JP2021087952A - 触媒およびこの触媒を用いるフッ素化炭化水素の製造プロセス - Google Patents
触媒およびこの触媒を用いるフッ素化炭化水素の製造プロセス Download PDFInfo
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- JP2021087952A JP2021087952A JP2021024682A JP2021024682A JP2021087952A JP 2021087952 A JP2021087952 A JP 2021087952A JP 2021024682 A JP2021024682 A JP 2021024682A JP 2021024682 A JP2021024682 A JP 2021024682A JP 2021087952 A JP2021087952 A JP 2021087952A
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- 239000003054 catalyst Substances 0.000 title claims abstract description 172
- 238000000034 method Methods 0.000 title claims abstract description 83
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- 229910052725 zinc Inorganic materials 0.000 claims abstract description 18
- 150000001875 compounds Chemical class 0.000 claims abstract description 15
- 238000001179 sorption measurement Methods 0.000 claims abstract description 15
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 10
- 229910052738 indium Inorganic materials 0.000 claims abstract description 7
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 6
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 6
- 229910052742 iron Inorganic materials 0.000 claims abstract description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 5
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 5
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 5
- 229910052792 caesium Inorganic materials 0.000 claims abstract description 4
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 4
- 229910052802 copper Inorganic materials 0.000 claims abstract description 4
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 4
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 4
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 4
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 4
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 4
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 4
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 4
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 4
- 229910052684 Cerium Inorganic materials 0.000 claims abstract description 3
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 3
- 229910052737 gold Inorganic materials 0.000 claims abstract description 3
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 3
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 3
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract description 3
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 3
- 229910052702 rhenium Inorganic materials 0.000 claims abstract description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 3
- 229910052706 scandium Inorganic materials 0.000 claims abstract description 3
- 229910052709 silver Inorganic materials 0.000 claims abstract description 3
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 3
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 3
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 3
- 239000002245 particle Substances 0.000 claims description 53
