TW200610730A - Method for producing high-purity active silicic acid aqueous solution - Google Patents

Method for producing high-purity active silicic acid aqueous solution

Info

Publication number
TW200610730A
TW200610730A TW094122539A TW94122539A TW200610730A TW 200610730 A TW200610730 A TW 200610730A TW 094122539 A TW094122539 A TW 094122539A TW 94122539 A TW94122539 A TW 94122539A TW 200610730 A TW200610730 A TW 200610730A
Authority
TW
Taiwan
Prior art keywords
aqueous solution
silicic acid
acid aqueous
active silicic
chelating agent
Prior art date
Application number
TW094122539A
Other languages
English (en)
Chinese (zh)
Other versions
TWI367862B (enExample
Inventor
Kuniaki Maejima
Shinsuke Miyabe
Masahiro Izumi
Original Assignee
Nippon Chemical Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Ind filed Critical Nippon Chemical Ind
Publication of TW200610730A publication Critical patent/TW200610730A/zh
Application granted granted Critical
Publication of TWI367862B publication Critical patent/TWI367862B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141Preparation of hydrosols or aqueous dispersions
    • C01B33/142Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C01B33/143Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/10Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
    • B01J20/103Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate comprising silica
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/08Silica
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
TW094122539A 2004-07-30 2005-07-04 Method for producing high-purity active silicic acid aqueous solution TW200610730A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004222730A JP3691047B1 (ja) 2004-07-30 2004-07-30 高純度活性珪酸水溶液の製造方法

Publications (2)

Publication Number Publication Date
TW200610730A true TW200610730A (en) 2006-04-01
TWI367862B TWI367862B (enExample) 2012-07-11

Family

ID=35004129

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094122539A TW200610730A (en) 2004-07-30 2005-07-04 Method for producing high-purity active silicic acid aqueous solution

Country Status (3)

Country Link
JP (1) JP3691047B1 (enExample)
KR (1) KR101185696B1 (enExample)
TW (1) TW200610730A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103403124A (zh) * 2011-02-22 2013-11-20 赢创德固赛有限公司 由碱金属硅酸盐溶液制备高纯度含水胶态二氧化硅溶胶的方法
CN113929102A (zh) * 2021-11-24 2022-01-14 航天特种材料及工艺技术研究所 一种利用螯合原理制备高纯硅酸的方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011017783A1 (de) 2011-04-29 2012-10-31 Evonik Degussa Gmbh Verfahren zur Herstellung wässriger kolloidaler Silikasole hoher Reinheit aus Alkalimetallsilikatlösungen
DE102011004534A1 (de) 2011-02-22 2012-08-23 Evonik Degussa Gmbh Verfahren zur Herstellung wässriger kolloidaler Silikasole hoher Reinheit aus Alkalimetallsilikatlösungen
CN102092735B (zh) * 2011-03-11 2013-01-16 福建海能新材料有限公司 一种水玻璃的纯化方法
EP3366641B1 (en) * 2015-10-20 2021-05-05 Nissan Chemical Corporation Method for producing purified aqueous solution of silicic acid
JP7663074B2 (ja) * 2019-06-24 2025-04-16 日産化学株式会社 キレート剤含有水ガラス及びシリカゾルの製造方法
CN113603098A (zh) * 2021-07-05 2021-11-05 航天特种材料及工艺技术研究所 一种低成本制备高纯硅酸的方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW530029B (en) * 1999-11-17 2003-05-01 Akzo Nobel Nv A method for manufacturing of silica sols

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103403124A (zh) * 2011-02-22 2013-11-20 赢创德固赛有限公司 由碱金属硅酸盐溶液制备高纯度含水胶态二氧化硅溶胶的方法
CN103403124B (zh) * 2011-02-22 2015-09-30 赢创德固赛有限公司 由碱金属硅酸盐溶液制备高纯度含水胶态二氧化硅溶胶的方法
CN113929102A (zh) * 2021-11-24 2022-01-14 航天特种材料及工艺技术研究所 一种利用螯合原理制备高纯硅酸的方法

Also Published As

Publication number Publication date
JP2006036612A (ja) 2006-02-09
TWI367862B (enExample) 2012-07-11
JP3691047B1 (ja) 2005-08-31
KR101185696B1 (ko) 2012-09-24
KR20060048899A (ko) 2006-05-18

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees