CN113490696B - 用于聚苯乙烯-b-聚(甲基丙烯酸甲酯)二嵌段共聚物的接触孔自组装的快速可交联中性底层及其配制剂 - Google Patents
用于聚苯乙烯-b-聚(甲基丙烯酸甲酯)二嵌段共聚物的接触孔自组装的快速可交联中性底层及其配制剂 Download PDFInfo
- Publication number
- CN113490696B CN113490696B CN201980080346.8A CN201980080346A CN113490696B CN 113490696 B CN113490696 B CN 113490696B CN 201980080346 A CN201980080346 A CN 201980080346A CN 113490696 B CN113490696 B CN 113490696B
- Authority
- CN
- China
- Prior art keywords
- mole
- present
- mol
- random copolymer
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/062—Copolymers with monomers not covered by C09D133/06
- C09D133/068—Copolymers with monomers not covered by C09D133/06 containing glycidyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
- C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
- C09D125/02—Homopolymers or copolymers of hydrocarbons
- C09D125/04—Homopolymers or copolymers of styrene
- C09D125/06—Polystyrene
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/10—Homopolymers or copolymers of methacrylic acid esters
- C09D133/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/002—Priming paints
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/008—Temporary coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
- C08F2800/10—Copolymer characterised by the proportions of the comonomers expressed as molar percentages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Formation Of Insulating Films (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862776802P | 2018-12-07 | 2018-12-07 | |
| US62/776,802 | 2018-12-07 | ||
| PCT/EP2019/083589 WO2020115090A1 (en) | 2018-12-07 | 2019-12-04 | Rapid cross-linkable neutral underlayers for contact hole self-assembly of polystyrene-b- poly(methyl methacrylate) diblock copolymers and their formulation thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113490696A CN113490696A (zh) | 2021-10-08 |
| CN113490696B true CN113490696B (zh) | 2022-12-23 |
Family
ID=68808356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201980080346.8A Active CN113490696B (zh) | 2018-12-07 | 2019-12-04 | 用于聚苯乙烯-b-聚(甲基丙烯酸甲酯)二嵌段共聚物的接触孔自组装的快速可交联中性底层及其配制剂 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US12559644B2 (https=) |
| EP (1) | EP3891198B1 (https=) |
| JP (1) | JP7269346B2 (https=) |
| KR (1) | KR102561427B1 (https=) |
| CN (1) | CN113490696B (https=) |
| SG (1) | SG11202103809PA (https=) |
| TW (1) | TWI772720B (https=) |
| WO (1) | WO2020115090A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG11202103809PA (en) | 2018-12-07 | 2021-05-28 | Merck Patent Gmbh | Rapid cross-linkable neutral underlayers for contact hole self-assembly of polystyrene-b- poly(methyl methacrylate) diblock copolymers and their formulation thereof |
| WO2022243216A1 (en) * | 2021-05-18 | 2022-11-24 | Merck Patent Gmbh | Hydrophobic crosslinkable pinning underlayers with improved dry etch capabilities for patterning directed self-assembly of ps-b-pmma type block copolymers |
| KR20250004089A (ko) * | 2022-05-03 | 2025-01-07 | 메르크 파텐트 게엠베하 | 이블록 공중합체의 유도 자기 조립을 위한 SiARC 기판 상용성을 개선하기 위한 히드록실 단량체를 함유하는 신규한 중성 매트의 개발 |
| CN117331279A (zh) * | 2022-06-23 | 2024-01-02 | 华为技术有限公司 | 感光树脂组合物、膜材、含苯并环丁烯结构的环氧化合物及其应用 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106104754A (zh) * | 2014-01-16 | 2016-11-09 | 布鲁尔科技公司 | 用于直接自组装的高chi嵌段共聚物 |
