JP2022510681A5 - - Google Patents

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Publication number
JP2022510681A5
JP2022510681A5 JP2021531967A JP2021531967A JP2022510681A5 JP 2022510681 A5 JP2022510681 A5 JP 2022510681A5 JP 2021531967 A JP2021531967 A JP 2021531967A JP 2021531967 A JP2021531967 A JP 2021531967A JP 2022510681 A5 JP2022510681 A5 JP 2022510681A5
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Japan
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mol
repeating units
range
present
random copolymer
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JP2021531967A
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Japanese (ja)
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JP2022510681A (ja
JP7269346B2 (ja
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Priority claimed from PCT/EP2019/083589 external-priority patent/WO2020115090A1/en
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Publication of JP2022510681A5 publication Critical patent/JP2022510681A5/ja
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JP2021531967A 2018-12-07 2019-12-04 ポリスチレン-b-ポリ(メチルメタクリレート)ジブロックコポリマーのコンタクトホール自己集合のための高速架橋可能な中性下層及びそれらの調合物 Active JP7269346B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862776802P 2018-12-07 2018-12-07
US62/776,802 2018-12-07
PCT/EP2019/083589 WO2020115090A1 (en) 2018-12-07 2019-12-04 Rapid cross-linkable neutral underlayers for contact hole self-assembly of polystyrene-b- poly(methyl methacrylate) diblock copolymers and their formulation thereof

Publications (3)

Publication Number Publication Date
JP2022510681A JP2022510681A (ja) 2022-01-27
JP2022510681A5 true JP2022510681A5 (https=) 2022-12-01
JP7269346B2 JP7269346B2 (ja) 2023-05-08

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JP2021531967A Active JP7269346B2 (ja) 2018-12-07 2019-12-04 ポリスチレン-b-ポリ(メチルメタクリレート)ジブロックコポリマーのコンタクトホール自己集合のための高速架橋可能な中性下層及びそれらの調合物

Country Status (8)

Country Link
US (1) US12559644B2 (https=)
EP (1) EP3891198B1 (https=)
JP (1) JP7269346B2 (https=)
KR (1) KR102561427B1 (https=)
CN (1) CN113490696B (https=)
SG (1) SG11202103809PA (https=)
TW (1) TWI772720B (https=)
WO (1) WO2020115090A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11202103809PA (en) 2018-12-07 2021-05-28 Merck Patent Gmbh Rapid cross-linkable neutral underlayers for contact hole self-assembly of polystyrene-b- poly(methyl methacrylate) diblock copolymers and their formulation thereof
WO2022243216A1 (en) * 2021-05-18 2022-11-24 Merck Patent Gmbh Hydrophobic crosslinkable pinning underlayers with improved dry etch capabilities for patterning directed self-assembly of ps-b-pmma type block copolymers
KR20250004089A (ko) * 2022-05-03 2025-01-07 메르크 파텐트 게엠베하 이블록 공중합체의 유도 자기 조립을 위한 SiARC 기판 상용성을 개선하기 위한 히드록실 단량체를 함유하는 신규한 중성 매트의 개발
CN117331279A (zh) * 2022-06-23 2024-01-02 华为技术有限公司 感光树脂组合物、膜材、含苯并环丁烯结构的环氧化合物及其应用

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