- 150000004692 metal hydroxides Chemical class 0.000 claims description 36
- 239000000243 solution Substances 0.000 claims description 30
- 239000008188 pellet Substances 0.000 claims description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 26
- 239000011701 zinc Substances 0.000 claims description 23
- 239000011651 chromium Substances 0.000 claims description 21
- FXRLMCRCYDHQFW-UHFFFAOYSA-N 2,3,3,3-tetrafluoropropene Chemical compound FC(=C)C(F)(F)F FXRLMCRCYDHQFW-UHFFFAOYSA-N 0.000 claims description 20
- 239000008367 deionised water Substances 0.000 claims description 20
- 229910021641 deionized water Inorganic materials 0.000 claims description 20
- 229910000000 metal hydroxide Inorganic materials 0.000 claims description 16
- 239000002002 slurry Substances 0.000 claims description 16
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 claims description 14
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 229910002804 graphite Inorganic materials 0.000 claims description 12
- 239000010439 graphite Substances 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 12
- 239000002244 precipitate Substances 0.000 claims description 11
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 claims description 9
- 238000010304 firing Methods 0.000 claims description 8
- 125000001475 halogen functional group Chemical group 0.000 claims description 8
- 229910044991 metal oxide Inorganic materials 0.000 claims description 8
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- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 7
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- 238000001354 calcination Methods 0.000 claims description 7
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- FDOPVENYMZRARC-UHFFFAOYSA-N 1,1,1,2,2-pentafluoropropane Chemical compound CC(F)(F)C(F)(F)F FDOPVENYMZRARC-UHFFFAOYSA-N 0.000 claims description 4
- ZDCWZRQSHBQRGN-UHFFFAOYSA-N 1,1,1,2,3-pentafluoropropane Chemical group FCC(F)C(F)(F)F ZDCWZRQSHBQRGN-UHFFFAOYSA-N 0.000 claims description 4
- PGJHURKAWUJHLJ-UHFFFAOYSA-N 1,1,2,3-tetrafluoroprop-1-ene Chemical group FCC(F)=C(F)F PGJHURKAWUJHLJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000001914 filtration Methods 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- 239000012266 salt solution Substances 0.000 claims description 4
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- LDTMPQQAWUMPKS-OWOJBTEDSA-N (e)-1-chloro-3,3,3-trifluoroprop-1-ene Chemical compound FC(F)(F)\C=C\Cl LDTMPQQAWUMPKS-OWOJBTEDSA-N 0.000 claims description 3
- VJGCZWVJDRIHNC-UHFFFAOYSA-N 1-fluoroprop-1-ene Chemical compound CC=CF VJGCZWVJDRIHNC-UHFFFAOYSA-N 0.000 claims description 3
- JRHNUZCXXOTJCA-UHFFFAOYSA-N 1-fluoropropane Chemical compound CCCF JRHNUZCXXOTJCA-UHFFFAOYSA-N 0.000 claims description 3
- OQISUJXQFPPARX-UHFFFAOYSA-N 2-chloro-3,3,3-trifluoroprop-1-ene Chemical compound FC(F)(F)C(Cl)=C OQISUJXQFPPARX-UHFFFAOYSA-N 0.000 claims description 3
- PHFQLYPOURZARY-UHFFFAOYSA-N chromium trinitrate Chemical compound [Cr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PHFQLYPOURZARY-UHFFFAOYSA-N 0.000 claims description 3