| CN107849202A (zh) * | 2015-06-04 | 2018-03-27 | 株式会社Lg化学 | 中性层组合物 |
| CN108137313A (zh) * | 2015-10-16 | 2018-06-08 | Az电子材料卢森堡有限公司 | 用于嵌段共聚物自组装的组合物和方法 |
Family Cites Families (72)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB715913A (en) | 1951-03-09 | 1954-09-22 | Rohm & Haas | Improvements in or relating to esters of vinyloxyalkoxy compounds and unsaturated carboxylic acids |
| FR1233582A (fr) | 1959-04-20 | 1960-10-12 | Rhone Poulenc Sa | Azonitriles sulfonés |
| US3285949A (en) | 1964-04-17 | 1966-11-15 | Goodrich Co B F | Carboxyl-terminated butadiene polymers prepared in tertiary butanol with bis-azocyano acid initiation |
| US3285959A (en) | 1965-04-19 | 1966-11-15 | Millmaster Onyx Corp | Dodecyl-dimethyl-1, 2, 4, 5-tetramethyl-benzyl ammonium chloride |
| US3474054A (en) | 1966-09-13 | 1969-10-21 | Permalac Corp The | Surface coating compositions containing pyridine salts or aromatic sulfonic acids |
| US3919077A (en) | 1972-12-29 | 1975-11-11 | Darrell Duayne Whitehurst | Sorbent for removal of heavy metals |
| US4200729A (en) | 1978-05-22 | 1980-04-29 | King Industries, Inc | Curing amino resins with aromatic sulfonic acid oxa-azacyclopentane adducts |
| US4251665A (en) | 1978-05-22 | 1981-02-17 | King Industries, Inc. | Aromatic sulfonic acid oxa-azacyclopentane adducts |
| JPS58225103A (ja) | 1982-06-22 | 1983-12-27 | Sumitomo Bakelite Co Ltd | 熱可塑性樹脂の架橋方法 |
| US4698394A (en) | 1985-12-23 | 1987-10-06 | Shell Oil Company | Reactive styrene polymers |
| EP0227124B2 (en) | 1985-12-23 | 1996-01-31 | Shell Internationale Researchmaatschappij B.V. | Olefinic benzocyclobutene polymers and processes for the preparation thereof |
| CA1293090C (en) | 1986-09-29 | 1991-12-10 | Pui Kwan Wong | Olefinic benzocyclobutene polymers and processes for the preparation thereof |
| US5136029A (en) | 1988-10-20 | 1992-08-04 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Hydrolyzable silyl group-containing azo compound |
| US5446125A (en) | 1991-04-01 | 1995-08-29 | Ocg Microelectronic Materials, Inc. | Method for removing metal impurities from resist components |
| US5187019A (en) | 1991-09-06 | 1993-02-16 | King Industries, Inc. | Latent catalysts |
| US5571657A (en) | 1993-09-30 | 1996-11-05 | Shipley Company, Inc. | Modified cation exhange process |
| JP3363051B2 (ja) | 1997-02-21 | 2003-01-07 | 丸善石油化学株式会社 | ビニルフェノール系重合体の金属除去法 |
| NL1014545C2 (nl) | 1999-03-31 | 2002-02-26 | Ciba Sc Holding Ag | Oxim-derivaten en de toepassing daarvan als latente zuren. |
| EP1095711B1 (en) | 1999-10-27 | 2004-01-28 | Novartis AG | Process for coating a material surface |
| WO2002074836A1 (de) | 2001-02-23 | 2002-09-26 | Ems-Chemie Ag | Thermoplastische blockcopolymere aus polyalkyl(meth)acrylat- und polyamidsegmenten sowie deren verwendung |
| JP2003048929A (ja) | 2001-05-29 | 2003-02-21 | Nippon Shokubai Co Ltd | 硬化性樹脂組成物 |
| EP1408066B1 (en) | 2001-06-20 | 2010-03-31 | Nippon Kayaku Kabushiki Kaisha | Block copolymer reduced in impurity content; polymeric carrier; pharmaceutical preparations in polymeric form and process for the preparation of the same |
