TR200200276T2 - Yüksek saflıkta stabilize edilmiş hidroksilamin çözeltilerinin imalat yöntemi - Google Patents
Yüksek saflıkta stabilize edilmiş hidroksilamin çözeltilerinin imalat yöntemiInfo
- Publication number
- TR200200276T2 TR200200276T2 TR2002/00276T TR200200276T TR200200276T2 TR 200200276 T2 TR200200276 T2 TR 200200276T2 TR 2002/00276 T TR2002/00276 T TR 2002/00276T TR 200200276 T TR200200276 T TR 200200276T TR 200200276 T2 TR200200276 T2 TR 200200276T2
- Authority
- TR
- Turkey
- Prior art keywords
- manufacturing
- high purity
- hydroxylamine solutions
- stabilized hydroxylamine
- purity stabilized
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/14—Hydroxylamine; Salts thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/14—Hydroxylamine; Salts thereof
- C01B21/149—Stabilisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
- B01J39/04—Processes using organic exchangers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J41/00—Anion exchange; Use of material as anion exchangers; Treatment of material for improving the anion exchange properties
- B01J41/04—Processes using organic exchangers
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/14—Hydroxylamine; Salts thereof
- C01B21/1481—Purification
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Medicines Containing Plant Substances (AREA)
Abstract
Isbu bulus, yüksek saflikta stabilize edilmis hidroksilamin çözeltilerinin imal edilmesine iliskin edilmesine iliskin bir yöntemle ilgili olup, sulu bir hidrosilamin çikis çözeltisi, anyonlarin ayristirilmasi için önceden bir hidroksilamin-stabilizatörü ile yüklenmis olan bir anyon degistirici ile islemden geçirilmektedir.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19936594A DE19936594A1 (de) | 1999-08-04 | 1999-08-04 | Verfahren zur Herstellung von hochreinen stabilisierten Hydroxylaminlösungen |
Publications (1)
Publication Number | Publication Date |
---|---|
TR200200276T2 true TR200200276T2 (tr) | 2002-06-21 |
Family
ID=7917086
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TR2002/00276T TR200200276T2 (tr) | 1999-08-04 | 2000-08-03 | Yüksek saflıkta stabilize edilmiş hidroksilamin çözeltilerinin imalat yöntemi |
Country Status (19)
Country | Link |
---|---|
US (1) | US6534681B1 (tr) |
EP (1) | EP1200340B1 (tr) |
JP (1) | JP4948727B2 (tr) |
KR (1) | KR20020048384A (tr) |
CN (1) | CN1367757A (tr) |
AT (1) | ATE344785T1 (tr) |
AU (1) | AU6570000A (tr) |
BR (1) | BR0012912A (tr) |
CA (1) | CA2380826A1 (tr) |
DE (2) | DE19936594A1 (tr) |
DK (1) | DK1200340T3 (tr) |
ES (1) | ES2275533T3 (tr) |
IL (1) | IL147535A0 (tr) |
MX (1) | MXPA02001050A (tr) |
NO (1) | NO20020462L (tr) |
PT (1) | PT1200340E (tr) |
TR (1) | TR200200276T2 (tr) |
TW (1) | TW487679B (tr) |
WO (1) | WO2001010777A1 (tr) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1434735B1 (en) * | 2001-10-03 | 2006-10-25 | BASF Aktiengesellschaft | Stabilized hydroxylamine solutions |
DE10314492B4 (de) * | 2003-03-27 | 2008-10-16 | Domo Caproleuna Gmbh | Verfahren zur Herstellung einer wässrigen Lösung von Hydroxylamin |
JP4578885B2 (ja) * | 2003-08-13 | 2010-11-10 | 昭和電工株式会社 | ヒドロキシルアミンの製造方法 |
US7396519B2 (en) * | 2004-01-26 | 2008-07-08 | San Fu Chemical Company, Ltd. | Preparation of a high purity and high concentration hydroxylamine free base |
JP4578999B2 (ja) * | 2005-02-10 | 2010-11-10 | 昭和電工株式会社 | ヒドロキシルアミンの製造方法 |
JP4578998B2 (ja) * | 2005-02-10 | 2010-11-10 | 昭和電工株式会社 | ヒドロキシルアミンの製造方法 |
US8062429B2 (en) * | 2007-10-29 | 2011-11-22 | Ekc Technology, Inc. | Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions |
US8802609B2 (en) | 2007-10-29 | 2014-08-12 | Ekc Technology Inc | Nitrile and amidoxime compounds and methods of preparation for semiconductor processing |
CN101910057A (zh) * | 2007-10-29 | 2010-12-08 | Ekc技术公司 | 稳定的含羟胺溶液和其制备方法 |
WO2009058274A1 (en) * | 2007-10-29 | 2009-05-07 | Ekc Technology, Inc. | Chemical mechanical polishing and wafer cleaning composition comprising amidoxime compounds and associated method for use |
WO2009058272A1 (en) * | 2007-10-29 | 2009-05-07 | Ekc Technology, Inc. | Copper cmp polishing pad cleaning composition comprising of amidoxime compounds |
TWI490191B (zh) * | 2007-10-29 | 2015-07-01 | Ekc Technology Inc | 含醯胺肟化合物之半導體加工組成物 |