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- 239000002904 solvent Substances 0.000 claims description 3
- LVGUZGTVOIAKKC-UHFFFAOYSA-N 1,1,1,2-tetrafluoroethane Chemical compound FCC(F)(F)F LVGUZGTVOIAKKC-UHFFFAOYSA-N 0.000 claims description 2
- INEMUVRCEAELBK-UHFFFAOYSA-N 1,1,1,2-tetrafluoropropane Chemical compound CC(F)C(F)(F)F INEMUVRCEAELBK-UHFFFAOYSA-N 0.000 claims description 2
- 229910002651 NO3 Inorganic materials 0.000 claims description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 2
- 238000005119 centrifugation Methods 0.000 claims description 2
- 238000006115 defluorination reaction Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
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- UCUXYVNKFJJXDE-UHFFFAOYSA-N nitrate;hydrate Chemical compound O.[O-][N+]([O-])=O UCUXYVNKFJJXDE-UHFFFAOYSA-N 0.000 claims description 2
- 230000001376 precipitating effect Effects 0.000 claims description 2
- 238000003825 pressing Methods 0.000 claims description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
- 238000003756 stirring Methods 0.000 claims description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims 2
- CDOOAUSHHFGWSA-OWOJBTEDSA-N (e)-1,3,3,3-tetrafluoroprop-1-ene Chemical compound F\C=C\C(F)(F)F CDOOAUSHHFGWSA-OWOJBTEDSA-N 0.000 claims 1
- BYHQTRFJOGIQAO-GOSISDBHSA-N 3-(4-bromophenyl)-8-[(2R)-2-hydroxypropyl]-1-[(3-methoxyphenyl)methyl]-1,3,8-triazaspiro[4.5]decan-2-one Chemical compound C[C@H](CN1CCC2(CC1)CN(C(=O)N2CC3=CC(=CC=C3)OC)C4=CC=C(C=C4)Br)O BYHQTRFJOGIQAO-GOSISDBHSA-N 0.000 claims 1
- CYJRNFFLTBEQSQ-UHFFFAOYSA-N 8-(3-methyl-1-benzothiophen-5-yl)-N-(4-methylsulfonylpyridin-3-yl)quinoxalin-6-amine Chemical compound CS(=O)(=O)C1=C(C=NC=C1)NC=1C=C2N=CC=NC2=C(C=1)C=1C=CC2=C(C(=CS2)C)C=1 CYJRNFFLTBEQSQ-UHFFFAOYSA-N 0.000 claims 1
- 239000001294 propane Substances 0.000 claims 1
- 229910052723 transition metal Inorganic materials 0.000 claims 1
- 150000003624 transition metals Chemical class 0.000 claims 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 abstract description 19
- 238000002459 porosimetry Methods 0.000 abstract description 10
- 229910052736 halogen Inorganic materials 0.000 abstract description 4
- 150000002367 halogens Chemical class 0.000 abstract description 3
- 125000004432 carbon atom Chemical group C* 0.000 abstract description 2
- -1 halogen hydrides Chemical class 0.000 abstract description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 54
- 238000006243 chemical reaction Methods 0.000 description 35
- 230000000052 comparative effect Effects 0.000 description 32
- 229910052757 nitrogen Inorganic materials 0.000 description 27
- 238000009826 distribution Methods 0.000 description 18
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- 230000000694 effects Effects 0.000 description 14
- 235000011114 ammonium hydroxide Nutrition 0.000 description 8
- 239000000523 sample Substances 0.000 description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
