US20230313380A1 - Methods for depositing sacrificial coatings on aerospace components - Google Patents

Methods for depositing sacrificial coatings on aerospace components Download PDF

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US20230313380A1
US20230313380A1 US18/200,497 US202318200497A US2023313380A1 US 20230313380 A1 US20230313380 A1 US 20230313380A1 US 202318200497 A US202318200497 A US 202318200497A US 2023313380 A1 US2023313380 A1 US 2023313380A1
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aerospace component
metal oxide
layer
template layer
aluminum
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Sukti Chatterjee
Kenichi Ohno
Lance A. Scudder
Yuriy Melnik
David A. BRITZ
Pravin K. Narwankar
Thomas Knisley
Mark Saly
Jeffrey ANTHIS
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Applied Materials Inc
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Applied Materials Inc
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Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SALY, MARK, MELNIK, YURIY, NARWANKAR, PRAVIN K., OHNO, KENICHI, SCUDDER, LANCE A., ANTHIS, Jeffrey, BRITZ, David A., CHATTERJEE, SUKTI, KNISLEY, THOMAS
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56After-treatment
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C19/00Alloys based on nickel or cobalt
    • C22C19/03Alloys based on nickel or cobalt based on nickel
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/405Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02Pretreatment of the material to be coated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10Oxidising
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10Oxidising
    • C23C8/12Oxidising using elemental oxygen or ozone
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/80After-treatment

Definitions

  • Embodiments of the present disclosure generally relate to deposition processes, and in particular to vapor deposition processes for depositing films on aerospace components.
  • Turbine engines typically have components which corrode or degrade over time due to being exposed to hot gases and/or reactive chemicals (e.g., acids, bases, or salts). Such turbine components are often protected by a thermal and/or chemical barrier coating.
  • the current coatings used on airfoils exposed to the hot gases of combustion in gas turbine engines for both environmental protection and as bond coats in thermal barrier coating (TBC) systems include both diffusion aluminides and various metal alloy coatings. These coatings are applied over substrate materials, typically nickel-based superalloys, to provide protection against oxidation and corrosion attack. These coatings are formed on the substrate in a number of different ways.
  • a nickel aluminide layer may be grown as an outer coat on a nickel base superalloy by simply exposing the substrate to an aluminum rich environment at elevated temperatures. The aluminum diffuses into the substrate and combines with the nickel to form an outer surface of the nickel-aluminum alloy.
  • Platinum electroplating of exteriors typically forms a reasonably uniform coating, however, electroplating the interior of a component has proven to be challenging.
  • the resulting electroplating coatings are often too thin to be protective or too thick that there are other adverse mechanical effects, such as high weight gain or fatigue life debit.
  • aluminide coatings suffer from non-uniformity on interior passages of components. Aluminide coatings are brittle, which can lead to reduced life when exposed to fatigue.
  • coatings are on the order of greater than 10 micrometers in thickness, which can cause component weight to increase, making design of the disks and other support structures more challenging. Many of these coatings also require high temperature (e.g., greater than 500° C.) steps to deposit or promote enough interdiffusion of the coating into the alloy to achieve adhesion. It is desired by many to have coatings that (1) protect metals from oxidation and corrosion, (2) have high adhesion to the metal, and/or (3) are sufficiently thin to not materially increase weight or reduce fatigue life outside of current design practices for bare metal.
  • Embodiments of the present disclosure generally relate to protective coatings on aerospace components and methods for depositing the protective coatings.
  • a method for producing a protective coating on an aerospace component includes depositing a metal oxide template layer on the aerospace component containing nickel and aluminum (e.g., nickel-aluminum superalloy) and heating the aerospace component containing the metal oxide template layer during a thermal process and/or an oxidation process.
  • the thermal process and/or oxidation process includes diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer, oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer, and removing all or some of the metal oxide template layer while leaving the aluminum oxide layer.
  • the metal oxide template layer may partially form a solid solution of the templating element with the aluminum oxide layer.
  • a method for producing a protective coating on an aerospace component includes depositing a metal oxide template layer on the aerospace component containing nickel and aluminum, where the metal oxide template layer contains chromium oxide, tungsten oxide, molybdenum oxide, vanadium oxide, or any combination thereof. The method also includes heating the aerospace component containing the metal oxide template layer to a temperature of about 900° C. to about 1,200° C. during a thermal process and/or an oxidation process.
  • the thermal process and/or oxidation process includes diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer, oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer, and removing all or some of the metal oxide template layer while leaving the aluminum oxide layer.
  • the metal oxide template layer may partially form a solid solution of the templating element with the aluminum oxide layer.
  • an aerospace component contains a body containing a nickel superalloy, a metal oxide template layer disposed on the body, and an aluminum oxide layer disposed between the body of the aerospace component and the metal oxide template layer.
  • the superalloy within the body contains nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, or alloys thereof.
  • the metal oxide template layer contains chromium, tungsten, molybdenum, vanadium or any combination thereof.
  • the aluminum oxide layer contains ⁇ -Al 2 O 3 .
  • the metal oxide template layer and the aluminum oxide layer have the same crystal structure, such as a corundum crystal structure.
  • the metal oxide template layer and the aluminum oxide layer can have crystal structures with a lattice mismatch of about 0.1% to about 10%.
  • the metal oxide template layer may partially form a solid solution of the templating element with the aluminum oxide layer.
  • the solid solution zone of mixed metal oxides has a lattice mismatch less than that of the templating oxide and the aluminum oxide.
  • FIGS. 1 A- 1 D are schematic cross-sectional views of protective coatings disposed on an aerospace component at different time intervals, according to one or more embodiments described and discussed herein.
  • Embodiments of the present disclosure generally relate to protective coatings disposed on an aerospace components and methods for depositing or otherwise forming the protective coatings.
  • Aerospace components as described and discussed herein can be or include one or more turbine blades, turbine vanes, ribs, fins, pin fins, combustor fuel nozzles, combustor shields, or any other aerospace component or part that can benefit from having protective coating deposited thereon.
  • the protective coatings can be deposited or otherwise formed on interior surfaces and/or exterior surfaces of the aerospace components.
  • a method for producing a protective coating on an aerospace component includes depositing a metal oxide template layer on the aerospace component containing nickel and aluminum (e.g., nickel-aluminum superalloy) and heating the aerospace component containing the metal oxide template layer during a thermal process and/or an oxidation process.
  • the thermal process and/or oxidation process includes diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer, oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer, and removing at least a portion of the metal oxide template layer while leaving the aluminum oxide layer.
  • FIGS. 1 A- 1 D are schematic cross-sectional views of protective coatings disposed on an aerospace component 102 at different time intervals, according to one or more embodiments described and discussed herein.
  • FIG. 1 A depicts the aerospace component 102 having a surface 104 .
  • the surface 104 can be one or more interior surfaces and/or one or more exterior surfaces of the aerospace component 102 .
  • the aerospace component 102 can be or include a turbine blade, a turbine vane, a support member, a frame, a rib, a fin, a pin fin, a combustor fuel nozzle, a combustor shield, an internal cooling channel, or any combination thereof.
  • the aerospace component 102 contains one or more nickel superalloys.
  • the nickel superalloy can be or include a nickel-aluminum superalloy and contain nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, other elements, dopants thereof, or alloys thereof.
  • the nickel superalloy contains about 20 wt %, about 30 wt %, about 40 wt %, about 45 wt %, about 48 wt %, about 50 wt %, about 55 wt %, about 58 wt %, or about 60 wt % to about 62 wt %, about 65 wt %, about 68 wt %, about 70 wt %, about 75 wt %, about 80 wt %, about 85 wt %, or about 90 wt % of nickel.
  • the nickel superalloy contains about 20 wt % to about 90 wt %, about 30 wt % to about 80 wt %, about 40 wt % to about 90 wt %, about 40 wt % to about 80 wt %, about 40 wt % to about 75 wt %, about 20 wt % to about 70 wt %, about 40 wt % to about 65 wt %, about 40 wt % to about 62 wt %, about 40 wt % to about 60 wt %, about 40 wt % to about 58 wt %, about 40 wt % to about 55 wt %, about 40 wt % to about 50 wt %, about 50 wt % to about 90 wt %, about 50 wt % to about 80 wt %, about 50 wt % to about 75 wt %, about 20 wt
  • the nickel superalloy contains about 0.2 wt %, about 0.5 wt %, about 0.8 wt %, about 1 wt %, about 1.5 wt %, about 2 wt %, about 2.5 wt %, about 3 wt %, about 3.5 wt %, about 4 wt %, or about 4.5 wt % to about 5 wt %, about 6 wt %, about 7 wt %, about 8 wt %, about 9 wt %, about 10 wt %, about 12 wt %, about 15 wt %, about 18 wt %, or about 20 wt % of aluminum.
  • the nickel superalloy contains about 0.2 wt % to about 20 wt %, about 0.5 wt % to about 20 wt %, about 0.5 wt % to about 18 wt %, about 0.5 wt % to about 15 wt %, about 0.5 wt % to about 12 wt %, about 0.5 wt % to about 10 wt %, about 0.5 wt % to about 8 wt %, about 0.5 wt % to about 6 wt %, about 0.5 wt % to about 5 wt %, about 0.5 wt % to about 4 wt %, about 0.5 wt % to about 3 wt %, about 0.5 wt % to about 2 wt %, about 0.5 wt % to about 1 wt %, about 1 wt % to about 20 wt %, about 1 wt % to %
  • the nickel superalloy contains about 40 wt % or greater of nickel and about 0.5 wt % to about 15 wt % of aluminum. In some examples, the nickel superalloy contains about 50 wt % or greater of nickel and about 1 wt % to about 10 wt % of aluminum. In other examples, the nickel superalloy contains about 58 wt % or greater of nickel and about 2 wt % to about 8 wt % of aluminum.
  • the nickel superalloy can be or include the CMSX-4 superalloy, the CMSX-4 Plus superalloy, PWA alloys, Rene alloys, one or more Inconel alloys, one or more Haynes alloys, e.g. Haynes 214, Haynes 233, alumina forming austenitic steel alloys, or any combinations thereof.
  • Table 1 provides the elemental compositions of several exemplary superalloys useful in embodiments described and discussed herein. In Table 1, Alloy (1) is the CMSX-4 superalloy, Alloy (2) is the CMSX-4 Plus superalloy, and all weights are in units of weight percent (wt %) unless otherwise noted.
  • FIG. 1 B depicts a metal oxide template layer 110 disposed on the surface 104 of the aerospace component 102 , as described and discussed in one or more embodiments herein.
  • the metal oxide template layer 110 contains one or more metal oxides, such as chromium oxide (e.g., CrO, CrO 2 , or Cr 2 O 3 ), tungsten oxide (e.g., WO 3 ), molybdenum oxide (e.g., MoO 2 or MoO 3 ), vanadium oxide (e.g., VO, VO 2 , or V 2 O 5 ), dopants thereof, or any combination thereof.
  • the metal oxide template layer 110 does not include aluminum oxide as a template layer.
  • the metal oxide contained in the metal oxide template layer 110 has a crystalline lattice that promotes the growth or otherwise formation of aluminum oxide during a thermal process and/or an oxidation process.
  • the metal oxide contained in the metal oxide template layer 110 can be sublimed, evaporated, oxidized, or otherwise removed from the aerospace component 102 at a later time. As such, the metal oxide template layer is removed by sublimation or evaporation or oxidation during the thermal process and/or oxidation process during and/or subsequent to the formation of the aluminum oxide.
  • the metal oxide template layer 110 contains chromium oxide
  • the method further includes converting the chromium oxide to chromium oxide hydroxide (CrO 2 (OH) 2 ) during the thermal process and/or oxidation process.
  • the metal oxide template layer 110 has a thickness of about 10 nm, about 20 nm, about 30 nm, about 50 nm, about 80 nm, about 100 nm, about 150 nm, or about 200 nm to about 250 nm, about 300 nm, about 350 nm, about 400 nm, about 500 nm, about 600 nm, about 700 nm, about 800 nm, about 900 nm, about 1,000 nm, about 1,200 nm, about 1,500 nm, about 1,800 nm, about 2,000 nm, about 3,500 nm, about 5,000 nm, about 7,500 nm, about 10,000 nm, or thicker.
  • the metal oxide template layer 110 has a thickness of about 1,000 nm to about 2,000 nm, about 1,000 nm to about 5,000 nm, about 2,000 nm to about 10,000 nm, about 10 nm to about 10,000 nm, about 10 nm to about 5,000 nm, about 10 nm to about 3,500 nm, about 10 nm to about 2,000 nm, about 10 nm to about 1,500 nm, about 10 nm to about 1,000 nm, about 10 nm to about 800 nm, about 10 nm to about 600 nm, about 10 nm to about 500 nm, about 10 nm to about 400 nm, about 10 nm to about 300 nm, about 10 nm to about 200 nm, about 10 nm to about 100 nm, about 10 nm to about 80 nm, about 10 nm to about 50 nm, about 10 nm to about 30 nm, about 100 nm tom to
  • the metal oxide template layer 110 can be deposited on the aerospace component 102 by one or more vapor deposition processes, such an atomic layer deposition (ALD) process, a plasma-enhanced ALD (PE-ALD) process, a thermal chemical vapor deposition (CVD) process, a plasma-enhanced CVD (PE-CVD) process, as well as other deposition processes.
  • ALD atomic layer deposition
  • PE-ALD plasma-enhanced ALD
  • CVD thermal chemical vapor deposition
  • PE-CVD plasma-enhanced CVD
  • FIG. 1 C depicts an aluminum oxide layer 120 disposed between the aerospace component 102 and the metal oxide template layer 110 , as described and discussed in one or more embodiments herein.
  • the aerospace component 102 containing the metal oxide template layer 110 is exposed to one or more thermal processes and/or one or more oxidation processes to produce the aluminum oxide layer 120 .
  • the thermal process and/or oxidation process progresses, the aluminum oxide layer 120 continues to form and the metal oxide template layer 110 progressively is removed.
  • the metal oxide template layer 110 is completely consumed or otherwise removed and the aluminum oxide layer 120 is the protective coating for the remaining portion of the aerospace component 102 , as depicted in FIG. 1 D .
  • the thermal process and/or oxidation process includes diffusing aluminum contained within the aerospace component 102 towards the surface 104 containing the metal oxide template layer 110 , oxidizing the diffused aluminum to produce the aluminum oxide layer 120 which is disposed between the aerospace component 102 and the metal oxide template layer 110 , and removing at least a portion of the metal oxide template layer 110 while leaving the aluminum oxide layer 120 .
  • the metal oxide template layer 110 is substantially removed or completely removed during the thermal process and/or oxidation process.
  • the metal oxide template layer 110 and the aluminum oxide layer 120 have the same crystalline structure or substantially the same crystalline structure. In one or more examples, the metal oxide template layer 110 and the aluminum oxide layer 120 have a corundum crystal structure. The metal oxide template layer 110 performs as a template and nucleates and helps grow the aluminum oxide layer 120 from the diffused aluminum and therefore they both share the common lattice or crystalline structure. In some examples, the aluminum oxide layer 120 contains ⁇ -Al 2 O 3 . The metal oxide template layer 110 and the aluminum oxide layer 120 have crystal structures with a lattice mismatch of about 0.1%, about 0.5%, about 1%, about 2%, about 3%, or about 4% to about 5%, about 6%, about 8%, or about 10%. For example, the metal oxide template layer 110 and the aluminum oxide layer 120 have crystal structures with a lattice mismatch of about 0.1% to about 10%, about 0.5% to about 8%, or about 1% to about 5%.
  • the aluminum oxide layer 120 has a thickness of about 10 nm, about 20 nm, about 30 nm, about 50 nm, about 80 nm, about 100 nm, about 150 nm, or about 200 nm to about 250 nm, about 300 nm, about 350 nm, about 400 nm, about 500 nm, about 600 nm, about 700 nm, about 800 nm, about 900 nm, about 1,000 nm, about 1,200 nm, about 1,500 nm, about 2,000 nm, about 2,500 nm, about 3,000 nm, about 5,000 nm, about 6,000 nm, about 10,000 nm, or thicker.