| JP2003238682A (ja) | 2002-02-19 | 2003-08-27 | Sumitomo Bakelite Co Ltd | ポリアミド系化合物中の金属除去方法 |
| JP4224996B2 (ja) | 2002-07-25 | 2009-02-18 | パナソニック株式会社 | 撮像装置 |
| WO2004062371A1 (en) | 2003-01-09 | 2004-07-29 | Alcon, Inc. | Dual function uv-absorbers for ophthalmic lens materials |
| JP2004255299A (ja) | 2003-02-26 | 2004-09-16 | Matsushita Electric Ind Co Ltd | 触媒担持用フィルタ及び溶媒乾燥方法並びにそれを用いたフィルタへの触媒担持方法 |
| US7471614B2 (en) | 2003-08-29 | 2008-12-30 | International Business Machines Corporation | High density data storage medium |
| US8133534B2 (en) | 2004-11-22 | 2012-03-13 | Wisconsin Alumni Research Foundation | Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials |
| US20090286927A1 (en) | 2005-06-27 | 2009-11-19 | Niels Dan Anders Sodergard | Hyperbranched Polymers |
| US8168284B2 (en) | 2005-10-06 | 2012-05-01 | Wisconsin Alumni Research Foundation | Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates |
| US7411053B2 (en) | 2006-05-25 | 2008-08-12 | Harruna Issifu I | Ligand-functionalized/azo compounds and methods of use thereof |
| JP2008088368A (ja) | 2006-10-04 | 2008-04-17 | Canon Inc | 高分子化合物を含有する組成物の製造方法、組成物、及び液体付与方法 |
| US7964107B2 (en) | 2007-02-08 | 2011-06-21 | Micron Technology, Inc. | Methods using block copolymer self-assembly for sub-lithographic patterning |
| KR100926697B1 (ko) | 2007-06-12 | 2009-11-17 | 연세대학교 산학협력단 | 온도와 조성에 의한 부피 수축 원리를 이용한 다공성 나노구조체의 기공 크기 조절 |
| US8080615B2 (en) | 2007-06-19 | 2011-12-20 | Micron Technology, Inc. | Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide |
| US7790350B2 (en) | 2007-07-30 | 2010-09-07 | International Business Machines Corporation | Method and materials for patterning a neutral surface |
| KR100930966B1 (ko) | 2007-09-14 | 2009-12-10 | 한국과학기술원 | 블록공중합체의 나노구조와 일치하지 않는 형태의 표면패턴상에 형성되는 블록공중합체의 나노구조체 및 그 제조방법 |
| US9183870B2 (en) | 2007-12-07 | 2015-11-10 | Wisconsin Alumni Research Foundation | Density multiplication and improved lithography by directed block copolymer assembly |
| US7763319B2 (en) | 2008-01-11 | 2010-07-27 | International Business Machines Corporation | Method of controlling orientation of domains in block copolymer films |
| US7521094B1 (en) | 2008-01-14 | 2009-04-21 | International Business Machines Corporation | Method of forming polymer features by directed self-assembly of block copolymers |
| US8017194B2 (en) | 2008-01-17 | 2011-09-13 | International Business Machines Corporation | Method and material for a thermally crosslinkable random copolymer |
| US8999492B2 (en) | 2008-02-05 | 2015-04-07 | Micron Technology, Inc. | Method to produce nanometer-sized features with directed assembly of block copolymers |
| US7560141B1 (en) | 2008-11-11 | 2009-07-14 | International Business Machines Corporation | Method of positioning patterns from block copolymer self-assembly |
| US8362179B2 (en) | 2008-11-19 | 2013-01-29 | Wisconsin Alumni Research Foundation | Photopatternable imaging layers for controlling block copolymer microdomain orientation |
| JP5431012B2 (ja) | 2009-04-30 | 2014-03-05 | 株式会社ダイセル | 共重合体、該共重合体を含む樹脂組成物及びその硬化物 |
| JP5222805B2 (ja) | 2009-07-09 | 2013-06-26 | パナソニック株式会社 | 自己組織化パターン形成方法 |
