JPWO2020262406A1 - - Google Patents

Info

Publication number
JPWO2020262406A1
JPWO2020262406A1 JP2021527659A JP2021527659A JPWO2020262406A1 JP WO2020262406 A1 JPWO2020262406 A1 JP WO2020262406A1 JP 2021527659 A JP2021527659 A JP 2021527659A JP 2021527659 A JP2021527659 A JP 2021527659A JP WO2020262406 A1 JPWO2020262406 A1 JP WO2020262406A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021527659A
Other languages
Japanese (ja)
Other versions
JP7663074B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2020262406A1 publication Critical patent/JPWO2020262406A1/ja
Application granted granted Critical
Publication of JP7663074B2 publication Critical patent/JP7663074B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/20—Silicates
    • C01B33/32—Alkali metal silicates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/145—Preparation of hydroorganosols, organosols or dispersions in an organic medium
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C229/02—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
    • C07C229/04—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
    • C07C229/06—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton
    • C07C229/10—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C07C229/16—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of hydrocarbon radicals substituted by amino or carboxyl groups, e.g. ethylenediamine-tetra-acetic acid, iminodiacetic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/01—Saturated compounds having only one carboxyl group and containing hydroxy or O-metal groups
    • C07C59/10—Polyhydroxy carboxylic acids
    • C07C59/105—Polyhydroxy carboxylic acids having five or more carbon atoms, e.g. aldonic acids
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Silicon Compounds (AREA)
JP2021527659A 2019-06-24 2020-06-23 キレート剤含有水ガラス及びシリカゾルの製造方法 Active JP7663074B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019116288 2019-06-24
JP2019116288 2019-06-24
PCT/JP2020/024667 WO2020262406A1 (ja) 2019-06-24 2020-06-23 キレート剤含有水ガラス及びシリカゾルの製造方法

Publications (2)

Publication Number Publication Date
JPWO2020262406A1 true JPWO2020262406A1 (enExample) 2020-12-30
JP7663074B2 JP7663074B2 (ja) 2025-04-16

Family

ID=74060614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021527659A Active JP7663074B2 (ja) 2019-06-24 2020-06-23 キレート剤含有水ガラス及びシリカゾルの製造方法

Country Status (4)

Country Link
JP (1) JP7663074B2 (enExample)
CN (1) CN114007981A (enExample)
TW (1) TWI888388B (enExample)
WO (1) WO2020262406A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113149021B (zh) * 2021-04-14 2022-12-27 上海都进新材料科技有限公司 一种节能降耗生产硅溶胶的方法
CN113929102B (zh) * 2021-11-24 2023-06-20 航天特种材料及工艺技术研究所 一种利用螯合原理制备高纯硅酸的方法
CN116002691A (zh) * 2022-12-01 2023-04-25 航天特种材料及工艺技术研究所 一种去除硅酸中高价金属离子杂质的方法
JPWO2024253205A1 (enExample) * 2023-06-08 2024-12-12
WO2025164297A1 (ja) * 2024-01-31 2025-08-07 株式会社トクヤマ 高純度ケイ酸ナトリウム水溶液及びその製造方法
CN118754131A (zh) * 2024-06-17 2024-10-11 山东金亿达新材料有限公司 一种水溶性原硅酸及其制备方法和应用

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0481526B2 (enExample) * 1985-07-11 1992-12-24 Nippon Chemical Ind
JPH055766B2 (enExample) * 1985-01-31 1993-01-25 Nippon Chemical Ind
JP2000247625A (ja) * 1999-03-04 2000-09-12 Nippon Chem Ind Co Ltd 高純度シリカゾル及びその製造方法
JP2005179159A (ja) * 2003-12-24 2005-07-07 Dokai Chemical Industries Co Ltd 高純度シリカゲルの製造方法
JP3691048B1 (ja) * 2004-08-09 2005-08-31 日本化学工業株式会社 高純度コロイダルシリカの製造方法
JP3691047B1 (ja) * 2004-07-30 2005-08-31 日本化学工業株式会社 高純度活性珪酸水溶液の製造方法
JP2005289702A (ja) * 2004-03-31 2005-10-20 Fuji Kagaku Kk ケイ酸ソーダ含有組成物及びその製造方法
JP2006036605A (ja) * 2004-07-29 2006-02-09 Catalysts & Chem Ind Co Ltd 高純度水性シリカゾルの製造方法
JP2013032276A (ja) * 2005-08-10 2013-02-14 Jgc Catalysts & Chemicals Ltd 異形シリカゾル

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1155514A (zh) * 1996-01-25 1997-07-30 天津市化学试剂一厂 高纯度、高浓度、高均匀颗粒分布的大颗粒二氧化硅溶胶的制造方法
CA2203486C (en) * 1996-05-09 2003-06-17 Christopher P. Karwas Clear aqueous solutions of sodium silicate

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH055766B2 (enExample) * 1985-01-31 1993-01-25 Nippon Chemical Ind
JPH0481526B2 (enExample) * 1985-07-11 1992-12-24 Nippon Chemical Ind
JP2000247625A (ja) * 1999-03-04 2000-09-12 Nippon Chem Ind Co Ltd 高純度シリカゾル及びその製造方法
JP2005179159A (ja) * 2003-12-24 2005-07-07 Dokai Chemical Industries Co Ltd 高純度シリカゲルの製造方法
JP2005289702A (ja) * 2004-03-31 2005-10-20 Fuji Kagaku Kk ケイ酸ソーダ含有組成物及びその製造方法
JP2006036605A (ja) * 2004-07-29 2006-02-09 Catalysts & Chem Ind Co Ltd 高純度水性シリカゾルの製造方法
JP3691047B1 (ja) * 2004-07-30 2005-08-31 日本化学工業株式会社 高純度活性珪酸水溶液の製造方法
JP3691048B1 (ja) * 2004-08-09 2005-08-31 日本化学工業株式会社 高純度コロイダルシリカの製造方法
JP2013032276A (ja) * 2005-08-10 2013-02-14 Jgc Catalysts & Chemicals Ltd 異形シリカゾル

Also Published As

Publication number Publication date
TWI888388B (zh) 2025-07-01
TW202112666A (zh) 2021-04-01
WO2020262406A1 (ja) 2020-12-30
CN114007981A (zh) 2022-02-01
JP7663074B2 (ja) 2025-04-16

Similar Documents

Publication Publication Date Title
BR112019017762A2 (enExample)
BR112021017339A2 (enExample)
BR112021018450A2 (enExample)
BR112021017637A2 (enExample)
BR112021017892A2 (enExample)
BR112021017782A2 (enExample)
BR112021017939A2 (enExample)
BR112021017738A2 (enExample)
BR112021016996A2 (enExample)
BR112021008711A2 (enExample)
BR112019016141A2 (enExample)
BR112021016821A2 (enExample)
BR112021017728A2 (enExample)
BR112021013944A2 (enExample)
BR112021018452A2 (enExample)
BR112021017703A2 (enExample)
AU2020104490A5 (enExample)
BR112019016142A2 (enExample)
BR112019016138A2 (enExample)
BR112021017732A2 (enExample)
BR112021017234A2 (enExample)
BR112021017355A2 (enExample)
BR112021018168A2 (enExample)
BR112021018093A2 (enExample)
BR112021018102A2 (enExample)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230316

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240501

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20240624

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240830

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20241127

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20250127

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250203

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20250305

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250318

R150 Certificate of patent or registration of utility model

Ref document number: 7663074

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150