  • the aluminum oxide layer 120 has a thickness of about 1,000 nm to about 2,000 nm, about 1,000 nm to about 5,000 nm, or about 2,000 nm to about 10,000 nm, about 10 nm to about 10,000 nm, about 10 nm to about 8,000 nm, about 10 nm to about 5,000 nm, about 10 nm to about 3,500 nm, about 10 nm to about 2,000 nm, about 10 nm to about 1,500 nm, about 10 nm to about 1,200 nm, about 10 nm to about 1,000 nm, about 10 nm to about 800 nm, about 10 nm to about 600 nm, about 10 nm to about 500 nm, about 10 nm to about 400 nm, about 10 nm to about 300 nm, about 10 nm to about 200 nm, about 10 nm to about 100 nm, about 10 nm to about 80 nm, about 10 nm to
  • the aerospace component is heated to a temperature of about 800° C., about 850° C., about 900° C., about 950° C., about 980° C., or about 1,000° C. to about 1,050° C., about 1,100° C., about 1,150° C., about 1,200° C., about 1,300° C., about 1,400° C., or about 1,500° C.
  • the aerospace component is heated to a temperature of about 800° C. to about 1,500° C., about 800° C. to about 1,300° C., about 800° C. to about 1,150° C., about 800° C. to about 1,100° C., about 800° C.
  • the aerospace component is heated for about 20 minutes, about 30 minutes, about 40 minutes, about 50 minutes, about 1 hour, about 1.5 hours, or about 2 hours to about 3 hours, about 5 hours, about 8 hours, about 10 hours, about 20 hours, about 24 hours, about 30 hours, about 50 hours, about 80 hours, about 100 hours, about 1,000 hours, about 10,000 hours, about 25,000 hours, about 35,000 hours, about 50,000 hours, about 100,000 hours, about 200,000 hours or longer.
  • the aerospace component is heated for about 20 minutes to about 100 hours, about 20 minutes to about 50 hours, about 20 minutes to about 24 hours, about 20 minutes to about 10 hours, about 20 minutes to about 5 hours, about 20 minutes to about 2 hours, about 20 minutes to about 1 hour, about 20 minutes to about 45 minutes, about 20 minutes to about 40 minutes, or about 20 minutes to about 30 minutes during the thermal process and/or oxidation process.
  • the aerospace component is thermally cycled while running or otherwise using the aerospace component in a turbine, an engine, a pump, or other machinery.
  • the aerospace component is heated while running a jet or a pump containing the aerospace component, then cooled when use is stopped.
  • This heating and cooling is a single thermal cycle and can be repeated numerous times as the thermal process and/or oxidation process.
  • the aerospace component can be thermally cycled from an ambient temperature of about ⁇ 50° C. to about 35° C., then heated to warmer temperature of about 35° C. to about 100° C., then heated to a process temperature of about 100° C. to about 1,200° C.
  • the aerospace component can be cooled to warmer temperature and/or the ambient temperature to complete one thermal cycle.
  • These heating and cooling sub-cycles form a single thermal cycle which can be repeated 2 times, 3 times, about 50 times, about 100 times, about 500 times, or about 1,000 times to about 2,000 times, about 4,000 times, about 10,000 times, about 15,000 times, about 25,000 times, or more.
  • the aerospace component is heated to a temperature of about 800° C. to about 1,500° C. for about 20 minutes to about 100 hours during the thermal process. In other examples, the aerospace component is heated to a temperature of about 900° C. to about 1,200° C. during the thermal process. In some examples, the aerospace component is heated to a temperature of about 1,000° C. to about 1,100° C. during the thermal process.
  • oxygen is diffused through the metal oxide template layer before reacting with the aluminum to produce the aluminum oxide layer during the thermal process and/or oxidation process.
  • the oxygen can come from one or more oxygen sources.
  • Exemplary oxygen sources or oxidizing agents can be or include oxygen gas (O 2 ), ambient air (containing O 2 ), water or vapor, ozone, atomic oxygen, nitrous oxide, hydrogen peroxide, one or more organic peroxides, or any combination thereof.
  • the aerospace component and the metal oxide template layer are exposed to air containing the oxygen during the thermal process and/or oxidation process. This ambient oxygen (O 2 ) is the oxidizing agent during the thermal process and/or oxidation process.
  • the method includes powering a jet engine or a turbine containing the aerospace component while performing the thermal process and/or oxidation process.
  • thermal energy derived from combustion of fuel in the jet engine or the turbine is used to heat the aerospace component and the metal oxide template layer during the thermal process and/or oxidation process.
  • the jet engine containing the aerospace component is attached to an aircraft which is flown between destinations.
  • the turbine is a land-based turbine (e.g., pump) containing the aerospace component which is ran during the thermal process and/or oxidation process.
  • the aerospace component and the metal oxide template layer are heated in a processing chamber or furnace containing one or more oxygen sources or oxidizing agents during the thermal process and/or oxidation process.
  • oxygen sources or oxidizing agents can be or include oxygen gas (O 2 ), ambient air (containing O 2 ), water or vapor, ozone, atomic oxygen, nitrous oxide, hydrogen peroxide, one or more organic peroxides, or any combination thereof.
  • the aerospace component and the metal oxide template layer are preheated for a first period, maintained at a predetermined temperature for a second period, and cooled for a third period during one heat cycle of the thermal process.
  • the predetermined temperature is about 900° C. to about 1,200° C., or about 1,000° C. to about 1,100° C.
  • the heat cycle can be repeated from 2, 3, 5, 8, 10, 12, 15, or 20 times to about 30, about 40, about 50, about 80, about 100, about 120, about 150, about 200, about 250, about 300, about 1,000, about 2,000, about 3,500, about 5,000, about 10,000, about 20,000, about 30,000, or more.
  • the heat cycle can be repeated from 2 about 300 times, from 10 times to about 150 times, from 20 times to about 100 times, or from 2,000 times to about 10,000 times.
  • the first period is about 1 minute to about 30 minutes
  • the second period is about 15 minutes to about 120 minutes
  • the third period is about 0.5 minutes to about 15 minutes.
  • the first period is about 5 minutes to about 25 minutes
  • the second period is about 20 minutes to about 90 minutes
  • the third period is about 1 minute to about 10 minutes.
  • the first period is about 10 minutes to about 20 minutes
  • the second period is about 30 minutes to about 60 minutes
  • the third period is about 3 minutes to about 8 minutes.
  • an aerospace component contains a body containing a nickel superalloy, a metal oxide template layer disposed on the body, and an aluminum oxide layer disposed between the body of the aerospace component and the metal oxide template layer.
  • the superalloy within the body contains nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, or alloys thereof.
  • the metal oxide template layer contains chromium, tungsten, molybdenum, vanadium or any combination thereof.
  • the aluminum oxide layer contains ⁇ -Al 2 O 3 .
  • the metal oxide template layer and the aluminum oxide layer have the same crystal structure, such as a corundum crystal structure.
  • the metal oxide template layer and the aluminum oxide layer can have crystal structures with a lattice mismatch of about 0.1%, about 0.5%, about 1%, about 2%, about 3%, or about 4% to about 5%, about 6%, about 7%, about 8%, about 9%, or about 10%.
  • the metal oxide template layer and the aluminum oxide layer can have crystal structures with a lattice mismatch of about 0.1% to about 10%, about 2% to about 6%, about 3% to about 5%, or about 3.5% to about 4.5.
  • the aerospace component Prior to depositing or otherwise forming the metal oxide template layer on the aerospace component, the aerospace component may be optionally exposed to one or more pre-clean processes.
  • the surfaces of the aerospace component can contain oxides, organics, oil, soil, particulate, debris, and/or other contaminants are removed prior to producing the metal oxide template layer (e.g., protective coating) on the aerospace component.
  • the pre-clean process can be or include one or more basting or texturing processes, vacuum purges, solvent clean, acid clean, wet clean, plasma clean, sonication, or any combination thereof. Once cleaned and/or textured, the subsequently deposited metal oxide template layer has stronger adhesion to the surfaces of the aerospace component than if otherwise not exposed to the pre-clean process.
  • the surfaces of the aerospace component can be blasted with or otherwise exposed to beads, sand, carbonate, or other particulates to remove oxides and other contaminates therefrom and/or to provide texturing to the surfaces of the aerospace component.
  • the aerospace component can be placed into a chamber within a pulsed push-pull system and exposed to cycles of purge gas (e.g., N 2 , Ar, He, or any combination thereof) and vacuum purges to remove debris from small holes on the aerospace component.
  • the surfaces of the aerospace component can be exposed to hydrogen plasma, oxygen or ozone plasma, and/or nitrogen plasma, which can be generated in a plasma chamber or by a remote plasma system.
  • the surfaces of the aerospace component can be exposed to a hydrogen plasma, then degassed, then exposed to ozone treatment.
  • the surfaces of the aerospace component can be exposed to a wet clean that includes: soaking in an alkaline degreasing solution, rinsing, exposing the surfaces to an acid clean (e.g., sulfuric acid, phosphoric acid, or hydrochloric acid), rinsing, and exposing the surfaces deionized water sonication bath.
  • an acid clean e.g., sulfuric acid, phosphoric acid, or hydrochloric acid
  • the surfaces of the aerospace component can be exposed to a wet clean that includes: exposing the surfaces to a dilute acid solution (e.g., acetic acid or hydrochloric acid), rinsing, and exposing the surfaces deionized water sonication bath.
  • a dilute acid solution e.g., acetic acid or hydrochloric acid
  • rinsing e.g., acetic acid or hydrochloric acid
  • exposing the surfaces deionized water sonication bath e.g., a supercritical carbon dioxide wash
  • purge gas e.g., N 2 , Ar, He, or any combination thereof
  • the aerospace component can be exposed to heating or drying processes, such as heating the aerospace component to a temperature of about 50° C., about 65° C., or about 80° C. to about 100° C., about 120° C., or about 150° C. and exposing to surfaces to the purge gas.
  • the aerospace component can be heated in an oven or exposed to lamps for the heating or drying processes.
  • the aerospace component can be exposed to a first precursor and a first reactant to form the deposited oxide layer on the aerospace component by a vapor deposition process.
  • the vapor deposition process can be an ALD process, a plasma-enhanced ALD (PE-ALD) process, a thermal chemical vapor deposition (CVD) process, a plasma-enhanced CVD (PE-CVD) process, or any combination thereof.
  • the vapor deposition process is an ALD process and the method includes sequentially exposing the surface of the aerospace component to the first precursor and the first reactant to form the deposited oxide layer.
  • Each cycle of the ALD process includes exposing the surface of the aerospace component to the first precursor, conducting a pump-purge, exposing the aerospace component to the first reactant, and conducting a pump-purge to form the deposited oxide layer.
  • the order of the first precursor and the first reactant can be reversed, such that the ALD cycle includes exposing the surface of the aerospace component to the first reactant, conducting a pump-purge, exposing the aerospace component to the first precursor, and conducting a pump-purge to form the deposited oxide layer.
  • the aerospace component is exposed to the first precursor for about 0.1 seconds to about 10 seconds, the first reactant for about 0.1 seconds to about 10 seconds, and the pump-purge for about 0.5 seconds to about 30 seconds. In other examples, during each ALD cycle, the aerospace component is exposed to the first precursor for about 0.5 seconds to about 3 seconds, the first reactant for about 0.5 seconds to about 3 seconds, and the pump-purge for about 1 second to about 10 seconds.
  • Each ALD cycle is repeated from 2, 3, 4, 5, 6, 8, about 10, about 12, or about 15 times to about 18, about 20, about 25, about 30, about 40, about 50, about 65, about 80, about 100, about 120, about 150, about 200, about 250, about 300, about 350, about 400, about 500, about 800, about 1,000, or more times to form the first deposited layer.
  • each ALD cycle is repeated from 2 times to about 1,000 times, 2 times to about 800 times, 2 times to about 500 times, 2 times to about 300 times, 2 times to about 250 times, 2 times to about 200 times, 2 times to about 150 times, 2 times to about 120 times, 2 times to about 100 times, 2 times to about 80 times, 2 times to about 50 times, 2 times to about 30 times, 2 times to about 20 times, 2 times to about 15 times, 2 times to about 10 times, 2 times to 5 times, about 8 times to about 1,000 times, about 8 times to about 800 times, about 8 times to about 500 times, about 8 times to about 300 times, about 8 times to about 250 times, about 8 times to about 200 times, about 8 times to about 150 times, about 8 times to about 120 times, about 8 times to about 100 times, about 8 times to about 80 times, about 8 times to about 50 times, about 8 times to about 30 times, about 8 times to about 20 times, about 8 times to about 15 times, about 8 times to about 10 times, about 20 times to about 1,000 times, about 20 times to about 800 times,
  • the vapor deposition process is a CVD process and the method includes simultaneously exposing the aerospace component to the first precursor and the first reactant to form the deposited oxide layer.
  • each of the first precursor and the first reactant can independent include one or more carrier gases.
  • One or more purge gases can be flowed across the aerospace component and/or throughout the processing chamber in between the exposures of the first precursor and the first reactant.
  • the same gas may be used as a carrier gas and a purge gas.
  • Exemplary carrier gases and purge gases can independently be or include one or more of nitrogen (N 2 ), argon, helium, neon, hydrogen (H 2 ), or any combination thereof.
  • the deposited oxide layer can have a thickness of about 0.1 nm, about 0.2 nm, about 0.3 nm, about 0.4 nm, about 0.5 nm, about 0.8 nm, about 1 nm, about 2 nm, about 3 nm, about 5 nm, about 8 nm, about 10 nm, about 12 nm, or about 15 nm to about 18 nm, about 20 nm, about 25 nm, about 30 nm, about 40 nm, about 50 nm, about 60 nm, about 80 nm, about 100 nm, about 120 nm, or about 150 nm.
  • the deposited oxide layer can have a thickness of about 0.1 nm to about 150 nm, about 0.2 nm to about 150 nm, about 0.2 nm to about 120 nm, about 0.2 nm to about 100 nm, about 0.2 nm to about 80 nm, about 0.2 nm to about 50 nm, about 0.2 nm to about 40 nm, about 0.2 nm to about 30 nm, about 0.2 nm to about 20 nm, about 0.2 nm to about 10 nm, about 0.2 nm to about 5 nm, about 0.2 nm to about 1 nm, about 0.2 nm to about 0.5 nm, about 0.5 nm to about 150 nm, about 0.5 nm to about 120 nm, about 0.5 nm to about 100 nm, about 0.5 nm to about 80 nm, about 0.5 nm to about 50 nm, about 0.5 nm, about
  • the first precursor contains one or more chromium precursors, one or more tungsten precursors, or one or more molybdenum precursors, one or more vanadium precursors.
  • the first reactant contains one or more oxidizing agents.
  • the deposited oxide layer is chromium oxide (e.g., CrO, CrO 2 , or Cr 2 O 3 ), tungsten oxide (e.g., WO 3 ), molybdenum oxide (e.g., MoO 2 or MoO 3 ), vanadium oxide (e.g., VO, VO 2 , or V 2 O 5 ), dopants thereof, or any combination thereof.
  • the chromium precursor can be or include one or more of chromium cyclopentadiene compounds, chromium carbonyl compounds, chromium acetylacetonate compounds, chromium diazadienyl compounds, substitutes thereof, complexes thereof, abducts thereof, salts thereof, or any combination thereof.
  • Exemplary chromium precursor can be or include bis(cyclopentadiene) chromium (Cp 2 Cr), bis(pentamethylcyclopentadiene) chromium ((Me 5 Cp) 2 Cr), bis(isoproplycyclopentadiene) chromium ((iPrCp) 2 Cr), bis(ethylbenzene) chromium ((EtBz) 2 Cr), chromium hexacarbonyl (Cr(CO) 6 ), chromium acetylacetonate (Cr(acac) 3 , also known as, tris(2,4-pentanediono) chromium), chromium hexafluoroacetylacetonate (Cr(hfac) 3 ), chromium(III) tris(2,2,6,6-tetramethyl-3,5-heptanedionate) ⁇ Cr(tmhd) 3 ⁇ , chro
  • each R and R′ is independently selected from H, C1-C6 alkyl, aryl, acyl, alkylamido, hydrazido, silyl, aldehyde, keto, C2-C4 alkenyl, alkynyl, or substitutes thereof.