| US8569427B2 (en) | 2009-10-08 | 2013-10-29 | University Of South Carolina | Polymers derived from rosin and their methods of preparation |
| US8623458B2 (en) | 2009-12-18 | 2014-01-07 | International Business Machines Corporation | Methods of directed self-assembly, and layered structures formed therefrom |
| US8309278B2 (en) | 2010-07-07 | 2012-11-13 | Massachusetts Institute Of Technology | Guided self-assembly of block copolymer line structures for integrated circuit interconnects |
| DE102010034577B4 (de) | 2010-08-17 | 2013-01-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung durchschlagfester ultradünner Dielektrika in elektronischen Bauteilen unter Verwendung vernetzbarer polymerer dielektrischer Materialien |
| KR101781517B1 (ko) | 2010-09-30 | 2017-09-26 | 삼성디스플레이 주식회사 | 블록 공중합체 및 이를 이용한 패턴 형성 방법 |
| KR101892623B1 (ko) | 2011-04-29 | 2018-08-30 | 삼성디스플레이 주식회사 | 중성표면을 형성하기 위한 랜덤 공중합체 및 그 제조 및 사용 방법들 |
| JP6064360B2 (ja) | 2011-05-11 | 2017-01-25 | Jsr株式会社 | パターン形成方法及びレジスト下層膜形成用組成物 |
| JP2013008951A (ja) | 2011-05-26 | 2013-01-10 | Sumitomo Chemical Co Ltd | 光及び熱エネルギー架橋性有機薄膜トランジスタ絶縁層材料 |
| JP5240380B1 (ja) | 2011-07-05 | 2013-07-17 | Jsr株式会社 | 樹脂組成物、重合体、硬化膜および電子部品 |
| US8691925B2 (en) | 2011-09-23 | 2014-04-08 | Az Electronic Materials (Luxembourg) S.A.R.L. | Compositions of neutral layer for directed self assembly block copolymers and processes thereof |
| NL2009555A (en) | 2011-10-03 | 2013-04-08 | Asml Netherlands Bv | Method to provide a patterned orientation template for a self-assemblable polymer. |
| US9157008B2 (en) | 2012-02-10 | 2015-10-13 | Board Of Regents, The University Of Texas System | Anhydride copolymer top coats for orientation control of thin film block copolymers |
| US20130209755A1 (en) * | 2012-02-15 | 2013-08-15 | Phillip Dene Hustad | Self-assembled structures, method of manufacture thereof and articles comprising the same |
| US8686109B2 (en) | 2012-03-09 | 2014-04-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Methods and materials for removing metals in block copolymers |
| US9086621B2 (en) | 2012-04-20 | 2015-07-21 | Asml Netherlands B.V. | Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers |
| WO2013160027A1 (en) | 2012-04-27 | 2013-10-31 | Asml Netherlands B.V. | Methods and compositions for providing spaced lithography features on a substrate by self-assembly of block copolymers |
| US8835581B2 (en) | 2012-06-08 | 2014-09-16 | Az Electronic Materials (Luxembourg) S.A.R.L. | Neutral layer polymer composition for directed self assembly and processes thereof |
| JP6454324B2 (ja) * | 2013-04-03 | 2019-01-16 | ブルーワー サイエンス アイ エヌ シー. | 誘導自己組織化用ブロックコポリマーに用いる高エッチング耐性ポリマーブロック |
| US10457088B2 (en) | 2013-05-13 | 2019-10-29 | Ridgefield Acquisition | Template for self assembly and method of making a self assembled pattern |
| US9291909B2 (en) | 2013-05-17 | 2016-03-22 | Az Electronic Materials (Luxembourg) S.A.R.L. | Composition comprising a polymeric thermal acid generator and processes thereof |
| US9093263B2 (en) | 2013-09-27 | 2015-07-28 | Az Electronic Materials (Luxembourg) S.A.R.L. | Underlayer composition for promoting self assembly and method of making and using |
