KR20230119186A - 지향성 자기 조립을 위한 교호 공중합체 세그먼트로이루어진 조정 가능한 하이 카이 디블록 공중합체 및 그의 적용 - Google Patents

지향성 자기 조립을 위한 교호 공중합체 세그먼트로이루어진 조정 가능한 하이 카이 디블록 공중합체 및 그의 적용 Download PDF

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Publication number
KR20230119186A
KR20230119186A KR1020237023589A KR20237023589A KR20230119186A KR 20230119186 A KR20230119186 A KR 20230119186A KR 1020237023589 A KR1020237023589 A KR 1020237023589A KR 20237023589 A KR20237023589 A KR 20237023589A KR 20230119186 A KR20230119186 A KR 20230119186A
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South Korea
Prior art keywords
alkylene
alkyl
block copolymer
moiety
structural formula
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English (en)
Korean (ko)
Inventor
듀라이라즈 바스카란
엠디 에스 라만
사친 보바데
에드워드 더블유 엔지
빅토르 몬리얼
은정 정
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메르크 파텐트 게엠베하
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Publication of KR20230119186A publication Critical patent/KR20230119186A/ko
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/06—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from hydroxycarboxylic acids
    • C08G63/08—Lactones or lactides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR1020237023589A 2020-12-17 2021-12-15 지향성 자기 조립을 위한 교호 공중합체 세그먼트로이루어진 조정 가능한 하이 카이 디블록 공중합체 및 그의 적용 Pending KR20230119186A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202063126570P 2020-12-17 2020-12-17
US63/126,570 2020-12-17
PCT/EP2021/085861 WO2022129154A1 (en) 2020-12-17 2021-12-15 Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof

Publications (1)

Publication Number Publication Date
KR20230119186A true KR20230119186A (ko) 2023-08-16

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KR1020237023589A Pending KR20230119186A (ko) 2020-12-17 2021-12-15 지향성 자기 조립을 위한 교호 공중합체 세그먼트로이루어진 조정 가능한 하이 카이 디블록 공중합체 및 그의 적용

Country Status (7)

Country Link
US (1) US12583961B2 (https=)
EP (1) EP4263643A1 (https=)
JP (1) JP2024501808A (https=)
KR (1) KR20230119186A (https=)
CN (1) CN116761831A (https=)
TW (1) TW202233709A (https=)
WO (1) WO2022129154A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4263643A1 (en) 2020-12-17 2023-10-25 Merck Patent GmbH Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof
EP4615891A1 (en) * 2022-11-11 2025-09-17 Merck Patent GmbH Dsa of liquid crystal block copolymers for integrated circuit patterning
WO2026041747A1 (en) 2024-08-22 2026-02-26 Merck Patent Gmbh Carbon and silicone enriched new high-chi block copolymers of novel architectures for thin-film self-assembly applications

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2582659B1 (fr) * 1985-06-03 1987-07-31 Saint Gobain Isover Alliages de polymeres polystyrene polyamide
DE10029699A1 (de) 2000-06-16 2001-12-20 Emtec Magnetics Gmbh Magnetische oder magnetisierbare Bindemittelzusammensetzung
DE10029697A1 (de) 2000-06-16 2001-12-20 Basf Ag Feststoffhaltige Bindemittelzusammensetzung mit radikalisch polymerisierten Blockcopolymeren
JP4963946B2 (ja) * 2006-12-08 2012-06-27 電気化学工業株式会社 （メタ）アクリル酸エステルを用いたブロック共重合体
JP2010283928A (ja) 2009-06-02 2010-12-16 Kuraray Co Ltd 高分子トランスデューサ
WO2015041146A1 (ja) * 2013-09-20 2015-03-26 Dic株式会社 ブロック共重合体の製造方法及びその方法により得られたブロック共重合体
FR3014877B1 (fr) * 2013-12-17 2017-03-31 Arkema France Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
FR3022249B1 (fr) 2014-06-11 2018-01-19 Arkema France Procede de controle de la periode d'un film de copolymere a blocs nanostructue a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
JP2016107211A (ja) 2014-12-05 2016-06-20 Jsr株式会社 自己組織化膜の形成方法、パターン形成方法及び自己組織化膜形成用組成物
US10259907B2 (en) * 2015-02-20 2019-04-16 Az Electronic Materials (Luxembourg) S.À R.L. Block copolymers with surface-active junction groups, compositions and processes thereof
WO2018066716A1 (ja) 2016-10-07 2018-04-12 Jsr株式会社 パターン形成方法及び組成物
EP4263643A1 (en) 2020-12-17 2023-10-25 Merck Patent GmbH Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof

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Publication number Publication date
CN116761831A (zh) 2023-09-15
WO2022129154A1 (en) 2022-06-23
JP2024501808A (ja) 2024-01-16
US20240002571A1 (en) 2024-01-04
US12583961B2 (en) 2026-03-24
TW202233709A (zh) 2022-09-01
EP4263643A1 (en) 2023-10-25

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