  • each R is independently a C1-C6 alkyl which is selected from methyl, ethyl, propyl, butyl, or isomers thereof, and R′ is H.
  • R is methyl and R′ is H
  • R is ethyl and R′ is H
  • R is iso-propyl and R′ is H
  • R is tert-butyl and R′ is H.
  • Exemplary oxidizing agents can be or include water (e.g., steam), oxygen (O 2 ), atomic oxygen, ozone, nitrous oxide, one or more peroxides, one or more alcohols, plasmas thereof, or any combination thereof.
  • Embodiments of the present disclosure further relate to any one or more of the following paragraphs 1-35:
  • a method for producing a protective coating on an aerospace component comprising: depositing a metal oxide template layer on the aerospace component comprising nickel and aluminum; and heating the aerospace component containing the metal oxide template layer during a thermal process comprising: diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer; oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer; and removing at least a portion of the metal oxide template layer while leaving the aluminum oxide layer.
  • a method for producing a protective coating on an aerospace component comprising: depositing a metal oxide template layer on the aerospace component comprising nickel and aluminum, wherein the metal oxide template layer comprises chromium oxide, tungsten oxide, molybdenum oxide, vanadium oxide, or any combination thereof; and heating the aerospace component containing the metal oxide template layer to a temperature of about 900° C. to about 1,200° C. during a thermal process comprising: diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer; oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer; and removing at least a portion of the metal oxide template layer while leaving the aluminum oxide layer.
  • An aerospace component comprising: a body comprising a nickel superalloy, the superalloy comprises nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, or alloys thereof; a metal oxide template layer disposed on the body, wherein the metal oxide template layer comprises chromium, tungsten, molybdenum, vanadium or any combination thereof; and an aluminum oxide layer disposed between the body of the aerospace component and the metal oxide template layer.
  • metal oxide template layer comprises chromium oxide, tungsten oxide, molybdenum oxide, vanadium oxide, or any combination thereof.
  • the aerospace component is a turbine blade, a turbine vane, a support member, a frame, a rib, a fin, a pin fin, a combustor fuel nozzle, a combustor shield, an internal cooling channel, or any combination thereof.
  • the aerospace component comprises a nickel superalloy
  • the nickel superalloy comprises nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, or alloys thereof.
  • nickel superalloy comprises about 40 wt % or greater of nickel and about 0.5 wt % to about 15 wt % of aluminum.
  • nickel superalloy comprises about 50 wt % or greater of nickel and about 1 wt % to about 10 wt % of aluminum.
  • nickel superalloy comprises about 58 wt % or greater of nickel and about 2 wt % to about 8 wt % of aluminum.
  • compositions, an element or a group of elements are preceded with the transitional phrase “comprising”, it is understood that we also contemplate the same composition or group of elements with transitional phrases “consisting essentially of,” “consisting of”, “selected from the group of consisting of,” or “is” preceding the recitation of the composition, element, or elements and vice versa.

Abstract

Embodiments of the present disclosure generally relate to protective coatings on aerospace components and methods for depositing the protective coatings. In one or more embodiments, an aerospace component has a body containing a nickel superalloy, a metal oxide template layer disposed on the body, and an aluminum oxide layer disposed between the body of the aerospace component and the metal oxide template layer. The metal oxide template layer contains chromium oxide, chromium oxide hydroxide, or a combination thereof. The aluminum oxide layer contains α-Al2O3. The metal oxide template layer and the aluminum oxide layer have a corundum crystal structure and have crystal structures with a lattice mismatch of about 0.1% to about 10%.

Description

    CROSS-REFERENCE TO RELATED APPLICATIONS
  • This application is a divisional of U.S. application Ser. No. 16/560,838, filed on Sep. 4, 2019, which claims benefit to U.S. Prov. Appl. No. 62/861,925, filed on Jun. 14, 2019, which is herein incorporated by reference.
  • BACKGROUND Field
  • Embodiments of the present disclosure generally relate to deposition processes, and in particular to vapor deposition processes for depositing films on aerospace components.
  • Description of the Related Art
  • Turbine engines typically have components which corrode or degrade over time due to being exposed to hot gases and/or reactive chemicals (e.g., acids, bases, or salts). Such turbine components are often protected by a thermal and/or chemical barrier coating. The current coatings used on airfoils exposed to the hot gases of combustion in gas turbine engines for both environmental protection and as bond coats in thermal barrier coating (TBC) systems include both diffusion aluminides and various metal alloy coatings. These coatings are applied over substrate materials, typically nickel-based superalloys, to provide protection against oxidation and corrosion attack. These coatings are formed on the substrate in a number of different ways. For example, a nickel aluminide layer may be grown as an outer coat on a nickel base superalloy by simply exposing the substrate to an aluminum rich environment at elevated temperatures. The aluminum diffuses into the substrate and combines with the nickel to form an outer surface of the nickel-aluminum alloy.
  • However, as the increased demands for engine performance elevate the engine operating temperatures and/or the engine life requirements, improvements in the performance of coatings when used as environmental coatings or as bond coatings are needed over and above the capabilities of these existing coatings. Because of these demands, a coating that can be used for environmental protection or as a bond coat capable of withstanding higher operating temperatures or operating for a longer period of time before requiring removal for repair, or both, is desired. These known coating materials and deposition techniques have several shortcomings. Most metal alloy coatings deposited by low pressure plasma spray, plasma vapor deposition (PVD), electron beam PVD (EBPVD), cathodic arc, or similar sputtering techniques are line of sight coatings, meaning that interiors of components are not able to be coated. Platinum electroplating of exteriors typically forms a reasonably uniform coating, however, electroplating the interior of a component has proven to be challenging. The resulting electroplating coatings are often too thin to be protective or too thick that there are other adverse mechanical effects, such as high weight gain or fatigue life debit. Similarly, aluminide coatings suffer from non-uniformity on interior passages of components. Aluminide coatings are brittle, which can lead to reduced life when exposed to fatigue.
  • In addition, most of these coatings are on the order of greater than 10 micrometers in thickness, which can cause component weight to increase, making design of the disks and other support structures more challenging. Many of these coatings also require high temperature (e.g., greater than 500° C.) steps to deposit or promote enough interdiffusion of the coating into the alloy to achieve adhesion. It is desired by many to have coatings that (1) protect metals from oxidation and corrosion, (2) have high adhesion to the metal, and/or (3) are sufficiently thin to not materially increase weight or reduce fatigue life outside of current design practices for bare metal.
  • Therefore, improved protective coatings and methods for depositing the protective coatings are needed.
  • SUMMARY
  • Embodiments of the present disclosure generally relate to protective coatings on aerospace components and methods for depositing the protective coatings. In one or more embodiments, a method for producing a protective coating on an aerospace component includes depositing a metal oxide template layer on the aerospace component containing nickel and aluminum (e.g., nickel-aluminum superalloy) and heating the aerospace component containing the metal oxide template layer during a thermal process and/or an oxidation process. The thermal process and/or oxidation process includes diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer, oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer, and removing all or some of the metal oxide template layer while leaving the aluminum oxide layer. The metal oxide template layer may partially form a solid solution of the templating element with the aluminum oxide layer.
  • In some embodiments, a method for producing a protective coating on an aerospace component includes depositing a metal oxide template layer on the aerospace component containing nickel and aluminum, where the metal oxide template layer contains chromium oxide, tungsten oxide, molybdenum oxide, vanadium oxide, or any combination thereof. The method also includes heating the aerospace component containing the metal oxide template layer to a temperature of about 900° C. to about 1,200° C. during a thermal process and/or an oxidation process. The thermal process and/or oxidation process includes diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer, oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer, and removing all or some of the metal oxide template layer while leaving the aluminum oxide layer. The metal oxide template layer may partially form a solid solution of the templating element with the aluminum oxide layer.
  • In other embodiments, an aerospace component contains a body containing a nickel superalloy, a metal oxide template layer disposed on the body, and an aluminum oxide layer disposed between the body of the aerospace component and the metal oxide template layer. The superalloy within the body contains nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, or alloys thereof. The metal oxide template layer contains chromium, tungsten, molybdenum, vanadium or any combination thereof. In some examples, the aluminum oxide layer contains α-Al2O3. The metal oxide template layer and the aluminum oxide layer have the same crystal structure, such as a corundum crystal structure. The metal oxide template layer and the aluminum oxide layer can have crystal structures with a lattice mismatch of about 0.1% to about 10%. The metal oxide template layer may partially form a solid solution of the templating element with the aluminum oxide layer. The solid solution zone of mixed metal oxides has a lattice mismatch less than that of the templating oxide and the aluminum oxide.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • So that the manner in which the above recited features of the present disclosure can be understood in detail, a more particular description of the disclosure, briefly summarized above, may be had by reference to embodiments, some of which are illustrated in the appended drawings. It is to be noted, however, that the appended drawings illustrate only exemplary embodiments and are therefore not to be considered limiting of its scope, may admit to other equally effective embodiments.
  • FIGS. 1A-1D are schematic cross-sectional views of protective coatings disposed on an aerospace component at different time intervals, according to one or more embodiments described and discussed herein.
  • To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the Figures. It is contemplated that elements and features of one or more embodiments may be beneficially incorporated in other embodiments.
  • DETAILED DESCRIPTION
  • Embodiments of the present disclosure generally relate to protective coatings disposed on an aerospace components and methods for depositing or otherwise forming the protective coatings. Aerospace components as described and discussed herein can be or include one or more turbine blades, turbine vanes, ribs, fins, pin fins, combustor fuel nozzles, combustor shields, or any other aerospace component or part that can benefit from having protective coating deposited thereon. The protective coatings can be deposited or otherwise formed on interior surfaces and/or exterior surfaces of the aerospace components.
  • In one or more embodiments, a method for producing a protective coating on an aerospace component includes depositing a metal oxide template layer on the aerospace component containing nickel and aluminum (e.g., nickel-aluminum superalloy) and heating the aerospace component containing the metal oxide template layer during a thermal process and/or an oxidation process. The thermal process and/or oxidation process includes diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer, oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer, and removing at least a portion of the metal oxide template layer while leaving the aluminum oxide layer.
  • FIGS. 1A-1D are schematic cross-sectional views of protective coatings disposed on an aerospace component 102 at different time intervals, according to one or more embodiments described and discussed herein. FIG. 1A depicts the aerospace component 102 having a surface 104. The surface 104 can be one or more interior surfaces and/or one or more exterior surfaces of the aerospace component 102. The aerospace component 102 can be or include a turbine blade, a turbine vane, a support member, a frame, a rib, a fin, a pin fin, a combustor fuel nozzle, a combustor shield, an internal cooling channel, or any combination thereof. The aerospace component 102 contains one or more nickel superalloys. The nickel superalloy can be or include a nickel-aluminum superalloy and contain nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, other elements, dopants thereof, or alloys thereof.
  • The nickel superalloy contains about 20 wt %, about 30 wt %, about 40 wt %, about 45 wt %, about 48 wt %, about 50 wt %, about 55 wt %, about 58 wt %, or about 60 wt % to about 62 wt %, about 65 wt %, about 68 wt %, about 70 wt %, about 75 wt %, about 80 wt %, about 85 wt %, or about 90 wt % of nickel. For examples, the nickel superalloy contains about 20 wt % to about 90 wt %, about 30 wt % to about 80 wt %, about 40 wt % to about 90 wt %, about 40 wt % to about 80 wt %, about 40 wt % to about 75 wt %, about 20 wt % to about 70 wt %, about 40 wt % to about 65 wt %, about 40 wt % to about 62 wt %, about 40 wt % to about 60 wt %, about 40 wt % to about 58 wt %, about 40 wt % to about 55 wt %, about 40 wt % to about 50 wt %, about 50 wt % to about 90 wt %, about 50 wt % to about 80 wt %, about 50 wt % to about 75 wt %, about 20 wt % to about 70 wt %, about 50 wt % to about 65 wt %, about 50 wt % to about 62 wt %, about 50 wt % to about 60 wt %, about 50 wt % to about 58 wt %, about 50 wt % to about 55 wt %, about 58 wt % to about 90 wt %, about 58 wt % to about 80 wt %, about 58 wt % to about 75 wt %, about 20 wt % to about 70 wt %, about 58 wt % to about 65 wt %, about 58 wt % to about 62 wt %, or about 58 wt % to about 60 wt % of nickel.
  • The nickel superalloy contains about 0.2 wt %, about 0.5 wt %, about 0.8 wt %, about 1 wt %, about 1.5 wt %, about 2 wt %, about 2.5 wt %, about 3 wt %, about 3.5 wt %, about 4 wt %, or about 4.5 wt % to about 5 wt %, about 6 wt %, about 7 wt %, about 8 wt %, about 9 wt %, about 10 wt %, about 12 wt %, about 15 wt %, about 18 wt %, or about 20 wt % of aluminum. For example, the nickel superalloy contains about 0.2 wt % to about 20 wt %, about 0.5 wt % to about 20 wt %, about 0.5 wt % to about 18 wt %, about 0.5 wt % to about 15 wt %, about 0.5 wt % to about 12 wt %, about 0.5 wt % to about 10 wt %, about 0.5 wt % to about 8 wt %, about 0.5 wt % to about 6 wt %, about 0.5 wt % to about 5 wt %, about 0.5 wt % to about 4 wt %, about 0.5 wt % to about 3 wt %, about 0.5 wt % to about 2 wt %, about 0.5 wt % to about 1 wt %, about 1 wt % to about 20 wt %, about 1 wt % to about 18 wt %, about 1 wt % to about 15 wt %, about 1 wt % to about 12 wt %, about 1 wt % to about 10 wt %, about 1 wt % to about 8 wt %, about 1 wt % to about 6 wt %, about 1 wt % to about 5 wt %, about 1 wt % to about 4 wt %, about 1 wt % to about 3 wt %, about 1 wt % to about 2 wt %, about 1 wt % to about 1 wt %, about 3 wt % to about 20 wt %, about 3 wt % to about 18 wt %, about 3 wt % to about 15 wt %, about 3 wt % to about 12 wt %, about 3 wt % to about 10 wt %, about 3 wt % to about 8 wt %, about 3 wt % to about 6 wt %, about 3 wt % to about 5 wt %, or about 3 wt % to about 4 wt % of aluminum.
  • In one or more examples, the nickel superalloy contains about 40 wt % or greater of nickel and about 0.5 wt % to about 15 wt % of aluminum. In some examples, the nickel superalloy contains about 50 wt % or greater of nickel and about 1 wt % to about 10 wt % of aluminum. In other examples, the nickel superalloy contains about 58 wt % or greater of nickel and about 2 wt % to about 8 wt % of aluminum.
  • In some examples, the nickel superalloy can be or include the CMSX-4 superalloy, the CMSX-4 Plus superalloy, PWA alloys, Rene alloys, one or more Inconel alloys, one or more Haynes alloys, e.g. Haynes 214, Haynes 233, alumina forming austenitic steel alloys, or any combinations thereof. Table 1 provides the elemental compositions of several exemplary superalloys useful in embodiments described and discussed herein. In Table 1, Alloy (1) is the CMSX-4 superalloy, Alloy (2) is the CMSX-4 Plus superalloy, and all weights are in units of weight percent (wt %) unless otherwise noted.
