SG11202007946TA - Reactor for applying a coating on internal surfaces of components - Google Patents
Reactor for applying a coating on internal surfaces of componentsInfo
- Publication number
- SG11202007946TA SG11202007946TA SG11202007946TA SG11202007946TA SG11202007946TA SG 11202007946T A SG11202007946T A SG 11202007946TA SG 11202007946T A SG11202007946T A SG 11202007946TA SG 11202007946T A SG11202007946T A SG 11202007946TA SG 11202007946T A SG11202007946T A SG 11202007946TA
- Authority
- SG
- Singapore
- Prior art keywords
- reactor
- coating
- applying
- components
- internal surfaces
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862644645P | 2018-03-19 | 2018-03-19 | |
PCT/US2019/022788 WO2019182991A1 (en) | 2018-03-19 | 2019-03-18 | Reactor for applying a coating on internal surfaces of components |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202007946TA true SG11202007946TA (en) | 2020-10-29 |
Family
ID=67903902
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202007946TA SG11202007946TA (en) | 2018-03-19 | 2019-03-18 | Reactor for applying a coating on internal surfaces of components |
Country Status (5)
Country | Link |
---|---|
US (1) | US20190284692A1 (en) |
EP (1) | EP3768875A4 (en) |
CN (1) | CN111868299A (en) |
SG (1) | SG11202007946TA (en) |
WO (1) | WO2019182991A1 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10276411B2 (en) | 2017-08-18 | 2019-04-30 | Applied Materials, Inc. | High pressure and high temperature anneal chamber |
CN111936664A (en) | 2018-03-19 | 2020-11-13 | 应用材料公司 | Method for depositing a coating on an aerospace component |
US11015252B2 (en) | 2018-04-27 | 2021-05-25 | Applied Materials, Inc. | Protection of components from corrosion |
US11009339B2 (en) | 2018-08-23 | 2021-05-18 | Applied Materials, Inc. | Measurement of thickness of thermal barrier coatings using 3D imaging and surface subtraction methods for objects with complex geometries |
WO2020219332A1 (en) | 2019-04-26 | 2020-10-29 | Applied Materials, Inc. | Methods of protecting aerospace components against corrosion and oxidation |
US11794382B2 (en) | 2019-05-16 | 2023-10-24 | Applied Materials, Inc. | Methods for depositing anti-coking protective coatings on aerospace components |
US11697879B2 (en) | 2019-06-14 | 2023-07-11 | Applied Materials, Inc. | Methods for depositing sacrificial coatings on aerospace components |
US11466364B2 (en) | 2019-09-06 | 2022-10-11 | Applied Materials, Inc. | Methods for forming protective coatings containing crystallized aluminum oxide |
US11519066B2 (en) | 2020-05-21 | 2022-12-06 | Applied Materials, Inc. | Nitride protective coatings on aerospace components and methods for making the same |
US11739429B2 (en) | 2020-07-03 | 2023-08-29 | Applied Materials, Inc. | Methods for refurbishing aerospace components |
US20240110281A1 (en) * | 2022-09-30 | 2024-04-04 | Raytheon Technologies Corporation | Stacking tool fixture for forced flow chemical vapor infiltration |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5362228A (en) * | 1991-11-04 | 1994-11-08 | Societe Europeenne De Propulsion | Apparatus for preheating a flow of gas in an installation for chemical vapor infiltration, and a densification method using the apparatus |
US6332926B1 (en) * | 1999-08-11 | 2001-12-25 | General Electric Company | Apparatus and method for selectively coating internal and external surfaces of an airfoil |
US6905730B2 (en) * | 2003-07-08 | 2005-06-14 | General Electric Company | Aluminide coating of turbine engine component |
US7875119B2 (en) * | 2004-10-01 | 2011-01-25 | United Technologies Corporation | Apparatus and method for coating an article |
US7838070B2 (en) * | 2005-07-28 | 2010-11-23 | General Electric Company | Method of coating gas turbine components |
EP1772531A1 (en) * | 2005-10-07 | 2007-04-11 | Siemens Aktiengesellschaft | Method and apparatus for internal coating. |
EP1806426A1 (en) * | 2006-01-09 | 2007-07-11 | Siemens Aktiengesellschaft | Supporting device for metallic turbine components |
CN101339895B (en) * | 2008-08-22 | 2010-06-02 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Gas distribution device and plasma processing apparatus applying the same |
GB0902633D0 (en) * | 2009-02-18 | 2009-04-01 | Rolls Royce Plc | A method and an arrangement for vapour phase coating of an internal surface of at least one hollow article |
WO2015047783A1 (en) * | 2013-09-24 | 2015-04-02 | United Technologies Corporation | Method of simultaneously applying three different diffusion aluminide coatings to a single part |
US9873940B2 (en) * | 2013-12-31 | 2018-01-23 | Lam Research Corporation | Coating system and method for coating interior fluid wetted surfaces of a component of a semiconductor substrate processing apparatus |
US20170241273A1 (en) * | 2016-02-18 | 2017-08-24 | General Electric Company | System and Method for Simultaneously Depositing Multiple Coatings on a Turbine Blade of a Gas Turbine Engine |
-
2019
- 2019-03-18 CN CN201980019149.5A patent/CN111868299A/en active Pending
- 2019-03-18 SG SG11202007946TA patent/SG11202007946TA/en unknown
- 2019-03-18 US US16/356,681 patent/US20190284692A1/en not_active Abandoned
- 2019-03-18 WO PCT/US2019/022788 patent/WO2019182991A1/en unknown
- 2019-03-18 EP EP19772037.8A patent/EP3768875A4/en active Pending
Also Published As
Publication number | Publication date |
---|---|
EP3768875A4 (en) | 2021-12-15 |
EP3768875A1 (en) | 2021-01-27 |
WO2019182991A1 (en) | 2019-09-26 |
US20190284692A1 (en) | 2019-09-19 |
CN111868299A (en) | 2020-10-30 |
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