JP2024501808A5 - - Google Patents
Info
- Publication number
- JP2024501808A5 JP2024501808A5 JP2023537023A JP2023537023A JP2024501808A5 JP 2024501808 A5 JP2024501808 A5 JP 2024501808A5 JP 2023537023 A JP2023537023 A JP 2023537023A JP 2023537023 A JP2023537023 A JP 2023537023A JP 2024501808 A5 JP2024501808 A5 JP 2024501808A5
- Authority
- JP
- Japan
- Prior art keywords
- alkylene
- group
- block copolymer
- alkyl
- oxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063126570P | 2020-12-17 | 2020-12-17 | |
| US63/126,570 | 2020-12-17 | ||
| PCT/EP2021/085861 WO2022129154A1 (en) | 2020-12-17 | 2021-12-15 | Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024501808A JP2024501808A (ja) | 2024-01-16 |
| JP2024501808A5 true JP2024501808A5 (https=) | 2024-11-07 |
Family
ID=79287792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023537023A Pending JP2024501808A (ja) | 2020-12-17 | 2021-12-15 | 誘導自己集合化のための交互コポリマーセグメントからなる調整可能な高カイジブロックコポリマー及びそれの応用 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US12583961B2 (https=) |
| EP (1) | EP4263643A1 (https=) |
| JP (1) | JP2024501808A (https=) |
| KR (1) | KR20230119186A (https=) |
| CN (1) | CN116761831A (https=) |
| TW (1) | TW202233709A (https=) |
| WO (1) | WO2022129154A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4263643A1 (en) | 2020-12-17 | 2023-10-25 | Merck Patent GmbH | Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof |
| EP4615891A1 (en) * | 2022-11-11 | 2025-09-17 | Merck Patent GmbH | Dsa of liquid crystal block copolymers for integrated circuit patterning |
| WO2026041747A1 (en) | 2024-08-22 | 2026-02-26 | Merck Patent Gmbh | Carbon and silicone enriched new high-chi block copolymers of novel architectures for thin-film self-assembly applications |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2582659B1 (fr) * | 1985-06-03 | 1987-07-31 | Saint Gobain Isover | Alliages de polymeres polystyrene polyamide |
| DE10029699A1 (de) | 2000-06-16 | 2001-12-20 | Emtec Magnetics Gmbh | Magnetische oder magnetisierbare Bindemittelzusammensetzung |
| DE10029697A1 (de) | 2000-06-16 | 2001-12-20 | Basf Ag | Feststoffhaltige Bindemittelzusammensetzung mit radikalisch polymerisierten Blockcopolymeren |
| JP4963946B2 (ja) * | 2006-12-08 | 2012-06-27 | 電気化学工業株式会社 | （メタ）アクリル酸エステルを用いたブロック共重合体 |
| JP2010283928A (ja) | 2009-06-02 | 2010-12-16 | Kuraray Co Ltd | 高分子トランスデューサ |
| WO2015041146A1 (ja) * | 2013-09-20 | 2015-03-26 | Dic株式会社 | ブロック共重合体の製造方法及びその方法により得られたブロック共重合体 |
| FR3014877B1 (fr) * | 2013-12-17 | 2017-03-31 | Arkema France | Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure |
| FR3022249B1 (fr) | 2014-06-11 | 2018-01-19 | Arkema France | Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure |
| JP2016107211A (ja) | 2014-12-05 | 2016-06-20 | Jsr株式会社 | 自己組織化膜の形成方法、パターン形成方法及び自己組織化膜形成用組成物 |
| US10259907B2 (en) * | 2015-02-20 | 2019-04-16 | Az Electronic Materials (Luxembourg) S.À R.L. | Block copolymers with surface-active junction groups, compositions and processes thereof |
| WO2018066716A1 (ja) | 2016-10-07 | 2018-04-12 | Jsr株式会社 | パターン形成方法及び組成物 |
| EP4263643A1 (en) | 2020-12-17 | 2023-10-25 | Merck Patent GmbH | Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof |
-
2021
- 2021-12-15 EP EP21839891.5A patent/EP4263643A1/en active Pending
- 2021-12-15 TW TW110146861A patent/TW202233709A/zh unknown
- 2021-12-15 JP JP2023537023A patent/JP2024501808A/ja active Pending
- 2021-12-15 KR KR1020237023589A patent/KR20230119186A/ko active Pending
- 2021-12-15 WO PCT/EP2021/085861 patent/WO2022129154A1/en not_active Ceased
- 2021-12-15 CN CN202180085047.0A patent/CN116761831A/zh active Pending
- 2021-12-15 US US18/253,083 patent/US12583961B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2024501808A5 (https=) | ||
| KR102327569B1 (ko) | 표면-활성 접합 기를 가진 블록 공중합체, 이의 조성물 및 방법 | |
| JP2021130821A5 (https=) | ||
| JP2005528499A5 (https=) | ||
| JP5346006B2 (ja) | マイケル付加化合物フルオロケミカルシラン | |
| US8343578B2 (en) | Self-assembled lamellar microdomains and method of alignment | |
| US9556353B2 (en) | Orientation control materials for block copolymers used in directed self-assembly applications | |
| KR102817907B1 (ko) | 기판의 선택적 소액성 표면 개질 | |
| JP2023521230A5 (https=) | ||
| JP2024040229A5 (https=) | ||
| JP2022510681A5 (https=) | ||
| JP7820296B2 (ja) | 非チオールタイプ窒素系疎水性ポリマーブラシ材料及び基材表面の改質のためのそれの使用 | |
| JP7662303B2 (ja) | パーフルオロポリエーテル変性ポリシラザン、表面処理剤、硬化皮膜並びに物品 | |
| US12583961B2 (en) | Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof | |
| JP2023502763A5 (https=) | ||
| JP6534034B2 (ja) | 硬化性組成物、並びにそれを用いた硬化物の製造方法及びその再溶解方法 | |
| JPH0464636B2 (https=) | ||
| CN115124668B (zh) | 含氟多嵌段共聚物及其制备方法和应用 | |
| JP2021005704A5 (https=) | ||
| KR20240058892A (ko) | Dsa에 사용하기 위한 스핀 코팅 방법을 통한 선택적 자기 조립 단층 | |
| JPWO2022114209A5 (https=) | ||
| JP2024534061A5 (https=) | ||
| TW201800434A (zh) | 具有線性表面活性接合基團之嵌段共聚物及其組合物與製法 | |
| JP7804508B2 (ja) | ブロック共重合体 | |
| CN114195643B (zh) | 化合物、聚合物、图案形成材料、图案形成方法及半导体装置的制造方法 |