JP3064595B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物

Info

Publication number
JP3064595B2
JP3064595B2 JP03316500A JP31650091A JP3064595B2 JP 3064595 B2 JP3064595 B2 JP 3064595B2 JP 03316500 A JP03316500 A JP 03316500A JP 31650091 A JP31650091 A JP 31650091A JP 3064595 B2 JP3064595 B2 JP 3064595B2
Authority
JP
Japan
Prior art keywords
resist composition
positive resist
group
heptanone
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP03316500A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0534919A (ja
Inventor
保則 上谷
靖宜 土居
和彦 橋本
晴喜 尾崎
良太郎 塙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to TW081103104A priority Critical patent/TW208070B/zh
Priority to EP92107034A priority patent/EP0510671B1/en
Priority to DE1992623083 priority patent/DE69223083T2/de
Priority to CA002067042A priority patent/CA2067042A1/en
Priority to MX9201930A priority patent/MX9201930A/es
Priority to KR1019920007036A priority patent/KR100219257B1/ko
Publication of JPH0534919A publication Critical patent/JPH0534919A/ja
Priority to US08/160,290 priority patent/US6383708B1/en
Application granted granted Critical
Publication of JP3064595B2 publication Critical patent/JP3064595B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
JP03316500A 1991-04-26 1991-11-29 ポジ型レジスト組成物 Expired - Lifetime JP3064595B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
TW081103104A TW208070B (OSRAM) 1991-04-26 1992-04-21
DE1992623083 DE69223083T2 (de) 1991-04-26 1992-04-24 Positivarbeitende Resistzusammensetzung
CA002067042A CA2067042A1 (en) 1991-04-26 1992-04-24 Positive resist composition
MX9201930A MX9201930A (es) 1991-04-26 1992-04-24 Composicion de capa protectora positiva (caso 516303).
EP92107034A EP0510671B1 (en) 1991-04-26 1992-04-24 Positive resist composition
KR1019920007036A KR100219257B1 (ko) 1991-04-26 1992-04-25 포지티브 레지스트 조성물
US08/160,290 US6383708B1 (en) 1991-04-26 1993-12-02 Positive resist composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3-97263 1991-04-26
JP9726391 1991-04-26

Publications (2)

Publication Number Publication Date
JPH0534919A JPH0534919A (ja) 1993-02-12
JP3064595B2 true JP3064595B2 (ja) 2000-07-12

Family

ID=14187658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03316500A Expired - Lifetime JP3064595B2 (ja) 1991-04-26 1991-11-29 ポジ型レジスト組成物

Country Status (4)

Country Link
US (1) US6383708B1 (OSRAM)
JP (1) JP3064595B2 (OSRAM)
KR (1) KR100219257B1 (OSRAM)
TW (1) TW208070B (OSRAM)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5486743A (en) * 1992-11-19 1996-01-23 Kabushiki Kaisha Toshiba Inverter and air conditioner controlled by the same
JPH07331292A (ja) * 1994-06-15 1995-12-19 Tonen Corp 洗浄液組成物
WO1998049601A1 (fr) * 1997-04-30 1998-11-05 Nippon Zeon Co., Ltd. Composition de photoresine positive pour photomasque
JP2006048017A (ja) * 2004-06-30 2006-02-16 Sumitomo Chemical Co Ltd 感放射線性樹脂組成物
KR101728820B1 (ko) 2013-12-12 2017-04-20 제일모직 주식회사 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 표시 소자

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE370542C (de) 1923-03-03 Gustav Scheu Steckkontakt
US3699135A (en) 1969-08-18 1972-10-17 Eastman Kodak Co Organosilicon polymeric dyes
JPS5024641B2 (OSRAM) * 1972-10-17 1975-08-18
US4526856A (en) 1983-05-23 1985-07-02 Allied Corporation Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents
JPS6024545A (ja) 1983-07-21 1985-02-07 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS6088941A (ja) 1983-10-21 1985-05-18 Nagase Kasei Kogyo Kk フオトレジスト組成物
JPS61118744A (ja) 1984-11-15 1986-06-06 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
US4732840A (en) * 1985-03-22 1988-03-22 Fuji Photo Film Co., Ltd. Planographic printing plate method using light sensitive material including phenolic resol with dibenzylic ether groups
US4845008A (en) 1986-02-20 1989-07-04 Fuji Photo Film Co., Ltd. Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent
KR920001450B1 (ko) 1986-12-23 1992-02-14 쉬플리 캄파니 인코포레이티드 감광성 내식막의 제조방법, 감광성 내식막 조성물 및 이의 제조방법
JPS63305348A (ja) 1987-06-05 1988-12-13 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
DE3735852A1 (de) * 1987-10-23 1989-05-03 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen farbstoff, und daraus hergestelltes positiv arbeitendes lichtempfindliches aufzeichnungsmaterial
DE3811040A1 (de) * 1988-03-31 1989-10-19 Ciba Geigy Ag Im nahen uv hochaufloesende positiv-fotoresists
JP2706978B2 (ja) 1988-05-07 1998-01-28 住友化学工業株式会社 ポジ型レジスト組成物
JP2629356B2 (ja) 1988-06-13 1997-07-09 住友化学工業株式会社 ポジ型レジスト組成物
JP2584672B2 (ja) * 1989-04-28 1997-02-26 富士写真フイルム株式会社 感光性組成物
US5246818A (en) * 1989-08-16 1993-09-21 Hoechst Celanese Corporation Developer composition for positive working color proofing films
EP0455228B1 (en) * 1990-05-02 1998-08-12 Mitsubishi Chemical Corporation Photoresist composition

Also Published As

Publication number Publication date
US6383708B1 (en) 2002-05-07
TW208070B (OSRAM) 1993-06-21
KR100219257B1 (ko) 1999-09-01
JPH0534919A (ja) 1993-02-12
KR920020261A (ko) 1992-11-20

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