JP3691047B1 - 高純度活性珪酸水溶液の製造方法 - Google Patents

高純度活性珪酸水溶液の製造方法 Download PDF

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Publication number
JP3691047B1
JP3691047B1 JP2004222730A JP2004222730A JP3691047B1 JP 3691047 B1 JP3691047 B1 JP 3691047B1 JP 2004222730 A JP2004222730 A JP 2004222730A JP 2004222730 A JP2004222730 A JP 2004222730A JP 3691047 B1 JP3691047 B1 JP 3691047B1
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JP
Japan
Prior art keywords
aqueous solution
active silicic
acid
silicic acid
chelating agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004222730A
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English (en)
Japanese (ja)
Other versions
JP2006036612A (ja
Inventor
邦明 前島
慎介 宮部
昌宏 泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP2004222730A priority Critical patent/JP3691047B1/ja
Priority to TW094122539A priority patent/TW200610730A/zh
Priority to KR1020050069217A priority patent/KR101185696B1/ko
Application granted granted Critical
Publication of JP3691047B1 publication Critical patent/JP3691047B1/ja
Publication of JP2006036612A publication Critical patent/JP2006036612A/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/10—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
    • B01J20/103—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate comprising silica
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/08—Silica
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
JP2004222730A 2004-07-30 2004-07-30 高純度活性珪酸水溶液の製造方法 Expired - Fee Related JP3691047B1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004222730A JP3691047B1 (ja) 2004-07-30 2004-07-30 高純度活性珪酸水溶液の製造方法
TW094122539A TW200610730A (en) 2004-07-30 2005-07-04 Method for producing high-purity active silicic acid aqueous solution
KR1020050069217A KR101185696B1 (ko) 2004-07-30 2005-07-29 고순도 활성 규산 수용액의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004222730A JP3691047B1 (ja) 2004-07-30 2004-07-30 高純度活性珪酸水溶液の製造方法

Publications (2)

Publication Number Publication Date
JP3691047B1 true JP3691047B1 (ja) 2005-08-31
JP2006036612A JP2006036612A (ja) 2006-02-09

Family

ID=35004129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004222730A Expired - Fee Related JP3691047B1 (ja) 2004-07-30 2004-07-30 高純度活性珪酸水溶液の製造方法

Country Status (3)

Country Link
JP (1) JP3691047B1 (enExample)
KR (1) KR101185696B1 (enExample)
TW (1) TW200610730A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012113650A3 (de) * 2011-02-22 2012-11-22 Evonik Degussa Gmbh Verfahren zur herstellung wässriger kolloidaler silikasole hoher reinheit aus alkalimetallsilikatlösungen
KR20180068958A (ko) 2015-10-20 2018-06-22 닛산 가가쿠 고교 가부시키 가이샤 정제된 규산수용액의 제조방법
JPWO2020262406A1 (enExample) * 2019-06-24 2020-12-30
CN113603098A (zh) * 2021-07-05 2021-11-05 航天特种材料及工艺技术研究所 一种低成本制备高纯硅酸的方法
CN113929102A (zh) * 2021-11-24 2022-01-14 航天特种材料及工艺技术研究所 一种利用螯合原理制备高纯硅酸的方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011017783A1 (de) 2011-04-29 2012-10-31 Evonik Degussa Gmbh Verfahren zur Herstellung wässriger kolloidaler Silikasole hoher Reinheit aus Alkalimetallsilikatlösungen
DE102011004534A1 (de) 2011-02-22 2012-08-23 Evonik Degussa Gmbh Verfahren zur Herstellung wässriger kolloidaler Silikasole hoher Reinheit aus Alkalimetallsilikatlösungen
CN102092735B (zh) * 2011-03-11 2013-01-16 福建海能新材料有限公司 一种水玻璃的纯化方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW530029B (en) * 1999-11-17 2003-05-01 Akzo Nobel Nv A method for manufacturing of silica sols

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012113650A3 (de) * 2011-02-22 2012-11-22 Evonik Degussa Gmbh Verfahren zur herstellung wässriger kolloidaler silikasole hoher reinheit aus alkalimetallsilikatlösungen
US10065865B2 (en) 2011-02-22 2018-09-04 Evonik Degussa Gmbh Process for preparing aqueous colloidal silica sols of high purity from alkali metal silicate solutions
KR20180068958A (ko) 2015-10-20 2018-06-22 닛산 가가쿠 고교 가부시키 가이샤 정제된 규산수용액의 제조방법
CN108349741A (zh) * 2015-10-20 2018-07-31 日产化学工业株式会社 经纯化的硅酸水溶液的制造方法
JPWO2017069065A1 (ja) * 2015-10-20 2018-08-09 日産化学工業株式会社 精製された珪酸水溶液の製造方法
US10865113B2 (en) 2015-10-20 2020-12-15 Nissan Chemical Industries, Ltd. Method for producing purified aqueous solution of silicic acid
JPWO2020262406A1 (enExample) * 2019-06-24 2020-12-30
WO2020262406A1 (ja) * 2019-06-24 2020-12-30 日産化学株式会社 キレート剤含有水ガラス及びシリカゾルの製造方法
CN114007981A (zh) * 2019-06-24 2022-02-01 日产化学株式会社 含有螯合剂的水玻璃及硅溶胶的制造方法
JP7663074B2 (ja) 2019-06-24 2025-04-16 日産化学株式会社 キレート剤含有水ガラス及びシリカゾルの製造方法
CN113603098A (zh) * 2021-07-05 2021-11-05 航天特种材料及工艺技术研究所 一种低成本制备高纯硅酸的方法
CN113929102A (zh) * 2021-11-24 2022-01-14 航天特种材料及工艺技术研究所 一种利用螯合原理制备高纯硅酸的方法
CN113929102B (zh) * 2021-11-24 2023-06-20 航天特种材料及工艺技术研究所 一种利用螯合原理制备高纯硅酸的方法

Also Published As

Publication number Publication date
JP2006036612A (ja) 2006-02-09
TWI367862B (enExample) 2012-07-11
KR101185696B1 (ko) 2012-09-24
KR20060048899A (ko) 2006-05-18
TW200610730A (en) 2006-04-01

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