  • TABLE 1
    Alloy Ni Co Cr Mo W Re Ru Ta Al Hf
    (1) 61.7 9 6.5 0.6 6 3 0 6.5 5.6 0.1
    (2) 60.5 10 3.5 0.6 6 4.8 0 8 5.7 0.1
    S Y
    Alloy Nb C Fe O Ti Zr B (ppmw) (ppmw)
    (1) 0 0 0 0 1 0 0 2 0
    (2) 0 0 0 0 0.85 0 0 0.5-1 0
  • FIG. 1B depicts a metal oxide template layer 110 disposed on the surface 104 of the aerospace component 102, as described and discussed in one or more embodiments herein. The metal oxide template layer 110 contains one or more metal oxides, such as chromium oxide (e.g., CrO, CrO2, or Cr2O3), tungsten oxide (e.g., WO3), molybdenum oxide (e.g., MoO2 or MoO3), vanadium oxide (e.g., VO, VO2, or V2O5), dopants thereof, or any combination thereof. In some examples, the metal oxide template layer 110 does not include aluminum oxide as a template layer. The metal oxide contained in the metal oxide template layer 110 has a crystalline lattice that promotes the growth or otherwise formation of aluminum oxide during a thermal process and/or an oxidation process. The metal oxide contained in the metal oxide template layer 110 can be sublimed, evaporated, oxidized, or otherwise removed from the aerospace component 102 at a later time. As such, the metal oxide template layer is removed by sublimation or evaporation or oxidation during the thermal process and/or oxidation process during and/or subsequent to the formation of the aluminum oxide. In one or more examples, the metal oxide template layer 110 contains chromium oxide, and the method further includes converting the chromium oxide to chromium oxide hydroxide (CrO2(OH)2) during the thermal process and/or oxidation process.
  • The metal oxide template layer 110 has a thickness of about 10 nm, about 20 nm, about 30 nm, about 50 nm, about 80 nm, about 100 nm, about 150 nm, or about 200 nm to about 250 nm, about 300 nm, about 350 nm, about 400 nm, about 500 nm, about 600 nm, about 700 nm, about 800 nm, about 900 nm, about 1,000 nm, about 1,200 nm, about 1,500 nm, about 1,800 nm, about 2,000 nm, about 3,500 nm, about 5,000 nm, about 7,500 nm, about 10,000 nm, or thicker. For example, the metal oxide template layer 110 has a thickness of about 1,000 nm to about 2,000 nm, about 1,000 nm to about 5,000 nm, about 2,000 nm to about 10,000 nm, about 10 nm to about 10,000 nm, about 10 nm to about 5,000 nm, about 10 nm to about 3,500 nm, about 10 nm to about 2,000 nm, about 10 nm to about 1,500 nm, about 10 nm to about 1,000 nm, about 10 nm to about 800 nm, about 10 nm to about 600 nm, about 10 nm to about 500 nm, about 10 nm to about 400 nm, about 10 nm to about 300 nm, about 10 nm to about 200 nm, about 10 nm to about 100 nm, about 10 nm to about 80 nm, about 10 nm to about 50 nm, about 10 nm to about 30 nm, about 100 nm to about 2,000 nm, about 100 nm to about 1,500 nm, about 100 nm to about 1,000 nm, about 100 nm to about 800 nm, about 100 nm to about 600 nm, about 100 nm to about 500 nm, about 100 nm to about 400 nm, about 100 nm to about 300 nm, or about 100 nm to about 200 nm.
  • The metal oxide template layer 110 can be deposited on the aerospace component 102 by one or more vapor deposition processes, such an atomic layer deposition (ALD) process, a plasma-enhanced ALD (PE-ALD) process, a thermal chemical vapor deposition (CVD) process, a plasma-enhanced CVD (PE-CVD) process, as well as other deposition processes.
  • FIG. 1C depicts an aluminum oxide layer 120 disposed between the aerospace component 102 and the metal oxide template layer 110, as described and discussed in one or more embodiments herein. The aerospace component 102 containing the metal oxide template layer 110 is exposed to one or more thermal processes and/or one or more oxidation processes to produce the aluminum oxide layer 120. As the thermal process and/or oxidation process progresses, the aluminum oxide layer 120 continues to form and the metal oxide template layer 110 progressively is removed. Eventually, the metal oxide template layer 110 is completely consumed or otherwise removed and the aluminum oxide layer 120 is the protective coating for the remaining portion of the aerospace component 102, as depicted in FIG. 1D.
  • In one or more embodiments, the thermal process and/or oxidation process includes diffusing aluminum contained within the aerospace component 102 towards the surface 104 containing the metal oxide template layer 110, oxidizing the diffused aluminum to produce the aluminum oxide layer 120 which is disposed between the aerospace component 102 and the metal oxide template layer 110, and removing at least a portion of the metal oxide template layer 110 while leaving the aluminum oxide layer 120. In some examples, the metal oxide template layer 110 is substantially removed or completely removed during the thermal process and/or oxidation process.
  • In some embodiments, the metal oxide template layer 110 and the aluminum oxide layer 120 have the same crystalline structure or substantially the same crystalline structure. In one or more examples, the metal oxide template layer 110 and the aluminum oxide layer 120 have a corundum crystal structure. The metal oxide template layer 110 performs as a template and nucleates and helps grow the aluminum oxide layer 120 from the diffused aluminum and therefore they both share the common lattice or crystalline structure. In some examples, the aluminum oxide layer 120 contains α-Al2O3. The metal oxide template layer 110 and the aluminum oxide layer 120 have crystal structures with a lattice mismatch of about 0.1%, about 0.5%, about 1%, about 2%, about 3%, or about 4% to about 5%, about 6%, about 8%, or about 10%. For example, the metal oxide template layer 110 and the aluminum oxide layer 120 have crystal structures with a lattice mismatch of about 0.1% to about 10%, about 0.5% to about 8%, or about 1% to about 5%.
  • The aluminum oxide layer 120 has a thickness of about 10 nm, about 20 nm, about 30 nm, about 50 nm, about 80 nm, about 100 nm, about 150 nm, or about 200 nm to about 250 nm, about 300 nm, about 350 nm, about 400 nm, about 500 nm, about 600 nm, about 700 nm, about 800 nm, about 900 nm, about 1,000 nm, about 1,200 nm, about 1,500 nm, about 2,000 nm, about 2,500 nm, about 3,000 nm, about 5,000 nm, about 6,000 nm, about 10,000 nm, or thicker. For example, the aluminum oxide layer 120 has a thickness of about 1,000 nm to about 2,000 nm, about 1,000 nm to about 5,000 nm, or about 2,000 nm to about 10,000 nm, about 10 nm to about 10,000 nm, about 10 nm to about 8,000 nm, about 10 nm to about 5,000 nm, about 10 nm to about 3,500 nm, about 10 nm to about 2,000 nm, about 10 nm to about 1,500 nm, about 10 nm to about 1,200 nm, about 10 nm to about 1,000 nm, about 10 nm to about 800 nm, about 10 nm to about 600 nm, about 10 nm to about 500 nm, about 10 nm to about 400 nm, about 10 nm to about 300 nm, about 10 nm to about 200 nm, about 10 nm to about 100 nm, about 10 nm to about 80 nm, about 10 nm to about 50 nm, about 10 nm to about 30 nm, about 20 nm to about 1,000 nm, about 20 nm to about 800 nm, about 20 nm to about 600 nm, about 20 nm to about 500 nm, about 20 nm to about 400 nm, about 20 nm to about 300 nm, about 20 nm to about 200 nm, about 20 nm to about 100 nm, about 20 nm to about 80 nm, about 20 nm to about 50 nm, about 100 nm to about 1,200 nm, about 100 nm to about 1,000 nm, about 100 nm to about 800 nm, about 100 nm to about 600 nm, about 100 nm to about 500 nm, about 100 nm to about 400 nm, about 100 nm to about 300 nm, or about 100 nm to about 200 nm.
  • In one or more embodiments, during the thermal process and/or oxidation process, the aerospace component is heated to a temperature of about 800° C., about 850° C., about 900° C., about 950° C., about 980° C., or about 1,000° C. to about 1,050° C., about 1,100° C., about 1,150° C., about 1,200° C., about 1,300° C., about 1,400° C., or about 1,500° C. For example the aerospace component is heated to a temperature of about 800° C. to about 1,500° C., about 800° C. to about 1,300° C., about 800° C. to about 1,150° C., about 800° C. to about 1,100° C., about 800° C. to about 1,050° C., about 800° C. to about 1,000° C., about 800° C. to about 950° C., about 800° C. to about 900° C., about 850° C. to about 1,500° C., about 850° C. to about 1,300° C., about 850° C. to about 1,150° C., about 850° C. to about 1,100° C., about 850° C. to about 1,050° C., about 850° C. to about 1,000° C., about 850° C. to about 950° C., about 850° C. to about 900° C., about 950° C. to about 1,500° C., about 950° C. to about 1,300° C., about 950° C. to about 1,150° C., about 950° C. to about 1,100° C., about 950° C. to about 1,050° C., or about 950° C. to about 1,000° C. during the thermal process and/or oxidation process.
  • In some embodiments, during the thermal process and/or oxidation process, the aerospace component is heated for about 20 minutes, about 30 minutes, about 40 minutes, about 50 minutes, about 1 hour, about 1.5 hours, or about 2 hours to about 3 hours, about 5 hours, about 8 hours, about 10 hours, about 20 hours, about 24 hours, about 30 hours, about 50 hours, about 80 hours, about 100 hours, about 1,000 hours, about 10,000 hours, about 25,000 hours, about 35,000 hours, about 50,000 hours, about 100,000 hours, about 200,000 hours or longer. For example, the aerospace component is heated for about 20 minutes to about 100 hours, about 20 minutes to about 50 hours, about 20 minutes to about 24 hours, about 20 minutes to about 10 hours, about 20 minutes to about 5 hours, about 20 minutes to about 2 hours, about 20 minutes to about 1 hour, about 20 minutes to about 45 minutes, about 20 minutes to about 40 minutes, or about 20 minutes to about 30 minutes during the thermal process and/or oxidation process.
  • In some embodiments, the aerospace component is thermally cycled while running or otherwise using the aerospace component in a turbine, an engine, a pump, or other machinery. For example, the aerospace component is heated while running a jet or a pump containing the aerospace component, then cooled when use is stopped. This heating and cooling is a single thermal cycle and can be repeated numerous times as the thermal process and/or oxidation process. As such, during the thermal process and/or oxidation process, the aerospace component can be thermally cycled from an ambient temperature of about −50° C. to about 35° C., then heated to warmer temperature of about 35° C. to about 100° C., then heated to a process temperature of about 100° C. to about 1,200° C. Thereafter, the aerospace component can be cooled to warmer temperature and/or the ambient temperature to complete one thermal cycle. These heating and cooling sub-cycles form a single thermal cycle which can be repeated 2 times, 3 times, about 50 times, about 100 times, about 500 times, or about 1,000 times to about 2,000 times, about 4,000 times, about 10,000 times, about 15,000 times, about 25,000 times, or more.
  • In one or more examples, the aerospace component is heated to a temperature of about 800° C. to about 1,500° C. for about 20 minutes to about 100 hours during the thermal process. In other examples, the aerospace component is heated to a temperature of about 900° C. to about 1,200° C. during the thermal process. In some examples, the aerospace component is heated to a temperature of about 1,000° C. to about 1,100° C. during the thermal process.
  • In one or more embodiments, oxygen is diffused through the metal oxide template layer before reacting with the aluminum to produce the aluminum oxide layer during the thermal process and/or oxidation process. The oxygen can come from one or more oxygen sources. Exemplary oxygen sources or oxidizing agents can be or include oxygen gas (O2), ambient air (containing O2), water or vapor, ozone, atomic oxygen, nitrous oxide, hydrogen peroxide, one or more organic peroxides, or any combination thereof. In one or more examples, the aerospace component and the metal oxide template layer are exposed to air containing the oxygen during the thermal process and/or oxidation process. This ambient oxygen (O2) is the oxidizing agent during the thermal process and/or oxidation process.
  • In one or more embodiments, the method includes powering a jet engine or a turbine containing the aerospace component while performing the thermal process and/or oxidation process. For example, thermal energy derived from combustion of fuel in the jet engine or the turbine is used to heat the aerospace component and the metal oxide template layer during the thermal process and/or oxidation process. In some examples, the jet engine containing the aerospace component is attached to an aircraft which is flown between destinations. In other examples, the turbine is a land-based turbine (e.g., pump) containing the aerospace component which is ran during the thermal process and/or oxidation process.
  • In other embodiments, the aerospace component and the metal oxide template layer are heated in a processing chamber or furnace containing one or more oxygen sources or oxidizing agents during the thermal process and/or oxidation process. Exemplary oxygen sources or oxidizing agents can be or include oxygen gas (O2), ambient air (containing O2), water or vapor, ozone, atomic oxygen, nitrous oxide, hydrogen peroxide, one or more organic peroxides, or any combination thereof.
  • In one or more embodiments, the aerospace component and the metal oxide template layer are preheated for a first period, maintained at a predetermined temperature for a second period, and cooled for a third period during one heat cycle of the thermal process. The predetermined temperature is about 900° C. to about 1,200° C., or about 1,000° C. to about 1,100° C. The heat cycle can be repeated from 2, 3, 5, 8, 10, 12, 15, or 20 times to about 30, about 40, about 50, about 80, about 100, about 120, about 150, about 200, about 250, about 300, about 1,000, about 2,000, about 3,500, about 5,000, about 10,000, about 20,000, about 30,000, or more. In some examples, the heat cycle can be repeated from 2 about 300 times, from 10 times to about 150 times, from 20 times to about 100 times, or from 2,000 times to about 10,000 times.
  • In one or more examples, the first period is about 1 minute to about 30 minutes, the second period is about 15 minutes to about 120 minutes, and the third period is about 0.5 minutes to about 15 minutes. In some examples, the first period is about 5 minutes to about 25 minutes, the second period is about 20 minutes to about 90 minutes, and the third period is about 1 minute to about 10 minutes. In other examples, the first period is about 10 minutes to about 20 minutes, the second period is about 30 minutes to about 60 minutes, and the third period is about 3 minutes to about 8 minutes.
  • In one or more embodiments, an aerospace component contains a body containing a nickel superalloy, a metal oxide template layer disposed on the body, and an aluminum oxide layer disposed between the body of the aerospace component and the metal oxide template layer. The superalloy within the body contains nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, or alloys thereof. The metal oxide template layer contains chromium, tungsten, molybdenum, vanadium or any combination thereof. In some examples, the aluminum oxide layer contains α-Al2O3. The metal oxide template layer and the aluminum oxide layer have the same crystal structure, such as a corundum crystal structure. The metal oxide template layer and the aluminum oxide layer can have crystal structures with a lattice mismatch of about 0.1%, about 0.5%, about 1%, about 2%, about 3%, or about 4% to about 5%, about 6%, about 7%, about 8%, about 9%, or about 10%. For example, the metal oxide template layer and the aluminum oxide layer can have crystal structures with a lattice mismatch of about 0.1% to about 10%, about 2% to about 6%, about 3% to about 5%, or about 3.5% to about 4.5.
  • Optional Pre-Clean of Aerospace Component
  • Prior to depositing or otherwise forming the metal oxide template layer on the aerospace component, the aerospace component may be optionally exposed to one or more pre-clean processes. The surfaces of the aerospace component can contain oxides, organics, oil, soil, particulate, debris, and/or other contaminants are removed prior to producing the metal oxide template layer (e.g., protective coating) on the aerospace component. The pre-clean process can be or include one or more basting or texturing processes, vacuum purges, solvent clean, acid clean, wet clean, plasma clean, sonication, or any combination thereof. Once cleaned and/or textured, the subsequently deposited metal oxide template layer has stronger adhesion to the surfaces of the aerospace component than if otherwise not exposed to the pre-clean process.
  • In one or more examples, the surfaces of the aerospace component can be blasted with or otherwise exposed to beads, sand, carbonate, or other particulates to remove oxides and other contaminates therefrom and/or to provide texturing to the surfaces of the aerospace component. In some examples, the aerospace component can be placed into a chamber within a pulsed push-pull system and exposed to cycles of purge gas (e.g., N2, Ar, He, or any combination thereof) and vacuum purges to remove debris from small holes on the aerospace component. In other examples, the surfaces of the aerospace component can be exposed to hydrogen plasma, oxygen or ozone plasma, and/or nitrogen plasma, which can be generated in a plasma chamber or by a remote plasma system.
