JP3743273B2 - 電気光学装置の製造方法 - Google Patents

電気光学装置の製造方法 Download PDF

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Publication number
JP3743273B2
JP3743273B2 JP2000294325A JP2000294325A JP3743273B2 JP 3743273 B2 JP3743273 B2 JP 3743273B2 JP 2000294325 A JP2000294325 A JP 2000294325A JP 2000294325 A JP2000294325 A JP 2000294325A JP 3743273 B2 JP3743273 B2 JP 3743273B2
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contact hole
data line
film
opening
electro
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Expired - Fee Related
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JP2000294325A
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Japanese (ja)
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JP2002108244A (ja
JP2002108244A5 (enExample
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尚 佐藤
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Seiko Epson Corp
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Seiko Epson Corp
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  • Liquid Crystal (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP2000294325A 2000-09-27 2000-09-27 電気光学装置の製造方法 Expired - Fee Related JP3743273B2 (ja)

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JP2000294325A JP3743273B2 (ja) 2000-09-27 2000-09-27 電気光学装置の製造方法

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JP2000294325A JP3743273B2 (ja) 2000-09-27 2000-09-27 電気光学装置の製造方法

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JP2002108244A JP2002108244A (ja) 2002-04-10
JP2002108244A5 JP2002108244A5 (enExample) 2005-02-24
JP3743273B2 true JP3743273B2 (ja) 2006-02-08

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102749779A (zh) * 2012-05-28 2012-10-24 友达光电股份有限公司 像素阵列基板、显示面板、接触窗结构及其制造方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI269248B (en) 2002-05-13 2006-12-21 Semiconductor Energy Lab Display device
KR100635061B1 (ko) 2004-03-09 2006-10-17 삼성에스디아이 주식회사 평판 표시 장치 및 그의 제조 방법
JP4211674B2 (ja) 2004-05-12 2009-01-21 セイコーエプソン株式会社 半導体装置及びその製造方法、電気光学装置及びその製造方法、並びに電子機器
JP4315074B2 (ja) * 2004-07-15 2009-08-19 セイコーエプソン株式会社 半導体装置用基板及びその製造方法、電気光学装置用基板、電気光学装置並びに電子機器
JP4655943B2 (ja) * 2006-01-18 2011-03-23 セイコーエプソン株式会社 電気光学装置及びその製造方法、並びに導電層の接続構造
JP4910706B2 (ja) * 2007-01-05 2012-04-04 セイコーエプソン株式会社 電気光学装置の製造方法
JP2008191470A (ja) * 2007-02-06 2008-08-21 Toshiba Matsushita Display Technology Co Ltd 液晶表示装置
JP5352333B2 (ja) * 2009-04-23 2013-11-27 株式会社ジャパンディスプレイ アクティブマトリクス型表示装置
JP5535147B2 (ja) * 2011-08-03 2014-07-02 株式会社ジャパンディスプレイ 表示装置及び表示装置の製造方法
US9293480B2 (en) * 2013-07-10 2016-03-22 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and display device including the semiconductor device
JP6908086B2 (ja) * 2019-10-29 2021-07-21 セイコーエプソン株式会社 電気光学装置、電気光学装置の製造方法および電子機器
WO2021130592A1 (ja) * 2019-12-27 2021-07-01 株式会社半導体エネルギー研究所 半導体装置、および半導体装置の作製方法
JP2024033405A (ja) * 2022-08-30 2024-03-13 株式会社ジャパンディスプレイ 表示装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0990425A (ja) * 1995-09-19 1997-04-04 Sony Corp 表示装置
JPH1054995A (ja) * 1996-06-06 1998-02-24 Pioneer Electron Corp 反射型液晶表示装置
JP3716580B2 (ja) * 1997-02-27 2005-11-16 セイコーエプソン株式会社 液晶装置及びその製造方法、並びに投写型表示装置
JPH1195687A (ja) * 1997-09-20 1999-04-09 Semiconductor Energy Lab Co Ltd 表示装置
TW486581B (en) * 1998-01-06 2002-05-11 Seiko Epson Corp Semiconductor device, substrate for electro-optical device, electro-optical device, electronic equipment, and projection display apparatus
JP3820743B2 (ja) * 1998-03-30 2006-09-13 セイコーエプソン株式会社 アクティブマトリクス基板およびアクティブマトリクス基板の製造方法および表示装置
JP3690119B2 (ja) * 1998-06-23 2005-08-31 セイコーエプソン株式会社 液晶装置及び投射型表示装置
JP2000077667A (ja) * 1998-08-28 2000-03-14 Seiko Epson Corp 半導体装置の製造方法
KR100469109B1 (ko) * 1998-11-26 2005-02-02 세이코 엡슨 가부시키가이샤 전기 광학 장치 및 그 제조방법 및 전자기기
JP3767221B2 (ja) * 1999-01-11 2006-04-19 セイコーエプソン株式会社 電気光学装置及びその製造方法
EP1081537A1 (en) * 1999-09-03 2001-03-07 Alcatel Method for processing conductive layer structures and devices including such conductive layer structures
JP3374911B2 (ja) * 1999-09-30 2003-02-10 日本電気株式会社 透過液晶パネル、画像表示装置、パネル製造方法
JP3608531B2 (ja) * 2000-08-31 2005-01-12 セイコーエプソン株式会社 電気光学装置及び投射型表示装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102749779A (zh) * 2012-05-28 2012-10-24 友达光电股份有限公司 像素阵列基板、显示面板、接触窗结构及其制造方法
CN102749779B (zh) * 2012-05-28 2015-06-24 友达光电股份有限公司 像素阵列基板、显示面板、接触窗结构及其制造方法

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