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- VQWFNAGFNGABOH-UHFFFAOYSA-K chromium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[Cr+3] VQWFNAGFNGABOH-UHFFFAOYSA-K 0.000 description 4
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- 238000012360 testing method Methods 0.000 description 3
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- UTACNSITJSJFHA-UHFFFAOYSA-N 1,1,1,3-tetrachloropropane Chemical compound ClCCC(Cl)(Cl)Cl UTACNSITJSJFHA-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 238000000441 X-ray spectroscopy Methods 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 150000001350 alkyl halides Chemical class 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
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- MSSNHSVIGIHOJA-UHFFFAOYSA-N pentafluoropropane Chemical compound FC(F)CC(F)(F)F MSSNHSVIGIHOJA-UHFFFAOYSA-N 0.000 description 2
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- FYIRUPZTYPILDH-UHFFFAOYSA-N 1,1,1,2,3,3-hexafluoropropane Chemical compound FC(F)C(F)C(F)(F)F FYIRUPZTYPILDH-UHFFFAOYSA-N 0.000 description 1
- DMUPYMORYHFFCT-UHFFFAOYSA-N 1,2,3,3,3-pentafluoroprop-1-ene Chemical compound FC=C(F)C(F)(F)F DMUPYMORYHFFCT-UHFFFAOYSA-N 0.000 description 1
- FDMFUZHCIRHGRG-UHFFFAOYSA-N 3,3,3-trifluoroprop-1-ene Chemical compound FC(F)(F)C=C FDMFUZHCIRHGRG-UHFFFAOYSA-N 0.000 description 1
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- QIVBCDIJIAJPQS-VIFPVBQESA-N L-tryptophane Chemical compound C1=CC=C2C(C[C@H](N)C(O)=O)=CNC2=C1 QIVBCDIJIAJPQS-VIFPVBQESA-N 0.000 description 1
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- 239000003463 adsorbent Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
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- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/24—Chromium, molybdenum or tungsten
- B01J23/26—Chromium
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- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
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- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/84—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/85—Chromium, molybdenum or tungsten
- B01J23/86—Chromium
- B01J23/866—Nickel and chromium
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- B01J27/06—Halogens; Compounds thereof
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Abstract
Description
a)金属塩溶液および水酸化物溶液を調製する工程と、
b)7.5を超えるpHで溶液を混合して、金属水酸化物(複数可)を沈殿させる工程と、
c)沈殿した金属水酸化物を乾燥させる工程と、
d)金属水酸化物(複数可)を焼成して金属酸化物(複数可)を形成する工程と、を含む。
500mLの脱イオン水ヒールを、オーバーフロー、オーバーヘッド撹拌機、pHプローブ、および熱電対を装着した1.7Lのジャケット付きガラス容器に添加し、15°Cに冷却した。撹拌機を500rpmで作動させ、実施例5に保存し、250rpmで回転させた。
活性=50−(S2−RT)
式中、S2は、ストレス温度2で10%の134aの収率を得るための予測反応温度であり、RTは、287.5℃である。
安定性=50−(S3−RT)
式中、S3は、ストレス温度3で10%の134aの収率を得るための予測反応温度であり、RTは、287.5℃である。
表3を参照して以下に記載されるように適合される、実施例1〜8の方法に実質的に従って触媒を調製した。
図1および2、ならびに表4は、投与の開始から2、6、および15分後、ならびに投与が完了した後の測定粒径分布を示す。開始から2分後には、非常に小さな粒子がほとんどであるが、いくつかの大きな粒子も存在する。これらの大きな粒子は、投与開始から6分後には存在しなくなり、その時点までに小さな粒子の総数は最大となる。その後、分布は大きなサイズへの段階的なシフトを示す。
