TW208070B - - Google Patents
Info
- Publication number
- TW208070B TW208070B TW081103104A TW81103104A TW208070B TW 208070 B TW208070 B TW 208070B TW 081103104 A TW081103104 A TW 081103104A TW 81103104 A TW81103104 A TW 81103104A TW 208070 B TW208070 B TW 208070B
- Authority
- TW
- Taiwan
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9726391 | 1991-04-26 | ||
| JP03316500A JP3064595B2 (ja) | 1991-04-26 | 1991-11-29 | ポジ型レジスト組成物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW208070B true TW208070B (OSRAM) | 1993-06-21 |
Family
ID=14187658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW081103104A TW208070B (OSRAM) | 1991-04-26 | 1992-04-21 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6383708B1 (OSRAM) |
| JP (1) | JP3064595B2 (OSRAM) |
| KR (1) | KR100219257B1 (OSRAM) |
| TW (1) | TW208070B (OSRAM) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5486743A (en) * | 1992-11-19 | 1996-01-23 | Kabushiki Kaisha Toshiba | Inverter and air conditioner controlled by the same |
| JPH07331292A (ja) * | 1994-06-15 | 1995-12-19 | Tonen Corp | 洗浄液組成物 |
| WO1998049601A1 (fr) * | 1997-04-30 | 1998-11-05 | Nippon Zeon Co., Ltd. | Composition de photoresine positive pour photomasque |
| JP2006048017A (ja) * | 2004-06-30 | 2006-02-16 | Sumitomo Chemical Co Ltd | 感放射線性樹脂組成物 |
| KR101728820B1 (ko) | 2013-12-12 | 2017-04-20 | 제일모직 주식회사 | 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 표시 소자 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE370542C (de) | 1923-03-03 | Gustav Scheu | Steckkontakt | |
| US3699135A (en) | 1969-08-18 | 1972-10-17 | Eastman Kodak Co | Organosilicon polymeric dyes |
| JPS5024641B2 (OSRAM) * | 1972-10-17 | 1975-08-18 | ||
| US4526856A (en) | 1983-05-23 | 1985-07-02 | Allied Corporation | Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents |
| JPS6024545A (ja) | 1983-07-21 | 1985-02-07 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
| JPS6088941A (ja) | 1983-10-21 | 1985-05-18 | Nagase Kasei Kogyo Kk | フオトレジスト組成物 |
| JPS61118744A (ja) | 1984-11-15 | 1986-06-06 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジスト組成物 |
| US4732840A (en) * | 1985-03-22 | 1988-03-22 | Fuji Photo Film Co., Ltd. | Planographic printing plate method using light sensitive material including phenolic resol with dibenzylic ether groups |
| US4845008A (en) | 1986-02-20 | 1989-07-04 | Fuji Photo Film Co., Ltd. | Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent |
| KR920001450B1 (ko) | 1986-12-23 | 1992-02-14 | 쉬플리 캄파니 인코포레이티드 | 감광성 내식막의 제조방법, 감광성 내식막 조성물 및 이의 제조방법 |
| JPS63305348A (ja) | 1987-06-05 | 1988-12-13 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
| DE3735852A1 (de) * | 1987-10-23 | 1989-05-03 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen farbstoff, und daraus hergestelltes positiv arbeitendes lichtempfindliches aufzeichnungsmaterial |
| DE3811040A1 (de) * | 1988-03-31 | 1989-10-19 | Ciba Geigy Ag | Im nahen uv hochaufloesende positiv-fotoresists |
| JP2706978B2 (ja) | 1988-05-07 | 1998-01-28 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
| JP2629356B2 (ja) | 1988-06-13 | 1997-07-09 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
| JP2584672B2 (ja) * | 1989-04-28 | 1997-02-26 | 富士写真フイルム株式会社 | 感光性組成物 |
| US5246818A (en) * | 1989-08-16 | 1993-09-21 | Hoechst Celanese Corporation | Developer composition for positive working color proofing films |
| EP0455228B1 (en) * | 1990-05-02 | 1998-08-12 | Mitsubishi Chemical Corporation | Photoresist composition |
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1991
- 1991-11-29 JP JP03316500A patent/JP3064595B2/ja not_active Expired - Lifetime
-
1992
- 1992-04-21 TW TW081103104A patent/TW208070B/zh active
- 1992-04-25 KR KR1019920007036A patent/KR100219257B1/ko not_active Expired - Lifetime
-
1993
- 1993-12-02 US US08/160,290 patent/US6383708B1/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP3064595B2 (ja) | 2000-07-12 |
| US6383708B1 (en) | 2002-05-07 |
| KR100219257B1 (ko) | 1999-09-01 |
| JPH0534919A (ja) | 1993-02-12 |
| KR920020261A (ko) | 1992-11-20 |