  • In one or more examples, such as for organic removal or oxide removal, the surfaces of the aerospace component can be exposed to a hydrogen plasma, then degassed, then exposed to ozone treatment. In other examples, such as for organic removal, the surfaces of the aerospace component can be exposed to a wet clean that includes: soaking in an alkaline degreasing solution, rinsing, exposing the surfaces to an acid clean (e.g., sulfuric acid, phosphoric acid, or hydrochloric acid), rinsing, and exposing the surfaces deionized water sonication bath. In some examples, such as for oxide removal, the surfaces of the aerospace component can be exposed to a wet clean that includes: exposing the surfaces to a dilute acid solution (e.g., acetic acid or hydrochloric acid), rinsing, and exposing the surfaces deionized water sonication bath. In one or more examples, such as for particle removal, the surfaces of the aerospace component can be exposed to sonication (e.g., megasonication) and/or a supercritical carbon dioxide wash, followed by exposing to cycles of purge gas (e.g., N2, Ar, He, or any combination thereof) and vacuum purges to remove particles from and dry the surfaces. In some examples, the aerospace component can be exposed to heating or drying processes, such as heating the aerospace component to a temperature of about 50° C., about 65° C., or about 80° C. to about 100° C., about 120° C., or about 150° C. and exposing to surfaces to the purge gas. The aerospace component can be heated in an oven or exposed to lamps for the heating or drying processes.
  • Vapor Deposition of Metal Oxide Template Layer
  • The aerospace component can be exposed to a first precursor and a first reactant to form the deposited oxide layer on the aerospace component by a vapor deposition process. The vapor deposition process can be an ALD process, a plasma-enhanced ALD (PE-ALD) process, a thermal chemical vapor deposition (CVD) process, a plasma-enhanced CVD (PE-CVD) process, or any combination thereof.
  • In one or more embodiments, the vapor deposition process is an ALD process and the method includes sequentially exposing the surface of the aerospace component to the first precursor and the first reactant to form the deposited oxide layer. Each cycle of the ALD process includes exposing the surface of the aerospace component to the first precursor, conducting a pump-purge, exposing the aerospace component to the first reactant, and conducting a pump-purge to form the deposited oxide layer. The order of the first precursor and the first reactant can be reversed, such that the ALD cycle includes exposing the surface of the aerospace component to the first reactant, conducting a pump-purge, exposing the aerospace component to the first precursor, and conducting a pump-purge to form the deposited oxide layer.
  • In some examples, during each ALD cycle, the aerospace component is exposed to the first precursor for about 0.1 seconds to about 10 seconds, the first reactant for about 0.1 seconds to about 10 seconds, and the pump-purge for about 0.5 seconds to about 30 seconds. In other examples, during each ALD cycle, the aerospace component is exposed to the first precursor for about 0.5 seconds to about 3 seconds, the first reactant for about 0.5 seconds to about 3 seconds, and the pump-purge for about 1 second to about 10 seconds.
  • Each ALD cycle is repeated from 2, 3, 4, 5, 6, 8, about 10, about 12, or about 15 times to about 18, about 20, about 25, about 30, about 40, about 50, about 65, about 80, about 100, about 120, about 150, about 200, about 250, about 300, about 350, about 400, about 500, about 800, about 1,000, or more times to form the first deposited layer. For example, each ALD cycle is repeated from 2 times to about 1,000 times, 2 times to about 800 times, 2 times to about 500 times, 2 times to about 300 times, 2 times to about 250 times, 2 times to about 200 times, 2 times to about 150 times, 2 times to about 120 times, 2 times to about 100 times, 2 times to about 80 times, 2 times to about 50 times, 2 times to about 30 times, 2 times to about 20 times, 2 times to about 15 times, 2 times to about 10 times, 2 times to 5 times, about 8 times to about 1,000 times, about 8 times to about 800 times, about 8 times to about 500 times, about 8 times to about 300 times, about 8 times to about 250 times, about 8 times to about 200 times, about 8 times to about 150 times, about 8 times to about 120 times, about 8 times to about 100 times, about 8 times to about 80 times, about 8 times to about 50 times, about 8 times to about 30 times, about 8 times to about 20 times, about 8 times to about 15 times, about 8 times to about 10 times, about 20 times to about 1,000 times, about 20 times to about 800 times, about 20 times to about 500 times, about 20 times to about 300 times, about 20 times to about 250 times, about 20 times to about 200 times, about 20 times to about 150 times, about 20 times to about 120 times, about 20 times to about 100 times, about 20 times to about 80 times, about 20 times to about 50 times, about 20 times to about 30 times, about 50 times to about 1,000 times, about 50 times to about 500 times, about 50 times to about 350 times, about 50 times to about 300 times, about 50 times to about 250 times, about 50 times to about 150 times, or about 50 times to about 100 times to form the deposited oxide layer.
  • In other embodiments, the vapor deposition process is a CVD process and the method includes simultaneously exposing the aerospace component to the first precursor and the first reactant to form the deposited oxide layer. During an ALD process or a CVD process, each of the first precursor and the first reactant can independent include one or more carrier gases. One or more purge gases can be flowed across the aerospace component and/or throughout the processing chamber in between the exposures of the first precursor and the first reactant. In some examples, the same gas may be used as a carrier gas and a purge gas. Exemplary carrier gases and purge gases can independently be or include one or more of nitrogen (N2), argon, helium, neon, hydrogen (H2), or any combination thereof.
  • The deposited oxide layer can have a thickness of about 0.1 nm, about 0.2 nm, about 0.3 nm, about 0.4 nm, about 0.5 nm, about 0.8 nm, about 1 nm, about 2 nm, about 3 nm, about 5 nm, about 8 nm, about 10 nm, about 12 nm, or about 15 nm to about 18 nm, about 20 nm, about 25 nm, about 30 nm, about 40 nm, about 50 nm, about 60 nm, about 80 nm, about 100 nm, about 120 nm, or about 150 nm. For example, the deposited oxide layer can have a thickness of about 0.1 nm to about 150 nm, about 0.2 nm to about 150 nm, about 0.2 nm to about 120 nm, about 0.2 nm to about 100 nm, about 0.2 nm to about 80 nm, about 0.2 nm to about 50 nm, about 0.2 nm to about 40 nm, about 0.2 nm to about 30 nm, about 0.2 nm to about 20 nm, about 0.2 nm to about 10 nm, about 0.2 nm to about 5 nm, about 0.2 nm to about 1 nm, about 0.2 nm to about 0.5 nm, about 0.5 nm to about 150 nm, about 0.5 nm to about 120 nm, about 0.5 nm to about 100 nm, about 0.5 nm to about 80 nm, about 0.5 nm to about 50 nm, about 0.5 nm to about 40 nm, about 0.5 nm to about 30 nm, about 0.5 nm to about 20 nm, about 0.5 nm to about 10 nm, about 0.5 nm to about 5 nm, about 0.5 nm to about 1 nm, about 2 nm to about 150 nm, about 2 nm to about 120 nm, about 2 nm to about 100 nm, about 2 nm to about 80 nm, about 2 nm to about 50 nm, about 2 nm to about 40 nm, about 2 nm to about 30 nm, about 2 nm to about 20 nm, about 2 nm to about 10 nm, about 2 nm to about 5 nm, about 2 nm to about 3 nm, about 10 nm to about 150 nm, about 10 nm to about 120 nm, about 10 nm to about 100 nm, about 10 nm to about 80 nm, about 10 nm to about 50 nm, about 10 nm to about 40 nm, about 10 nm to about 30 nm, about 10 nm to about 20 nm, or about 10 nm to about 15 nm.
  • In one or more embodiments, the first precursor contains one or more chromium precursors, one or more tungsten precursors, or one or more molybdenum precursors, one or more vanadium precursors. The first reactant contains one or more oxidizing agents. In some examples, the deposited oxide layer is chromium oxide (e.g., CrO, CrO2, or Cr2O3), tungsten oxide (e.g., WO3), molybdenum oxide (e.g., MoO2 or MoO3), vanadium oxide (e.g., VO, VO2, or V2O5), dopants thereof, or any combination thereof.
  • The chromium precursor can be or include one or more of chromium cyclopentadiene compounds, chromium carbonyl compounds, chromium acetylacetonate compounds, chromium diazadienyl compounds, substitutes thereof, complexes thereof, abducts thereof, salts thereof, or any combination thereof. Exemplary chromium precursor can be or include bis(cyclopentadiene) chromium (Cp2Cr), bis(pentamethylcyclopentadiene) chromium ((Me5Cp)2Cr), bis(isoproplycyclopentadiene) chromium ((iPrCp)2Cr), bis(ethylbenzene) chromium ((EtBz)2Cr), chromium hexacarbonyl (Cr(CO)6), chromium acetylacetonate (Cr(acac)3, also known as, tris(2,4-pentanediono) chromium), chromium hexafluoroacetylacetonate (Cr(hfac)3), chromium(III) tris(2,2,6,6-tetramethyl-3,5-heptanedionate) {Cr(tmhd)3}, chromium(II) bis(1,4-ditertbutyldiazadienyl), isomers thereof, complexes thereof, abducts thereof, salts thereof, or any combination thereof. Exemplary chromium diazadienyl compounds can have a chemical formula of:
  • Figure US20230313380A1-20231005-C00001
  • where each R and R′ is independently selected from H, C1-C6 alkyl, aryl, acyl, alkylamido, hydrazido, silyl, aldehyde, keto, C2-C4 alkenyl, alkynyl, or substitutes thereof. In some examples, each R is independently a C1-C6 alkyl which is selected from methyl, ethyl, propyl, butyl, or isomers thereof, and R′ is H. For example, R is methyl and R′ is H, R is ethyl and R′ is H, R is iso-propyl and R′ is H, or R is tert-butyl and R′ is H.
  • Exemplary oxidizing agents can be or include water (e.g., steam), oxygen (O2), atomic oxygen, ozone, nitrous oxide, one or more peroxides, one or more alcohols, plasmas thereof, or any combination thereof.
  • Embodiments of the present disclosure further relate to any one or more of the following paragraphs 1-35:
  • 1. A method for producing a protective coating on an aerospace component, comprising: depositing a metal oxide template layer on the aerospace component comprising nickel and aluminum; and heating the aerospace component containing the metal oxide template layer during a thermal process comprising: diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer; oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer; and removing at least a portion of the metal oxide template layer while leaving the aluminum oxide layer.
  • 2. A method for producing a protective coating on an aerospace component, comprising: depositing a metal oxide template layer on the aerospace component comprising nickel and aluminum, wherein the metal oxide template layer comprises chromium oxide, tungsten oxide, molybdenum oxide, vanadium oxide, or any combination thereof; and heating the aerospace component containing the metal oxide template layer to a temperature of about 900° C. to about 1,200° C. during a thermal process comprising: diffusing aluminum contained within the aerospace component towards a surface of the aerospace component containing the metal oxide template layer; oxidizing the diffused aluminum to produce an aluminum oxide layer disposed between the aerospace component and the metal oxide template layer; and removing at least a portion of the metal oxide template layer while leaving the aluminum oxide layer.
  • 3. An aerospace component, comprising: a body comprising a nickel superalloy, the superalloy comprises nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, or alloys thereof; a metal oxide template layer disposed on the body, wherein the metal oxide template layer comprises chromium, tungsten, molybdenum, vanadium or any combination thereof; and an aluminum oxide layer disposed between the body of the aerospace component and the metal oxide template layer.
  • 4. The method or the aerospace component according to any one of paragraphs 1-3, wherein the metal oxide template layer comprises chromium oxide, tungsten oxide, molybdenum oxide, vanadium oxide, or any combination thereof.
  • 5. The method or the aerospace component according to any one of paragraphs 1-4, wherein the metal oxide template layer comprises chromium oxide, and the method further comprises converting the chromium oxide to chromium oxide hydroxide during the thermal process.
  • 6. The method or the aerospace component according to any one of paragraphs 1-5, wherein the metal oxide template layer has a thickness of about 10 nm to about 2,000 nm.
  • 7. The method or the aerospace component according to any one of paragraphs 1-6, wherein the metal oxide template layer has a thickness of about 100 nm to about 1,000 nm.
  • 8. The method or the aerospace component according to any one of paragraphs 1-7, wherein the aluminum oxide layer has a thickness of about 10 nm to about 1,000 nm.
  • 9. The method or the aerospace component according to any one of paragraphs 1-8, wherein the aluminum oxide layer has a thickness of about 20 nm to about 500 nm.
  • 10. The method or the aerospace component according to any one of paragraphs 1-9, wherein the aluminum oxide layer comprises α-Al2O3.
  • 11. The method or the aerospace component according paragraph 10, wherein the metal oxide template layer and the aluminum oxide layer have a corundum crystal structure.
  • 12. The method or the aerospace component according paragraph 10, wherein the metal oxide template layer and the aluminum oxide layer have crystal structures with a lattice mismatch of about 0.1% to about 10%.
  • 13. The method or the aerospace component according to any one of paragraphs 1-12, wherein the metal oxide template layer is removed by sublimation or evaporation or oxidation during the thermal process.
  • 14. The method or the aerospace component according to any one of paragraphs 1-13, wherein the aerospace component is heated to a temperature of about 800° C. to about 1,500° C. for about 20 minutes to about 100 hours during the thermal process.
  • 15. The method or the aerospace component according paragraph 14, wherein the aerospace component is heated to a temperature of about 900° C. to about 1,200° C. during the thermal process.
  • 16. The method or the aerospace component according paragraph 15, wherein the aerospace component is heated to a temperature of about 1,000° C. to about 1,100° C. during the thermal process.
  • 17. The method or the aerospace component according to any one of paragraphs 1-16, wherein oxygen is diffused through the metal oxide template layer before reacting with the aluminum to produce the aluminum oxide layer.
  • 18. The method or the aerospace component according paragraph 17, wherein the aerospace component and the metal oxide template layer are exposed to air containing the oxygen during the thermal process.
  • 19. The method or the aerospace component according to any one of paragraphs 1-18, further comprising powering a jet engine or a turbine containing the aerospace component while performing the thermal process.
  • 20. The method or the aerospace component according paragraph 19, wherein thermal energy from the jet engine or the turbine is used to heat the aerospace component and the metal oxide template layer during the thermal process.
  • 21. The method or the aerospace component according to any one of paragraphs 1-20, wherein the aerospace component and the metal oxide template layer are heated in a processing chamber or furnace during the thermal process.
  • 22. The method or the aerospace component according paragraph 21, wherein the aerospace component and the metal oxide template layer are preheated for a first period, maintained at a predetermined temperature for a second period, and cooled for a third period during one heat cycle of the thermal process.
  • 23. The method or the aerospace component according paragraph 22, wherein the first period is about 1 minute to about 30 minutes, the second period is about 15 minutes to about 120 minutes, and the third period is about 0.5 minutes to about 15 minutes.
  • 24. The method or the aerospace component according paragraph 22, wherein the first period is about 5 minutes to about 25 minutes, the second period is about 20 minutes to about 90 minutes, and the third period is about 1 minute to about 10 minutes.
  • 25. The method or the aerospace component according paragraph 22, wherein the first period is about 10 minutes to about 20 minutes, the second period is about 30 minutes to about 60 minutes, and the third period is about 3 minutes to about 8 minutes.
  • 26. The method or the aerospace component according paragraph 22, wherein the heat cycle is repeated from 2 times to about 300 times.
  • 27. The method or the aerospace component according paragraph 22, wherein the heat cycle is repeated from 10 times to about 150 times.
  • 28. The method or the aerospace component according paragraph 22, wherein the predetermined temperature is about 900° C. to about 1,200° C.
  • 29. The method or the aerospace component according paragraph 22, wherein the predetermined temperature is about 1,000° C. to about 1,100° C.
  • 30. The method or the aerospace component according to any one of paragraphs 1-29, wherein the metal oxide template layer is deposited on the aerospace component by an ALD process or a CVD process.
  • 31. The method or the aerospace component according to any one of paragraphs 1-30, wherein the aerospace component is a turbine blade, a turbine vane, a support member, a frame, a rib, a fin, a pin fin, a combustor fuel nozzle, a combustor shield, an internal cooling channel, or any combination thereof.
  • 32. The method or the aerospace component according to any one of paragraphs 1-31, wherein the aerospace component comprises a nickel superalloy, and wherein the nickel superalloy comprises nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, or alloys thereof.
  • 33. The method or the aerospace component according paragraph 32, wherein the nickel superalloy comprises about 40 wt % or greater of nickel and about 0.5 wt % to about 15 wt % of aluminum.