| JP6558894B2 (ja) | 2013-12-31 | 2019-08-14 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | コポリマーの設計、その製造方法およびそれを含む物品 |
| US9738765B2 (en) * | 2015-02-19 | 2017-08-22 | International Business Machines Corporation | Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers |
| KR101738513B1 (ko) | 2016-06-17 | 2017-05-26 | 이기성 | 동영상 미디어를 제공하기 위한 이동 단말기, 이를 포함한 시스템 및 그 제어 방법 |
| SG11201900207PA (en) * | 2016-08-18 | 2019-03-28 | Az Electronic Mat Luxembourg Sarl | Polymer compositions for self-assembly applications |
| SG11202103809PA (en) | 2018-12-07 | 2021-05-28 | Merck Patent Gmbh | Rapid cross-linkable neutral underlayers for contact hole self-assembly of polystyrene-b- poly(methyl methacrylate) diblock copolymers and their formulation thereof |
-
2019
- 2019-12-04 SG SG11202103809PA patent/SG11202103809PA/en unknown
- 2019-12-04 EP EP19816628.2A patent/EP3891198B1/en active Active
- 2019-12-04 JP JP2021531967A patent/JP7269346B2/ja active Active
- 2019-12-04 US US17/293,710 patent/US12559644B2/en active Active
- 2019-12-04 TW TW108144341A patent/TWI772720B/zh active
- 2019-12-04 WO PCT/EP2019/083589 patent/WO2020115090A1/en not_active Ceased
- 2019-12-04 CN CN201980080346.8A patent/CN113490696B/zh active Active
- 2019-12-04 KR KR1020217018565A patent/KR102561427B1/ko active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106104754A (zh) * | 2014-01-16 | 2016-11-09 | 布鲁尔科技公司 | 用于直接自组装的高chi嵌段共聚物 |
| CN107849202A (zh) * | 2015-06-04 | 2018-03-27 | 株式会社Lg化学 | 中性层组合物 |
| CN108137313A (zh) * | 2015-10-16 | 2018-06-08 | Az电子材料卢森堡有限公司 | 用于嵌段共聚物自组装的组合物和方法 |
Non-Patent Citations (1)
| Title |
|---|
| 定向嵌段共聚物薄膜制备纳米孔阵列模板;王非等;《功能材料》;20060320(第03期);431-433 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020115090A1 (en) | 2020-06-11 |
| CN113490696A (zh) | 2021-10-08 |
| SG11202103809PA (en) | 2021-05-28 |
| TW202031701A (zh) | 2020-09-01 |
| KR102561427B1 (ko) | 2023-07-28 |
| TWI772720B (zh) | 2022-08-01 |
| EP3891198A1 (en) | 2021-10-13 |
| KR20210100116A (ko) | 2021-08-13 |
| US12559644B2 (en) | 2026-02-24 |
| EP3891198B1 (en) | 2023-03-15 |
| JP2022510681A (ja) | 2022-01-27 |
| JP7269346B2 (ja) | 2023-05-08 |
| US20220002575A1 (en) | 2022-01-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2949702B1 (en) | Compositions of neutral layer for directed self assembly block copolymers and processes thereof | |
| CN113490696B (zh) | 用于聚苯乙烯-b-聚(甲基丙烯酸甲酯)二嵌段共聚物的接触孔自组装的快速可交联中性底层及其配制剂 | |
| TWI832955B (zh) | 在低玻璃轉移溫度(Tg)寡聚物存在下用於形成圖案的增強定向自組裝 | |
| KR102409830B1 (ko) | 자가-조립 적용을 위한 중합체 조성물 | |
| JP7835780B2 (ja) | Ps-b-pmmaタイプブロックコポリマーの誘導自己集合体をパターン化するための改善されたドライエッチング能を有する疎水性の架橋可能ピン止め下層 | |
| TWI887304B (zh) | 非硫醇類基於氮之疏水性高分子刷材料及其用於基板表面修飾之用途 | |
| CN107074532A (zh) | 用于定向自组装图案化中的通孔形成的缺陷减少方法和组合物 | |
| TW202140580A (zh) | 用於嵌段共聚物之自組裝之新穎組合物及方法 | |
| US11384193B2 (en) | Hydrophobic pinning mat for directed self-assembly of diblock copolymer novel compositions and processes for self-assembly of block copolymers | |
| TW202424027A (zh) | 用於定向自組裝之低Tg多繫鏈共聚合雙嵌段共聚物 | |
| KR20250145104A (ko) | 지향적 자가 조립 응용분야에서 자가 조립된 모폴로지를 개선하기 위한 블록 공중합체 배합물 | |
| TW202406953A (zh) | 開發含有羥基單體之新型中性墊以改善用於雙嵌段共聚物定向自組裝之SiARC基板的相容性 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |