JP2019514196A - 回路保護素子 - Google Patents
回路保護素子 Download PDFInfo
- Publication number
- JP2019514196A JP2019514196A JP2018545935A JP2018545935A JP2019514196A JP 2019514196 A JP2019514196 A JP 2019514196A JP 2018545935 A JP2018545935 A JP 2018545935A JP 2018545935 A JP2018545935 A JP 2018545935A JP 2019514196 A JP2019514196 A JP 2019514196A
- Authority
- JP
- Japan
- Prior art keywords
- circuit protection
- sheet
- laminate
- sheets
- noise filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003990 capacitor Substances 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 20
- 238000012986 modification Methods 0.000 claims description 17
- 230000004048 modification Effects 0.000 claims description 17
- 239000004020 conductor Substances 0.000 description 22
- 238000010586 diagram Methods 0.000 description 19
- 239000011521 glass Substances 0.000 description 18
- 238000000605 extraction Methods 0.000 description 15
- 239000000126 substance Substances 0.000 description 14
- 238000007747 plating Methods 0.000 description 11
- 239000000919 ceramic Substances 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 7
- 239000011810 insulating material Substances 0.000 description 7
- 239000011148 porous material Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000011664 signaling Effects 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- 230000001934 delay Effects 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 230000008054 signal transmission Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910020599 Co 3 O 4 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910003962 NiZn Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- VASIZKWUTCETSD-UHFFFAOYSA-N manganese(II) oxide Inorganic materials [Mn]=O VASIZKWUTCETSD-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0288—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using passive elements as protective elements, e.g. resistors, capacitors, inductors, spark-gaps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0296—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices involving a specific disposition of the protective devices
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Coils Or Transformers For Communication (AREA)
- Filters And Equalizers (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20160027325 | 2016-03-07 | ||
KR10-2016-0027325 | 2016-03-07 | ||
KR10-2016-0180228 | 2016-12-27 | ||
KR1020160180228A KR20170104366A (ko) | 2016-03-07 | 2016-12-27 | 회로 보호 소자 |
PCT/KR2017/002342 WO2017155250A1 (ko) | 2016-03-07 | 2017-03-03 | 회로 보호 소자 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2019514196A true JP2019514196A (ja) | 2019-05-30 |
Family
ID=59926946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018545935A Pending JP2019514196A (ja) | 2016-03-07 | 2017-03-03 | 回路保護素子 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2019514196A (zh) |
KR (2) | KR20170104366A (zh) |
CN (1) | CN108780795B (zh) |
TW (1) | TWI655747B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019112329A1 (ko) * | 2017-12-07 | 2019-06-13 | 주식회사 아모텍 | 다이오드 복합소자 및 그의 제조 방법 |
