JP2022537508A - 航空宇宙用部品上へ犠牲コーティングを堆積させるための方法 - Google Patents
航空宇宙用部品上へ犠牲コーティングを堆積させるための方法 Download PDFInfo
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- JP2022537508A JP2022537508A JP2021572946A JP2021572946A JP2022537508A JP 2022537508 A JP2022537508 A JP 2022537508A JP 2021572946 A JP2021572946 A JP 2021572946A JP 2021572946 A JP2021572946 A JP 2021572946A JP 2022537508 A JP2022537508 A JP 2022537508A
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- metal oxide
- template layer
- aluminum
- aerospace component
- aerospace
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- 238000000034 method Methods 0.000 title claims abstract description 144
- 238000000151 deposition Methods 0.000 title claims abstract description 18
- 238000000576 coating method Methods 0.000 title description 22
- 239000011248 coating agent Substances 0.000 title description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 119
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 119
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 96
- 230000008569 process Effects 0.000 claims abstract description 88
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 59
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 48
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 48
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 48
- 229910000601 superalloy Inorganic materials 0.000 claims abstract description 37
- 230000003647 oxidation Effects 0.000 claims abstract description 32
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 32
- 239000011253 protective coating Substances 0.000 claims abstract description 21
- 238000010438 heat treatment Methods 0.000 claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 claims abstract description 9
- 239000011651 chromium Substances 0.000 claims description 27
- 229910052804 chromium Inorganic materials 0.000 claims description 22
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 21
- 238000000231 atomic layer deposition Methods 0.000 claims description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 16
- 229910045601 alloy Inorganic materials 0.000 claims description 14
- 239000000956 alloy Substances 0.000 claims description 14
- 239000013078 crystal Substances 0.000 claims description 14
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 13
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- 239000001301 oxygen Substances 0.000 claims description 13
- 229910052760 oxygen Inorganic materials 0.000 claims description 13
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 12
- 229910052750 molybdenum Inorganic materials 0.000 claims description 12
- 239000011733 molybdenum Substances 0.000 claims description 12
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 12
- 229910052721 tungsten Inorganic materials 0.000 claims description 12
- 239000010937 tungsten Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 7
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims description 7
- 238000005229 chemical vapour deposition Methods 0.000 claims description 7
- 229910017052 cobalt Inorganic materials 0.000 claims description 7
- 239000010941 cobalt Substances 0.000 claims description 7
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 7
