JP2022524811A5 - - Google Patents

Info

Publication number
JP2022524811A5
JP2022524811A5 JP2021554687A JP2021554687A JP2022524811A5 JP 2022524811 A5 JP2022524811 A5 JP 2022524811A5 JP 2021554687 A JP2021554687 A JP 2021554687A JP 2021554687 A JP2021554687 A JP 2021554687A JP 2022524811 A5 JP2022524811 A5 JP 2022524811A5
Authority
JP
Japan
Prior art keywords
dielectric material
layer
dielectric
depositing
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021554687A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022524811A (ja
JP7547359B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2020/021996 external-priority patent/WO2020185835A1/en
Publication of JP2022524811A publication Critical patent/JP2022524811A/ja
Publication of JP2022524811A5 publication Critical patent/JP2022524811A5/ja
Application granted granted Critical
Publication of JP7547359B2 publication Critical patent/JP7547359B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021554687A 2019-03-11 2020-03-11 静電チャックの製造方法 Active JP7547359B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962816687P 2019-03-11 2019-03-11
US62/816,687 2019-03-11
PCT/US2020/021996 WO2020185835A1 (en) 2019-03-11 2020-03-11 Methods of manufacturing electrostatic chucks

Publications (3)

Publication Number Publication Date
JP2022524811A JP2022524811A (ja) 2022-05-10
JP2022524811A5 true JP2022524811A5 (https=) 2024-05-15
JP7547359B2 JP7547359B2 (ja) 2024-09-09

Family

ID=72423932

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021554687A Active JP7547359B2 (ja) 2019-03-11 2020-03-11 静電チャックの製造方法

Country Status (10)

Country Link
US (1) US11673161B2 (https=)
EP (1) EP3939157A4 (https=)
JP (1) JP7547359B2 (https=)
KR (1) KR102796742B1 (https=)
CN (1) CN113647009B (https=)
IL (1) IL286108B2 (https=)
MY (1) MY210488A (https=)
SG (1) SG11202109712UA (https=)
TW (1) TWI843819B (https=)
WO (1) WO2020185835A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119153287B (zh) * 2024-11-19 2025-10-14 海拓创新技术(杭州)有限公司 一种静电卡盘的制造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100430643B1 (ko) * 1994-01-31 2004-05-12 어플라이드 머티어리얼스, 인코포레이티드 두께가 균일한 절연체 막을 갖는 정전기 척
US6225240B1 (en) 1998-11-12 2001-05-01 Advanced Micro Devices, Inc. Rapid acceleration methods for global planarization of spin-on films
JP3616732B2 (ja) 1999-07-07 2005-02-02 東京エレクトロン株式会社 基板の処理方法及び処理装置
JP2008016795A (ja) * 2006-07-06 2008-01-24 Momentive Performance Materials Inc 耐腐食性ウェーハプロセス装置およびその作製方法
KR100867631B1 (ko) 2007-02-01 2008-11-10 삼성전자주식회사 반도체 장치 및 그 제조 방법
US8206829B2 (en) * 2008-11-10 2012-06-26 Applied Materials, Inc. Plasma resistant coatings for plasma chamber components
EP2490073B1 (en) 2011-02-18 2015-09-23 ASML Netherlands BV Substrate holder, lithographic apparatus, and method of manufacturing a substrate holder
US9360771B2 (en) * 2011-03-17 2016-06-07 Asml Netherlands B.V. Electrostatic clamp, lithographic apparatus, and device manufacturing method
NL2008630A (en) * 2011-04-27 2012-10-30 Asml Netherlands Bv Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder.
WO2012147931A1 (ja) 2011-04-27 2012-11-01 住友大阪セメント株式会社 静電チャック装置
US8941969B2 (en) * 2012-12-21 2015-01-27 Applied Materials, Inc. Single-body electrostatic chuck
WO2015013142A1 (en) * 2013-07-22 2015-01-29 Applied Materials, Inc. An electrostatic chuck for high temperature process applications
CN107078086B (zh) * 2014-02-07 2021-01-26 恩特格里斯公司 静电夹具以及制造其之方法
TWI656596B (zh) * 2014-08-26 2019-04-11 Asml Holding N. V. 靜電夾具及其製造方法
US10115527B2 (en) 2015-03-09 2018-10-30 Blackberry Limited Thin film dielectric stack
DE102015210736B3 (de) * 2015-06-11 2016-10-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung mit folie zum elektrostatischen koppeln eines substrats mit einem substratträger
JP2017216443A (ja) * 2016-05-20 2017-12-07 ラム リサーチ コーポレーションLam Research Corporation 再配線層における均一性を実現するためのシステム及び方法
JP6796531B2 (ja) * 2017-03-31 2020-12-09 日本特殊陶業株式会社 基板保持装置の補修方法

Similar Documents

Publication Publication Date Title
JP6955023B2 (ja) 静電チャックのための新しい修理方法
CA2097404A1 (en) System for continuous fabrication of micro-structures and thin film semiconductor devices on elongate substrates
US9633834B2 (en) Photolithographic method for forming a coating layer
JP2022524811A5 (https=)
JP2003203906A (ja) プラズマスプレイ方式を利用したセラミック半導体部品の製造及びリサイクル方法
EP3059081A1 (en) Nanofiber interlaminar layer for ceramic matrix composites
JP7547359B2 (ja) 静電チャックの製造方法
TW363202B (en) Insulator composition and green tape
TWI565532B (zh) 奈米球溶液塗佈方法與其應用
CN111916556A (zh) 压电复合薄膜及其制备方法和压电器件
CN101693515B (zh) 用于mems领域的可图形化聚合物薄膜的制备方法
DK1756882T3 (da) Fremgangsmåde til fremstilling af piezoelektriske materialer
KR102182699B1 (ko) 플라즈마 처리 장치용 내부재 및 이의 제조 방법
JP2007224348A5 (https=)
CN1955330A (zh) 用于制造部件的方法和设备
JP3598726B2 (ja) 耐酸化性の改善されたSiC系複合材料及びその製造方法
EP0368504A3 (en) Method for planarizing an integrated circuit structure
LU501047B1 (en) Mim actuator with thick pzt film and haptic device with such an actuator
KR101001644B1 (ko) 정전척의 전극 제조방법
JPH0447886B2 (https=)
EP0422748A3 (en) Method for planarizing an integrated structure
JPH0255280A (ja) セラミック成型体の製造法
CN108505017A (zh) 一种精确控制dlc膜层厚度的dlc膜层制备方法
KR20200061116A (ko) 개선된 세라믹 마스크 제조 방법 및 그 세라믹 마스크
JPH02278850A (ja) 半導体装置の製造方法