KR102084066B1 (ko) * | 2018-06-12 | 2020-03-04 | 주식회사 모다이노칩 | 적층형 소자 |
KR20240030266A (ko) * | 2022-08-30 | 2024-03-07 | 주식회사 아모텍 | 적층형 공통 모드 필터 |
KR20240030264A (ko) * | 2022-08-30 | 2024-03-07 | 주식회사 아모텍 | 적층형 공통 모드 필터 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11273953A (ja) * | 1998-03-24 | 1999-10-08 | Murata Mfg Co Ltd | 積層型コモンモードチョークコイル |
JP2004214643A (ja) * | 2002-12-17 | 2004-07-29 | Tdk Corp | 積層チップバリスタとその製造方法 |
JP2007259026A (ja) * | 2006-03-23 | 2007-10-04 | Mitsubishi Materials Corp | 積層型ノイズフィルタ |
JP4458093B2 (ja) * | 2005-01-07 | 2010-04-28 | 株式会社村田製作所 | 電子部品及び電子部品製造方法 |
WO2013031842A1 (ja) * | 2011-09-02 | 2013-03-07 | 株式会社 村田製作所 | フェライト磁器組成物、セラミック電子部品、及びセラミック電子部品の製造方法 |
WO2013038893A1 (ja) * | 2011-09-14 | 2013-03-21 | 株式会社村田製作所 | Esd保護デバイスおよびその製造方法 |
JP2015192149A (ja) * | 2014-03-28 | 2015-11-02 | イノチップ テクノロジー シーオー エルティディー | 回路保護素子 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001358017A (ja) * | 2000-06-12 | 2001-12-26 | Murata Mfg Co Ltd | 積層型コイル部品 |
CN1220328C (zh) * | 2001-06-21 | 2005-09-21 | 株式会社村田制作所 | 噪声滤波器 |
JP2004072006A (ja) * | 2002-08-09 | 2004-03-04 | Matsushita Electric Ind Co Ltd | 積層コモンモードノイズフィルタ |
JP2005223262A (ja) * | 2004-02-09 | 2005-08-18 | Mitsubishi Materials Corp | 積層型コモンモードチョークコイル及びその製造方法 |
KR100845948B1 (ko) * | 2007-04-11 | 2008-07-11 | 주식회사 이노칩테크놀로지 | 회로 보호 소자 및 그 제조 방법 |
KR100876206B1 (ko) | 2007-04-11 | 2008-12-31 | 주식회사 이노칩테크놀로지 | 회로 보호 소자 및 그 제조 방법 |
KR101135354B1 (ko) * | 2010-10-14 | 2012-04-16 | 주식회사 이노칩테크놀로지 | 회로 보호 소자 및 그 제조 방법 |
WO2013031873A1 (ja) * | 2011-08-31 | 2013-03-07 | 株式会社村田製作所 | 積層型コモンモードチョークコイルおよび高周波部品 |
WO2013164952A1 (ja) * | 2012-05-02 | 2013-11-07 | 株式会社村田製作所 | 電子部品 |
JP6074653B2 (ja) * | 2012-09-07 | 2017-02-08 | パナソニックIpマネジメント株式会社 | コモンモードノイズフィルタ |
-
2016
- 2016-12-27 KR KR1020160180228A patent/KR20170104366A/ko not_active Application Discontinuation
-
2017
- 2017-03-03 CN CN201780015304.7A patent/CN108780795B/zh active Active
- 2017-03-03 JP JP2018545935A patent/JP2019514196A/ja active Pending
- 2017-03-06 TW TW106107172A patent/TWI655747B/zh active
-
2018
- 2018-07-24 KR KR1020180086076A patent/KR102216555B1/ko active IP Right Grant
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11273953A (ja) * | 1998-03-24 | 1999-10-08 | Murata Mfg Co Ltd | 積層型コモンモードチョークコイル |
JP2004214643A (ja) * | 2002-12-17 | 2004-07-29 | Tdk Corp | 積層チップバリスタとその製造方法 |
JP4458093B2 (ja) * | 2005-01-07 | 2010-04-28 | 株式会社村田製作所 | 電子部品及び電子部品製造方法 |
JP2007259026A (ja) * | 2006-03-23 | 2007-10-04 | Mitsubishi Materials Corp | 積層型ノイズフィルタ |
WO2013031842A1 (ja) * | 2011-09-02 | 2013-03-07 | 株式会社 村田製作所 | フェライト磁器組成物、セラミック電子部品、及びセラミック電子部品の製造方法 |
WO2013038893A1 (ja) * | 2011-09-14 | 2013-03-21 | 株式会社村田製作所 | Esd保護デバイスおよびその製造方法 |
JP2015192149A (ja) * | 2014-03-28 | 2015-11-02 | イノチップ テクノロジー シーオー エルティディー | 回路保護素子 |
Also Published As
Publication number | Publication date |
---|---|
KR20180088611A (ko) | 2018-08-06 |
TWI655747B (zh) | 2019-04-01 |
TW201803083A (zh) | 2018-01-16 |
CN108780795B (zh) | 2023-06-20 |
KR20170104366A (ko) | 2017-09-15 |
KR102216555B1 (ko) | 2021-02-17 |
CN108780795A (zh) | 2018-11-09 |
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