- 229910000476 molybdenum oxide Inorganic materials 0.000 claims description 7
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 7
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 7
- 239000010936 titanium Substances 0.000 claims description 7
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 7
- 229910001935 vanadium oxide Inorganic materials 0.000 claims description 7
- 150000002739 metals Chemical class 0.000 claims description 6
- 230000001590 oxidative effect Effects 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 5
- 229910052593 corundum Inorganic materials 0.000 claims description 5
- 239000010431 corundum Substances 0.000 claims description 5
- 239000000446 fuel Substances 0.000 claims description 5
- 229910052720 vanadium Inorganic materials 0.000 claims description 5
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 5
- MOEHVXSVUJUROX-UHFFFAOYSA-M chromium(3+);oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Cr+3] MOEHVXSVUJUROX-UHFFFAOYSA-M 0.000 claims description 3
- 238000012545 processing Methods 0.000 claims description 3
- 238000000859 sublimation Methods 0.000 claims description 3
- 230000008022 sublimation Effects 0.000 claims description 3
- 238000005382 thermal cycling Methods 0.000 claims 1
- 230000008016 vaporization Effects 0.000 claims 1
- 238000009834 vaporization Methods 0.000 claims 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 abstract description 6
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- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 6
- 238000005137 deposition process Methods 0.000 description 6
- -1 other elements Substances 0.000 description 6
- 239000007800 oxidant agent Substances 0.000 description 6
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- 239000000203 mixture Substances 0.000 description 4
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- 239000006104 solid solution Substances 0.000 description 4
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- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 3
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
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- 229910000424 chromium(II) oxide Inorganic materials 0.000 description 3
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- 239000001257 hydrogen Substances 0.000 description 3
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- 239000001272 nitrous oxide Substances 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
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- 239000012080 ambient air Substances 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- XEHUIDSUOAGHBW-UHFFFAOYSA-N chromium;pentane-2,4-dione Chemical class [Cr].CC(=O)CC(C)=O.CC(=O)CC(C)=O.CC(=O)CC(C)=O XEHUIDSUOAGHBW-UHFFFAOYSA-N 0.000 description 2
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- 238000001035 drying Methods 0.000 description 2
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/02—Pretreatment of the material to be coated
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/10—Oxidising
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/10—Oxidising
- C23C8/12—Oxidising using elemental oxygen or ozone