  • 34. The method or the aerospace component according paragraph 32, wherein the nickel superalloy comprises about 50 wt % or greater of nickel and about 1 wt % to about 10 wt % of aluminum.
  • 35. The method or the aerospace component according paragraph 32, wherein the nickel superalloy comprises about 58 wt % or greater of nickel and about 2 wt % to about 8 wt % of aluminum.
  • While the foregoing is directed to embodiments of the disclosure, other and further embodiments may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow. All documents described herein are incorporated by reference herein, including any priority documents and/or testing procedures to the extent they are not inconsistent with this text. As is apparent from the foregoing general description and the specific embodiments, while forms of the present disclosure have been illustrated and described, various modifications can be made without departing from the spirit and scope of the present disclosure. Accordingly, it is not intended that the present disclosure be limited thereby. Likewise, the term “comprising” is considered synonymous with the term “including” for purposes of United States law. Likewise whenever a composition, an element or a group of elements is preceded with the transitional phrase “comprising”, it is understood that we also contemplate the same composition or group of elements with transitional phrases “consisting essentially of,” “consisting of”, “selected from the group of consisting of,” or “is” preceding the recitation of the composition, element, or elements and vice versa.
  • Certain embodiments and features have been described using a set of numerical upper limits and a set of numerical lower limits. It should be appreciated that ranges including the combination of any two values, e.g., the combination of any lower value with any upper value, the combination of any two lower values, and/or the combination of any two upper values are contemplated unless otherwise indicated. Certain lower limits, upper limits and ranges appear in one or more claims below.

Claims (20)

What is claimed is:
1. An aerospace component, comprising:
a body comprising a nickel superalloy;
a metal oxide template layer disposed on the body, wherein the metal oxide template layer comprises chromium oxide, chromium oxide hydroxide, or a combination thereof; and
an aluminum oxide layer disposed between the body of the aerospace component and the metal oxide template layer, wherein the aluminum oxide layer comprises α-Al2O3, wherein the metal oxide template layer and the aluminum oxide layer have a corundum crystal structure, and wherein the metal oxide template layer and the aluminum oxide layer have crystal structures with a lattice mismatch of about 0.1% to about 10%.
2. The aerospace component of claim 1, wherein the metal oxide template layer has a thickness of about 10 nm to about 2,000 nm.
3. The aerospace component of claim 2, wherein the aluminum oxide layer has a thickness of about 10 nm to about 1,000 nm.
4. The aerospace component of claim 1, wherein the metal oxide template layer and the aluminum oxide layer have crystal structures with a lattice mismatch of about 1% to about 8%.
5. The aerospace component of claim 1, wherein the metal oxide template layer is a material deposited on the aerospace component by an atomic layer deposition (ALD) process or a chemical vapor deposition (CVD) process.
6. The aerospace component of claim 1, wherein the aerospace component is a turbine blade, a turbine vane, a support member, a frame, a rib, a fin, a pin fin, a combustor fuel nozzle, a combustor shield, an internal cooling channel, or any combination thereof.
7. The aerospace component of claim 1, wherein the nickel superalloy comprises nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, or alloys thereof.
8. The aerospace component of claim 7, wherein the nickel superalloy comprises about 40 wt % or greater of nickel and about 0.5 wt % to about 15 wt % of aluminum.
9. The aerospace component of claim 1, wherein the nickel superalloy comprises about 50 wt % or greater of nickel and about 1 wt % to about 10 wt % of aluminum.
10. An aerospace component, comprising:
a body comprising a nickel superalloy, the superalloy comprises nickel, aluminum, and one or more metals selected from chromium, cobalt, titanium, molybdenum, tungsten, or alloys thereof;
a metal oxide template layer disposed on the body, wherein the metal oxide template layer comprises chromium oxide, tungsten oxide, molybdenum oxide, vanadium oxide, or any combination thereof; and
an aluminum oxide layer disposed between the body of the aerospace component and the metal oxide template layer, wherein the aluminum oxide layer comprises α-Al2O3, wherein the metal oxide template layer and the aluminum oxide layer have a corundum crystal structure, and wherein the metal oxide template layer and the aluminum oxide layer have crystal structures with a lattice mismatch of about 0.1% to about 10%.
11. The aerospace component of claim 10, wherein the metal oxide template layer comprises chromium oxide.
12. The aerospace component of claim 11, wherein the metal oxide template layer further comprises chromium oxide hydroxide.
13. The aerospace component of claim 10, wherein the metal oxide template layer has a thickness of about 10 nm to about 2,000 nm.
14. The aerospace component of claim 13, wherein the metal oxide template layer has a thickness of about 100 nm to about 1,000 nm.
15. The aerospace component of claim 10, wherein the aluminum oxide layer has a thickness of about 10 nm to about 1,000 nm.
16. The aerospace component of claim 15, wherein the aluminum oxide layer has a thickness of about 20 nm to about 500 nm.
17. The aerospace component of claim 10, wherein the metal oxide template layer and the aluminum oxide layer have crystal structures with a lattice mismatch of about 1% to about 8%.
18. The aerospace component of claim 10, wherein the aerospace component is a turbine blade, a turbine vane, a support member, a frame, a rib, a fin, a pin fin, a combustor fuel nozzle, a combustor shield, an internal cooling channel, or any combination thereof.
19. The aerospace component of claim 10, wherein the nickel superalloy comprises about 50 wt % or greater of nickel and about 1 wt % to about 10 wt % of aluminum.
20. An aerospace component, comprising:
a body comprising a nickel superalloy, wherein the nickel superalloy comprises about 40 wt % or greater of nickel and about 0.5 wt % to about 15 wt % of aluminum, and wherein the aerospace component is a turbine blade, a turbine vane, a support member, a frame, a rib, a fin, a pin fin, a combustor fuel nozzle, a combustor shield, an internal cooling channel, or any combination thereof;
a metal oxide template layer disposed on the body, wherein the metal oxide template layer comprises chromium oxide, chromium oxide hydroxide, or a combination thereof; and
an aluminum oxide layer disposed between the body of the aerospace component and the metal oxide template layer, wherein the aluminum oxide layer comprises α-Al2O3, wherein the metal oxide template layer and the aluminum oxide layer have a corundum crystal structure, and wherein the metal oxide template layer and the aluminum oxide layer have crystal structures with a lattice mismatch of about 2% to about 8%.
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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10276411B2 (en) 2017-08-18 2019-04-30 Applied Materials, Inc. High pressure and high temperature anneal chamber
EP3768874A4 (en) 2018-03-19 2022-03-30 Applied Materials, Inc. Methods for depositing coatings on aerospace components
WO2019209401A1 (en) 2018-04-27 2019-10-31 Applied Materials, Inc. Protection of components from corrosion
US11009339B2 (en) 2018-08-23 2021-05-18 Applied Materials, Inc. Measurement of thickness of thermal barrier coatings using 3D imaging and surface subtraction methods for objects with complex geometries
WO2020219332A1 (en) 2019-04-26 2020-10-29 Applied Materials, Inc. Methods of protecting aerospace components against corrosion and oxidation
US11794382B2 (en) 2019-05-16 2023-10-24 Applied Materials, Inc. Methods for depositing anti-coking protective coatings on aerospace components
US11697879B2 (en) 2019-06-14 2023-07-11 Applied Materials, Inc. Methods for depositing sacrificial coatings on aerospace components
US11466364B2 (en) 2019-09-06 2022-10-11 Applied Materials, Inc. Methods for forming protective coatings containing crystallized aluminum oxide
US11519066B2 (en) 2020-05-21 2022-12-06 Applied Materials, Inc. Nitride protective coatings on aerospace components and methods for making the same
WO2022005696A1 (en) 2020-07-03 2022-01-06 Applied Materials, Inc. Methods for refurbishing aerospace components
WO2022040146A1 (en) * 2020-08-18 2022-02-24 Applied Materials, Inc. Methods for cleaning aerospace components

Family Cites Families (287)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0209307B1 (en) 1985-07-15 1988-09-07 The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Cleaning of metal articles
EP0236309A1 (en) * 1985-09-14 1987-09-16 BBC Aktiengesellschaft Brown, Boveri & Cie. Ceramic protective coating
US5217757A (en) 1986-11-03 1993-06-08 United Technologies Corporation Method for applying aluminide coatings to superalloys
GB2216902A (en) * 1988-04-05 1989-10-18 Atomic Energy Authority Uk Protective coatings for alloys
FR2643087B1 (en) 1989-02-16 1991-06-07 Unirec PROCESS FOR DEPOSITING A CERAMIC-TYPE COATING ON A METAL SUBSTRATE AND ELEMENT COMPRISING A COATING OBTAINED BY THIS PROCESS
JP2823086B2 (en) 1990-05-21 1998-11-11 日本碍子株式会社 Connecting member and connecting method thereof
US5362228A (en) 1991-11-04 1994-11-08 Societe Europeenne De Propulsion Apparatus for preheating a flow of gas in an installation for chemical vapor infiltration, and a densification method using the apparatus
US6379466B1 (en) 1992-01-17 2002-04-30 Applied Materials, Inc. Temperature controlled gas distribution plate
US6495271B1 (en) 1993-03-01 2002-12-17 General Electric Company Spallation-resistant protective layer on high performance alloys
WO1996031687A1 (en) 1995-04-06 1996-10-10 General Electric Company Method and composite for protection of thermal barrier coating with an impermeable barrier coating
US5503874A (en) 1994-09-30 1996-04-02 General Electric Company Method for low temperature chemical vapor deposition of aluminides containing easily oxidized metals
US5950925A (en) 1996-10-11 1999-09-14 Ebara Corporation Reactant gas ejector head
RU2218451C2 (en) 1996-12-10 2003-12-10 Сименс Акциенгезелльшафт Article with heat-insulating layer subjected to action of hot gas and method of manufacture of such article
US5759640A (en) * 1996-12-27 1998-06-02 General Electric Company Method for forming a thermal barrier coating system having enhanced spallation resistance
JP2981184B2 (en) 1997-02-21 1999-11-22 トーカロ株式会社 Boiler heat transfer tube and method for producing boiler heat transfer tube with excellent effect of suppressing deposit adhesion on inner surface of tube
US5916378A (en) * 1997-03-11 1999-06-29 Wj Semiconductor Equipment Group, Inc. Method of reducing metal contamination during semiconductor processing in a reactor having metal components
JP2991990B2 (en) 1997-03-24 1999-12-20 トーカロ株式会社 Thermal spray coating for high temperature environment and method of manufacturing the same
US5975852A (en) * 1997-03-31 1999-11-02 General Electric Company Thermal barrier coating system and method therefor
TW417249B (en) 1997-05-14 2001-01-01 Applied Materials Inc Reliability barrier integration for cu application
US6156382A (en) 1997-05-16 2000-12-05 Applied Materials, Inc. Chemical vapor deposition process for depositing tungsten
US6309713B1 (en) 1997-06-30 2001-10-30 Applied Materials, Inc. Deposition of tungsten nitride by plasma enhanced chemical vapor deposition
US6162715A (en) 1997-06-30 2000-12-19 Applied Materials, Inc. Method of forming gate electrode connection structure by in situ chemical vapor deposition of tungsten and tungsten nitride
US6872429B1 (en) 1997-06-30 2005-03-29 Applied Materials, Inc. Deposition of tungsten nitride using plasma pretreatment in a chemical vapor deposition chamber
US6805750B1 (en) 1998-06-12 2004-10-19 United Technologies Corporation Surface preparation process for deposition of ceramic coating
US6106959A (en) 1998-08-11 2000-08-22 Siemens Westinghouse Power Corporation Multilayer thermal barrier coating systems
US6042898A (en) 1998-12-15 2000-03-28 United Technologies Corporation Method for applying improved durability thermal barrier coatings
US6514629B1 (en) 1998-12-15 2003-02-04 General Electric Company Article with hafnium-silicon-modified platinum-aluminum bond or environmental coating
US6245192B1 (en) 1999-06-30 2001-06-12 Lam Research Corporation Gas distribution apparatus for semiconductor processing
US6455167B1 (en) * 1999-07-02 2002-09-24 General Electric Company Coating system utilizing an oxide diffusion barrier for improved performance and repair capability
US6207295B1 (en) 1999-07-13 2001-03-27 General Electric Company Article with tailorable high temperature coating
US6402898B1 (en) 1999-07-28 2002-06-11 Yeda Research And Development Co., Ltd. Coherently controlled laser distillation of chiral enantiomers
US6332926B1 (en) 1999-08-11 2001-12-25 General Electric Company Apparatus and method for selectively coating internal and external surfaces of an airfoil
US6359089B2 (en) 2000-04-19 2002-03-19 Dupont Dow Elastomers, L.L.C. Fluorovinyl ether cure site monomers and fluoroelastomer copolymer compositions thereof
US6630244B1 (en) 2001-03-23 2003-10-07 Delavan Inc. Carbon resistant surface coating
JP3603112B2 (en) 2000-05-31 2004-12-22 独立行政法人産業技術総合研究所 Low temperature production of alumina crystalline thin film
US6620723B1 (en) 2000-06-27 2003-09-16 Applied Materials, Inc. Formation of boride barrier layers using chemisorption techniques
US6551929B1 (en) 2000-06-28 2003-04-22 Applied Materials, Inc. Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques
US6936538B2 (en) 2001-07-16 2005-08-30 Applied Materials, Inc. Method and apparatus for depositing tungsten after surface treatment to improve film characteristics
US7405158B2 (en) 2000-06-28 2008-07-29 Applied Materials, Inc. Methods for depositing tungsten layers employing atomic layer deposition techniques
US7732327B2 (en) 2000-06-28 2010-06-08 Applied Materials, Inc. Vapor deposition of tungsten materials
US7964505B2 (en) 2005-01-19 2011-06-21 Applied Materials, Inc. Atomic layer deposition of tungsten materials
US7101795B1 (en) 2000-06-28 2006-09-05 Applied Materials, Inc. Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer
US20020127336A1 (en) 2001-01-16 2002-09-12 Applied Materials, Inc. Method for growing thin films by catalytic enhancement
US6811814B2 (en) 2001-01-16 2004-11-02 Applied Materials, Inc. Method for growing thin films by catalytic enhancement
US6544665B2 (en) 2001-01-18 2003-04-08 General Electric Company Thermally-stabilized thermal barrier coating
US6951804B2 (en) 2001-02-02 2005-10-04 Applied Materials, Inc. Formation of a tantalum-nitride layer
US6465040B2 (en) 2001-02-06 2002-10-15 General Electric Company Method for refurbishing a coating including a thermally grown oxide
US20020117399A1 (en) 2001-02-23 2002-08-29 Applied Materials, Inc. Atomically thin highly resistive barrier layer in a copper via