図3および4、ならびに表5は、投与の開始から2、6、および15分後、ならびに投与が完了した後の測定粒径分布を示す。開始から2分後には、大きな粒子の存在がほとんどである。しかし6分で、大きな粒子の数は低減し、小さな粒子の数は有意に増加した。粒子システムは、投与の最後の15分間ではほとんど変化を示さない。
図5および6、ならびに表6は、投与の開始から2、6、および15分後、ならびに投与が完了した後の測定粒径分布を示す。開始から2分後には、小さな粒子の存在がほとんどであり、それは6分に達すると数が増加する。その後、それらの小さな粒子の総数は徐々に減少し、大きな粒子の数は増加する。
図7および8、ならびに表7は、投与の開始から2、6、および15分後、ならびに投与が完了した後の測定粒径分布を示す。分布は、投与のプロセスにわたって、より小さい粒子の数が徐々に増加することを示す。投与の最後の15分間では、より大きな粒子の数が減少する。
比較例の触媒を以下の方法に従って作製した。20 500mLの脱イオン水ヒールを、オーバーフロー、オーバーヘッド撹拌機、pHプローブ、および熱電対を装着した1.7Lのジャケット付きガラス容器に添加し、15°Cに冷却した。撹拌機を500rpmで作動させた。
500mLの脱イオン水ヒールを、オーバーフロー、オーバーヘッド撹拌機、pHプローブ、および熱電対を装着した1.7Lのジャケット付きガラス容器に添加し、15°Cに冷却した。撹拌機を500rpmで作動させ、実施例5に保存し、250rpmで回転させた。
500mLの脱イオン水ヒールを、オーバーフロー、オーバーヘッド撹拌機、pHプローブ、および熱電対を装着した1.7Lのジャケット付きガラス容器に添加し、15°Cに冷却した。撹拌機を411rpmで作動させた。Cr(NO3)2(OH)(水溶液)の溶液(500g)を600mLビーカーに量り取り、In(NO3)3.3H2O (13.3g)および17%のNH4OH溶液(318g)を別のビーカーに量り取った。次いで、触媒を、目標pH8.5で、実施例24と同じ手順によって調製し、スラリーを脱イオン水(3×600mL)で洗浄した。
500mLの脱イオン水ヒールを、オーバーフロー、オーバーヘッド撹拌機、pHプローブ、および熱電対を装着した1.7Lのジャケット付きガラス容器に添加し、15°Cに冷却した。撹拌機を406rpmで作動させた。Cr(NO3)2(OH)(水溶液)の溶液(500g)を600mLビーカーに量り取り、ZrOCl2.8H2O(13.6g)のメタノール(50mL)溶液および17%のNH4OH溶液(350g)を別のビーカーに量り取った。次いで、触媒を、目標pH8.5で、実施例24と同じ手順によって調製し、スラリーを脱イオン水(3×600mL)で洗浄した。
実施例24〜26の触媒の性能を、HFとの接触による1233xfのフッ素化からの1234yfおよび245cbの生成について試験した。結果を市販のクロミア触媒(比較例27)および市販のZnドープクロミア触媒(比較例28)の結果と比較した。
実施例24および25の触媒の性能を、245cbの脱フッ化水素化からの1234yfの生成について試験した。結果を市販のクロミア触媒(比較例29)および市販の亜鉛促進クロミア触媒(比較例30)の結果と比較した。
実施例24〜26の触媒の性能を、245ebの脱フッ化水素化からの1234yfおよび245cbの生成について試験した。結果を市販のクロミア触媒(比較例31)および市販の亜鉛促進クロミア触媒(比較例32)の結果と比較した。
Claims (49)
- クロミアおよび少なくとも1種の追加の金属またはその化合物を含む触媒であって、前記触媒が0.3cm3/gを超える全細孔容積を有し、平均細孔直径が90Å以上であり、前記全細孔容積がN2吸着圧入法によって測定され、前記平均細孔直径がN2BET吸着圧入法によって測定され、前記少なくとも1種の追加の金属がLi、Na、K、Ca、Mg、Cs、Sc、Al、Y、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Mn、Re、Fe、Ru、Co、Rh、Ir、Ni、Pd、In、Pt、Cu、Ag、Au、Zn、La、Ce、およびそれらの混合物から選択される、触媒。
- 前記細孔容積が0.4cm3/g以上、例えば0.5cm3/g以上である、請求項1に記載の触媒。
- N2BET吸着圧入法によって測定される場合、前記触媒の前記平均細孔幅が100Å以上、例えば110Å以上または120Å以上である、請求項1または2に記載の触媒。
- N2BJH吸着圧入法によって測定される場合、前記触媒の前記平均細孔幅が130Å以上、例えば140Å以上、150Å以上、または170Å以上である、請求項1〜3のいずれか一項に記載の触媒。
- N2BJH脱着圧入法によって測定される場合、前記触媒の前記平均細孔幅が90Å以上、例えば100Å以上、110Å以上、または120Å以上である、請求項1〜4のいずれか一項に記載の触媒。
- 複数の触媒粒子を含む1つまたは複数のペレットの形態で提供される、請求項1〜5のいずれか一項に記載の触媒。
- 前記ペレットがグラファイトを、好ましくは約0.5重量%〜約10重量%、例えば約1重量%〜約5重量%の量で含む、請求項6に記載の触媒。
- 前記ペレットが約1mm〜約100mmの最長寸法を有する、請求項6または7に記載の触媒。
- 前記金属が遷移金属である、請求項1〜8のいずれか一項に記載の触媒。
- 亜鉛を含む、請求項9に記載の触媒。
- 前記触媒が未使用物である、請求項1〜10のいずれか一項に記載の触媒。
- 請求項1〜11のいずれか一項に記載の触媒の調製方法であって、
a)金属塩溶液および水酸化物溶液を調製する工程と、
b)7.5を超えるpHで前記溶液を混合して、前記金属水酸化物(複数可)を沈殿させる工程と、
c)前記沈殿した金属水酸化物を乾燥させる工程と、
d)前記金属水酸化物を焼成して前記金属酸化物(複数可)を形成する工程と、を含む、方法。 - 工程b)が8を超えるpHで行われる、請求項12に記載の方法。
- 工程b)が8.5以上のpHで行われる、請求項12または13に記載の方法。
- 前記金属塩が、水酸化物硝酸塩(例えば、Cr(OH)(NO3)2などの硝酸クロム塩)などの硝酸塩を含む、請求項12〜14のいずれか一項に記載の方法。
- 前記水酸化物溶液が、水酸化アンモニウム(NH4OH)を含み得る、請求項12〜15のいずれか一項に記載の方法。
- 前記金属塩溶液が、約1mol/l〜約10mol/l、例えば約2mol/l〜約8mol/l、例えば約3mol/l〜約7mol/lまたは約4mol/l〜約6mol/lの濃度で提供される、請求項12〜16のいずれか一項に記載の方法。
- 前記水酸化物溶液が、1mol/l〜約10mol/l、例えば約2mol/l〜約8mol/l、例えば約3mol/l〜約7mol/lまたは約4mol/l〜約6mol/lの濃度で提供される、請求項12〜17のいずれか一項に記載の方法。
