JP2024519063A5 - - Google Patents
Info
- Publication number
- JP2024519063A5 JP2024519063A5 JP2023571602A JP2023571602A JP2024519063A5 JP 2024519063 A5 JP2024519063 A5 JP 2024519063A5 JP 2023571602 A JP2023571602 A JP 2023571602A JP 2023571602 A JP2023571602 A JP 2023571602A JP 2024519063 A5 JP2024519063 A5 JP 2024519063A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- coating
- substrate
- random copolymer
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163189803P | 2021-05-18 | 2021-05-18 | |
| US63/189,803 | 2021-05-18 | ||
| PCT/EP2022/063127 WO2022243216A1 (en) | 2021-05-18 | 2022-05-16 | Hydrophobic crosslinkable pinning underlayers with improved dry etch capabilities for patterning directed self-assembly of ps-b-pmma type block copolymers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2024519063A JP2024519063A (ja) | 2024-05-08 |
| JP2024519063A5 true JP2024519063A5 (https=) | 2024-05-22 |
| JP7835780B2 JP7835780B2 (ja) | 2026-03-25 |
Family
ID=82019972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023571602A Active JP7835780B2 (ja) | 2021-05-18 | 2022-05-16 | Ｐｓ－ｂ－ｐｍｍａタイプブロックコポリマーの誘導自己集合体をパターン化するための改善されたドライエッチング能を有する疎水性の架橋可能ピン止め下層 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20240219829A1 (https=) |
| EP (1) | EP4341310B1 (https=) |
| JP (1) | JP7835780B2 (https=) |
| KR (1) | KR20240008940A (https=) |
| CN (1) | CN117321096A (https=) |
| TW (1) | TWI901886B (https=) |
| WO (1) | WO2022243216A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4044216A1 (en) * | 2021-02-16 | 2022-08-17 | Siltronic AG | Method for testing the stress robustness of a semiconductor substrate |
| KR20240101079A (ko) * | 2022-12-23 | 2024-07-02 | 삼성전자주식회사 | 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| KR102868869B1 (ko) * | 2024-01-26 | 2025-10-14 | 에스케이하이닉스 주식회사 | 가교제 프리 포토레지스트를 활용한 네거티브 패턴 형성방법 |
| WO2026041747A1 (en) * | 2024-08-22 | 2026-02-26 | Merck Patent Gmbh | Carbon and silicone enriched new high-chi block copolymers of novel architectures for thin-film self-assembly applications |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8101261B2 (en) * | 2008-02-13 | 2012-01-24 | Micron Technology, Inc. | One-dimensional arrays of block copolymer cylinders and applications thereof |
| US8623458B2 (en) * | 2009-12-18 | 2014-01-07 | International Business Machines Corporation | Methods of directed self-assembly, and layered structures formed therefrom |
| US8691925B2 (en) * | 2011-09-23 | 2014-04-08 | Az Electronic Materials (Luxembourg) S.A.R.L. | Compositions of neutral layer for directed self assembly block copolymers and processes thereof |
| US8835581B2 (en) | 2012-06-08 | 2014-09-16 | Az Electronic Materials (Luxembourg) S.A.R.L. | Neutral layer polymer composition for directed self assembly and processes thereof |
| JP6454324B2 (ja) * | 2013-04-03 | 2019-01-16 | ブルーワー サイエンス アイ エヌ シー． | 誘導自己組織化用ブロックコポリマーに用いる高エッチング耐性ポリマーブロック |
| US10457088B2 (en) | 2013-05-13 | 2019-10-29 | Ridgefield Acquisition | Template for self assembly and method of making a self assembled pattern |
| US9093263B2 (en) | 2013-09-27 | 2015-07-28 | Az Electronic Materials (Luxembourg) S.A.R.L. | Underlayer composition for promoting self assembly and method of making and using |
| US9181449B2 (en) | 2013-12-16 | 2015-11-10 | Az Electronic Materials (Luxembourg) S.A.R.L. | Underlayer composition for promoting self assembly and method of making and using |
| JP6558894B2 (ja) * | 2013-12-31 | 2019-08-14 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | コポリマーの設計、その製造方法およびそれを含む物品 |
| CN104749905B (zh) * | 2013-12-31 | 2018-02-13 | 罗门哈斯电子材料有限公司 | 定向自组装图案形成方法和组合物 |
| US9505945B2 (en) | 2014-10-30 | 2016-11-29 | Az Electronic Materials (Luxembourg) S.A.R.L. | Silicon containing block copolymers for direct self-assembly application |
| KR102651697B1 (ko) * | 2015-09-07 | 2024-03-27 | 아이엠이씨 브이제트더블유 | 트렌치 보조 케모에피탁시(trac) dsa 흐름 |
| US9574104B1 (en) * | 2015-10-16 | 2017-02-21 | Az Electronic Materials (Luxembourg) S.A.R.L. | Compositions and processes for self-assembly of block copolymers |
| JP2017110150A (ja) * | 2015-12-18 | 2017-06-22 | Jsr株式会社 | 着色組成物、着色硬化膜及び表示素子 |
| EP3858872B1 (en) * | 2016-12-21 | 2022-05-11 | Merck Patent GmbH | Compositions and processes for self-assembly of block copolymers |
| US20190127506A1 (en) * | 2017-11-02 | 2019-05-02 | Rohm And Haas Electronic Materials Llc | Low temperature curable addition polymers from vinyl arylcyclobutene-containing monomers and methods for making the same |
| SG11202103809PA (en) * | 2018-12-07 | 2021-05-28 | Merck Patent Gmbh | Rapid cross-linkable neutral underlayers for contact hole self-assembly of polystyrene-b- poly(methyl methacrylate) diblock copolymers and their formulation thereof |
-
2022
- 2022-05-16 WO PCT/EP2022/063127 patent/WO2022243216A1/en not_active Ceased
- 2022-05-16 KR KR1020237043549A patent/KR20240008940A/ko active Pending
- 2022-05-16 US US18/554,651 patent/US20240219829A1/en active Pending
- 2022-05-16 CN CN202280035777.4A patent/CN117321096A/zh active Pending
- 2022-05-16 JP JP2023571602A patent/JP7835780B2/ja active Active
- 2022-05-16 EP EP22729526.8A patent/EP4341310B1/en active Active
- 2022-05-16 TW TW111118185A patent/TWI901886B/zh active
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