US6878206B2 (en) 2001-07-16 2005-04-12 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
EP1247941A1 (en) 2001-04-03 2002-10-09 Siemens Aktiengesellschaft Gas turbine blade
US7211144B2 (en) 2001-07-13 2007-05-01 Applied Materials, Inc. Pulsed nucleation deposition of tungsten layers
US20070009658A1 (en) 2001-07-13 2007-01-11 Yoo Jong H Pulse nucleation enhanced nucleation technique for improved step coverage and better gap fill for WCVD process
WO2003029515A2 (en) 2001-07-16 2003-04-10 Applied Materials, Inc. Formation of composite tungsten films
US20030198754A1 (en) 2001-07-16 2003-10-23 Ming Xi Aluminum oxide chamber and process
AU2002354941A1 (en) 2001-07-17 2003-03-03 Dana-Farber Cancer Institute, Inc. Mll translocations specify a distinct gene expression profile, distinguishing a unique leukemia
US20030029715A1 (en) 2001-07-25 2003-02-13 Applied Materials, Inc. An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems
US20080268635A1 (en) 2001-07-25 2008-10-30 Sang-Ho Yu Process for forming cobalt and cobalt silicide materials in copper contact applications
JP2005504885A (en) 2001-07-25 2005-02-17 アプライド マテリアルズ インコーポレイテッド Barrier formation using a novel sputter deposition method
US8110489B2 (en) 2001-07-25 2012-02-07 Applied Materials, Inc. Process for forming cobalt-containing materials
US20090004850A1 (en) 2001-07-25 2009-01-01 Seshadri Ganguli Process for forming cobalt and cobalt silicide materials in tungsten contact applications
US9051641B2 (en) 2001-07-25 2015-06-09 Applied Materials, Inc. Cobalt deposition on barrier surfaces
US6607976B2 (en) 2001-09-25 2003-08-19 Applied Materials, Inc. Copper interconnect barrier layer structure and formation method
US20030059535A1 (en) 2001-09-25 2003-03-27 Lee Luo Cycling deposition of low temperature films in a cold wall single wafer process chamber
US7049226B2 (en) 2001-09-26 2006-05-23 Applied Materials, Inc. Integration of ALD tantalum nitride for copper metallization
US20030057526A1 (en) 2001-09-26 2003-03-27 Applied Materials, Inc. Integration of barrier layer and seed layer
US20030059538A1 (en) 2001-09-26 2003-03-27 Applied Materials, Inc. Integration of barrier layer and seed layer
TW589684B (en) 2001-10-10 2004-06-01 Applied Materials Inc Method for depositing refractory metal layers employing sequential deposition techniques
US20030072884A1 (en) 2001-10-15 2003-04-17 Applied Materials, Inc. Method of titanium and titanium nitride layer deposition
US6916398B2 (en) 2001-10-26 2005-07-12 Applied Materials, Inc. Gas delivery apparatus and method for atomic layer deposition
US6620956B2 (en) 2001-11-16 2003-09-16 Applied Materials, Inc. Nitrogen analogs of copper II β-diketonates as source reagents for semiconductor processing
WO2003044242A2 (en) 2001-11-16 2003-05-30 Applied Materials, Inc. Atomic layer deposition of copper using a reducing gas and non-fluorinated copper precursors
JP2003164819A (en) 2001-11-30 2003-06-10 Fujikura Ltd Method for cleaning extruder or its part
US7081271B2 (en) 2001-12-07 2006-07-25 Applied Materials, Inc. Cyclical deposition of refractory metal silicon nitride
US6949342B2 (en) 2001-12-21 2005-09-27 Whitehead Institute For Biomedical Research Prostate cancer diagnosis and outcome prediction by expression analysis
US6939801B2 (en) 2001-12-21 2005-09-06 Applied Materials, Inc. Selective deposition of a barrier layer on a dielectric material
US6809026B2 (en) 2001-12-21 2004-10-26 Applied Materials, Inc. Selective deposition of a barrier layer on a metal film
US20030123216A1 (en) 2001-12-27 2003-07-03 Yoon Hyungsuk A. Deposition of tungsten for the formation of conformal tungsten silicide
US6677247B2 (en) 2002-01-07 2004-01-13 Applied Materials Inc. Method of increasing the etch selectivity of a contact sidewall to a preclean etchant
US6942929B2 (en) 2002-01-08 2005-09-13 Nianci Han Process chamber having component with yttrium-aluminum coating
US7371467B2 (en) 2002-01-08 2008-05-13 Applied Materials, Inc. Process chamber component having electroplated yttrium containing coating
US6827815B2 (en) 2002-01-15 2004-12-07 Applied Materials, Inc. Showerhead assembly for a processing chamber
US6620670B2 (en) 2002-01-18 2003-09-16 Applied Materials, Inc. Process conditions and precursors for atomic layer deposition (ALD) of AL2O3
US6730175B2 (en) 2002-01-22 2004-05-04 Applied Materials, Inc. Ceramic substrate support
AU2003238853A1 (en) 2002-01-25 2003-09-02 Applied Materials, Inc. Apparatus for cyclical deposition of thin films
US6911391B2 (en) 2002-01-26 2005-06-28 Applied Materials, Inc. Integration of titanium and titanium nitride layers
KR100442869B1 (en) 2002-02-02 2004-08-02 삼성전자주식회사 Equipment for cleaning process of the semiconductor wafer using vaporizing chemicals and cleaning process using the same equipment
US6827978B2 (en) 2002-02-11 2004-12-07 Applied Materials, Inc. Deposition of tungsten films
US20030157760A1 (en) 2002-02-20 2003-08-21 Applied Materials, Inc. Deposition of tungsten films for dynamic random access memory (DRAM) applications
US6833161B2 (en) 2002-02-26 2004-12-21 Applied Materials, Inc. Cyclical deposition of tungsten nitride for metal oxide gate electrode
US6905939B2 (en) 2002-02-27 2005-06-14 Applied Materials, Inc. Process for forming silicon oxide material
US6972267B2 (en) 2002-03-04 2005-12-06 Applied Materials, Inc. Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor
US6825134B2 (en) 2002-03-26 2004-11-30 Applied Materials, Inc. Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow
US7439191B2 (en) 2002-04-05 2008-10-21 Applied Materials, Inc. Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications
US6846516B2 (en) 2002-04-08 2005-01-25 Applied Materials, Inc. Multiple precursor cyclical deposition system
US6869838B2 (en) 2002-04-09 2005-03-22 Applied Materials, Inc. Deposition of passivation layers for active matrix liquid crystal display (AMLCD) applications
US7279432B2 (en) 2002-04-16 2007-10-09 Applied Materials, Inc. System and method for forming an integrated barrier layer
US20030235961A1 (en) 2002-04-17 2003-12-25 Applied Materials, Inc. Cyclical sequential deposition of multicomponent films
US20030203616A1 (en) 2002-04-24 2003-10-30 Applied Materials, Inc. Atomic layer deposition of tungsten barrier layers using tungsten carbonyls and boranes for copper metallization
US7094445B2 (en) 2002-05-07 2006-08-22 General Electric Company Dimensionally controlled pack aluminiding of internal surfaces of a hollow article
US6616978B1 (en) * 2002-05-09 2003-09-09 General Electric Company Protecting a substrate with a multilayer oxide/phosphate coating having a temperature-stepped cure
US20030215570A1 (en) 2002-05-16 2003-11-20 Applied Materials, Inc. Deposition of silicon nitride
US7404985B2 (en) 2002-06-04 2008-07-29 Applied Materials, Inc. Noble metal layer formation for copper film deposition
US20040009665A1 (en) 2002-06-04 2004-01-15 Applied Materials, Inc. Deposition of copper films
US7264846B2 (en) 2002-06-04 2007-09-04 Applied Materials, Inc. Ruthenium layer formation for copper film deposition
US7910165B2 (en) 2002-06-04 2011-03-22 Applied Materials, Inc. Ruthenium layer formation for copper film deposition
US7041335B2 (en) 2002-06-04 2006-05-09 Applied Materials, Inc. Titanium tantalum nitride silicide layer
US20080090425A9 (en) 2002-06-12 2008-04-17 Christopher Olsen Two-step post nitridation annealing for lower EOT plasma nitrided gate dielectrics
KR101044366B1 (en) 2002-06-12 2011-06-29 어플라이드 머티어리얼스, 인코포레이티드 Plasma method and apparatus for processing a substrate
US6858547B2 (en) 2002-06-14 2005-02-22 Applied Materials, Inc. System and method for forming a gate dielectric
US7067439B2 (en) 2002-06-14 2006-06-27 Applied Materials, Inc. ALD metal oxide deposition process using direct oxidation
US20030232501A1 (en) 2002-06-14 2003-12-18 Kher Shreyas S. Surface pre-treatment for enhancement of nucleation of high dielectric constant materials
US6924191B2 (en) 2002-06-20 2005-08-02 Applied Materials, Inc. Method for fabricating a gate structure of a field effect transistor
US6838125B2 (en) 2002-07-10 2005-01-04 Applied Materials, Inc. Method of film deposition using activated precursor gases
US20040013803A1 (en) 2002-07-16 2004-01-22 Applied Materials, Inc. Formation of titanium nitride films using a cyclical deposition process
US20040018738A1 (en) 2002-07-22 2004-01-29 Wei Liu Method for fabricating a notch gate structure of a field effect transistor
US6784096B2 (en) 2002-09-11 2004-08-31 Applied Materials, Inc. Methods and apparatus for forming barrier layers in high aspect ratio vias
US6808816B2 (en) 2002-09-13 2004-10-26 General Electric Company Method and coating system for reducing carbonaceous deposits on surfaces exposed to hydrocarbon fuels at elevated temperatures
EP1411210A1 (en) 2002-10-15 2004-04-21 ALSTOM Technology Ltd Method of depositing an oxidation and fatigue resistant MCrAIY-coating
US8257450B2 (en) 2002-12-18 2012-09-04 Afton Chemical Intangibles Llc Manganese compounds to inhibit both low-and high-temperature corrosion in utility and industrial furnace systems
US20070023142A1 (en) 2002-12-19 2007-02-01 Lagraff John R Airfoil refurbishment method
US7262133B2 (en) 2003-01-07 2007-08-28 Applied Materials, Inc. Enhancement of copper line reliability using thin ALD tan film to cap the copper line
US7244683B2 (en) 2003-01-07 2007-07-17 Applied Materials, Inc. Integration of ALD/CVD barriers with porous low k materials
US7060366B2 (en) 2003-02-19 2006-06-13 General Electric Company Article including a substrate with a metallic coating and a chromium-aluminide protective coating thereon, and its preparation and use in component restoration
US6930059B2 (en) 2003-02-27 2005-08-16 Sharp Laboratories Of America, Inc. Method for depositing a nanolaminate film by atomic layer deposition
US7429540B2 (en) 2003-03-07 2008-09-30 Applied Materials, Inc. Silicon oxynitride gate dielectric formation using multiple annealing steps
JP3865705B2 (en) * 2003-03-24 2007-01-10 トーカロ株式会社 Heat shielding coating material excellent in corrosion resistance and heat resistance, and method for producing the same
US20040198069A1 (en) 2003-04-04 2004-10-07 Applied Materials, Inc. Method for hafnium nitride deposition
US6887589B2 (en) 2003-04-18 2005-05-03 General Electric Company Nickel aluminide coating and coating systems formed therewith
KR20060079144A (en) 2003-06-18 2006-07-05 어플라이드 머티어리얼스, 인코포레이티드 Atomic layer deposition of barrier materials
KR100630677B1 (en) 2003-07-02 2006-10-02 삼성전자주식회사 Etching process having plasma pre-treatment for inducing carbon contained fluorine free - polymer on photoresist patterns
US6905730B2 (en) 2003-07-08 2005-06-14 General Electric Company Aluminide coating of turbine engine component
GB0319349D0 (en) 2003-08-18 2003-09-17 Southside Thermal Sciences Sts Coatings and an optical method for detecting corrosion processes in coatings
US6921251B2 (en) 2003-09-05 2005-07-26 General Electric Company Aluminide or chromide coating of turbine engine rotor component
US20050085031A1 (en) 2003-10-15 2005-04-21 Applied Materials, Inc. Heterogeneous activation layers formed by ionic and electroless reactions used for IC interconnect capping layers
US20050109276A1 (en) 2003-11-25 2005-05-26 Applied Materials, Inc. Thermal chemical vapor deposition of silicon nitride using BTBAS bis(tertiary-butylamino silane) in a single wafer chamber
US6979498B2 (en) 2003-11-25 2005-12-27 General Electric Company Strengthened bond coats for thermal barrier coatings
US7361233B2 (en) 2003-12-10 2008-04-22 General Electric Company Methods of hydrogen cleaning of metallic surfaces
US7285312B2 (en) * 2004-01-16 2007-10-23 Honeywell International, Inc. Atomic layer deposition for turbine components
DE102004002946A1 (en) 2004-01-21 2005-08-11 Forschungszentrum Jülich GmbH Protective layer for an aluminum-containing alloy for use at high temperatures, and method for producing such a protective layer
US20050255329A1 (en) 2004-05-12 2005-11-17 General Electric Company Superalloy article having corrosion resistant coating thereon
US20050252449A1 (en) 2004-05-12 2005-11-17 Nguyen Son T Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
US20060019033A1 (en) 2004-05-21 2006-01-26 Applied Materials, Inc. Plasma treatment of hafnium-containing materials
US20060153995A1 (en) 2004-05-21 2006-07-13 Applied Materials, Inc. Method for fabricating a dielectric stack
US20060062917A1 (en) 2004-05-21 2006-03-23 Shankar Muthukrishnan Vapor deposition of hafnium silicate materials with tris(dimethylamino)silane
US8323754B2 (en) 2004-05-21 2012-12-04 Applied Materials, Inc. Stabilization of high-k dielectric materials
US8119210B2 (en) 2004-05-21 2012-02-21 Applied Materials, Inc. Formation of a silicon oxynitride layer on a high-k dielectric material
JP2006010403A (en) 2004-06-23 2006-01-12 Seiko Epson Corp Method for repairing exterior component for timepiece
DE602005016933D1 (en) 2004-06-28 2009-11-12 Cambridge Nanotech Inc ATOMIC SEPARATION SYSTEM AND METHOD
US7241686B2 (en) 2004-07-20 2007-07-10 Applied Materials, Inc. Atomic layer deposition of tantalum-containing materials using the tantalum precursor TAIMATA
US20060019032A1 (en) 2004-07-23 2006-01-26 Yaxin Wang Low thermal budget silicon nitride formation for advance transistor fabrication
US20060021633A1 (en) 2004-07-27 2006-02-02 Applied Materials, Inc. Closed loop clean gas control
US7875119B2 (en) 2004-10-01 2011-01-25 United Technologies Corporation Apparatus and method for coating an article
US20060084283A1 (en) 2004-10-20 2006-04-20 Paranjpe Ajit P Low temperature sin deposition methods
US7374825B2 (en) 2004-12-01 2008-05-20 General Electric Company Protection of thermal barrier coating by an impermeable barrier coating
US7429402B2 (en) 2004-12-10 2008-09-30 Applied Materials, Inc. Ruthenium as an underlayer for tungsten film deposition
US7560395B2 (en) 2005-01-05 2009-07-14 Micron Technology, Inc. Atomic layer deposited hafnium tantalum oxide dielectrics
JP3757418B1 (en) 2005-01-19 2006-03-22 石川島播磨重工業株式会社 Method for local application of diffusion aluminide coating
US7508648B2 (en) 2005-02-08 2009-03-24 Micron Technology, Inc. Atomic layer deposition of Dy doped HfO2 films as gate dielectrics
US7265048B2 (en) 2005-03-01 2007-09-04 Applied Materials, Inc. Reduction of copper dewetting by transition metal deposition
KR100674967B1 (en) 2005-04-06 2007-01-26 삼성전자주식회사 Method of forming photoresist patterns having fine pitch using double patterning technique
CA2605970A1 (en) 2005-04-29 2006-11-09 National Research Council Of Canada Method of on-line thickness measurement of applied coatings
US7473655B2 (en) 2005-06-17 2009-01-06 Applied Materials, Inc. Method for silicon based dielectric chemical vapor deposition
US20060286819A1 (en) 2005-06-21 2006-12-21 Applied Materials, Inc. Method for silicon based dielectric deposition and clean with photoexcitation
US7651955B2 (en) 2005-06-21 2010-01-26 Applied Materials, Inc. Method for forming silicon-containing materials during a photoexcitation deposition process
US7601652B2 (en) 2005-06-21 2009-10-13 Applied Materials, Inc. Method for treating substrates and films with photoexcitation
US7317229B2 (en) 2005-07-20 2008-01-08 Applied Materials, Inc. Gate electrode structures and methods of manufacture
US20070049043A1 (en) 2005-08-23 2007-03-01 Applied Materials, Inc. Nitrogen profile engineering in HI-K nitridation for device performance enhancement and reliability improvement