- 工程(b)が、水などの溶媒体中で前記溶液を混合することによって行われる、請求項12〜18のいずれか一項に記載の方法。
- 工程b)が、実質的に一定の温度、例えば0〜50°C、好ましくは10〜30°Cで行われる、請求項12〜19のいずれか一項に記載の方法。
- 工程(b)が、例えば1つ以上のインペラ、ジェットミキサー、または再循環ポンプの使用によって、前記混合溶液を撹拌しながら行われる、請求項12〜20のいずれか一項に記載の方法。
- 工程(b)中に形成された前記沈殿物が、好ましくは、約5μm〜約20μm、例えば約7μm〜約15μmまたは約8μm〜約13μm、例えば約10μmの平均最長寸法を有する粒子を含む、請求項13〜22のいずれか一項に記載の方法。
- 工程(c)が、例えば濾過または遠心作用によって、金属水酸化物沈殿物(複数可)のスラリーから液体を除去して、湿潤ケーキを生成することを含む、請求項12〜22のいずれか一項に記載の方法。
- 前記ケーキが、任意の乾燥または焼成の前に、好ましくは水(例えば、脱イオン水)またはアルカリ水溶液(例えば、水酸化アンモニウム)への曝露によって洗浄される、請求項23に記載の方法。
- 工程(c)が、ケーキを高温に曝露することによって、前記湿潤金属水酸化物(複数可)ケーキから液体、例えば残留液体を除去することを含み、好ましくは、前記高温が50℃〜200℃であり、より好ましくは80℃〜150℃、例えば約90℃〜約120℃であり得る、請求項23または24に記載の方法。
- 前記沈殿物が、好ましくは、少なくとも15分間、例えば少なくとも30分間または少なくとも1時間にわたって前記高温に曝露される、請求項25に記載の方法。
- 工程(d)が、好ましくは液体の除去および/または乾燥後に、前記金属水酸化物を焼成する工程を含む、請求項12〜26のいずれか一項に記載の方法。
- 前記焼成工程が、前記金属水酸化物を約200℃〜約550℃、例えば約250℃〜約500℃、例えば約300℃〜約400℃の温度に加熱することを含む、請求項12〜27のいずれか一項に記載の方法。
- 前記焼成工程が、約15%未満、例えば約12%未満または約10%未満、例えば約8%のTGA強熱減量(LOI)を有する触媒を生成するのに十分な時間にわたって行われる、請求項12〜28のいずれか一項に記載の方法。
- 前記焼成金属酸化物とグラファイトとを混合して、約0.1重量%〜約10重量%のグラファイトを含む触媒組成物を提供することをさらに含む、請求項12〜19のいずれか一項に記載の方法。
- 前記焼成金属酸化物および/または触媒組成物が押圧されて触媒ペレットを形成する、請求項12〜30のいずれか一項に記載の方法。
- 前記押圧が、約1〜100トン、例えば約1〜10トン、例えば約5トンの荷重下で行われる、請求項31に記載の方法。
- そのように形成された前記ペレットが約1mm〜約100mmの最長寸法を有し、好ましくは前記ペレットが約1mm〜約10mm、例えば約3mm〜約5mmの最長寸法を有する、請求項32に記載の方法。
- C2〜3ヒドロハロカーボン種をフッ素化するプロセスであって、前記種と請求項1〜11のいずれか一項に記載の触媒とを接触させることを含む、プロセス。
- トリクロロエチレンと前記触媒とをHFの存在下で接触させて、1,1,1,2−テトラフルオロエタン(134a)を生成することを含む、請求項34に記載のプロセス。
- 前記種がC3ヒドロハロカーボン種である、請求項34に記載のプロセス。
- C2〜3ヒドロハロカーボン種を脱ハロゲン化水素化するプロセスであって、前記種と請求項1〜11のいずれか一項に記載の触媒とを接触させることを含む、プロセス。
- 前記種がC3ヒドロハロカーボン種である、請求項37に記載のプロセス。
- ヒドロ(ハロ)フルオロプロパンと前記触媒とを接触させて、フルオロプロペンを生成することを含む、請求項37または請求項38に記載のプロセス。
- 前記フルオロプロペンが、テトラフルオロプロペン(1234)である、請求項37に記載のプロセス。
- 前記ヒドロ(ハロ)プロパンが、1,1,1,2,3−ペンタフルオロプロパン、1,1,1,2,2−ペンタフルオロプロパン、および/または1,1,1,3,3−ペンタフルオロプロパンから選択される化合物を含む、請求項40に記載のプロセス。
- 前記テトラフルオロプロパンが、1,3,3,3−テトラフルオロプロペンおよび/または2,3,3,3−テトラフルオロプロペンを含む、請求項40または請求項41に記載のプロセス。
- テトラフルオロプロペンを製造するプロセスであって、ヒドロ(ハロ)プロペンとHFとを、請求項1〜11のいずれか一項に記載の触媒の存在下で接触させることを含む、プロセス。
- 前記ヒドロ(ハロ)プロペンが、1−クロロ−3,3,3−トリフルオロプロペンおよび/または2−クロロ−3,3,3−トリフルオロプロペンなどのヒドロクロロフルオロプロペンを含む、請求項43に記載のプロセス。
- 飽和C2〜3ヒドロハロカーボン種からHFを除去するプロセスであって、前記種と請求項1〜11のいずれか一項に記載の触媒とを接触させることを含む、プロセス。
- 不飽和C2〜3ヒドロハロカーボン種にHFを添加するプロセスであって、前記種と請求項1〜11のいずれか一項に記載の触媒とを接触させることを含む、プロセス。
- 前記方法が気相中で行われる、請求項34〜46のいずれか一項に記載のプロセス。
- C2〜3ヒドロハロカーボン種の前記フッ素化および/または脱フッ化水素化における請求項1〜11のいずれかに記載の触媒の使用。
- 請求項1〜11のいずれか一項に記載のフッ素化触媒。
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EP3509741B2 (en) | 2024-01-24 |
JP2019529085A (ja) | 2019-10-17 |
KR20190047718A (ko) | 2019-05-08 |
CN109843429A (zh) | 2019-06-04 |
EP3509741A1 (en) | 2019-07-17 |
US11406965B2 (en) | 2022-08-09 |
KR102311685B1 (ko) | 2021-10-14 |
CN109843429B (zh) | 2023-04-07 |
GB201615209D0 (en) | 2016-10-19 |
JP6876124B2 (ja) | 2021-05-26 |
WO2018046928A1 (en) | 2018-03-15 |
EP3509741B1 (en) | 2020-11-04 |
JP7132378B2 (ja) | 2022-09-06 |
US20190217276A1 (en) | 2019-07-18 |
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