US7838483B2 (en) * | 2008-10-29 | 2010-11-23 | Ekc Technology, Inc. | Process of purification of amidoxime containing cleaning solutions and their use |
US20100105595A1 (en) * | 2008-10-29 | 2010-04-29 | Wai Mun Lee | Composition comprising chelating agents containing amidoxime compounds |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3661996A (en) * | 1969-02-24 | 1972-05-09 | Polaroid Corp | Purification of n-substituted hydroxylamines |
US4202765A (en) * | 1977-10-28 | 1980-05-13 | Allied Chemical Corporation | Hydroxylamine purification via cation exchange |
US4147623A (en) | 1977-10-28 | 1979-04-03 | Allied Chemical Corporation | Hydroxylamine purification via ion exclusion |
DE3608495A1 (de) * | 1986-03-14 | 1987-09-17 | Basf Ag | Verfahren zur herstellung von waessrigen loesungen von hydroxylamin |
JP2775992B2 (ja) * | 1990-05-14 | 1998-07-16 | 東亞合成株式会社 | ヒドロキシルアミンの製造法 |
US5266290A (en) | 1992-07-10 | 1993-11-30 | Thiokol Corporation | Process for making high purity hydroxylammonium nitrate |
HRP960601B1 (en) | 1995-12-20 | 2001-12-31 | Basf Ag | Process for separating medium boiling substances from a mixture of low, medium and high boiling substances |
DE19725851A1 (de) | 1997-06-18 | 1998-12-24 | Basf Ag | Verfahren zur Herstellung hochreiner, wässriger Hydroxylaminlösungen |
US5788946A (en) | 1997-07-16 | 1998-08-04 | Ashland Inc. | Purification of hydroxylamine |
DE19733681A1 (de) * | 1997-08-04 | 1999-02-11 | Basf Ag | Verfahren zur Herstellung einer wäßrigen Lösung von freiem Hydroxylamin |
JP4395257B2 (ja) * | 1997-08-15 | 2010-01-06 | サッチェム, インコーポレイテッド | 触媒フィルム、触媒フィルムの作製方法、および触媒フィルムを用いる化合物の電気的合成 |
US5872295A (en) * | 1998-02-13 | 1999-02-16 | Concept Sciences, Inc. | Purification of hydroxylamine |
DE19806578A1 (de) | 1998-02-17 | 1999-08-19 | Basf Ag | Verfahren zur Herstellung wäßriger, im wesentlichen metallionenfreier Hydroxylaminlösungen |
-
1999
- 1999-08-04 DE DE19936594A patent/DE19936594A1/de not_active Withdrawn
-
2000
- 2000-08-02 TW TW089115503A patent/TW487679B/zh active
- 2000-08-03 IL IL14753500A patent/IL147535A0/xx unknown
- 2000-08-03 DK DK00953150T patent/DK1200340T3/da active
- 2000-08-03 PT PT00953150T patent/PT1200340E/pt unknown
- 2000-08-03 AU AU65700/00A patent/AU6570000A/en not_active Abandoned
- 2000-08-03 ES ES00953150T patent/ES2275533T3/es not_active Expired - Lifetime
- 2000-08-03 CA CA002380826A patent/CA2380826A1/en not_active Abandoned
- 2000-08-03 JP JP2001515251A patent/JP4948727B2/ja not_active Expired - Lifetime
- 2000-08-03 BR BR0012912-7A patent/BR0012912A/pt not_active Application Discontinuation
- 2000-08-03 US US10/048,555 patent/US6534681B1/en not_active Expired - Lifetime
- 2000-08-03 WO PCT/EP2000/007542 patent/WO2001010777A1/de active IP Right Grant
- 2000-08-03 DE DE50013723T patent/DE50013723D1/de not_active Expired - Lifetime
- 2000-08-03 AT AT00953150T patent/ATE344785T1/de active
- 2000-08-03 EP EP00953150A patent/EP1200340B1/de not_active Expired - Lifetime
- 2000-08-03 MX MXPA02001050A patent/MXPA02001050A/es not_active Application Discontinuation
- 2000-08-03 KR KR1020027001487A patent/KR20020048384A/ko not_active Application Discontinuation
- 2000-08-03 TR TR2002/00276T patent/TR200200276T2/tr unknown
- 2000-08-03 CN CN00811108A patent/CN1367757A/zh active Pending
-
2002
- 2002-01-29 NO NO20020462A patent/NO20020462L/no unknown
Also Published As
Publication number | Publication date |
---|---|
EP1200340B1 (de) | 2006-11-08 |
DE50013723D1 (de) | 2006-12-21 |
NO20020462D0 (no) | 2002-01-29 |
MXPA02001050A (es) | 2002-08-20 |
ATE344785T1 (de) | 2006-11-15 |
AU6570000A (en) | 2001-03-05 |
DE19936594A1 (de) | 2001-02-08 |
DK1200340T3 (da) | 2007-03-12 |
IL147535A0 (en) | 2002-08-14 |
JP2003509316A (ja) | 2003-03-11 |
BR0012912A (pt) | 2002-04-23 |
ES2275533T3 (es) | 2007-06-16 |
CA2380826A1 (en) | 2001-02-15 |
NO20020462L (no) | 2002-01-29 |
TW487679B (en) | 2002-05-21 |
JP4948727B2 (ja) | 2012-06-06 |
US6534681B1 (en) | 2003-03-18 |
WO2001010777A1 (de) | 2001-02-15 |
EP1200340A1 (de) | 2002-05-02 |
PT1200340E (pt) | 2007-02-28 |
KR20020048384A (ko) | 2002-06-22 |
CN1367757A (zh) | 2002-09-04 |
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