JP2878654B2 - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JP2878654B2
JP2878654B2 JP8243450A JP24345096A JP2878654B2 JP 2878654 B2 JP2878654 B2 JP 2878654B2 JP 8243450 A JP8243450 A JP 8243450A JP 24345096 A JP24345096 A JP 24345096A JP 2878654 B2 JP2878654 B2 JP 2878654B2
Authority
JP
Japan
Prior art keywords
visible light
fullerene
layer
polymer compound
functional group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP8243450A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1090893A (ja
Inventor
右副 田島
忠浩 石井
一夫 武内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Priority to JP8243450A priority Critical patent/JP2878654B2/ja
Priority to US08/928,337 priority patent/US5998089A/en
Priority to EP97115899A priority patent/EP0829765B1/fr
Priority to DE69712580T priority patent/DE69712580T2/de
Publication of JPH1090893A publication Critical patent/JPH1090893A/ja
Application granted granted Critical
Publication of JP2878654B2 publication Critical patent/JP2878654B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP8243450A 1996-09-13 1996-09-13 感光性樹脂組成物 Expired - Fee Related JP2878654B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP8243450A JP2878654B2 (ja) 1996-09-13 1996-09-13 感光性樹脂組成物
US08/928,337 US5998089A (en) 1996-09-13 1997-09-12 Photosensitive resin composition comprising fullerene
EP97115899A EP0829765B1 (fr) 1996-09-13 1997-09-12 Compositions à base de résine photosensible
DE69712580T DE69712580T2 (de) 1996-09-13 1997-09-12 Photoempfindliche Harzzusammensetzung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8243450A JP2878654B2 (ja) 1996-09-13 1996-09-13 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPH1090893A JPH1090893A (ja) 1998-04-10
JP2878654B2 true JP2878654B2 (ja) 1999-04-05

Family

ID=17104072

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8243450A Expired - Fee Related JP2878654B2 (ja) 1996-09-13 1996-09-13 感光性樹脂組成物

Country Status (4)

Country Link
US (1) US5998089A (fr)
EP (1) EP0829765B1 (fr)
JP (1) JP2878654B2 (fr)
DE (1) DE69712580T2 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100234143B1 (ko) * 1996-06-07 1999-12-15 미야즈 쥰이치로 레지스트 물질 및 그 제조 방법
JP3032833B2 (ja) * 1997-09-22 2000-04-17 ザ ユニバーシティ オブ バーミンガム 電子線レジスト
US6793967B1 (en) * 1999-06-25 2004-09-21 Sony Corporation Carbonaceous complex structure and manufacturing method therefor
CA2312140A1 (fr) 1999-06-25 2000-12-25 Matthias Ramm Structure d'heterojonction de type a separation de charge et methode de fabrication
US6794473B2 (en) * 2001-05-01 2004-09-21 Nippon Shokubai Co., Ltd. Acrylic acid (salt) polymer, its production process and uses
KR20030002739A (ko) * 2001-06-29 2003-01-09 주식회사 하이닉스반도체 반도체 소자의 포토레지스트 제조 방법 및 이를 이용한포토레지스트 패턴 형성 방법
US8907323B2 (en) * 2002-04-23 2014-12-09 Philip D. Freedman Microprocessor assembly
WO2004048462A1 (fr) * 2002-11-28 2004-06-10 Jsr Corporation Composition de resine photodurcissable, dispositif medical utilisant cette derniere et procede de fabrication correspondant
CL2011003025A1 (es) 2011-11-30 2012-07-06 Univ Arturo Prat 40% Metodo para obtener un producto alimenticio microencapsulado para peces; producto alimenticio que contiene al menos, alginato, levadura, suero, harina de pescado y otros excipientes; y usos de dicho producto.

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033751A (ja) * 1983-08-03 1985-02-21 Nippon Telegr & Teleph Corp <Ntt> 符・復号器
JPS6062105A (ja) * 1983-09-16 1985-04-10 Sharp Corp 高透磁率合金膜の製造方法
JPS60134413A (ja) * 1983-12-22 1985-07-17 Seiko Epson Corp 半導体装置の製造方法
US5561026A (en) * 1992-06-30 1996-10-01 Nippon Oil Co., Ltd. Photosensitive materials comprising fullerene
JPH06242543A (ja) * 1993-02-18 1994-09-02 Fuji Photo Film Co Ltd ハロゲン化銀感光材料
JPH0784337A (ja) * 1993-09-17 1995-03-31 Toshiba Corp 光記録素子
DE4344840A1 (de) * 1993-12-30 1995-07-06 Geckeler Kurt E Priv Doz Dr Synthese von aromatischen, makromolekularen C¶6¶¶0¶-Materialien
JP3615263B2 (ja) * 1995-04-13 2005-02-02 日本化薬株式会社 フラーレン誘導体、樹脂組成物及びその硬化物

Also Published As

Publication number Publication date
US5998089A (en) 1999-12-07
JPH1090893A (ja) 1998-04-10
DE69712580T2 (de) 2003-01-09
EP0829765B1 (fr) 2002-05-15
DE69712580D1 (de) 2002-06-20
EP0829765A1 (fr) 1998-03-18

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