JP2002170765A (ja) * | 2000-12-04 | 2002-06-14 | Nikon Corp | ステージ装置及び露光装置 |
JP4021158B2 (ja) * | 2001-04-27 | 2007-12-12 | 株式会社新川 | 半導体製造装置におけるxyテーブル |
JP2002343706A (ja) * | 2001-05-18 | 2002-11-29 | Nikon Corp | ステージ装置及びステージの駆動方法、露光装置及び露光方法、並びにデバイス及びその製造方法 |
US6788385B2 (en) | 2001-06-21 | 2004-09-07 | Nikon Corporation | Stage device, exposure apparatus and method |
KR100391000B1 (ko) * | 2001-06-30 | 2003-07-12 | 주식회사 하이닉스반도체 | 반도체 노광 장치 |
CN100355031C (zh) * | 2002-03-12 | 2007-12-12 | 浜松光子学株式会社 | 基板的分割方法 |
KR100937318B1 (ko) * | 2002-12-02 | 2010-01-18 | 두산인프라코어 주식회사 | 머시닝센터 이송축의 직각도 조정장치 |
AU2003297814A1 (en) * | 2002-12-09 | 2004-06-30 | Acm Research, Inc. | Measuring alignment between a wafer chuck and polishing/plating receptacle |
KR101547077B1 (ko) | 2003-04-09 | 2015-08-25 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
TWI573175B (zh) | 2003-10-28 | 2017-03-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法 |
TW201809801A (zh) | 2003-11-20 | 2018-03-16 | 日商尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
KR101119813B1 (ko) | 2003-12-15 | 2012-03-06 | 가부시키가이샤 니콘 | 스테이지 장치, 노광 장치, 및 노광 방법 |
JP4586367B2 (ja) * | 2004-01-14 | 2010-11-24 | 株式会社ニコン | ステージ装置及び露光装置 |
TWI389174B (zh) | 2004-02-06 | 2013-03-11 | 尼康股份有限公司 | 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法 |
JP5130714B2 (ja) | 2004-04-09 | 2013-01-30 | 株式会社ニコン | 移動体の駆動方法、ステージ装置、露光装置、露光方法、及びデバイス製造方法 |
KR101119814B1 (ko) | 2004-06-07 | 2012-03-06 | 가부시키가이샤 니콘 | 스테이지 장치, 노광 장치 및 노광 방법 |
JP4779973B2 (ja) | 2004-09-01 | 2011-09-28 | 株式会社ニコン | 基板ホルダ及びステージ装置並びに露光装置 |
JP4541849B2 (ja) * | 2004-11-22 | 2010-09-08 | キヤノン株式会社 | 位置決め装置 |
US7557529B2 (en) | 2005-01-11 | 2009-07-07 | Nikon Corporation | Stage unit and exposure apparatus |
US7456935B2 (en) * | 2005-04-05 | 2008-11-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table |
KR101455551B1 (ko) | 2005-05-12 | 2014-10-27 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
US7292317B2 (en) * | 2005-06-08 | 2007-11-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing substrate stage compensating |
US7675201B2 (en) * | 2006-07-25 | 2010-03-09 | Asml Netherlands B.V. | Lithographic apparatus with planar motor driven support |
WO2008041575A1 (fr) * | 2006-09-29 | 2008-04-10 | Nikon Corporation | Dispositif formant platine et dispositif d'exposition |
JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
JP4554715B2 (ja) * | 2009-02-24 | 2010-09-29 | ファナック株式会社 | ケーブルクランプまたは中継する構造を備えた直線駆動装置 |
KR101693168B1 (ko) * | 2009-05-15 | 2017-01-17 | 가부시키가이샤 니콘 | 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법 |
JP5651035B2 (ja) * | 2011-02-09 | 2015-01-07 | 株式会社ソディック | 移動装置 |
CN102887341A (zh) * | 2011-07-22 | 2013-01-23 | 大银微系统股份有限公司 | 悬臂式平台的横梁预拉模组 |
CN103522079B (zh) * | 2013-09-29 | 2016-01-06 | 天津大学 | 双弹簧预紧柔性解耦直线电机定位平台 |
US9878386B2 (en) | 2013-10-31 | 2018-01-30 | Foundation Of Soongsil University-Industry Cooperation | Eccentric electrode for electric discharge machining, method of manufacturing the same, and micro electric discharge machining apparatus including the same |
CN103824792A (zh) * | 2014-02-28 | 2014-05-28 | 上海和辉光电有限公司 | 一种储藏柜及控制方法 |
JP5912143B2 (ja) * | 2014-03-04 | 2016-04-27 | 株式会社新川 | ボンディング装置 |
JP6379612B2 (ja) * | 2014-04-11 | 2018-08-29 | 株式会社ニコン | 移動体装置及び露光装置、並びにデバイス製造方法 |
CN107664920B (zh) * | 2016-07-29 | 2019-04-12 | 上海微电子装备(集团)股份有限公司 | 电磁导轨装置 |
JP2019529970A (ja) * | 2016-09-09 | 2019-10-17 | エーエスエムエル ホールディング エヌ.ブイ. | リソグラフィ装置及びサポート構造背景 |
CN110328405B (zh) * | 2019-08-09 | 2020-09-22 | 佛山市镭科智能设备有限公司 | 一种型材的夹持控制方法 |
CN114043260B (zh) * | 2022-01-13 | 2022-04-26 | 上海隐冠半导体技术有限公司 | 位移装置 |
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EP0393994B1 (en) * | 1989-04-17 | 1994-06-15 | SHARP Corporation | A linear driving apparatus |
NL9100407A (nl) * | 1991-03-07 | 1992-10-01 | Philips Nv | Optisch lithografische inrichting met een krachtgecompenseerd machinegestel. |