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/80—After-treatment
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Abstract
Description
[0036]航空宇宙用部品上への金属酸化物テンプレート層の堆積又は形成の前に、航空宇宙用部品は、場合によっては、一又は複数の予洗浄プロセスに曝露され得る。航空宇宙用部品の表面は、酸化物、有機物、油、土壌、微粒子、破片を含むことがあり、かつ/又は他の汚染物質は、航空宇宙用部品上への金属酸化物テンプレート層(例えば保護コーティング)の生成前に除去される。予洗浄プロセスは、一又は複数のベースティング又はテクスチャリングプロセス、真空パージ、溶媒洗浄、酸洗浄、ウェット洗浄、プラズマ洗浄、超音波処理、又はそれらの任意の組み合わせであり得るか、又はそれらを含み得る。続いて堆積される金属酸化物テンプレート層は、一旦洗浄及び/又はテクスチャリングされると、予洗浄プロセスに曝露されていない場合よりも、航空宇宙用部品の表面への接着が強くなる。
[0039]航空宇宙用部品は、第1の前駆体及び第1の反応物質に曝露されて、蒸着プロセスによって、堆積酸化物層を航空宇宙用部品上に形成し得る。蒸着プロセスは、ALDプロセス、プラズマALD(PE-ALD)プロセス、熱的化学気相堆積(CVD)プロセス、プラズマCVD(PE-CVD)プロセス、又はそれらの任意の組み合わせであり得る。
Claims (15)
- 航空宇宙用部品上に保護コーティングを生成するための方法であって、
ニッケルとアルミニウムとを含む前記航空宇宙用部品上に金属酸化物テンプレート層を堆積することと;
熱的プロセス中に前記金属酸化物テンプレート層を含む前記航空宇宙用部品を加熱することであって、前記熱的プロセスが、
前記航空宇宙用部品内に含まれるアルミニウムを、前記金属酸化物テンプレート層を含む前記航空宇宙用部品の表面に向かって拡散することと、
拡散されたアルミニウムを酸化させて、前記航空宇宙用部品と前記金属酸化物テンプレート層との間に配置される酸化アルミニウム層を生成することと、
前記酸化アルミニウム層を残しながら、前記金属酸化物テンプレート層の少なくとも一部を除去することと
を含む、前記航空宇宙用部品を加熱することと
を含む、方法。 - 前記金属酸化物テンプレート層が、酸化クロム、酸化タングステン、酸化モリブデン、酸化バナジウム、又はそれらの任意の組み合わせを含む、請求項1に記載の方法。
- 前記金属酸化物テンプレート層が酸化クロムを含み、前記熱的プロセス中に前記酸化クロムをクロムオキシドヒドロキシドに変換することをさらに含む、請求項1に記載の方法。
- 前記金属酸化物テンプレート層が約10nmから約2,000nmの厚さを有し、前記酸化アルミニウム層が約10nmから約1,000nmの厚さを有する、請求項1に記載の方法。
- 前記酸化アルミニウム層がα-Al2O3を含み、前記金属酸化物テンプレート層及び前記酸化アルミニウム層がコランダム結晶構造を有する、請求項1に記載の方法。
- 前記金属酸化物テンプレート層及び前記酸化アルミニウム層が、約0.1%から約10%の格子不整合がある結晶構造を有する、請求項5に記載の方法。
- 前記金属酸化物テンプレート層が、前記熱的プロセス中に昇華又は蒸発又は酸化によって除去され、前記航空宇宙用部品が、前記熱的プロセス中に、約800℃から約1,500℃の温度に約20分間から約100時間加熱される、請求項1に記載の方法。
- 酸素が、アルミニウムと反応する前に、前記金属酸化物テンプレート層を通じて拡散されて、前記酸化アルミニウム層を生成し、前記航空宇宙用部品及び前記金属酸化物テンプレート層が、前記熱的プロセス中に酸素を含む空気に曝露される、請求項1に記載の方法。
- 前記熱的プロセスを実施しながら、前記航空宇宙用部品を含むジェットエンジン又はタービンに動力を供給することであって、前記ジェットエンジン又は前記タービンからの熱エネルギーが、前記熱的プロセス中に前記航空宇宙用部品及び前記金属酸化物テンプレート層を加熱するのに使用される、ジェットエンジン又はタービンに動力を供給することをさらに含む、請求項1に記載の方法。
- 前記航空宇宙用部品及び前記金属酸化物テンプレート層が、前記熱的プロセス中に処理チャンバ又は炉内で加熱され、前記航空宇宙用部品及び前記金属酸化物テンプレート層が、前記熱的プロセスの1つの熱サイクル中に、第1の期間予熱され、第2の期間所定の温度で維持され、第3の期間冷却される、請求項1に記載の方法。
- 前記第1の期間が約1分間から約30分間であり、前記第2の期間が約15分間から約120分間であり、前記第3の期間が約0.5分間から約15分間であり、前記熱サイクルが2回から約300回繰り返され、前記所定の温度が約900℃から約1,200℃である、請求項10に記載の方法。
- 前記航空宇宙用部品が、タービンブレード、タービン翼、支持部材、フレーム、リブ、フィン、ピンフィン、燃焼器燃料ノズル、燃焼器シールド、内部冷却チャネル、又はそれらの任意の組み合わせであり、前記航空宇宙用部品がニッケル超合金を含み、前記ニッケル超合金が、ニッケルと、アルミニウムと、クロム、コバルト、チタン、モリブデン、タングステン、又はそれらの合金から選択される一又は複数の金属とを含む、請求項1に記載の方法。
- 前記ニッケル超合金が、約40wt%以上のニッケルと、約0.5wt%から約15wt%のアルミニウムとを含む、請求項12に記載の方法。
- 航空宇宙用部品上に保護コーティングを生成するための方法であって、
ニッケルとアルミニウムとを含む前記航空宇宙用部品上に金属酸化物テンプレート層を堆積することであって、前記金属酸化物テンプレート層が、酸化クロム、酸化タングステン、酸化モリブデン、酸化バナジウム、又はそれらの任意の組み合わせを含み、前記金属酸化物テンプレート層が、原子層堆積(ALD)プロセス又は化学気相堆積(CVD)プロセスによって前記航空宇宙用部品上に堆積される、金属酸化物テンプレート層を堆積することと;
熱的プロセス中に、前記金属酸化物テンプレート層を含む前記航空宇宙用部品を約900℃から約1,200℃の温度に加熱することであって、前記熱的プロセスが、
前記航空宇宙用部品内に含まれるアルミニウムを、前記金属酸化物テンプレート層を含む前記航空宇宙用部品の表面に向かって拡散することと、
拡散されたアルミニウムを酸化させて、前記航空宇宙用部品と前記金属酸化物テンプレート層との間に配置される酸化アルミニウム層を生成することと、
前記酸化アルミニウム層を残しながら、前記金属酸化物テンプレート層の少なくとも一部を除去することと
を含む、前記航空宇宙用部品を加熱することと
を含む、方法。 - 航空宇宙用部品であって、
ニッケル超合金を含む本体であって、前記超合金が、ニッケルと、アルミニウムと、クロム、コバルト、チタン、モリブデン、タングステン、又はそれらの合金から選択される一又は複数の金属とを含む、本体と;
前記本体上に配置される金属酸化物テンプレート層であって、クロム、タングステン、モリブデン、バナジウム、又はそれらの任意の組み合わせを含む、金属酸化物テンプレート層と;
前記航空宇宙用部品の前記本体と前記金属酸化物テンプレート層との間に配置される酸化アルミニウム層とを含む、
航空宇宙用部品。
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