JP2024501808A - 誘導自己集合化のための交互コポリマーセグメントからなる調整可能な高カイジブロックコポリマー及びそれの応用 - Google Patents

誘導自己集合化のための交互コポリマーセグメントからなる調整可能な高カイジブロックコポリマー及びそれの応用 Download PDF

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JP2024501808A
JP2024501808A JP2023537023A JP2023537023A JP2024501808A JP 2024501808 A JP2024501808 A JP 2024501808A JP 2023537023 A JP2023537023 A JP 2023537023A JP 2023537023 A JP2023537023 A JP 2023537023A JP 2024501808 A JP2024501808 A JP 2024501808A
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alkylene
block copolymer
alkyl
moiety
oxy
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Japanese (ja)
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JP2024501808A5 (https=
Inventor
バスカラン・ドゥライラジュ
ラーマン・エムディー・エス
ボバーデ・サチン
エヌジー・エドワード・ダブリュー
モンリアル・ヴィクター
チョン・ウンジョン
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Merck Patent GmbH
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Merck Patent GmbH
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Publication of JP2024501808A5 publication Critical patent/JP2024501808A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/06—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from hydroxycarboxylic acids
    • C08G63/08—Lactones or lactides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2023537023A 2020-12-17 2021-12-15 誘導自己集合化のための交互コポリマーセグメントからなる調整可能な高カイジブロックコポリマー及びそれの応用 Pending JP2024501808A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202063126570P 2020-12-17 2020-12-17
US63/126,570 2020-12-17
PCT/EP2021/085861 WO2022129154A1 (en) 2020-12-17 2021-12-15 Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof

Publications (2)

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JP2024501808A true JP2024501808A (ja) 2024-01-16
JP2024501808A5 JP2024501808A5 (https=) 2024-11-07

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JP2023537023A Pending JP2024501808A (ja) 2020-12-17 2021-12-15 誘導自己集合化のための交互コポリマーセグメントからなる調整可能な高カイジブロックコポリマー及びそれの応用

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Country Link
US (1) US12583961B2 (https=)
EP (1) EP4263643A1 (https=)
JP (1) JP2024501808A (https=)
KR (1) KR20230119186A (https=)
CN (1) CN116761831A (https=)
TW (1) TW202233709A (https=)
WO (1) WO2022129154A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4263643A1 (en) 2020-12-17 2023-10-25 Merck Patent GmbH Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof
EP4615891A1 (en) * 2022-11-11 2025-09-17 Merck Patent GmbH Dsa of liquid crystal block copolymers for integrated circuit patterning
WO2026041747A1 (en) 2024-08-22 2026-02-26 Merck Patent Gmbh Carbon and silicone enriched new high-chi block copolymers of novel architectures for thin-film self-assembly applications

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015041146A1 (ja) * 2013-09-20 2015-03-26 Dic株式会社 ブロック共重合体の製造方法及びその方法により得られたブロック共重合体
JP2017501270A (ja) * 2013-12-17 2017-01-12 アルケマ フランス スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム
JP2017524760A (ja) * 2014-06-11 2017-08-31 アルケマ フランス スチレン及びメチルメタクリレートに基づくナノ構造化ブロック共重合体フィルムの周期をコントロールする方法、及びナノ構造化ブロック共重合体フィルム
JP2018507301A (ja) * 2015-02-20 2018-03-15 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法

Family Cites Families (8)

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Publication number Priority date Publication date Assignee Title
FR2582659B1 (fr) * 1985-06-03 1987-07-31 Saint Gobain Isover Alliages de polymeres polystyrene polyamide
DE10029699A1 (de) 2000-06-16 2001-12-20 Emtec Magnetics Gmbh Magnetische oder magnetisierbare Bindemittelzusammensetzung
DE10029697A1 (de) 2000-06-16 2001-12-20 Basf Ag Feststoffhaltige Bindemittelzusammensetzung mit radikalisch polymerisierten Blockcopolymeren
JP4963946B2 (ja) * 2006-12-08 2012-06-27 電気化学工業株式会社 （メタ）アクリル酸エステルを用いたブロック共重合体
JP2010283928A (ja) 2009-06-02 2010-12-16 Kuraray Co Ltd 高分子トランスデューサ
JP2016107211A (ja) 2014-12-05 2016-06-20 Jsr株式会社 自己組織化膜の形成方法、パターン形成方法及び自己組織化膜形成用組成物
WO2018066716A1 (ja) 2016-10-07 2018-04-12 Jsr株式会社 パターン形成方法及び組成物
EP4263643A1 (en) 2020-12-17 2023-10-25 Merck Patent GmbH Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015041146A1 (ja) * 2013-09-20 2015-03-26 Dic株式会社 ブロック共重合体の製造方法及びその方法により得られたブロック共重合体
JP2017501270A (ja) * 2013-12-17 2017-01-12 アルケマ フランス スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム
JP2017524760A (ja) * 2014-06-11 2017-08-31 アルケマ フランス スチレン及びメチルメタクリレートに基づくナノ構造化ブロック共重合体フィルムの周期をコントロールする方法、及びナノ構造化ブロック共重合体フィルム
JP2018507301A (ja) * 2015-02-20 2018-03-15 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法

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Publication number Publication date
KR20230119186A (ko) 2023-08-16
CN116761831A (zh) 2023-09-15
WO2022129154A1 (en) 2022-06-23
US20240002571A1 (en) 2024-01-04
US12583961B2 (en) 2026-03-24
TW202233709A (zh) 2022-09-01
EP4263643A1 (en) 2023-10-25

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