JPH0529442A (ja) * | 1991-07-18 | 1993-02-05 | Toshiba Corp | テ−ブル装置 |
US5285142A (en) * | 1993-02-09 | 1994-02-08 | Svg Lithography Systems, Inc. | Wafer stage with reference surface |
JPH07260472A (ja) * | 1994-03-22 | 1995-10-13 | Nikon Corp | ステージ装置の直交度測定方法 |
US5528118A (en) * | 1994-04-01 | 1996-06-18 | Nikon Precision, Inc. | Guideless stage with isolated reaction stage |
JPH08229759A (ja) * | 1995-02-24 | 1996-09-10 | Canon Inc | 位置決め装置並びにデバイス製造装置及び方法 |
-
1995
- 1995-06-09 JP JP14319095A patent/JP3800616B2/ja not_active Expired - Lifetime
- 1995-06-21 GB GB9900929A patent/GB2329518B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9900940A patent/GB2329522B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9817494A patent/GB2325566B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9817490A patent/GB2325563B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9825844A patent/GB2329516B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9512659A patent/GB2290658B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9900926A patent/GB2329517B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9817491A patent/GB2329067B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9900935A patent/GB2329520B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9900933A patent/GB2329519B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9817492A patent/GB2325564B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9900937A patent/GB2329521B/en not_active Expired - Lifetime
- 1995-06-21 GB GB9817493A patent/GB2325565B/en not_active Expired - Lifetime
- 1995-06-26 KR KR1019950018389A patent/KR100281853B1/ko not_active IP Right Cessation
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1998
- 1998-12-24 HK HK00103151A patent/HK1026767A1/xx not_active IP Right Cessation
- 1998-12-24 HK HK01101433A patent/HK1035432A1/xx not_active IP Right Cessation
- 1998-12-24 HK HK98115706A patent/HK1017824A1/xx not_active IP Right Cessation
- 1998-12-24 HK HK01101430A patent/HK1032291A1/xx not_active IP Right Cessation
- 1998-12-24 HK HK01101432A patent/HK1035431A1/xx not_active IP Right Cessation
- 1998-12-24 HK HK01101436A patent/HK1035435A1/xx not_active IP Right Cessation
- 1998-12-24 HK HK00103149A patent/HK1025841A1/xx not_active IP Right Cessation
- 1998-12-24 HK HK01101434A patent/HK1035433A1/xx not_active IP Right Cessation
- 1998-12-24 HK HK01101431A patent/HK1035430A1/xx not_active IP Right Cessation
- 1998-12-24 HK HK00103148A patent/HK1025840A1/xx not_active IP Right Cessation
- 1998-12-24 HK HK00103152A patent/HK1025842A1/xx not_active IP Right Cessation
- 1998-12-24 HK HK00103150A patent/HK1026766A1/xx not_active IP Right Cessation
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1999
- 1999-02-05 KR KR1019990003984A patent/KR100281857B1/ko not_active IP Right Cessation
- 1999-02-05 KR KR1019990003982A patent/KR100281855B1/ko not_active IP Right Cessation
- 1999-02-05 KR KR1019990003992A patent/KR100281860B1/ko not_active IP Right Cessation
- 1999-02-05 KR KR1019990003983A patent/KR100281856B1/ko not_active IP Right Cessation
- 1999-02-05 KR KR1019990003989A patent/KR100281859B1/ko not_active IP Right Cessation
- 1999-02-05 KR KR1019990003987A patent/KR100281858B1/ko not_active IP Right Cessation
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2002
- 2002-10-21 JP JP2002305402A patent/JP3804786B2/ja not_active Expired - Lifetime
- 2002-10-21 JP JP2002305403A patent/JP3804787B2/ja not_active Expired - Lifetime
- 2002-10-21 JP JP2002305401A patent/JP3804785B2/ja not_active Expired - Lifetime
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2006
- 2006-03-17 JP JP2006075215A patent/JP4135188B2/ja not_active Expired - Lifetime
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2007
- 2007-03-30 JP JP2007094076A patent/JP4687911B2/ja not_active Expired - Lifetime
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Effective date: 20150620 |