US7402534B2 (en) 2005-08-26 2008-07-22 Applied Materials, Inc. Pretreatment processes within a batch ALD reactor
US7740960B1 (en) 2005-08-26 2010-06-22 The United States Of America As Represented By The Secretary Of The Army Multifunctionally graded environmental barrier coatings for silicon-base ceramic components
US20070054487A1 (en) 2005-09-06 2007-03-08 Applied Materials, Inc. Atomic layer deposition processes for ruthenium materials
US20070065578A1 (en) 2005-09-21 2007-03-22 Applied Materials, Inc. Treatment processes for a batch ALD reactor
US7807231B2 (en) 2005-11-30 2010-10-05 General Electric Company Process for forming thermal barrier coating resistant to infiltration
KR101192248B1 (en) 2005-12-21 2012-10-17 에스케이케미칼주식회사 Metal surface treating agent composition
US20070160859A1 (en) 2006-01-06 2007-07-12 General Electric Company Layered thermal barrier coatings containing lanthanide series oxides for improved resistance to CMAS degradation
FI121341B (en) 2006-02-02 2010-10-15 Beneq Oy Silver protective coating
US7833358B2 (en) 2006-04-07 2010-11-16 Applied Materials, Inc. Method of recovering valuable material from exhaust gas stream of a reaction chamber
US20070259111A1 (en) 2006-05-05 2007-11-08 Singh Kaushal K Method and apparatus for photo-excitation of chemicals for atomic layer deposition of dielectric film
US20070274837A1 (en) 2006-05-26 2007-11-29 Thomas Alan Taylor Blade tip coatings
JP5558815B2 (en) 2006-06-30 2014-07-23 アプライド マテリアルズ インコーポレイテッド Nanocrystal formation
US20080032510A1 (en) 2006-08-04 2008-02-07 Christopher Olsen Cmos sion gate dielectric performance with double plasma nitridation containing noble gas
US7700167B2 (en) 2006-08-31 2010-04-20 Honeywell International Inc. Erosion-protective coatings on polymer-matrix composites and components incorporating such coated composites
US20090239061A1 (en) 2006-11-08 2009-09-24 General Electric Corporation Ceramic corrosion resistant coating for oxidation resistance
WO2008057123A1 (en) 2006-11-09 2008-05-15 Massachusetts Institute Of Technology Preparation and properties of cr-c-p hard coatings annealed at high temperature for high temperature applications
US7776395B2 (en) 2006-11-14 2010-08-17 Applied Materials, Inc. Method of depositing catalyst assisted silicates of high-k materials
US20080268154A1 (en) 2007-04-30 2008-10-30 Shreyas Kher Methods for depositing a high-k dielectric material using chemical vapor deposition process
US8056652B2 (en) 2007-06-25 2011-11-15 Smith International, Inc. Barrier coated granules for improved hardfacing material using atomic layer deposition
US7910446B2 (en) 2007-07-16 2011-03-22 Applied Materials, Inc. Integrated scheme for forming inter-poly dielectrics for non-volatile memory devices
US20090134035A1 (en) 2007-08-02 2009-05-28 United Technologies Corporation Method for forming platinum aluminide diffusion coatings
KR101281682B1 (en) 2007-08-29 2013-07-03 삼성전자주식회사 Methods of forming aluminum oxide layer and manufacturing charge trap memory device using the same
US7585762B2 (en) 2007-09-25 2009-09-08 Applied Materials, Inc. Vapor deposition processes for tantalum carbide nitride materials
US7824743B2 (en) 2007-09-28 2010-11-02 Applied Materials, Inc. Deposition processes for titanium nitride barrier and aluminum
US7737028B2 (en) 2007-09-28 2010-06-15 Applied Materials, Inc. Selective ruthenium deposition on copper materials
US7867900B2 (en) 2007-09-28 2011-01-11 Applied Materials, Inc. Aluminum contact integration on cobalt silicide junction
US20090098289A1 (en) 2007-10-12 2009-04-16 Deininger Mark A Pig and Method for Applying Prophylactic Surface Treatments
AU2009205523A1 (en) 2008-01-14 2009-07-23 Applied Biosystems, Llc Compositions, methods, and kits for detecting ribonucleic acid
US8114852B2 (en) 2008-01-15 2012-02-14 The United States Of America As Represented By The Secretary Of Agriculture N-linked glycosylation alteration in E1 glycoprotein of classical swine fever virus and novel classical swine fever virus vaccine
US20090186237A1 (en) 2008-01-18 2009-07-23 Rolls-Royce Corp. CMAS-Resistant Thermal Barrier Coatings
US20110175038A1 (en) 2008-01-28 2011-07-21 College Of William & Mary Coated carbon nanoflakes
US8227078B2 (en) 2008-02-11 2012-07-24 General Electric Company Anti-fouling coatings for combustion system components exposed to slag, ash and/or char
GB0805224D0 (en) 2008-03-20 2008-04-30 Minebea Co Ltd An aerospace bearing component
US7659158B2 (en) 2008-03-31 2010-02-09 Applied Materials, Inc. Atomic layer deposition processes for non-volatile memory devices
US7816200B2 (en) 2008-04-22 2010-10-19 Applied Materials, Inc. Hardware set for growth of high k and capping material films
US20090269507A1 (en) 2008-04-29 2009-10-29 Sang-Ho Yu Selective cobalt deposition on copper surfaces
US8277670B2 (en) 2008-05-13 2012-10-02 Lam Research Corporation Plasma process with photoresist mask pretreatment
US7573586B1 (en) 2008-06-02 2009-08-11 United Technologies Corporation Method and system for measuring a coating thickness
US20100062149A1 (en) 2008-09-08 2010-03-11 Applied Materials, Inc. Method for tuning a deposition rate during an atomic layer deposition process
US8491967B2 (en) 2008-09-08 2013-07-23 Applied Materials, Inc. In-situ chamber treatment and deposition process
US20100075499A1 (en) 2008-09-19 2010-03-25 Olsen Christopher S Method and apparatus for metal silicide formation
US8031346B2 (en) 2008-10-31 2011-10-04 Siemens Energy, Inc. Coating evaluation process
US20100120245A1 (en) 2008-11-07 2010-05-13 Agus Sofian Tjandra Plasma and thermal anneal treatment to improve oxidation resistance of metal-containing films
US8470460B2 (en) 2008-11-25 2013-06-25 Rolls-Royce Corporation Multilayer thermal barrier coatings
US8658255B2 (en) 2008-12-19 2014-02-25 General Electric Company Methods for making environmental barrier coatings and ceramic components having CMAS mitigation capability
KR101263856B1 (en) 2008-12-31 2013-05-13 어플라이드 머티어리얼스, 인코포레이티드 Method of depositing tungsten film with reduced resistivity and improved surface morphology
GB0902633D0 (en) 2009-02-18 2009-04-01 Rolls Royce Plc A method and an arrangement for vapour phase coating of an internal surface of at least one hollow article
US8721812B2 (en) 2009-04-07 2014-05-13 Rolls-Royce Corporation Techniques for controlling precipitate phase domain size in an alloy
US8198671B2 (en) 2009-04-22 2012-06-12 Applied Materials, Inc. Modification of charge trap silicon nitride with oxygen plasma
WO2010128968A1 (en) 2009-05-08 2010-11-11 Mt Coatings, Llc Apparatus and methods for forming modified metal coatings
JP5581805B2 (en) 2010-05-24 2014-09-03 トヨタ自動車株式会社 Method for plating stainless steel material and plating material thereof
EP2392895B1 (en) 2010-06-01 2013-03-06 Tenaris Connections Ltd. Method for measurement of geometrical parameters of coated threaded joints
US20120024403A1 (en) 2010-07-30 2012-02-02 Hamilton Sundstrand Corporation Inorganic coke resistant coatings to prevent aircraft fuel system fouling
US9255327B2 (en) 2010-08-24 2016-02-09 Wayne State University Thermally stable volatile precursors
DE102010040839B4 (en) 2010-09-15 2013-10-17 Osram Opto Semiconductors Gmbh Method for producing an electronic component and electronic component
US8871297B2 (en) 2010-09-30 2014-10-28 Barry Barnett Method of applying a nanocrystalline coating to a gas turbine engine component
US8673397B2 (en) 2010-11-10 2014-03-18 General Electric Company Methods of fabricating and coating a component
KR101679721B1 (en) 2010-12-13 2016-11-28 삼성전자주식회사 A photomask and methods of manufacturing the photomask
US8592005B2 (en) 2011-04-26 2013-11-26 Asm Japan K.K. Atomic layer deposition for controlling vertical film growth
TW201308021A (en) 2011-06-15 2013-02-16 Applied Materials Inc Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin control
TWI492298B (en) 2011-08-26 2015-07-11 Applied Materials Inc Double patterning etching process
US8779407B2 (en) 2012-02-07 2014-07-15 Intermolecular, Inc. Multifunctional electrode
JP6126852B2 (en) 2012-02-21 2017-05-10 ハウメット コーポレイションHowmet Corporation Gas turbine component coating and coating method
FR3000601B1 (en) 2012-12-28 2016-12-09 Commissariat Energie Atomique METHOD FOR FORMING SPACERS OF A GRID OF A TRANSISTOR
GB2511768A (en) 2013-03-12 2014-09-17 Rolls Royce Plc Erosion Resistant Coating
CN105027316B (en) 2013-03-14 2018-07-17 应用材料公司 Thin-film package-is used for the thin superelevation barrier layer of OLED applications
SG11201507165PA (en) 2013-04-10 2015-10-29 Picosun Oy Protecting a target pump interior with an ald coating
WO2014170005A2 (en) 2013-04-16 2014-10-23 Oerlikon Trading Ag, Trübbach Chromium-based oxidation protection layer
US20160222803A1 (en) 2013-09-24 2016-08-04 United Technologies Corporation Method of simultaneously applying three different diffusion aluminide coatings to a single part
EP3060695B1 (en) 2013-10-21 2019-12-11 United Technologies Corporation Ceramic attachment configuration and method for manufacturing same
CN104647828B (en) 2013-11-21 2017-06-16 北京有色金属研究总院 A kind of Cr2O3And Al2O3Complex gradient hydrogen resistance coating and its preparation method and application
WO2015086049A1 (en) 2013-12-10 2015-06-18 Applied Materials, Inc. Evaporation source for organic material, apparatus having an evaporation source for organic material, system having an evaporation deposition apparatus with an evaporation source for organic materials, and method for operating an evaporation source for organic material
US9873940B2 (en) 2013-12-31 2018-01-23 Lam Research Corporation Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus
US9634335B2 (en) * 2014-01-09 2017-04-25 Bloom Energy Corporation Duplex coating for SOFC interconnect
CN105917029B (en) 2014-01-15 2019-05-28 萨夫罗克有限公司 For producing the method for chrome coating and the object of coating
CN105917030B (en) 2014-01-15 2018-04-13 萨夫罗克有限公司 For generating the method for the laminated coating containing chromium and the object of coating
US9385028B2 (en) 2014-02-03 2016-07-05 Applied Materials, Inc. Air gap process
CN106165141B (en) 2014-05-09 2019-01-15 应用材料公司 Substrate carrier system and the method for using it
WO2015191543A1 (en) 2014-06-10 2015-12-17 Applied Materials Israel, Ltd. Scanning an object using multiple mechanical stages
CN106661749B (en) 2014-07-11 2020-06-05 萨夫罗克有限公司 Chromium-containing coating, method for producing same and coated object
US9612522B2 (en) 2014-07-11 2017-04-04 Applied Materials, Inc. Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor
US10072335B2 (en) 2014-08-29 2018-09-11 University Of Maryland, College Park Method of coating of object
BR112017005778A2 (en) 2014-09-22 2017-12-12 3M Innovative Properties Co internal combustion engine components with antifouling properties and production methods thereof
US9620150B2 (en) 2014-11-11 2017-04-11 Seagate Technology Llc Devices including an amorphous gas barrier layer
CN104401089B (en) * 2014-11-28 2017-01-25 中国科学院金属研究所 High-temperature coating comprising nickel-chromium-oxygen active diffusion barrier layer and preparation method
US10141582B2 (en) * 2014-12-22 2018-11-27 Sonata Scientific LLC SOFC interconnect barriers and methods of making same
US9828672B2 (en) 2015-03-26 2017-11-28 Lam Research Corporation Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma
US9683281B2 (en) * 2015-04-10 2017-06-20 United Technologies Corporation Laser assisted oxide removal
WO2016179286A1 (en) 2015-05-05 2016-11-10 Massachusetts Institute Of Technology Substrate pre-scanning for high throughput microscopy
US20180351164A1 (en) 2015-05-15 2018-12-06 Applied Materials, Inc. Masking device for use in a lithium deposition process in the manufacturing of thin film batteries, apparatus configured for a lithium deposition process, method for manufacturing electrodes of thin film batteries, and thin film battery
DE102015209824A1 (en) 2015-05-28 2016-12-01 BSH Hausgeräte GmbH Apparatus and method for determining the contaminant load in a rinsing or washing liquor
KR20170063149A (en) 2015-11-30 2017-06-08 재단법인 포항산업과학연구원 Device and method for cleaning surface of material
FR3044684B1 (en) 2015-12-03 2017-12-08 Ge Energy Products France Snc VANADI CORROSION INHIBITORS BASED ON YTTRIUM AND MAGNESIUM
EP3205765A1 (en) 2016-02-11 2017-08-16 The Procter and Gamble Company Method of washing
KR101761736B1 (en) 2016-02-29 2017-07-26 주식회사 성진케미칼 Oxide film remover using low concentration chelate compound and utilzation method thereof
US11326253B2 (en) 2016-04-27 2022-05-10 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
KR102511828B1 (en) 2016-06-29 2023-03-21 삼성전자주식회사 Method for manufacturing magnetic memory device
US10081036B2 (en) 2016-09-19 2018-09-25 Applied Materials, Inc. Methods and systems for liquid particle prequalification
US10943834B2 (en) 2017-03-13 2021-03-09 Applied Materials, Inc. Replacement contact process
US20180261686A1 (en) 2017-03-13 2018-09-13 Applied Materials, Inc. Transistor sidewall formation process
JP2019513182A (en) 2017-03-17 2019-05-23 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated Carrier, vacuum system and method of operating a vacuum system
US10422984B2 (en) 2017-05-12 2019-09-24 Applied Materials, Inc. Flexible mode scanning optical microscopy and inspection system
US20180340445A1 (en) * 2017-05-25 2018-11-29 United Technologies Corporation Aluminum-chromium oxide coating and method therefor
US10954129B2 (en) 2017-06-08 2021-03-23 Applied Materials, Inc. Diamond-like carbon as mandrel
US10354889B2 (en) 2017-07-17 2019-07-16 Applied Materials, Inc. Non-halogen etching of silicon-containing materials
TWI782077B (en) 2017-09-11 2022-11-01 美商應用材料股份有限公司 Photomask cleaning processes
TWI796358B (en) 2017-09-18 2023-03-21 美商應用材料股份有限公司 Selectively etched self-aligned via processes
JP2021515654A (en) 2018-03-09 2021-06-24 メリット・メディカル・システムズ・インコーポレイテッドMerit Medical Systems,Inc. Ultrasound-compatible inflatable vascular compression and related systems and methods
US10497573B2 (en) 2018-03-13 2019-12-03 Applied Materials, Inc. Selective atomic layer etching of semiconductor materials
US11473197B2 (en) * 2018-03-16 2022-10-18 Raytheon Technologies Corporation HPC and HPT disks coated by atomic layer deposition
EP3768874A4 (en) 2018-03-19 2022-03-30 Applied Materials, Inc. Methods for depositing coatings on aerospace components
US20190284692A1 (en) 2018-03-19 2019-09-19 Applied Materials, Inc. Reactor for applying a coating on internal surfaces of components
US10573527B2 (en) 2018-04-06 2020-02-25 Applied Materials, Inc. Gas-phase selective etching systems and methods
US10490406B2 (en) 2018-04-10 2019-11-26 Appled Materials, Inc. Systems and methods for material breakthrough
WO2019209401A1 (en) 2018-04-27 2019-10-31 Applied Materials, Inc. Protection of components from corrosion
TWI821300B (en) 2018-06-19 2023-11-11 美商應用材料股份有限公司 Deposition system with shield mount
US20200043722A1 (en) 2018-07-31 2020-02-06 Applied Materials, Inc. Cvd based spacer deposition with zero loading
WO2020219332A1 (en) 2019-04-26 2020-10-29 Applied Materials, Inc. Methods of protecting aerospace components against corrosion and oxidation
US11794382B2 (en) 2019-05-16 2023-10-24 Applied Materials, Inc. Methods for depositing anti-coking protective coatings on aerospace components
US11697879B2 (en) 2019-06-14 2023-07-11 Applied Materials, Inc. Methods for depositing sacrificial coatings on aerospace components

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